• Title/Summary/Keyword: interlayer

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Small molecule interlayer for solution processed phosphorescent organic light-emitting device

  • Park, Tae-Jin;Park, Jung-Joo;Kim, Gyeong-Heon;Jeon, Woo-Sik;Pode, Ramchandra;Jang, Jin;Kwon, Jang-Hyuk
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.928-931
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    • 2008
  • Using 4,4'4"-tris(N-carbazolyl)-triphenylamine (TCTA) small molecule interlayer, we have fabricated efficient green PHOLED by solution process. The maximum current and power efficiency values of 33.7 cd/A and 19.6 lm/W are demonstrated, respectively. Results reveal a way to fabricate the PHOLED using TCTA interlayer by solution process, promising for efficient and simple manufacturing.

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Characterization of Ni SALICIDE process with Co interlayer and TiN capping layer for 0.1um CMOS device (Co-interlayer와 TiN capping을 적용한 니켈실리사이드의 0.1um CMOS 소자 특성 연구)

  • 오순영;지희환;배미숙;윤장근;김용구;황빈봉;박영호;이희덕;왕진석
    • Proceedings of the IEEK Conference
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    • 2003.07b
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    • pp.671-674
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    • 2003
  • 본 논문에서는 Cobalt interlayer 와 Titanium Nitride(TiN) capping layer를 Ni SALICIDE의 단점인 열 안정성과 sheet resistance 와 series 저항을 감소시키는데 적용하여 0.lum 급 CMOS 소자의 특성을 연구하였다. 첫째로, Ni/Si 의 interface 에 Co interlayer 를 증착하여 Nickel Silicide의 단점인 열 안정성 평가인 700℃, 30min의 furnace annealing 후에 낮은 sheet resistance와 누설전류를 줄일 수 있었다. 두번째로, TiN caping layer를 적용하여 실리사이드 형성시 산소와의 반응을 막아 실리사이드의 표면특성을 향상시켜 누설전류의 특성을 개선하였다. 결과적으로 소자의 구동전류 향상, 누설전류 저하, 낮은 면저항으로 소자의 특성을 개선하였다.

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Novel Small Molecular Materials For Solution Green Phosphorescent OLEDs

  • Lee, Ho-Jae;Yu, Eun-Sun;Jung, Sung-Hyun;Kim, Hyung-Sun;Kang, Eui-Su;Chae, Mi-Young;Chang, Tu-Won
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.791-793
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    • 2009
  • We have developed novel small molecular materials for solution phosphorescent OLEDs having multilayered device structures. These novel materials are applied as an interlayer which is between a buffer layer (or hole injection layer) and an emitting layer to improve the luminance efficiency of solution green phosphorescent OLEDs. In order to form stable double layers by spincoating process, we take the advantage of solubility differences of interlayer materials and emitting materials. Using CIM3 as an interlayer, we have attained the best luminance efficiency, 36 cd/A at a given constant of 2000cd/$m^2$ in the structure of ITO/PEDOT:PSS/CIM3/CIM6:Ir(mppy)$_3$/BAlq/Alq$_3$/LiF/Al.

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XPS Study of MoO3 Interlayer Between Aluminum Electrode and Inkjet-Printed Zinc Tin Oxide for Thin-Film Transistor

  • Choi, Woon-Seop
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.6
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    • pp.267-270
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    • 2011
  • In the process of inkjet-printed zinc tin oxide thin-film transistor, the effect of metallic interlayer underneath of source and drain electrode was investigated. The reason for the improved electrical properties with thin molybdenum oxide ($MoO_3$) layer was due to the chemically intermixed state of metallic interlayer, aluminum source and drain, and oxide semiconductor together. The atomic configuration of three Mo $3d_3$ and $3d_5$ doublets, three different Al 2p core levels, two Sn $3d_5$, and four different types of oxygen O 1s in the interfaces among those layers was confirmed by X-ray photospectroscopy.

Underwater Explosive Welding of Stainless Steel and Magnesium Alloy (수중 충격파를 이용한 스테인레스 스틸과 마그네슘합금의 폭발용접에 관한 연구)

  • Lee, Joon-Oh;Kim, Young-Kook;Cho, Sang-Ho
    • Tunnel and Underground Space
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    • v.22 no.3
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    • pp.221-225
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    • 2012
  • Magnesium is one of the light weight materials, which can improve fuel economy and reduce emissions in automotive industry. Recently, magnesium alloys have gained considerable attention due to good mechanical properties. In this work, we have performed an explosive welding using the magnesium alloys (AZ31) and stainless steel (SUS 304). As a result, SUS304/AZ31 were successfully combined each other; however, a resolidified interlayer was observed at the point of welded layer. To reduce the resolidified interlayer, we have changed the thickness (0.5 mm and 1 mm) of stainless steel, distance (45 mm and 60 mm) between explosive and the center of materials and initial angle ($20^{\circ}$ and $30^{\circ}$) of explosive. In the case of the thickness 0.5 mm and angle of $30^{\circ}$, the resolidfied interlayer was not observed due to the increase of distance from the explosive. To accurately estimate the resolidified interlayer, electron probe micro-analyzer (EPMA) method and hardness were used. For the EPMA analysis, mixed materials were confirmed at the resolidified interlayer, and the measurement exhibited the middle value compared with the AZ31 and SUS304.

Influence of Ag Thickness on the Properties of TiO2/Ag/TiO2 Trilayer Films (Ag 중간층 두께에 따른 TiO2/Ag/TiO2 박막의 광학적 특성 변화)

  • Kim, So-Young;Jeon, Jae-Hyun;Gong, Tae-Kyung;Kim, Sun-Kyung;Choi, Dong-Hyuk;Son, Dong-Il;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
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    • v.28 no.2
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    • pp.63-67
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    • 2015
  • $TiO_2/Ag/TiO_2$ trilayer films were deposited with radio frequency (RF) and direct current (DC) magnetron sputtering onto the glass substrate to consider the influence of Ag interlayer on the optical properties of the films. The thickness of $TiO_2$ films was kept at 24 nm, while the thickness of Ag interlayer was varied as 5, 10, 15, and 20 nm. As-deposited $TiO_2$ single layer films show the optical transmittance of 66.7% in the visible wave-length region and the optical reflectance of 16.5%, while the $TiO_2$ films with a 15 nm thick Ag interlayer show the enhanced optical transmittance of 80.2% and optical reflectance of 77.8%. The carrier concentration was also influenced by Ag interlayer. The highest carrier concentration of $1.01{\times}10^{23}cm^{-3}$ was observed for a 15 nm thick Ag interlayer in $TiO_2/Ag/TiO_2$ films. The observed result means that an optimized Ag interlayer in $TiO_2/Ag/TiO_2$ films enhanced the structural and optical properties of the films.

Microstructure and Ferroelectric Properties of PZT Thin Films Deposited on various Interlayers by R.F. Magnetron Sputtering (R.F. Magnetron Sputtering으로 다양한 Interlayer 층위에 형성시킨 PZT 박막의 미세구조와 강유전 특성)

  • Park, Chul-Ho;Choi, Duck-Young;Son, Young-Guk
    • Journal of the Korean Ceramic Society
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    • v.39 no.8
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    • pp.742-749
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    • 2002
  • The PZT thin films werre deposited on Pt/Ti/$SiO_2$/Si substrate by R. F. magnetron sputtering with $Pb_{1.1}Zr_{0.53}Ti_{0.47}O_3$ target. When interlayers(PbO, $TiO_2$, PbO/$TiO_2$) were inserted between PZT and Pt, the crystallization of the PZT thin films was considerably improved and the processing temperature was lowered. Compared to the pure PZT thin films, dielectric constant, dielectric loss and polarization properties of PZT thin films with interlayers were considerably improved. From XPS depth profile analysis, it was confirmed that PZT thin films and interlayers existed independently. In particular, PZT thin films deposited on interlayer(PbO/$TiO_2$) showed the best dielectric property (${\varepsilon}_r$=414.94, tan${\delta}$=0.0241, Pr=22${\mu}C/cm^2$).

CHARACTERISTICS OF DIAMONDLIKE CARBON COATED ALUMINA SEALS AT TEMPERATURES UP TO $400^{\circ}C$ (플라즈마 증착방식에 의해 DLC코팅된 알루미나 세라믹의 코팅박막 특성에 관한 연구)

  • Ok, Chul-Ho;Kim, Byoung-Yong;Kang, Dong-Hun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.397-397
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    • 2007
  • Diamondlike carbon (DLC) coatings were deposited on alumina ceramic seals using a plasma immersion ion deposition technique (PIID). Then they were subjected to tribological tests using a pin-on-disc tribometer under a high load (1.3 GPa) and under elevated temperatures up to 400C. Coefficients of friction (COFs) were recorded and compared with that of the untreated alumina while the wear tracks were analyzed using SEM with EDS to characterize the DLC films. To enhance the DLC adhesion to the substrate, various interlayers including Si and Cr were deposited using the PIID process or an ion beam assisted deposition (IBAD) method. It was observed that the DLC coating, if adhering well to the substrate, reduced the COFs significantly, from 0.4-0.8 for the uncoated alumina to about 0.05-0.1, within the tested temperature range. The adhesion was determined by the interlayer type and possibly by the application method. Cr interlayer did not perform as well as the Si interlayer. This could also be due to the fact that the Cr interlayer and the subsequent DLC coating had to be done in two different processing systems, while both the Si interlayer and the subsequent DLC film were deposited in one system without breaking the chamber. The coating failure mode was found to be delamination between the Cr and the alumina substrate. In contrast, the Si interlayer with proper DLC deposition procedures resulted in very good adhesion and hence excellent tribological performance. Further study may lead to future DLC applications of ceramic seals.

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Shear Bond Strength of 3D Printed Concrete Layers According to Water Cement Ratio and Printing Time Gap (물시멘트비와 프린팅 시간간격에 따른 3D 프린팅 콘크리트 레이어의 전단부착강도)

  • Kim, Jin-Ho;Lee, Yoon Jung;Jeong, Hoseong;Kim, Kang Su
    • Journal of the Korea institute for structural maintenance and inspection
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    • v.25 no.6
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    • pp.199-208
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    • 2021
  • The extrudability of 3D printed concrete and its member strength can be highly influenced by water cement ratio (W/C) and printing time gap (PTG). In this study, mold cast specimens and 3D printed specimens were fabricated with variables of W/C ratio and PTG, and their shear bond strength and interlayer surface moisture content were measured and analyzed. The test results showed that the shear bond strength is greatly influenced by the amount of interlayer surface moisture. It is thus recommended that proper amount of interlayer surface moisture with respect to PTG needs to be maintained to have a required interlayer shear bond strength. In addition, further research is required to estimate the effect of many environmental factors that can influence the interlayer surface moisture content.