• 한국재료학회지
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• 제5권8호
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• pp.960-965
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• 1995

반응 가스 분압의 조절에 의한 HCD식 이온 도금 법으로 다양한 조성의 Ti(C, N) 경질 피막을 ASP30 공구강에 도금하였고 이 피막의 내마모성에 대한 조성의 영향을 경도, 밀착력 및 마모기구의 변화 등의 관점에서 고찰하였다. 경도는 질소나 탄소와 같은 비금속 성분량의 증가에 비례하지만 탄소함유량의 중가는 밀착력을 오히려 감소시켰다. 이 경향은 피막 밀도가 비교적 작은 정략적비 이하인 구간([C+N]/Ti<1)에서 보다 그 이상인 조성에서 영향이 뚜렷하였다. 따라서 피막의 내마모 특성은 높은 경도를 유지할 수 있는 ([C+N]/Ti>1)인 구역 내에서 밀착력 저하에 의한 adhesive 형태로의 마모 기구 변이를 억제할 수 있는 저 탄소 조성을 가질 때 최대로 된다.

• 한국재료학회지
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• 제25권5호
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• pp.253-257
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• 2015

The implanting of metal products is performed with numerous surface treatments because of toxicity and adhesion. Recently, the surface modification of metal products has been actively studied by coating the surface of the TiC or TiN film. We prepared a Ti(10%)Ag Target which may be used in dental oral material by, using the AIP(arc ion plating) system TiAgN coating layer that was deposited on Ti g.23. The purpose of this study was to establish the optimal bias voltage conditions of the coated TiAgN layer formed by the AIP process. The TiAgN coatings were prepared with different bias voltage parameters (0V to -500V) to investigate the effect of bias voltage on their mechanical and chemical properties. The SEM(scanning electron microscope), EDS(energy dispersive X-ray spectrometer), XRD(X-ray diffraction), micro-hardness, and potentiodynamic polarization were measured and the surface characteristics of the TiAgN coating layers were evaluated. The TiAgN coating layer had different mechanical characteristics based on the bias voltage, which also showed differences in thickness and composition.

• 한국표면공학회지
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• 제43권5호
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• pp.238-242
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• 2010

In the present work, the influence of oxide on the Cr-Si-N coatings was investigated for the Cr-Si-O-N coatings on AISI 304 and Si wafer deposited by hybrid system, which combines the DC magnetron sputtering technique and arc ion plating (AIP) using Cr and Si target in an $Ar/N_2/O_2$ gaseous mixture. As the O content in the Cr-Si-N coatings increased, the diffraction patterns of the Cr-Si-O-N coatings showed CrN and $Cr_2O_3$ phases. However, as the O content increased to 28.8 at.%, diffraction peak of $Cr_2O_3$ was disappeared in the Cr-Si-O-N coating. The $d_{200}$ value was decreased with increasing of O content. The average grain size increased from about 40 nm to 65 nm as the O content increased. The maximum micro-hardness of the Cr-Si-O-N coating was obtained 4507 Hk at the O content of 24.8 at.%. The average friction coefficient of the Cr-Si-O-N coatings was gradually decreased by increasing the O content and the average friction coefficient decreased from 0.37 to 0.25 by increasing the O content. These results indicated that amorphous phase was increased in the Cr-Si-O-N coatings by increasing of O content.

• 센서학회지
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• 제22권2호
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• pp.130-135
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• 2013

This study proposed a noble process to fabricate TSV (Through Silicon Via) structure which has lower cost, shorter production time, and more simple fabrication process than plating method. In order to produce the via holes, the Si wafer was etched by a DRIE (Deep Reactive Ion Etching) process. The via hole was $100{\mu}m$ in diameter and $400{\mu}m$ in depth. A dielectric layer of $SiO_2$ was formed by thermal oxidation on the front side wafer and via hole side wall. An adhesion layer of Ti and a seed layer of Au were deposited. Soldering process was applied to fill the via holes with solder paste and metal powder. When the solder paste was used as via hole metal line, sintering state and electrical properties were excellent. However, electrical connection was poor due to occurrence of many voids. In the case of metal powder, voids were reduced but sintering state and electrical properties were bad. We tried the via hole filling process by using mixing solder paste and metal powder. As a consequence, it was confirmed that mixing rate of solder paste (4) : metal powder (3) was excellent electrical characteristics.

• 한국표면공학회지
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• 제36권3호
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• pp.256-262
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• 2003

The current efficiency and the composition of Zn-Cr and Zn-Cr-X (X : Co, Mn) alloy electrodeposits were investigated by using chloride bath with EDTA auditive and flow cell plating system. The current efficiency of Zn-Cr alloy decreased with increasing current density, while it increased with the content of Co and Mn of the Zn-Cr-X alloy bath in high current density region. The Cr content in Zn-Cr alloy increased from 1.4-2.7 to $28wt\%$ with increasing current density and the phase structure of the alloys changed from $\eta-Zn$ through $\eta-Zn+\gamma'-ZnCr\;to\;\gamma'-ZnCr$ with Increasing Cr content of the alloys. The Co content in Zn-Cr-Co alloys increased with Co content of the bath, while Cr content of the alloy increased or decreased in low current density region $(10-75A/dm^2)$ or high current density region $(75-100A/dm^2)$, respectively. $\gamma-ZnCo$ phase was formed in the Zn-Cr-Co alloy with above $9.0wt\%$ Co. The content of Mn and Cr in Zn-Cr-Mn alloys increased or decreased with the increase of current density in high current density region, respectively while Cr content of the alloy decreased noticeably with the increase of Mn content in the bath. Two phases of $\delta_1-ZnMn$ and $\gamma'-ZnCr$ were formed in the Zn-Cr-Mn alloy with above $8.6wt\%$ Mn.

• 멤브레인
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• 제8권3호
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• pp.148-156
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• 1998

이온교환막을 이용하는 확산투석은 농도차가 구동력인 막공정으로서 철강 산업, 금속 제련 산업, 전기 도금 산업 등으로부터 발생되어지는 폐산으로부터 염산 및 기타 산들을 회수하는데 사용된다. 이론적으로는 초기산 농도가 증가함에 따라 구동력인 농도차가 커지므로 선형적으로 산의 투과속도가 증가하게 된다. 그러나 염산의 경우 약 3 N 이상의 고농도 범위에서는 투과속도 증가율이 농도차가 커짐에 따라 감소하였다. 본 연구에서는 막흡수 실험과 확산투석조 실험을 통해 염산을 회수하기 위한 확산투석에 산의 농도가 미치는 영향과 농도 범위에 따른 음이온 교환막 내부에서의 산의 이동 기작을 고찰하였다. 실험 결과 저농도(<2 N)산의 경우에는 산의 분자확산, 그리고 고농도 (>2 N)산의 경우에는 수소이온 투과현상 (proton leakage)이 막에서의 지배적인 이동 기작임을 알 수 있었다. 또한 고농도 범위에서는 삼투압에 의한 물분자의 이동과 막의 탈수현상이 수소이온의 이동을 방해하므로 막에서의 산 플럭스 증가율이 감소하였다.

• Corrosion Science and Technology
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• 제11권6호
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• pp.275-279
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• 2012

Ni-W alloy deposits have lately attracted the interest as an alternative surface treatment method for hard chromium electrodeposits because of higher wear resistance, hardness at high temperature, and corrosion resistance. This study deals with influences of process variables, such as electodeposition current density, plating temperature and pH, on the internal stress of Ni-W nanocrystalline deposits. The internal stress was increased with increasing the applied current density. With increasing applied current density, the grain size of the deposit decreases and concentration of hydrogen in the deposit increases. The subsequent release of the hydrogen results in shrinkage of the deposit and the introduction of tensile stress in the deposit. Consequently, for layers deposited at high current density, cracking occurs readily owing to high tensile stress value. By increasing the temperature of the electrodeposition from $60^{\circ}C$ to $80^{\circ}C$, the internal stress was decreased. It seems that an increase in the number of active ions overcoming the activation energy at elevated temperature caused a decline in the concentration polarization and surface diffusion. It decreased the level of hydrogen absorption due to the lessened hydrogen evolution reaction. Therefore, the lower level of hydrogen absorption degenerated the hydride on the surface of the electrode, resulting in the reduction of the internal stress of the deposits. By increasing the pH of the electrodeposition from 5.6 to 6.8, the internal stress in the deposits were slightly decreased. It is considered that the decrease in internal stess of deposits was due to supply of W complex compound in cathode surface, and hydrogen ion resulted from decrease of activity.

• 마이크로전자및패키징학회지
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• 제12권2호
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• pp.129-134
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• 2005

SiP의 3D패키지에 있어서 구리도금은 매우 중요한 역할을 한다 이러한 구리 도금의 조건을 알아보기 위하여 조건이 다른 전해질에서 전기화학적 I-V특성을 분석하였다. 첨가제로 억제제와 촉진제의 특성을 분석하였다. 3D 패키지에 있어서 직경 50, 75, $100{\mu}m$의 via를 사용하였다. Via의 높이는 $100{\mu}m$로 동일하였다. Via의 내부는 확산방지층으로 Ta을 전도성 씨앗층으로 Cu를 magnetron 스퍼터링 방법으로 도포하였다. 직류, 펄스, 펄스-역펄스 등 전류의 파형을 변화시키면서 구리 도금을 하였다. 직류만 사용하였을 경우에는 결함 없이 via가 채워지지 않았으며 펄스도금을 한 경우 구리 충진이 개선을 되었으나 결함이 발생하였다. 펄스-역펄스를 사용한 경우 결함 없는 구리 충진층을 얻을 수 있었다.

• 대한치과보철학회지
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• 제45권6호
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• pp.769-779
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• 2007

Statement of problem. When TiN coating is applied to the abutment screw, occurrence of greater preload and prevention of the screw loosening could be expected due to decrease of frictional resistance. However, the proper thickness of TiN coating on abutment screw has not been yet reported. Purpose. The purpose of this study is to find out the appropriate TiN coating thickness by evaluating the detorque force and the surface change of titanium abutment screw with various TiN coating thickness. Material and methods. 1. Material Thirty five non-coated abutment screws were prepared for TiN coating. TiN coatings were prepared by Arc ion plating method. Depending on the coating deposition time(CDT), experimental groups were divided into 6 groups(CDT 30min, 60min, 90min, 120min, 150min, 180min) and those of 1 group was not coated as a control group. Each group was made up of 5 abutment screws. 2. Methods FE-SEM(Field Emission Scanning Electron Microscoper) and EDX(Energy Dispersive X-ray Spectroscopy) were used to observe the surface of the abutment screw. Electric scales was used to measure the weight of the abutment screw after the repeated closing and opening of 10 trials. Detorque force was measured with digital torque gauge, at each trial. Results. 1. As the coating deposition time increased, the surface became more consistent and smooth. 2. As for the abutment screws that were TiN coated for more than 60 minutes, no surface change was found after the repeated closing and opening. 3. The TiN coated abutment screws showed less weight change than the non-coated abutment screws. 4. The TiN coated abutment screws showed higher mean detorque force than the noncoated abutment screws. 5. The abutment screw coated for 60 minutes showed the highest mean detorque force. Conclusion. The coating layer of proper thickness is demanded to obtain consistent and smooth coating surface, resistance to wear, and increased detorque force of the abutment screw. In conclusion, the coating deposition time of 60 minutes indicated improved mechanical property, when TiN coating was conducted on titanium abutment screw.

• The Journal of Advanced Prosthodontics
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• 제7권2호
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• pp.166-171
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• 2015

PURPOSE. The aim of this study was to evaluate antibacterial activity and osteoblast-like cell viability according to the ratio of titanium nitride and zirconium nitride coating on commercially pure titanium using an arc ion plating system. MATERIALS AND METHODS. Polished titanium surfaces were used as controls. Surface topography was observed by scanning electron microscopy, and surface roughness was measured using a two-dimensional contact stylus profilometer. Antibacterial activity was evaluated against Streptococcus mutans and Porphyromonas gingivalis with the colony-forming unit assay. Cell compatibility, mRNA expression, and morphology related to human osteoblast-like cells (MG-63) on the coated specimens were determined by the XTT assay and reverse transcriptase-polymerase chain reaction. RESULTS. The number of S. mutans colonies on the TiN, ZrN and $(Ti_{1-x}Zr_x)N$ coated surface decreased significantly compared to those on the non-coated titanium surface (P<0.05). CONCLUSION. The number of P. gingivalis colonies on all surfaces showed no significant differences. TiN, ZrN and $(Ti_{1-x}Zr_x)N$ coated titanium showed antibacterial activity against S. mutans related to initial biofilm formation but not P. gingivalis associated with advanced periimplantitis, and did not influence osteoblast-like cell viability.