• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.105-105
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• 2012

We have developed a photoemission-assisted plasma-enhanced chemical vapor deposition (PAPE-CVD) [1,2], in which photoelectrons emitting from the substrate surface irradiated with UV light ($h{\nu}$=7.2 eV) from a Xe excimer lamp are utilized as a trigger for generating DC discharge plasma as depicted in Fig. 1. As a result, photoemission-assisted plasma can appear just above the substrate surface with a limited interval between the substrate and the electrode (~10 mm), enabling us to suppress effectively the unintended deposition of soot on the chamber walls, to increase the deposition rate, and to decrease drastically the electric power consumption. In case of the deposition of DLC gate insulator films for the top-gate graphene channel FET, plasma discharge power is reduced down to as low as 0.01W, giving rise to decrease significantly the plasma-induced damage on the graphene channel [3]. In addition, DLC thickness can be precisely controlled in an atomic scale and dielectric constant is also changed from low ${\kappa}$ for the passivation layer to high ${\kappa}$ for the gate insulator. On the other hand, negative electron affinity (NEA) of a hydrogen-terminated diamond surface is attractive and of practical importance for PAPECVD, because the diamond surface under PAPE-CVD with H2-diluted (about 1%) CH4 gas is exposed to a lot of hydrogen radicals and therefore can perform as a high-efficiency electron emitter due to NEA. In fact, we observed a large change of discharge current between with and without hydrogen termination. It is noted that photoelectrons are emitted from the SiO2 (350 nm)/Si interface with 7.2-eV UV light, making it possible to grow few-layer graphene on the thick SiO2 surface with no transition layer of amorphous carbon by means of PAPE-CVD without any metal catalyst.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.550-551
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• 2013

Large-area RF-driven ion source is being developed at Germany for the heating and current drive of ITER plasmas. Negative hydrogen (deuterium) ion sources are major components of neutral beam injection systems in future large-scale fusion experiments such as ITER and DEMO. RF ion sources for the production of positive hydrogen ions have been successfully developed at IPP (Max-Planck- Institute for Plasma Physics, Garching) for ASDEX-U and W7-AS neutral beam injection (NBI) systems. In recent, the first NBI system (NBI-1) has been developed successfully for the KSTAR. The first and second long-pulse ion sources (LPIS-1 and LPIS-2) of NBI-1 system consist of a magnetic bucket plasma generator with multi-pole cusp fields, filament heating structure, and a set of tetrode accelerators with circular apertures. There is a development plan of large-area RF ion source at KAERI to extract the positive ions, which can be used for the second NBI (NBI-2) system of KSTAR, and to extract the negative ions for future fusion devices such as ITER and K-DEMO. The large-area RF ion source consists of a driver region, including a helical antenna (6-turn copper tube with an outer diameter of 6 mm) and a discharge chamber (ceramic and/or quartz tubes with an inner diameter of 200 mm, a height of 150 mm, and a thickness of 8 mm), and an expansion region (magnetic bucket of prototype LPIS in the KAERI). RF power can be transferred up to 10 kW with a fixed frequency of 2 MHz through a matching circuit (auto- and manual-matching apparatus). Argon gas is commonly injected to the initial ignition of RF plasma discharge, and then hydrogen gas instead of argon gas is finally injected for the RF plasma sustainment. The uniformities of plasma density and electron temperature at the lowest area of expansion region (a distance of 300 mm from the driver region) are measured by using two electrostatic probes in the directions of short- and long-dimension of expansion region.

• 한국대기환경학회지
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• 제24권3호
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• pp.329-335
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• 2008

Volatile organic compounds emitted to the atmosphere can cause adverse effects on human health and participate in photochemical smog formation reactions. The destruction of a series of VOCs has been carried out by non-thermal plasma in other researches. And the characteristic of non-thermal plasma was operated at atmospheric pressure and low temperature. A new type non-thermal plasma reactor was investigated combined Glidarc plasma with water jet in this research. Also, it was found that the water-jet had an significant effect on the toluene removal efficiency. But too much water content does not favor toluene decomposition by decreasing of reaction temperature. The input toluene concentration, gas flow rate, water flow rate and specific energy input were used as experiment variables. The toluene removal efficiency, energy efficiency and specific energy input were 75.3%, 146.6 g/kWh and $1.12kWh/m^3$ at a water flow rate of 100 mL/min.

• 한국대기환경학회지
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• 제26권6호
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• pp.624-632
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• 2010

Perfluorocarbons (PFCs) are widely used in semiconductor industry. These gases need to be removed efficiently because of their strong absorption of infrared radiation and long atmospheric lifetimes which cause the global warming effect. To destruct $CF_4$, a waterjet gliding arc plasma was designed and manufactured. The highest $CF_4$ destruction showed at waterjet plasma case, compared to plasma discharge only or water scrubber only, respectively. In addition, it could be known that the $CF_4$ destruction should be associated with the electron and OH radicals. The operating conditions such as waterjet flow rate, initial $CF_4$ concentration, total gas flow rate, specific energy input were investigated experimentally using a plasma waterjet scrubber. Through the parametric studies, the highest $CF_4$ destruction of 94.5% was achieved at 0.2% $CF_4$, 2.1 kJ/L SEI, 20 L/min total gas flow rate and 18.5 mL/min waterjet flow rate.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.642-644
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• 1999

We have prepared the plasma-polymerized membrane for pervaporation of organic-liquid mixtures by the plasma polymerization technique. Plasma polymerization techniques were utilized in the development of hydrophilic composite membranes having high hydrogen ion permeability and excellent dimensional stability. To develop an organic liquid permselective Membrane, suppressing membrane swearing as well as enhancing the solubility difference is impotant. the objectives of the present study are to disign a suitable membrane for an organic-mixture system by the control of the plasma-polymer solubility.

• 청정기술
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• 제19권2호
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• pp.113-120
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• 2013

화학적으로 안정한 과불화합물을 처리하기 위해서는 많은 양의 에너지를 필요로 한다. 이러한 단점을 극복하기 위해서 저전력 아크 플라즈마 시스템을 개발하였다. 분해대상은 $CF_4$, $SF_6$, $NF_3$가 플라즈마 토치로 직접 주입되었으며, 아크 플라즈마 토치의 열효율을 측정하여 실출력을 계산하였다. 실출력과 폐기체 유량 변화 그리고 추가적인 반응가스에 의한 분해효율을 확인하였다. 또한 열역학적 평형조성 분석을 수행하여 실험 결과와 비교하였다. 토치의 열효율은 60~66%의 결과를 보였으며 폐가스 유량이 증가함에 따라 분해효율이 감소하였고 입력전력이 늘어남에 따라 분해효율이 상승되었다. 추가적인 반응 가스가 없이 $CF_4$, $SF_6$, $NF_3$의 분해효율은 입력전력이 3 kW, 폐가스 유량이 70 L/min인 조건에서 각각 4, 15, 90%를 보였다. 반응가스로 산소와 수소를 이용하여 분해효율을 급격하게 증가시킬 수 있었으며, 실험 결과 산소보다 수소를 사용하였을 경우가 분해효율 상승효과와 부산물 제어에 효과적인 것을 알 수 있었다. 수소의 경우, 발생되는 부산물은 불화수소산이었으며 이는 일반적인 습식 스크러버를 이용하여 처리가 용이한 물질이다. 수소를 이용한 화학반응에서 입력전력이 3 kW, 폐가스유량이 100 L/min인 조건에서 $CF_4$가 25%, $SF_6$가 39%, $NF_3$가 99%의 분해효율을 각각 나타냈다.

• 한국표면공학회지
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• 제42권5호
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• pp.232-239
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• 2009

This study presented the effect of membrane thickness on hydrogen permeability. Microvoids on the surface of the membrane should not exist for the exact values of hydrogen permeability. Pd-Cu-Ni hydrogen alloy membranes were fabricated by Ni powder sintering, substrate plasma pretreatment, sputtering and Cu reflow process. And this leaded to void-free surface and dense film of Pd-Cu-Ni hydrogen alloy membrane. Hydrogen permeation test showed that hydrogen permeability increased from 2.7 to $15.2ml/cm^2{\cdot}min{\cdot}atm^{0.5}$ as membrane thickness decreased from 12 to $4{\mu}m$. This represented the similar trend as a hydrogen permeability of pure palladium membrane based on solution-diffusion mechanism.

• 조명전기설비학회논문지
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• 제24권8호
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• pp.32-39
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• 2010

오늘날 화석연료의 다량 사용에 의한 환경오염이 지구온난화를 가속시키고 기상이변을 일으키며 지구생태계에 심각한 영향을 미치고 있다. 수소는 이러한 환경문제를 근본적으로 해결해 줄 지속 가능한 그린에너지로 생각되고 있다. 본 연구는 결합구조가 다른 메탄올 및 에탄올의 개질을 통한 수소발생을 위해 실린더형 배리어 방전형의 반응기를 제작하였다. 반응기에 인가되는 고전압의 크기, 메탄올 및 에탄올 농도 및 캐리어 가스(N2) 유량 등의 변화에 따른 반응기의 방전특성과 수소발생 특성을 측정하고 화학구조에 따른 수소발생 영향을 분석하였다. 수소발생은 인가전압의 증가에 따라 선형적으로 증가하였고 메탄올의 경우가 많았다. 이는 메탄올과 에탄올의 결합구조와 관련이 있는 것으로 생각된다. 수소발생 에너지효율은 에탄올의 경우 인가전압이 증가하여 방전전력이 증가할수록 전체적으로 감소하지만 메탄올의 경우 전압 22[kV](peak-to-peak)를 인가한 경우 가장 에너지 효율이 높게 나타났다.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회B
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• pp.2232-2237
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• 2007

Steam reforming and catalytic reforming of $CH_4$ conversion to produce synthesis gas require both high temperatures and high pressure. Non-thermal plasma is considered to be a promising technology for the hydrogen rich gas production from methane. In this study, three phase AC GlidArc plasma system was employed to investigate the effects of gas composition, gas flow rate, catalyst reactor temperature and applied electric power on the $CH_4$ and $H_2$ yield and the product distribution. The studied system consisted of three electrode and it connected AC generate power system different voltages. In this study, air was used for the partial oxidation of methane. The results showed that increasing gas flow rate, catalyst reactor temperature, or electric power enhanced $CH_4$ conversion and $H_2$ concentration. The reference conditions were found at a $O_2$/C molar ratio of 0.45, a feed flow rate of 4.9 ${\ell}$/min, and input power of 1kW for the maximum conversions of $CH_4$ with a high selectivity of $H_2$ and a low reactor energy density.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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• pp.66.1-66.1
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• 2010

Microcrystalline silicon at low temperatures has been developed using plasma enhanced chemical vapor deposition (PECVD). It has been found that energetically positive ion and atomic hydrogen collision on to growing surface have important effects on increasing growth rate, and atomic hydrogen density is necessary for the increasing growth rate correspondingly, while keeping ion bombardment is less level. Since the plasma potential is determined by working pressure, the ion energy can be reduced by increasing the deposition pressure of 700-1200 Pa. Also, correlation of the growth rate and crystallinity with deposition parameters such as working pressure, hydrogen flow rate and input power were investigated. Consequently an efficiency of 7.9% was obtained at a high growth rate of 0.92 nm/s at a high RF power 300W using a plasma-enhanced chemical vapor deposition method (27.12MHz).