• Bulletin of the Korean Chemical Society
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• v.33 no.10
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• pp.3378-3382
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• 2012

A superhydrophobic surface with a water contact angle > $150^{\circ}$ has attracted great interest from both fundamental and practical aspects. In this study, we demonstrated that hydrophobicity of a silica nanotube (SNT) array can be easily controlled by the SNT aspect ratio. In addition, the adhesive and anti-adhesive properties were controlled without modifying the hydrophobic surface. Various silica structures on a polydimethylsiloxane substrate were prepared using the desired alumina template. Bundle-arrayed and bowl-arrayed silica surfaces exhibited extraordinary superhydrophobicity due to the large frontal surface area and hierarchical micro/nanostructure. As the strategy used in this study is biocompatible and a wide range of hydrophobicities are capable of being controlled by the SNT aspect ratio, a hydrophobic surface composed of an SNT array could be an attractive candidate for bioapplications, such as cell and protein chips.

• The Korean Journal of Food And Nutrition
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• v.8 no.4
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• pp.335-343
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• 1995

In order to enhance the utility of alaska-pollack, the optimum conditions for the preparation of pronase hydrolysate. The optimum temperature and pH for the hydrolysis of alaska-pollack by pronase were 4$0^{\circ}C$ and pH 7.0. The reaction time and enzyme concentration were 4 hr and 1,000 units per g of substrate. Under the above optimum conditions alaska-pollack was hydrolysed by pronase yielding a hydrolytic degree of about 89eye. The bitterness and hyrophobicity of pronase hydrolysate were decreased with increasing reaction time. Hydrophobic amino acids(Tyr, Met, Ala, flu, Leu, and Phe) were increased for 2 hr, but fur thor hydrolysis was showed decrease of hydrophobic amino acids content. Palatable amino acids (Asp, Glu, Pro, Ser, Thr and Gly) were increased with hydrolysis time.

• Applied Science and Convergence Technology
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• v.23 no.1
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• pp.54-59
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• 2014

The roll-to-roll (R2R) fabrication method to make micro-scale pillar arrays for biomimetic functionalization of surfaces is presented. Inspired by the micro-structure of plants in nature, a surface with a synthetic micro-scale pillar array is fabricated via maskless photolithography. After the surface is SAM (self-assembled monolayer) coated with trichlorosilane in a vacuum desiccator, it displays a hydrophobic property even in R2R replicas of original substrate, whose properties are further characterized using various pitches and diameters. In order to perform a comparison between the original micro-pattern and its replicas, surface morphology was analyzed using scanning electron microscopy and wetting characteristics were measured via a contact angle measurement tool with a $10{\mu}L$ water droplet. Efficient roll-to-roll imprinting for a biomimetic functionalized surface has the potential for use in many fields ranging from water repelling and self-cleaning to microfluidic chips.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.2
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• pp.188-194
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• 2024

This paper introduces an optimized oxygen (O₂) plasma surface treatment technique to enhance sphere lithography on hydrophobic photoresist surfaces. The focus is on semiconductor manufacturing, particularly the creation of finer structures beyond the capabilities of traditional photolithography. The key breakthrough is a method that makes substrate surfaces hydrophilic without altering photoresist patterns. This is achieved by meticulously controlling the O₂ plasma treatment duration. The result is the consistent formation of nano and microscale patterns across large areas. From an academic perspective, the study deepens our understanding of surface treatments in pattern formation. Industrially, it heralds significant progress in semiconductor and precision manufacturing sectors, promising enhanced capabilities and efficiency.

• Journal of Adhesion and Interface
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• v.20 no.4
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• pp.146-154
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• 2019

In this study, alkoxysilane-functionalized amphiphilic polymer (AFAP), which have hydrophilic segment and hydrophobic segment functionalized by alkoxysilane group at the same backbone, was synthesized and used as a dispersant and control agent for reaction rate in the preparation of colloidally stable organic-inorganic (O-I) hybrid sols. After reaction with fluorosilane compounds, fluorinated O-I hybrid sols were prepared and coated onto glass substrate to form hydrophobic O-I hybrid coating films through low-temperature curing process. Surface hardness and hydrophobicity of cured coating films were varied with type of solvent and composition of AFAP and fluorinated alkoxysilane compounds. At appropriate solvent and composition of fluorinated alkoxysilane compounds, O-I hybrid coating film having high transparency and surface hardness could be prepared, which could be applicable to cover window of solar cell and displays.

• Textile Coloration and Finishing
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• v.20 no.1
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• pp.8-15
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• 2008

We presented the modified decal-transfer lithography (DTL) and light stamping lithography (LSL) as new powerful methods to generate patterns of poly(dimethylsiloxane) (PDMS) on the substrate. The microstructures of PDMS fabricated by covalent binding between PDMS and substrate had played as barrier to locally control wettability. The transfer mechanism of PDMS is cohesive mechanical failure (CMF) in DTL method. In the LSL method, the features of patterned PDMS are physically torn and transferred onto a substrate via UV-induced surface reaction that results in bonding between PDMS and substrate. Additionally we have exploited to generate the patterning of rhodamine B and quantum dots (QDs), which was accomplished by hydrophobic interaction between dyes and PDMS micropatterns. The topological analysis of micropatterning of PDMS were performed by atomic force microscopy (AFM), and the patterning of rhodamine B and quantum dots was clearly shown by optical and fluorescence microscope. Furthermore, it could be applied to surface guided flow patterns in microfluidic device because of control of surface wettability. The advantages of these methods are simple process, rapid transfer of PDMS, modulation of surface wettability, and control of various pattern size and shape. It may be applied to the fabrication of chemical sensor, display units, and microfluidic devices.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.05a
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• pp.81-81
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• 2015

inkjet printing system으로 flexible 기판위에 metal interconnection 혹은 metal mesh를 제작 할 때 metal과 flexible substrate 의 접착력을 향상 시키고 선폭을 조절하기 위하여 surface roughness를 생성 시키고 표면을 hydrophobic 하게 개질 하였다. 그 결과 metal line의 선폭과 접착력이 향상됨을 알 수 있었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.12
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• pp.1106-1110
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• 2005

We fabricated (110) silicon hard master by using anisotropic wet etching for embossing. The etching chemical for the silicon wafer was a TMAH $25\%$ solution. The anisotropic wet etching produces a smooth sidewall surface and the surface roughness of the fabricated master is about 3 nm. After spin coating an organic-inorganic sol-gel hybrid material on a silicon substrate, we employed hot embossing technique operated at a low pressure and temperature to form patterns on the silicon substrate by using the fabricated master. We successfully fabricated the multi-mode planar optical waveguides showing low propagation loss of 0.4 dB/cm. The surface roughness of embossed patterns was uniform for more than 10 times of the embossing processes with a single hydrophobic surface treatment of the silicon hard master.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.03b
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• pp.40-40
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• 2010

CdSe nanocrystals (NCs) have been decorated on singlewalled carbon nanotubes (SWCNTs) by combining a method of chemically modified substrate along with gate-bias control. CdSe/ZnS core/shell quantum dots were negatively charged by adding mercaptoacetic acid (MAA). The silicon oxide substrate was decorated by octadecyltrichlorosilane (OTS) and converted to hydrophobic surface. The negatively charged CdSe NCs were adsorbed on the SWCNT surface by applying the negative gate bias. The selective adsorption of CdSe quantum dots on SWCNTs was confirmed by confocal laser scanning microscope. The measured photocurrent clearly demonstrates that CdSe NCs decorated SWCNT can be used for photodetector and solar cell that are operable over a wide range of wavelengths.

• Journal of the Korean Ceramic Society
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• v.42 no.10 s.281
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• pp.645-648
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• 2005

To fabricate a (100) silicon hard master, we used anisotropic wet etching for the embossing. The etching chemical for the sili­con wafer was a TMAH 25$\%$ solution. The anisotropic wet etching produces a smooth sidewall surface inclined at 54.7°, and the surface roughness of the fabricated master is about 1 nm. After spin coating an organic-inorganic sol-gel hybrid resin on a silicon substrate, we used the fabricated master to form patterns on the silicon substrate. Thus, we successfully obtained patterns via the hot embossing technique with the (100) silicon hard master. Moreover, by using a single hydrophobic surface treatment of the master, we succeeded in achieving uniform surface roughness of the embossed patterns for more than ten embossments.