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http://dx.doi.org/10.12656/jksht.2015.28.2.63

Influence of Ag Thickness on the Properties of TiO2/Ag/TiO2 Trilayer Films  

Kim, So-Young (School of Materials Science and Engineering, University of Ulsan)
Jeon, Jae-Hyun (School of Materials Science and Engineering, University of Ulsan)
Gong, Tae-Kyung (School of Materials Science and Engineering, University of Ulsan)
Kim, Sun-Kyung (School of Materials Science and Engineering, University of Ulsan)
Choi, Dong-Hyuk (Dongkook Ind. Co., Ltd.)
Son, Dong-Il (Dongkook Ind. Co., Ltd.)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.28, no.2, 2015 , pp. 63-67 More about this Journal
Abstract
$TiO_2/Ag/TiO_2$ trilayer films were deposited with radio frequency (RF) and direct current (DC) magnetron sputtering onto the glass substrate to consider the influence of Ag interlayer on the optical properties of the films. The thickness of $TiO_2$ films was kept at 24 nm, while the thickness of Ag interlayer was varied as 5, 10, 15, and 20 nm. As-deposited $TiO_2$ single layer films show the optical transmittance of 66.7% in the visible wave-length region and the optical reflectance of 16.5%, while the $TiO_2$ films with a 15 nm thick Ag interlayer show the enhanced optical transmittance of 80.2% and optical reflectance of 77.8%. The carrier concentration was also influenced by Ag interlayer. The highest carrier concentration of $1.01{\times}10^{23}cm^{-3}$ was observed for a 15 nm thick Ag interlayer in $TiO_2/Ag/TiO_2$ films. The observed result means that an optimized Ag interlayer in $TiO_2/Ag/TiO_2$ films enhanced the structural and optical properties of the films.
Keywords
$TiO_2$; Ag; Magnetron sputtering; Low-emissivity glass; Optical reflectance;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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