• Title/Summary/Keyword: field annealing

Search Result 656, Processing Time 0.027 seconds

Large Barkhausen Effects by Annealing of CoFeSiB Amorphous Ribbon (CoFeSiB 아몰퍼스리본의 열처리에 의한 대바크하우젠 효과)

  • 임재근;강재덕;정병두;신용진
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 1999.05a
    • /
    • pp.59-72
    • /
    • 1999
  • In this thesis, we measured the Barkhausen effect of CoFeSiB amorphous ribbon and then investigated its possibility to be used as a sensor material. We used a sample of composition $($Fe_{0.06}$$Co_{0.94}$)_${0.79}$$Si_{2.1}$$B_{18.9}$ with a thickness 12[pm1, width 2.5[rnml and length 5[cm], which was fabricated by a single roll method. In order to improve magnetic characteristics of the sample, we had carried on annealing in the magnetic field and in none magnetic field. And, experimented results to the magnetic characteristics show that the ribbon has large Barkhausen jump even in weak magnetic field below 0.5[0el. From the results, we confirmed that the sample can be used as an magnetic sensor material.

  • PDF

Effects of Remanent Polarization State and Internal Field in Ferroelctric Film on the Hydrogen-induced Degradation Characteristics in Pt/Pb(Zr, Ti)O3/Pt Capacitor (강유전막의 잔류 분극 상태와 내부 전계가 Pt/Pb(Zr,Ti)O3/Pt 커패시터의 수소 열화 특성에 미치는 영향)

  • Kim, Dong-Cheon;Lee, Gang-Un;Lee, Won-Jong
    • Korean Journal of Materials Research
    • /
    • v.12 no.1
    • /
    • pp.75-81
    • /
    • 2002
  • The ferroelectric properties of Pb(Zr,Ti)O$_3$[PZT] films degrade when the films with Pt top electrodes are annealed in hydrogen containing environment. This is due to the reduction activity of atomic hydrogen that is generated by the catalytic activity of the Pt top electrode. At the initial stage of hydrogen annealing, oxygen vacancies are formed by the reduction activity of hydrogen mainly at the vicinity of top Pt/PZT interface, resulting in a shift of P-E (polarization-electric field) hysteresis curve toward the negative electric field direction. As the hydrogen annealing time increases, oxygen vacancies are formed inside the PZT film by the inward diffusion of hydrogen ions, as a result, the polarization degrades significantly and the degree of P-E curve shift decreases gradually. The direction and the magnitude of the remnant polarization in the PZT film affect the motion of hydrogen ions which determines the degradation of polarization characteristics and the shift in the P-E hysteresis curve of the PZT capacitor during hydrogen annealing. When the remnant polarization is formed in the PZT film by applying a pre-poling voltage prior to hydrogen annealing, the direction of the P-E curve shift induced by hydrogen annealing is opposite to the polarity of the pre-poling voltage. The hydrogen-induced degradation behavior of the PZT capacitor is also affected by the internal field that has been generated in the PZT film by the charges located at the top interface prior to hydrogen annealing.

Local Laser Annealing in Exchange-Biased Films with Out-of-Plane and In-Plane Magnetic Anisotropy

  • Choi, S.D.;Kim, S.W.;Jin, D.H.;Yun, D.K.;Lee, M.S.;Ahn, J.H.;Joo, H.W.;Lee, K.A.;Lee, S.S.;Hwang, D.G.
    • Journal of Magnetics
    • /
    • v.11 no.2
    • /
    • pp.66-69
    • /
    • 2006
  • Local magnetization reversal in the exchange-biased NiFe/FeMn and $[Pd/Co]_5/FeMn$ multilayers with in-plane and out-of-plane magnetic anisotropy was achieved by using laser annealing. The local annealed NiFe/FeMn film under the opposite magnetic field shows a magnetoresistance (MR) curve having two symmetric peaks at the positive and negative exchange biasing field (${\pm}H_{ex}$). The intensity of the nucleated MR peak rises as the exposed area extends during the laser annealing process, and the peak disappears under the reverse magnetic field. In the case of [Pd/Co]/FeMn films, the local magnetization reversal increased gradually as the laser power increases. The locally reversed magnetization was restored under the opposite magnetic field.

Magnetoresistive and Pinning Direction Behaviors of Synthetic Spin Valves with Different Pinning Layer Thickness

  • Cho, Ho-Gun;Kim, Young-Keun;Lee, Seong-Rae
    • Journal of Magnetics
    • /
    • v.7 no.4
    • /
    • pp.147-150
    • /
    • 2002
  • The pinning direction, the spin flop behaviors and the magnetoresistive properties in top synthetic spin valve structure [NiFe/CoFe/Cu/CoFe (t$_{p2}$)/Ru/CoFe (t$_{p1}$)/IrMn] were investigated. The magnetoresistive and pinning characteristics of synthetic spin valves strongly depended on the differences in the two pinning layer thickness, ${\Delta}t(=t_{p2}-t_{p1})$. In contrast to the conventional spin valves, the pinning direction (P1) was canted off with respect to the growth field axis with ${\Delta}t$. We found that the canting angle ${\Phi}$ had different values according to the annealing field direction and ${\Delta}t$. When the samples were annealed at above the blocking temperature of IrMn with zero fields, the canted pinned layer could be set along the growth field axis. Because the easy axis which was induced by the growth field during deposition is still active in all ferromagnetic layers except the IrMn at $250{^{\circ}C}$, the pinning direction could be aligned along the growth field axis, even in 0 field annealing.

Ferroelectrical Properties of SBT Capacitors with various Annealing Atmosphere (다양한 열처리 분위기에 따른 SBT 커패시터의 강유전체 특성)

  • Cho, Choon-Nam;Oh, Young-Choul;Kim, Jin-Sa;Choi, Woon-Shik;Kim, Chung-Hyeok;Park, Young-Pil;Hong, Jin-Woong;Lee, Joon-Ung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2003.05d
    • /
    • pp.72-76
    • /
    • 2003
  • The $Sr_{0.7}Bi_{2.6}Ta_2O_9$(SBT) thin films are deposited on Pt-coated electrode(Pt/$TiO_2/SiO_2$/Si) using RF magnetron sputtering method. The structural and electrical properties of SBT capacitors were influenced with annealing atmosphere. In the XRD pattern, the SBT thin films in all annealed atmosphere had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized in all annealing atmosphere and grains largely grew in oxygen annealing atmosphere. The maximum remanent polarization and the coercive electric field in oxygen annealing atmosphere are $12.40[{\mu}C/cm^2]$ and 30[kV/cm] respectively. The fatigue characteristics of SBT capacitors did not change up to $10^{10}$ switching cycles.

  • PDF

Electrical Properties of SBT Capacitors with various Annealing Atmosphere (다양한 열처리 분위기에 따른 SBT 커패시터의 전기적 특성)

  • 조춘남;김진사;신철기;최운식;김충혁;홍진웅;이준웅
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.16 no.3
    • /
    • pp.207-213
    • /
    • 2003
  • The Sr$\_$0.7/Bi$\_$2.6/Ta$_2$O$\_$9/(SBT) thin films are deposited on Pt-coated electrode(Pt/TiO$_2$/SiO$_2$/Si) using RF magnetron sputtering method. The structural and electrical properties of SBT capacitors were influenced with annealing atmosphere. In the XRD pattern, the SBT thin films in all annealed atmosphere had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized in all annealing atmosphere and grain largely grew in oxygen annealing atmosphere. The maximum remnant polarization and the coercive electric field in oxygen annealing atmosphere are 12.40[${\mu}$C/cm$^2$] and 30[kV/cm] respectively. The dielectric constant and leakage current density of capacitors annealed oxygen atmosphere are 340 and 2.13${\times}$10$\^$-9/ [A/cm$^2$] respectively. The fatigue characteristics of SBT capacitors did not change up to 10$\^$10/ switching cycles.

Fast Simulated Annealing Algorithm (Simulated Annealing의 수렴속도 개선에 관한 연구)

  • 정철곤;김중규
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.27 no.3A
    • /
    • pp.284-289
    • /
    • 2002
  • In this paper, we propose the fast simulated annealing algorithm to decrease convergence rate in image segmentation using MRF. Simulated annealing algorithm has a good performance in noisy image or texture image, But there is a problem to have a long convergence rate. To fad a solution to this problem, we have labeled each pixel adaptively according to its intensity before simulated annealing. Then, we show the superiority of proposed method through experimental results.

Optimized Local Relocation for VLSI Circuit Modification Using Mean-Field Annealing

  • Karimi, Gholam Reza;Verki, Ahmad Azizi;Mirzakuchaki, Sattar
    • ETRI Journal
    • /
    • v.32 no.6
    • /
    • pp.932-939
    • /
    • 2010
  • In this paper, a fast migration method is proposed. Our method executes local relocation on a model placement where an additional module is added to it for modification with a minimum number of displacements. This method is based on mean-field annealing (MFA), which produces a solution as reliable as a previously used method called simulated annealing. The proposed method requires substantially less time and hardware, and it is less sensitive to the initial and final temperatures. In addition, the solution runtime is mostly independent of the size and complexity of the input model placement. Our proposed MFA algorithm is optimized by enabling module rotation inside an energy function called permissible distances preservation energy. This, in turn, allows more options in moving the engaged modules. Finally, a three-phase cooling process governs the convergence of problem variables called neurons or spins.

Annealing-temperature Dependent Characteristics of PLZT Thin Films on ITO Coated Glass (ITO 기판에 제작된 PLZT 박막의 소성온도에 따른 특성)

  • Choi, Hyung-Wook;Jang, Nak-Won;Park, Chang-Yub
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.11 no.2
    • /
    • pp.128-132
    • /
    • 1998
  • 2/65/35 PLZT stock solution prepared by Sol-Gel processing was spin-coated on ITO coated glass and annealed by RTA(Rapid Thermal Annealing). The crystal structure of films was reported based on the observation of crystallization process and microstructure of the film fabricated at different fabrication condition. Films were crystallized into rhombohedral structure by annealing at $750^{\circ}C$ for 5 min. As the annealing temperature increased, the size of rosette structure of the films was grown up from $2.4{\mu}m$ to $15{\mu}m$, dielectric constant was increased, coercive field was decreased 33.82 kV/cm, remnant polarization was increased to 39.84 ${\mu}C/cm^2$ and Optical transmittance was decreased.

  • PDF

Effects of Annealing Gas and Pressure Conditions on the Electrical Characteristics of Tunneling FET (가스 및 압력조건에 따른 Annealing이 Tunneling FET의 전기적 특성에 미치는 영향)

  • Song, Hyun-Dong;Song, Hyeong-Sub;Babu, Eadi Sunil;Choi, Hyun-Woong;Lee, Hi-Deok
    • Journal of IKEEE
    • /
    • v.23 no.2
    • /
    • pp.704-709
    • /
    • 2019
  • In this paper, the electrical characteristics of tunneling field effect transistor(TFET) was studied for different annealing conditions. The TFET samples annealed using hydrogen forming gas(4 %) and Deuterium($D_2$) forming gas(4 %). All the measurements were conducted in noise shielded environment. The results show that subthreshold slope(SS) decreased by 33 mV/dec after annealing process compared to before annealing. Under various temperature range, the noise is improved by average of 31.2 % for 10 atm Deuterium gas at $V_G=3V$ condition. It is also noticed that, post metal annealing with $D_2$ gas reduces the noise by average of 30.7 % at $I_D=100nA$ condition.