Characteristics of HfO2 Thin Films Using Wet Etching |
Yang, Jeung-Ryoul
(Technosemichem Co., Ltd.)
Kwak, Noh-Seok (Department of Chemical Engineering, Chungnam National University) Lim, Jung-Hun (Technosemichem Co., Ltd.) Choi, Yong-Jae (Technosemichem Co., Ltd.) Hwang, Taek-Sung (Department of Chemical Engineering, Chungnam National University) |
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