• 제목/요약/키워드: etching solution

검색결과 532건 처리시간 0.027초

비고정화 된 일차원 광결정의 DBR 다공성 실리콘을 이용한 센서와 Drug Delivery로의 응용 (1-D photonic crystals of free-standing DBR PSi for sensing and drug delivery applications)

  • 고영대;김지훈;박종선;김성기;김동수;조성동;손홍래
    • 센서학회지
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    • 제15권6호
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    • pp.391-396
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    • 2006
  • Free-standing multilayer distributed Bragg reflectors (DBR) porous silicon dielectric mirrors, prepared by electrochemical etching of crystalline silicon using square wave currents are treated with polystyrene to produce flexible, stable composite materials in which the porous silicon matrix is covered with caffeine-impregnated polystyrene. Optically encoded DBR PSi/polystyrene composite films retain the optical reflectivity. Optical characteristics of DBR PSi/polystyrene composite films are stable and robust for 2 hrs in a pH=7 aqueous buffer solution. The appearance of caffeine and change of DBR peak were simultaneously measured by UV-vis spectrometer and Ocean optics 2000 spectrometer, respectively.

폴리이미드 종류에 따른 연성 동박 적층판의 부착력 연구 (Research on the Adhesion of Flexible Copper Clad Laminates According to Species of Polyimide)

  • 이재원;김상호
    • 한국표면공학회지
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    • 제38권2호
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    • pp.49-54
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    • 2005
  • Flexible copper clad laminates (FCCL) fabricated by sputtering has advantages in fine pitch etching and dimensional accuracy than previous casting or laminating type FCCL, But its lower adhesion is inevitable technical challenge to solve for commercializing it. Chromium (Cr) which strongly reacts with O moiety was used as tie-coating layer in order to improve low adhesion between copper (Cu) and polyimide (PI). Sputtering raw polyimide (SRPI) and casting raw polyimide (CRPI) were used as substrates at this research. PI was pretreated by plasma before sputtering, and each sample was varied with RF power and Cr thickness on sputtering. Peel strength of the FCCL on SRPI was higher than that on CRPI. Adhesion had maximum value when 10 nm of Cr was deposited on SRPI by RF power of 50 W. It seems to be by the formation of Cu-Cr-O solid solution at the metal-PI interface.

일체형 포토어노드를 활용한 메틸렌블루의 분해 (Photocatalytic Degradation of MB with One-body Photoanode)

  • 심은정;배상현;윤재경;주현규
    • 한국수소및신에너지학회논문집
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    • 제18권1호
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    • pp.40-45
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    • 2007
  • Methylene blue(MB) was photocatalytically degraded with one-body photoanode and solar simulator to investigate the possible application to both environmental purification and photoelectrochemical cell for hydrogen production. Photoactive titanium dioxide was formed on both sides of Ti plate following steps such as rinsing-annealing-calcination or anodizing(20 V, 30 V)-annealing($350^{\circ}C$, $450^{\circ}C)$ after etching. The prepared titania plate($2cm{\times}2\;cm$, ca 1.6 mg $TiO_2$ on the basis of $1\;{\mu}m$ thickness) was used to degrade MB(10 ppm in 200 mL solution). The reaction tended to follow the Langmuir-Hinshelwood kinetics with zero order. Comparative experiments with Degussa P25 showed the same zero order kinetics when 2 mg of P25 had been used, while the first order kinetics when 200 mg used. This concludes the feasibility of the prepared titania plate as a material for the purification of low-level harmful organics and an electrode or a membrane for photoelectrochemical system for hydrogen production.

공정 파라미터에 따른 금속분말(SUS316L, IN718) 레이저 적층 표면 및 단면 특성 분석 (A Study on Surface and Cross-section Properties Depending on the Process Parameters of Laser Depositions with Metal Powders (SUS316L and IN718))

  • 황준호;신성선;이종훈;김성욱;김현덕
    • Journal of Welding and Joining
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    • 제35권3호
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    • pp.28-34
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    • 2017
  • The authors derived the criteria on the process parameters of laser depositions with metal powers(SUS316L & IN718) by evaluating the surface and cross-section properties of the deposition layers. The surface characteristics of the deposition layer are investigated through optical microscopy by controlling the process parameters of laser output, powder feeding rate and gas feeding rate. The cross-section characteristics were also analyzed after polishing and chemical etching process. As the gas feeding rate increased, the amount of powder loss increased and the difference in the dilution ratio and heat affected zone depending on laser outputs was observed. In addition, the powder feeding rate used in the experiment did not interfere with the energy absorption of the base material.

리튬 이차전지용 금속이 담지된 다공성 실리콘 음극물질의 전기화학적 특성 (Electrochemical Characteristics of Porous Modified Silicon Impregnated with Metal as Anode Materials for Lithium Secondary Batteries)

  • 장은정;전법주
    • 한국수소및신에너지학회논문집
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    • 제23권4호
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    • pp.353-363
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    • 2012
  • The relationship between the diffusivity and electrochemical characteristics of lithium secondary battery with the modified Si anode material prepared in HF/$AgNO_3$ solution was investigated. The crystallographic structure and images of the modified porous Si and modified Si/Cu was examined using the X-ray diffraction, BET and SEM. To examine the effect of metal composite and pore size distribution according to chemical etching on the electrochemical characterization, the electrodes for half cells were prepared with the modified Si, modified Si/Cu, and modified Si/Cu annealed with $600^{\circ}C$. Our results showed that the chemical diffusivity of lithium ions was related to structure and resistance of Si/Cu composite anode material. The lithium diffusivity in modified silicon compound calculated from the CV was at the range of $1{\times}10^{-12}$ to $9{\times}10^{-16}cm^2/s$. The effects of modified silicon structure and resistance on the cycling efficiency were significant.

염화제이철 용액을 이용한 베릴륨동 기판의 식각 특성 (Etching properties of BeCu Foil using $FeCl_3$ solution)

  • 이근우;이병욱;이태성;이종하;이재홍;김창교
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.26-27
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    • 2006
  • 구리와 강철의 성질을 혼합한 것과 같은 우수한 성질을 갖고 있어서 열전도율이 좋고 내마모성이 뛰어난 베릴륨동 기판(BeCu foil)에 대한 식각 특성에 관하여 연구하였다. 일반적으로 베결륨구리에 대한 식각용액은 염화제이철($FeCl_3$)이 널리 알려져 있으며, 이 용액은 농도와 온도에 따라 식각시간이 달라지게 되어 식각되는 면의 상태가 영향을 받게 된다. 염화제이철의 농도를 변화시켜 본 결과 염화제이철의 농도가 증가할수록 식각률이 증가하였고, 염화제이철에 염산(HCI)을 첨가한 결과 식각률이 증가함을 알 수 있었다. 이는 염화제이철의 성분 중에서 염산(HCl)의 농도가 식각률에 영향을 미치고 있음을 나타낸다. 또한 염화제이철의 온도가 $40^{\circ}C$일때 식각률이 가장 우수하며 식각되는 면의 상태가 매우 양호해지고 각각 되는 면의 각도도 수직에 가까워진다.

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Fabrication of Field-Emitter Arrays using the Mold Method for FED Applications

  • Cho, Kyung-Jea;Ryu, Jeong-Tak;Kim, Yeon-Bo;Lee, Sang-Yun
    • Transactions on Electrical and Electronic Materials
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    • 제3권1호
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    • pp.4-8
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    • 2002
  • The typical mold method for FED (field emission display) fabrication is used to form a gate electrode, a gate oxide layer, and emitter tip after fabrication of a mold shape using wet-etching of Si substrate. However, in this study, new mold method using a side wall space structure was developed to make sharp emitter tips with the gate electrode. In new method, gate oxide layer and gate electrode layer were deposited on a Si wafer by LPCVD (low pressure chemical vapor deposition), and then BPSG (Boro phosphor silicate glass) thin film was deposited. After then, the BPSG thin film was flowed into the mold at high temperature in order to form a sharp mold structure. TiN was deposited as an emitter tip on it. The unfinished device was bonded to a glass substrate by anodic bonding techniques. The Si wafer was etched from backside by KOH-deionized water solution. Finally, the sharp field emitter array with gate electrode on the glass substrate was formed.

시편의 준비 방법 및 접촉저항이 알루미늄 합금의 아노다이징 피막 형성에 미치는 영향 (Effects of Specimen Preparation Method and Contact Resistance on the Formation of Anodizing Films on Aluminum Alloys)

  • 문성모
    • 한국표면공학회지
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    • 제53권1호
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    • pp.29-35
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    • 2020
  • In this study, five different specimen preparation methods were introduced and their advantages and disadvantages were presented. One of them, an epoxy mounting method has advantages of constant exposure area, ease of surface preparation without touching the specimen surface during polishing or cleaning, use of small amount of material and ease of specimen reuse by polishing or etching. However, in order to eliminate unexpected errors resulting from preferable reaction at the specimen/epoxy interface and contact resistance between the specimen and copper conducting line for electrical connection, it is recommended to cover the wall side of the specimen with porous anodic oxide films and to remain the contact resistance lower than 1 ohm. The increased contact resistance between the specimen and Cu conducting line appeared to result in increases of anodizing voltage and solution temperature during anodizing by which thickness and hardness of anodizing film on Al2024 alloy were drastically decreased and color of the films became more brightened.

습식식각을 이용한 HfO2 박막의 식각특성 (Characteristics of HfO2 Thin Films Using Wet Etching)

  • 양정열;곽노석;임정훈;최용재;황택성
    • 한국전기전자재료학회논문지
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    • 제24권9호
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    • pp.687-692
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    • 2011
  • Hafnium oxide ($HfO_2$) was very advantageous for substitute material of gate on existing transistor. $HfO_2$ has been widely studied due to high contact with polysilicon and thermal stability and also, it is easily etched by using HF solution. In this study, $HfO_2$ and thermal oxide films were etched by wet etch method using chemical etchant. Etch rate of $HfO_2$ and thermal oxide was linearly increased with increasing concentration of HF and temperature but etch rate of $HfO_2$ was higher than thermal oxide due to $H^+$, $F^-$, and $HF_2^-$ ions at below 0.5% concentration of HF. And also, etch selectivity was improved by adding Hydrazine as additive.

Synthesis of direct-patternable ZnO film incorporating Pt Nanoparticles

  • Choi, Yong-June;Park, Hyeong-Ho;Reddy, A.Sivasankar;Park, Hyung-Ho
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.369-369
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    • 2007
  • ZnO film has been investigated during several decades because it has excellent optical property like a transmittance among the range of visible light for using transparent conducting oxide (TCO) films. But ZnO film has not enough conductivity for applying to TCO devices. Therefore we synthesized platinum nanoparticles and they incorporated into ZnO due to improve the electrical property of ZnO film by sol-gel synthesis method. Also, we fabricated photosensitive ZnO thin film containing Pt nanoparticles by sol-gel process and spin-coating for using photochemical solution deposition. Photosensitive ZnO film could carry out the direct-pattern which allow the etching process to be convenient. The optical and electrical properties of ZnO film with or without various atomic percent of Pt nanoparticles annealed at various temperatures were investigated by using UV-Vis spectroscopy and 4-point probe method, respectively. We characterized the ZnO thin film containing Pt nanoparticles using X-ray diffraction, scanning electron microscopy, and X-ray photoelectron spectroscopy.

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