• 제목/요약/키워드: ion dependency

검색결과 48건 처리시간 0.019초

Modeling the Cardiac Na+/H+ Exchanger Based on Major Experimental Findings

  • Cha, Chae Young;Noma, Akinori
    • Molecules and Cells
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    • 제28권2호
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    • pp.81-85
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    • 2009
  • $Na^+-H^+$ exchanger (NHE) is the main acid extruder in cardiac myocytes. We review the experimental findings of ion-dependency of NHE activity, and the mathematical modeling developed so far. In spite of extensive investigation, many unsolved questions still remain. We consider that the precise description of NHE activity with mathematical models elucidates the roles of NHE in maintaining ionic homeostasis, especially under pathophysiological conditions.

Morphology of Metal Salt of Carboxylic Acid: Metal and Acid Dependency on Branched Round Cluster Images

  • Min Su Kang;Kwang-Jin Hwang
    • 대한화학회지
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    • 제67권4호
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    • pp.222-225
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    • 2023
  • Metallic salts of C10-18 aliphatic carboxylic acids were prepared and their scanning electron microscopic images were analyzed for the morphology dependency with the metal and the carboxylic acid. Regardless of metal ion, metal salts of dicarboxylic acids showed a high crystallinity with a fiber image (SuA-Na). The aromatic dicarboxylates also represented a morphology of a rectangular-rod or board shapes (IA-Li, IA-Ba). With Na ion, most aliphatic carboxylate (MA, PA, SA) showed a fiber-like crystallinity. However, other monovalent Li, K and multivalent Mg, especially Al ion resulted a glassy-amorphous in the metallic salts of acids (MA, PA, SA). With divalent Ba and Ca ions, the metal salt of aliphatic acids expressed a branched round cluster shape as in SA-Ca, SA-Ba. Both Li and Mg ions with a similar size showed a strong morphological similarity in the metallic salts of aliphatic acids MA, PA, SA. In the case of Na and Ca ions with a similar size (98, 106 pm), both ionic salts of stearic acid gave a branching effect for a fiber or round granular image. In the case of hydroxyl-aliphatic acids (HLA, HPA, HSA), the fiber images in HLA-Na and HSA-Na was appeared about 100 nm thicker than those of nonhydroxycarboxylates (LA-Na, SA-Na). The metallic salts of unsaturated C-18 carboxylic acids (OlA, LeA and LnA) showed an amorphous glassy image due to a kinked carbon chain.

초저이온농도에서 이온교환수지에 의한 실리카제거 평형특성 (Equilibrium Property of Ion Exchange Resin for Silica Removal at Ultralow Concentration)

  • 윤태경;이강춘;노병일
    • 한국환경과학회지
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    • 제16권8호
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    • pp.907-912
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    • 2007
  • Ion exchange resin was used to remove silica ion at ultralow concentration. The effects of temperature, type of ion exchange resin and single/mixed-resin systems on removal efficiency were estimated. As temperature increased, the slope of concentration profile became stiff, and the equilibrium concentration was higher. In the single resin system, the removal of silica was continued up to 400 min, but the silica concentration was recovered to initial concentration after 400 min due to the effect of dissolved $CO_2$. In the mixed-resin system it took about 600 min to reach equilibrium. Because of faster cation exchange reaction than anion exchange reaction, the effect of $CO_2$ could be removed. Based on the experimental results carried out in the mixed-resin system, the selectivity coefficients of silica ion for each ion exchange resin were calculated at some specific temperatures. The temperature dependency of the selectivity coefficient was expressed by the equation of Kraus-Raridon type.

Investigation of Adhesion Mechanism at the Metal-Organic Interface Modified by Plasma Part I

  • Sun, Yong-Bin
    • 마이크로전자및패키징학회지
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    • 제9권4호
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    • pp.31-34
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    • 2002
  • For the mold die sticking mechanism, the major explanation is that the silica as a filler in EMC (epoxy molding compound) wears die surface to be roughened, which results in increase of adhesion strength. As the sticking behavior, however, showed strong dependency on the EMC models based on the experimental results from different semiconductor manufacturers, chemisorption or acid-base interaction is apt to be also functioning as major mechanisms. In this investigation, the plasma source ion implantation (PSII) using $O_2, N_2$, and $CF_4$ modifies sample surface to form a new dense layer and improve surface hardness, and change metal surface condition from hydrophilic to hydrophobic or vice versa. Through surface energy quantification by measuring contact angle and surface ion coupling state analysis by Auger, major governing mechanism for sticking issue was figured out to be a complex of mechanical and chemical factors.

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생쥐의 난자와 초기배아의 칼슘이온 대사에 미치는 Ruthenium Red와 Ryanodine의 영향 (Effect of Ruthenium Red and Ryanodine on Calcium Ion Metabolism in Oocyte and Early Embryo of Mouse)

  • 이준영;홍순갑;김태식;민병열;김해권;윤용달
    • 한국발생생물학회지:발생과생식
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    • 제7권2호
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    • pp.95-103
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    • 2003
  • 세포내 칼슘은 다양한 세포에서 중요한 생리적 반응을 일으키며, ruthenium red와 ryanodine은 중요한 칼슘 조절자로 작용한다. Ruthenium red는 세포내 칼슘 저장고에서의 calcium induced calcium release(CICR)를 저해한다. Ryanodine은 ryanodine 통로를 통한 칼슘 방출을 촉진한다. 본 실험은 두 조절자가 생쥐 난자와 초기배아의 세포내 칼슘이온 농도에 영향을 미치는지 여부와 그 유효농도를 알아보고자 수행하였다 난자 및 초기배아내 칼슘이온 함량 변화는 Fluo-3/AM을 이용하여 공초점 레이저주사 현미경을 사용하여 실시간으로 측정하였다. Ruthenium red는 고농도(30$\mu$M, 300$\mu$M)에서 난자와 초기배아의 세포내 칼슘이온 농도를 저하시켰고, ryandoine은 저농도(0.01$\mu$M)에서 세포내 칼슘이온 농도를 증가시켰지만 고농도(10$\mu$M)에서는 세포내 칼슘이온 농도를 감소시켰다. 본 실험결과를 보면, ruthenium red와 ryanodine은 생쥐의 난자 및 초기배아에서도 세포내 칼슘이온 농도에 영향을 미쳤고, 그 유효농도는 근세포를 포함한 체세포와는 차이가 있었다.

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$BCl_3/Ar$ 유도 결합 플라즈마 시스템에서 이온 에너지 분포에 따른 $HfO_2$ 박막의 식각 (The Etching of $HfO_2$ Thin Film as the ion Energy Distributions in the $BCl_3/Ar$ Inductively Coupled Plasma System)

  • 김관하;김경태;김종규;우종창;강찬민;김창일
    • 전기학회논문지
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    • 제56권2호
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    • pp.349-354
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    • 2007
  • In this work, we investigated etching characteristics of $HfO_2$ thin film and Si using inductive coupled plasma(ICP) system. The ion energy distribution functions in an ICP system was analyzed by quadrupole mass spectrometer(QMS) with an electrostatic ion energy analyzer. The maximum etch rate of $HfO_2$ thin film is 85.5 nm/min at a $BCl_3/(BCl_3+Ar)$ of 20 % and decreased with further addition of $BCl_3$ gas. From the QMS measurements, the most dominant positive ion energy distributions(IEDS) showed a maximum at 20 % of $BCl_3$. These tendency was very similar to the etch characteristics. This result agreed with the universal energy dependency of ion enhanced chemical etching yields. And the maximum selectivity of $HfO_2$ over Si is 3.05 at a $O_2$ addition of 2 sccm into the $BCl_3/(BCl_3+Ar)$ of 20 % plasma.

$BCl_3/Ar$ 유도 결합 플라즈마 시스템해서 이온 에너지 분포에 따른$HfO_2$ 박막 식각 (The etching of $HfO_2$ thin film as the ion energy distributions in the $BCl_3/Ar$ inductively coupled plasma system)

  • 김관하;김경태;김종규;우종창;강찬민;김창일
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.117-118
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    • 2006
  • In this work, we investigated etching characteristics of $HfO_2$ thin film and Si using inductive coupled plasma (ICP) system. The ion energy distribution functions in an inductively coupled plasma was analyzed by quadrupole mass spectrometer with an electrostatic ion energy analyzer. The maximum etch rate of $HfO_2$ is 85.5 nm/min at a $BCl_3/(BCl_3+Ar)$ of 20% and decreased with further addition of $BCl_3$ gas. From the QMS measurements, the most dominant positive ion energy distributions (IEDs) showed a maximum at 20 % of $BCl_3$. These tendency was very similar to the etch characteristics. This result agreed with the universal energy dependency of ion enhanced chemical etching yields. And the maximum selectivity of $HfO_2$ over Si is 3.05 at a O2 addition of 2 sccm into the $BCl_3/(BCl_3+ Ar)$ of 20% plasma.

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Statistical Characterization of the Multi-Charged Fragment Ions in the CID and HCD Spectrum

  • Ramachandran, Sangeetha;Thomas, Tessamma
    • Mass Spectrometry Letters
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    • 제12권2호
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    • pp.41-46
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    • 2021
  • Collision-induced dissociation (CID) and higher-energy collisional dissociation (HCD) are the widely used fragmentation technique in mass spectrometry-based proteomics studies. Understanding the fragmentation pattern from the tandem mass spectra using statistical methods helps to implement efficient spectrum analysis algorithms. The study characterizes the frequency of occurrence of multi-charged fragment ions and their neutral loss events of doubly and triply charged peptides in the CID and HCD spectrum. The dependency of the length of the fragment ion on the occurrence of multi-charged fragment ion is characterized here. Study shows that the singly charged fragment ions are generally dominated in the doubly charged peptide spectrum. However, as the length of the product ion increases, the frequency of occurrence of charge 2 fragment ions increases. The y- ions have more tendencies to generate charge 2 fragment ions than b- ions, both in CID and HCD spectrum. The frequency of occurrence of charge 2 fragment ion peaks is prominent upon the dissociation of the triply charged peptides. For triply charged peptides, product ion of higher length occurred in multiple charge states in CID spectrum. The neutral loss peaks mostly exist in charge 2 states in the triply charged peptide spectrum. The b-ions peaks are observed in much less frequency than y-ions in HCD spectrum as the length of the fragment increases. Isotopic peaks are occurred in charge 2 state both in doubly and triply charged peptide's HCD spectrum.

CMOS Well의 Ion Implantation 공정조건에 따른 Latchup 면역성 모의실험 (Latchup Immunity Simulation of CMOS Well for Ion Implantation Process Simulation Conditions)

  • 김종관;이진우;김영훈;김태훈;성영권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1553-1555
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    • 1996
  • This paper deals with latchup effect in CMOS retrograde well, focusing on their dependence on I/I energy conditions, so we derived some latchup characteristics from simulation for different I/I conditions on implantation energies which were used in process simulation. From these results, we could understand the dependency of CMOS retrograde well latchup on I/I energy condition.

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글로벌 모델에 의한 저온 고밀도 플루오로카본 플라즈마 특성의 공정변수 의존성 해석 (Analysis of Process Parameter dependency on the characteristics of high density fluoro carbon plasma using global model)

  • 이호준;태흥식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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    • pp.879-881
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    • 1999
  • Radical and ion densities in a CF4 plasma have been calculated as a function of input power density. 9as pressure and feed gas flow rate using simple 0 dimensional global model. Fluorine atom is found to be the most abundant neutral particle. Highly fragmented species such as CF and CF+ become dominant neutral and ionic radical at the high power condition. As the pressure increases. ion density increases but ionization rate decreases due to the decrease in electron temperature. The fractional dissociation of CF4 feed gas decreases with pressure after increasing at the low pressure range. Electron density and temperature are almost independent of flow rate within calculation conditions studied. The fractional dissociation of CF4 monotonically decreases with flow rate. which results in increase in CF3 and decrease in CF density. The calculation results show that the SiO2 etch selectivity improvement correlates to the increase in the relative density of fluorocarbon ion and neutral radicals which has high C/F ratio.

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