Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1998.11c
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- Pages.770-772
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- 1998
Effects of $O_2$ Gas Addition to Etching of Platinum Thin Film by Inductively Coupled Plasmas
유도 결합 플라즈마를 이용한 백금 박막의 식각시 $O_2$ 가스 첨가 효과
- Kim, Nam-Hoon (Dept. of Electrical Engineering, Chung-Ang Univ.) ;
- Kim, Chang-Il (Dept. of Electrical Engineering, Chung-Ang Univ.) ;
- Kwon, Kwang-Ho (Dept. of Electronic Engineering, Han-Seo Univ.) ;
- Chang, Eui-Goo (Dept. of Electrical Engineering, Chung-Ang Univ.)
- Published : 1998.11.28
Abstract
The highest etch rate of Pt film was obtained at 10%
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