• 한국재료학회지
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• 제13권12호
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• pp.775-778
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• 2003

We studied InP etching in high density planar inductively coupled $BCl_3$and $BCl_3$/Ar plasmas(PICP). The investigated process parameters were PICP source power, RIE chuck power, chamber pressure and $BCl_3$/Ar gas composition. It was found that increase of PICP source power and RIE chuck power increased etch rate of InP, while that of chamber pressure decreased etch rate. Etched InP surface was clean and smooth (RMS roughness <2 nm) with a moderate etch rate (300-500 $\AA$/min) after the planar $BCl_3$/Ar ICP etching. It may make it possible to open a new regime of InP etching with $CH_4$$H_2$-free plasma chemistry. Some amount of Ar addition (<50%) also improved etch rates of InP, while too much Ar addition reduced etch rates of InP.

• 한국조명전기설비학회:학술대회논문집
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• 한국조명전기설비학회 2002년도 학술대회논문집
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• pp.191-196
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• 2002

In this paper we introduce novel electrode structure for high efficiency discharge. We operate discharge tube under the 0.16 torr pure Xe and apply the sinusoidal wave power to the lamp with 60kHz. We measure the electric power dissipation, plasma parameters, and 828 nm IR intensity. From these data we determine the discharge efficiency, IR intensity/watt, EEDF(Electron energy distribution function). As a result we obtain that the novel electrode structure has better performance in efficiency than that of conventional external electrode system. Also we determine the EEDF for each type of electrode structure by Boltzmann stover, EELNDIF code. The result of Boltzmann equation solving show that the noble electrode system has many high energy electrons compared with the conventional system.

• 한국염색가공학회지
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• 제20권5호
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• pp.1-6
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• 2008

3-(Hydroxyphenyl phosphinyl) propanoic acid (HPPA) has been one of the most commonly used durable flame retardant agents for polyethylene terephthalate (PET) for many years. We intended to explore the application of HPPA to cellulose fabrics as formaldehyde-free phosphorus based flame retardants (FRs) through green chemistry process. The flame retardancy of the flame-retardant treated cellulose fabrics were characterized by using inductively coupled plasma spectroscopy (ICP) and limiting oxygen index (LOI). Structural changes of the treated cellulose fabrics were carried out by thermogravimetric analysis (TGA) and Fourier transform infrared (FT-IR) spectroscopy. To enhance the flame retardancy of HPPA treated cellulose fibers, glycerol polyglycidyl ether (GPE), a crosslinking agent was employed. Both HPPA and GPE treated cotton fabric imparted an LOI value over 26.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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• pp.770-772
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• 1998

The highest etch rate of Pt film was obtained at 10% $Cl_2$/90% Ar gas mixing ratio in our previous investigation. However, the problems such as the etch residues(fence) remained on the pattern sidewall, low selectivity to oxide as mask and low etch slope were presented. In this paper, the etching by additive $O_2$ gas to 10% $Cl_2$/90% Ar gas base was examined. As a result, the fence-free pattern and high etch slope was observed and the selectivity to oxide increased without decreasing of the etch rate. And the reasons for this phenomenon was investigated by XPS(x-ray photoelectron spectroscopy) surface analysis and plasma characteristic.

• 대한의생명과학회지
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• 제11권3호
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• pp.301-305
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• 2005

MR spectroscopy of intracellularly located $^{133}Cs$ has been used to monitor the uptake of Gd-EOB-DTPA by the isolated rat liver. As shown by ${31}P$ spectroscopy, accumulation of $^{133}Cs$ ions in hepatocytes does not produce detectable effects on the metabolism. The hepatic internalization of Gd-EOB-DTPA was followed by the paramagnetic relaxation enhancement of the intracellular $^{133}Cs$ ions, and confirmed by parallel quantitations of Gd and Cs run by inductively coupled plasma analysis of liver samples and aliquots of perfusate. Two peaks are observed at -22.0 and -23.5 ppm, with respect to the line of the external reference arbitarily set to 0 ppm. Upon rinsing of the extracellular compartment with regular K-H free of CsCl, the high-field resonance disappears within 20min. The intracellular concentration was confirmed by ICP, which gives a $Cs^+$ content of $22.0\pm3.5mM$. The relaxation data significantly underestimate the Gd content, suggesting a potential compartmentation of $Cs^+$ and the contrast agent.

• 마이크로전자및패키징학회지
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• 제9권4호
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• pp.11-16
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• 2002

본 연구에서는 $SrBi_2Ta_2O_9$ (SBT)박막의 고속식각에 따른 잔류물질 및 식각 손상의 영향을 조사하였다. ICP-RIE (inductively coupled plasma reactive ion etching) 의 ICP power와 CCP(capacitively coupled plasma) power를 변화시키면서 고속식각에 따른 박막의 손상과 열화를 XPS 분석과 Capacitance-Voltage (C-V) 측정을 통하여 알아보았다. ICP와 CCP의 power가 증가함에 따라 식각율이 증가하였고 ICP power가 700 W, CCP power가 200 W 일때 식각율은 900$\AA$/min이었다. 강유전체의 건식식각에 있어서 문제점이 플라즈마에 의한 강유전체 박막의 열화인데 반응가스 $Ar/C1_2/CHF_3$를 20/14/2의 비율로 사용하고 ICP와 CCP power를 각각 700w와 200w로 사용하였을 때 전혀 열화되지 않는 강유전체 박막의 특성을 얻을 수 있었다. 본 연구 결과는 Metal-Ferroelectric-Semiconductor (MFS) 또는 Metal-Ferroelectric-Insulator-Semiconductor (MFIS) 구조를 가지는 단일 트랜지스터형 강유전체 메모리 소자를 만드는데 건식 식각이 응용될 수 있음을 보여준다

• 한국자기학회지
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• 제13권3호
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• pp.97-102
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• 2003

고집적 TMR소자의 프리층에 적용될 수 있는 인위적페리층(synthetic ferrimagnetic layer : SyFL)인 NiFe/Ru/NiFe박막을 만들고, 결정에너지, 지만에너지, 교환에너지를 고려한 총에너지로부터 평형상태에서의 관계식에서 Ru두께에 따른 보자력( $H_{c}$)변화와, 스핀플로핑자계( $H_{sf}$ ), 포화자계( $H_{s}$)에 대해 알아보았다. Ta(50$\AA$)/NiFe(50$\AA$)Ru(4~20$\AA$)/NiFe(30$\AA$)/Ta(50$\AA$) 구조를 ICP (inductively coupled plasma)형 헬리콘스퍼터로 제작하고, 주어진 Ru두께에서의 시편을 SQUID로 $\pm$15kOe까지 분석하여 M-H루프를 측정하였다. 에너지를 고려한 평형상태 예측은 실험과 잘 일치하였으며, 이방성에너지 $K_{u}$= 1000erg/㎤, 교환에너지 $J_{ex}$= 0.7erg/$\textrm{cm}^2$까지 조절이 가능하였다. 상온에서 $H_{c}$를 10 Oe이하로 만드는 것이 가능하였고, 공업적으로 의미있는 $H_{s}$, $H_{sf}$ 의 범위를 Ru두께 4~10 $\AA$에서 선택이 가능하였다. 또한 50 $\AA$이하의 얇은 NiFe박막에서 자기탄성계수는 0이 아닌 (+)로 작용할 수 있다는 점과 NiFe/Ru 계면 조도를 간접적으로 예상하는 것이 가능하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.427-427
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• 2016

Organic-inorganic hybrid perovskite have attracted significant attention as a new revolutionary light absorber for photovoltaic device due to its remarkable characteristics such as long charge diffusion lengths (100-1000nm), low recombination rate, and high extinction coefficient. Recently, power conversion efficiency of perovskite solar cell is above 20% that is approached to crystalline silicon solar cells. Planar heterojunction perovskite solar cells have simple device structure and can be fabricated low temperature process due to absence of mesoporous scaffold that should be annealed over 500 oC. However, in the planar structure, controlling perovskite film qualities such as crystallinity and coverage is important for high performances. Those controlling methods in one-step deposition have been reported such as adding additive, solvent-engineering, using anti-solvent, for pin-hole free perovskite layer to reduce shunting paths connecting between electron transport layer and hole transport layer. Here, we studied the effect of alkali metal halide to control the fabrication process of perovskite film. During the morphology determination step, alkali metal halides can affect film morphologies by intercalating with PbI2 layer and reducing $CH3NH3PbI3{\cdot}DMF$ intermediate phase resulting in needle shape morphology. As types of alkali metal ions, the diverse grain sizes of film were observed due to different crystallization rate depending on the size of alkali metal ions. The pin-hole free perovskite film was obtained with this method, and the resulting perovskite solar cells showed higher performance as > 10% of power conversion efficiency in large size perovskite solar cell as $5{\times}5cm$. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and inductively coupled plasma optical emission spectrometry (ICP-OES) are analyzed to prove the mechanism of perovskite film formation with alkali metal halides.

• 반도체디스플레이기술학회지
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• 제21권3호
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• pp.57-62
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• 2022

The plasma resistance of multi-component glasses containing La, Gd, Ti, Zn, Y, Zr, Nb, and Ta was analyzed in this study. The plasma etching was performed via inductively coupled plasma-reactive ion etching (ICP-RIE) using CF₄/O₂/Ar mixed gas. After the reaction, the glass with a low fluoride sublimation temperature and high content of P, Si, and Ti elements showed a high etching rate. On the other hand, the glass containing a high fluoride sublimation temperature component such as Ca, La, Gd, Y, and Zr exhibited high plasma resistance because the etch rate was lower than that of sapphire. Glass with low plasma resistance increased surface roughness after etching or nanoholes were formed on the surface, but glass with high plasma resistance showed little change in surface microstructure. Thus, the results of this study demonstrate the potential for the development of plasma-resistant glasses (PRGs) with other compositions besides alumino-silicate glasses, which are conventionally referred to as plasma-resistant glasses.

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2000년도 추계학술대회논문집
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• pp.21-24
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• 2000

Ferroelectric YMnO$_3$thin films are excellent dielectric materials for high integrated ferroelectric random access memory (FRAM) with metal-ferroelectric-silicon field effect transistor (MFSFET) structure. In this study, YMnO$_3$thin films were etched with Cl$_2$/Ar gas chemistries in inductively coupled plasma (ICP). The maximum etch rate of YMnO$_3$thin films is 285 $\AA$/min under Cl$_2$/Ar of 10/0, 600 W/-200 V and 15 mTorr. The selectivities of YMnO$_3$over CeO$_2$and $Y_2$O$_3$are 2.85, 1.72, respectively. The results of x-ray photoelectron spectroscopy (XPS) reflect that Y is removed dominantly by chemical reaction between Y and Cl, while Mn is removed more effective by Ar ion bombardment than chemical reaction. The results of secondary ion mass spectrometer (SIMS) were equal to these of XPS. The etch profile of the etched YMnO$_3$film is approximately 65$^{\circ}$and free of residues at the sidewall.