• Title/Summary/Keyword: ferroelectric materials

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Ferroelectric Properly of Bi3.75La0.25Ti3O12 Ceramic Sintered in the Ambient (분위기 소결공정에 의한 Bi3.75La0.25Ti3O12세라믹의 강유전특성)

  • 김응권;박춘배;박기엽;송준태
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.9
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    • pp.783-787
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    • 2002
  • In recent year, B $i_{4-}$x L $a_{x}$ $Ti_3$ $O_{12(BLT)}$ is one of promising substitute materials for the ferroelectric random access memory(FRAM) applications. But the systematic composition is still insufficient, so this experiment was carried out in ceramic ambient sintering process which has the very excellent ferroelectric property. Samples were prepared by a bulk and the purpose which was estimated with a suitability of thin films applications. The density of B $i_{3.75}$ L $a_{0.25}$ $Ti_3$ $O_{12}$ was high and the XRD pattern showed that the intensity of main peak (117) was increased at the argon ambient sintering. Controlling the quantity of oxygen, crystallization showed a thin, long plate like type, and we obtained the excellent dielectric and polarization properties at the argon atmosphere sintering. Also this sintering process was effective at the bulk sample. Argon ambient sintered sample produced higher permittivity of 154, the remanent polarization(2Pr) of 6.8 uC/$\textrm{cm}^2$ compared with that sintered in air and oxygen ambient. And this sintering process showed a possibility which could be applied to thin films process..

The Effect of the Heat Treatment of the ZrO2 Buffer Layer and SBT Thin Film on Interfacial Conditions and Ferroelectric Properties of the SrBi2Ta2O9/ZrO2/Si Structure (ZrO2 완충층과 SBT 박막의 열처리 과정이 SrBi2Ta2O9/ZrO2/Si 구조의 계면 상태 및 강유전 특성에 미치는 영향)

  • Oh, Young-Hun;Park, Chul-Ho;Son, Young-Guk
    • Journal of the Korean Ceramic Society
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    • v.42 no.9 s.280
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    • pp.624-630
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    • 2005
  • To investigate the possibility of the $ZrO_2$ buffer layer as the insulator for the Metal-Ferroelectric-Insulator-semiconductor (MFIS) structure, $ZrO_2$ and $SrBi_2Ta_2O_9$ (SBT) thin films were deposited on the P-type Si(111) wafer by the R.F. magnetron-sputtering method. According to the process with and without the post-annealing of the $ZrO_2$ buffer layer and SBT thin film, the diffusion amount of Sr, Bi, Ta elements show slight difference through the Glow Discharge Spectrometer (GDS) analysis. From X-ray Photoelectron Spectroscopy (XPS) results, we could confirm that the post-annealing process affects the chemical binding condition of the interface between the $ZrO_2$ thin film and the Si substrate. Compared to the MFIS structure without the post-annealing of the $ZrO_2$ buffer layer, memory window value of MFlS structure with post-annealing of the $ZrO_2$ buffer layer were considerably improved. The window memory of the Pt/SBT (260 nm, $800^{\circ}C)/ZrO_2$ (20 nm) structure increases from 0.75 to 2.2 V under the applied voltage of 9 V after post-annealing.

Planar Type Flexible Piezoelectric Thin Film Energy Harvester Using Laser Lift-off

  • Noh, Myoung-Sub;Kang, Min-Gyu;Yoon, Seok Jin;Kang, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.489.2-489.2
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    • 2014
  • The planar type flexible piezoelectric energy harvesters (PEH) based on PbZr0.52Ti0.48O3 (PZT) thin films on the flexible substrates are demonstrated to convert mechanical energy to electrical energy. The planar type energy harvesters have been realized, which have an electrode pair on the PZT thin films. The PZT thin films were deposited on double side polished sapphire substrates using conventional RF-magnetron sputtering. The PZT thin films on the sapphire substrates were transferred by PDMS stamp with laser lift-off (LLO) process. KrF excimer laser (wavelength: 248nm) were used for the LLO process. The PDMS stamp was attached to the top of the PZT thin films and the excimer laser induced onto back side of the sapphire substrate to detach the thin films. The detached thin films on the PDMS stamp transferred to adhesive layer coated on the flexible polyimide substrate. Structural properties of the PZT thin films were characterized using X-ray diffraction (XRD) and scanning electron microscopy (SEM). To measure piezoelectric power generation characteristics, Au/Cr inter digital electrode (IDE) was formed on the PZT thin films using the e-beam evaporation. The ferroelectric and piezoelectric properties were measured by a ferroelectric test system (Precision Premier-II) and piezoelectric force microscopy (PFM), respectively. The output signals of the flexible PEHs were evaluated by electrometer (6517A, Keithley). In the result, the transferred PZT thin films showed the ferroelectric and piezoelectric characteristics without electrical degradation and the fabricated flexible PEHs generated an AC-type output power electrical energy during periodically bending and releasing motion. We expect that the flexible PEHs based on laser transferred PZT thin film is able to be applied on self-powered electronic devices in wireless sensor networks technologies. Also, it has a lot of potential for high performance flexible piezoelectric energy harvester.

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Preparation of ZrO2 and SBT Thin Films for MFIS Structure and Electrical Properties (ZrO2 완충층과 SBT박막을 이용한 MFIS 구조의 제조 및 전기적 특성)

  • Kim, Min-Cheol;Jung, Woo-Suk;Son, Young-Guk
    • Journal of the Korean Ceramic Society
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    • v.39 no.4
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    • pp.377-385
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    • 2002
  • The possibility of $ZrO_2$ thin film as insulator for Metal-Ferroelectric-Insulator-Semiconductor(MFIS) structure was investgated. $SrBi_2Ta_2O_9$ and $SrBi_2Ta_2O_9$(SBT) thin films were deposited on P-type Si(111) wafer by R. F. magnetron sputtering method. The electrical properties of MFIS gate were relatively improved by inserting the $ZrO_2$ buffer layer. The window memory increased from 0.5 to 2.2V in the applied gate voltage range of 3-9V when the thickness of SBT film increased from 160 to 220nm with 20nm thick $ZrO_2$. The maximum value of window memory is 2.2V in Pt/SBT(160nm)/$ZrO_2$(20nm)/Si structure with the optimum thickness of $ZrO_2$. These memory windows are sufficient for practical application of NDRO-FRAM operating at low voltage.

Modeling and numerical simulation of electrostrictive materials and structures

  • Pechstein, Astrid;Krommer, Michael;Humer, Alexander
    • Smart Structures and Systems
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    • v.30 no.3
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    • pp.221-237
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    • 2022
  • This paper is concerned with nonlinear modeling and efficient numerical simulation of electrostrictive materials and structures. Two types of such materials are considered: relaxor ferroelectric ceramics and electrostrictive polymers. For ceramics, a geometrically linear formulation is developed, whereas polymers are studied in a geometrically nonlinear regime. In the paper, we focus on constitutive modeling first. For the reversible constitutive response under consideration, we introduce the augmented Helmholtz free energy, which is composed of a purely elastic part, a dielectric part and an augmentation term. For the elastic part, we involve an additive decomposition of the strain tensor into an elastic strain and an electrostrictive eigenstrain, which depends on the polarization of the material. In the geometrically nonlinear case, a corresponding multiplicative decomposition of the deformation gradient tensor replaces the additive strain decomposition used in the geometrically linear formulation. For the dielectric part, we first introduce the internal energy, to which a Legendre transformation is applied to compute the free energy. The augmentation term accounts for the contribution from vacuum to the energy. In our formulation, the augmented free energy depends not only on the strain and the electric field, but also on the polarization and an internal polarization; the latter two are internal variables. With the constitutive framework established, a Finite Element implementation is briefly discussed. We use high-order elements for the discretization of the independent variables, which include also the internal variables and, in case the material is assumed incompressible, the hydrostatic pressure, which is introduced as a Lagrange multiplier. The elements are implemented in the open source code Netgen/NGSolve. Finally, example problems are solved for both, relaxor ferroelectric ceramics and electrostrictive polymers. We focus on thin plate-type structures to show the efficiency of the numerical scheme and its applicability to thin electrostrictive structures.

The Dielectric Properties of PLZT Thin Films as Post Annealing Temperatures of TiO2 Buffer Layer (TiO2 Buffer Layer의 후열처리 온도 증가에 따른 PLZT 박막의 유전특성에 대한 연구)

  • Yoon, Ji-Eon;Lee, In-Seok;Kim, Sang-Jih;Son, Young-Guk
    • Journal of the Korean Vacuum Society
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    • v.17 no.6
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    • pp.560-565
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    • 2008
  • $(Pb_{0.98}La_{0.08})(Zr_{0.65}Ti_{0.35})O_3$ (PLZT) thin films with $TiO_2$ buffer layers were deposited on Pt/Ti/$SiO_2$/Si substrates by an R.F. magnetron sputtering method in order to improve the ferroelectric characteristics of the films. And the ferroelectric properties and crystallinities of the PLZT thin films were investigated in terms of the effects of the post annealing temperatures of $TiO_2$ buffer layers between a platinum bottom electrode and PLZT thin film. The ferroelectric properties of the PLZT thin films improved as increasing of the post annealing temperatures of $TiO_2$ layers, thereby reaching their maximum at $600^{\circ}C$.

Tailoring Low-field Strain Properties of [0.97Bi1/2(Na0.78K0.22)1/2TiO3-0.03LaFeO3]-Bi1/2(Na0.82K0.18)1/2TiO3 Lead-Free Relaxor/Ferroelectric Composites (무연 완화형/정규 강유전체 복합소재 [0.97Bi1/2(Na0.78K0.22)1/2TiO3-0.03LaFeO3]-Bi1/2(Na0.82K0.18)1/2TiO3의 저전계 전계유기 변형 특성 연구)

  • Hong, Chang-Hyo;Kang, Jin-Kyu;Jo, Wook;Lee, Jae-Shin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.6
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    • pp.342-347
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    • 2016
  • We investigated the effect of $Bi_{1/2}(Na_{0.82}K_{0.18})_{1/2}TiO_3$ (BNKT) modification on the ferroelectric and electric-field-induced strain (EFIS) properties of lead-free $0.97Bi_{1/2}(Na_{0.82}K_{0.18})_{1/2}TiO_3-0.03LaFeO_3$ (BNKTLF) ceramics as a function of BNKT content (x= 0, 0.1, 0.2, 0.3, 0.5, and 1). BNKT-modified BNKTLF powders were synthesized using a conventional solid-state reaction method. As the BNKT content x increased from 0 to 1 the normalized electric-field-induced strain ($S_{max}/E_{max}$) was observed to increase at relatively low fields, i.e., below the poling field. Moreover, BNKTLF-30BNKT showed about 460 pm/V as low as at 3 kV/mm, which is a considerably high value among the lead-free systems reported so far. Consequently, it was confirmed that ceramic-ceramic composite, a mixture of an ergodic relaxor matrix and embedded ferroelectric seeds, is a salient way to make lead-free piezoelectrics practical with enhanced EFIS at low field as well as less hysterical.

(K,Na)NbO3-based Lead-free Piezoelectric Materials: An Encounter with Scanning Probe Microscopy

  • Zhang, Mao-Hua;Thong, Hao Cheng;Lu, Yi Xue;Sun, Wei;Li, Jing-Feng;Wang, Ke
    • Journal of the Korean Ceramic Society
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    • v.54 no.4
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    • pp.261-271
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    • 2017
  • Environment-friendly $(K,Na)NbO_3-based$ (KNN) lead-free piezoelectric materials have been studied extensively in the past decade. Significant progress has been made in this field, manifesting competitive piezoelectric performance with that of lead-based, for specific application scenarios. Further understanding of the relationship between high piezoelectricity and microstructure or more precisely, ferroelectric domain structure, domain wall pinning effect, domain wall conduction and local polarization switching underpins the continuous advancement of piezoelectric properties, with the help of piezoresponse force microscopy (PFM). In this review, we will present the fundamentals of scanning probe microscopy (SPM) and its cardinal derivative in piezoelectric and ferroelectric world, PFM. Some representative operational modes and a variety of recent applications in KNN-based piezoelectric materials are presented. We expect that PFM and its combination with some newly developed technology will continue to provide great insight into piezoelectric materials and structures, and will play a valuable role in promoting the performance to a new level.