• Korean Chemical Engineering Research
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• 제54권6호
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• pp.723-733
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• 2016

반도체 배선 미세화에 의한 한계를 극복하기 위해 실리콘 관통 비아(through silicon via, TSV)를 사용한 소자의 3차원 적층에 대한 연구가 진행되고 있다. TSV 내부는 전해도금을 통해 구리로 채우며, 소자의 신뢰성을 확보하기 위해 결함 없는 TSV의 채움이 요구된다. TSV 입구와 벽면에서는 구리 전착을 억제하고, TSV 바닥에서 선택적으로 구리 전착을 유도하는 바닥 차오름을 통해 무결함 채움이 가능하다. 전해 도금액에 포함되는 유기 첨가제는 TSV 위치에 따라 국부적으로 구리 전착 속도를 결정하여 무결함 채움을 가능하게 한다. TSV의 채움 메커니즘은 첨가제의 거동에 기반하여 규명되므로 첨가제의 특성을 이해하는 연구가 선행되어야 한다. 본 총설에서는 첨가제의 작용기작을 바탕으로 하는 다양한 채움 메커니즘, TSV 채움 효율을 개선하기 위한 평탄제의 개발과 3-첨가제 시스템에서의 연구, 첨가제 작용기와 도금 방법의 수정을 통한 채움 특성의 향상에 관한 연구를 소개한다.

• 대한기계학회논문집A
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• 제39권10호
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• pp.1011-1019
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• 2015

Insulated gate bipolar transistor (IGBT) 소자는 전동차, 항공기 및 전기 자동차에 가장 많이 사용되는 고전압, 고전력용 전력 반도체이다. 그러나 IGBT 전력소자는 동작 시 발열 온도가 매우 높고, 이로 인해, IGBT 소자의 신뢰성 및 성능에 큰 영향을 미치고 있다. 따라서 발열 문제를 해결하기 위한 IGBT 모듈 패키지의 방열 설계는 매우 핵심적인 기술이며, 특히, 소자가 동작 한계 온도에 올라가지 않도록 방열 설계를 적절히 수행하여야 한다. 본 논문에서는 전동차에 사용되는 1200 A, 3.3 kV 급 IGBT 모듈 패키지의 열 특성에 대해 수치해석을 이용하여 분석하였다. IGBT 모듈 패키지에 사용되는 다양한 재료 및 소재의 두께에 대한 영향을 분석하였으며, 실험계획법을 이용한 최적화 설계를 수행하였다. 이를 통하여 열 저항을 최소화하기 위한 최적의 방열 설계 가이드 라인을 제시하고자 하였다.

• Journal of Welding and Joining
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• 제13권3호
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• pp.134-146
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• 1995

Aluminium nitride(AlN) is currently under investigation as potential candidate for replacing alumium oxide(Al$_{2}$ $O_{3}$) as a substrate material for for electronic circuit packaging. Brazing of aluminium nitride(AlN) to Cu with Ag base active alloy containing Ti has been investigated in vacuum. Binary Ag$_{98}$ $Ti_{2}$(AT) and ternary At-1wt.%Al(ATA), AT-1wt.%Ni(ATN), AT-1wt.% Mn(ATM) alloys showed good wettability to AlN and led to the development of strong bond between brate alloy and AlN ceramic. The reaction between AlN and the melted brazing alloys resulted in the formation of continuous TiN layers at the AlN side iterface. This reaction layer was found to increase by increase by increasing brazing time and temperature for all filler metals. The bond strength, measured by 4-point bend test, was increased with bonding temperature and showed maximum value and then decreased with temperature. It might be concluded that optimum thickness of the reaction layer was existed for maximum bond strength. The joint brazed at 900.deg.C for 1800sec using binary AT alloy fractured at the maximum load of 35kgf which is the highest value measured in this work. The failure of this joint was initiated at the interface between AlN and TiN layer and then proceeded alternately through the interior of the reaction layer and AlN ceramic itself.

• 한국응용과학기술학회지
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• 제32권1호
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• pp.85-92
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• 2015

생분해성 고분자인 셀룰로오스 아세테이트(CA)를 매트릭스로 용액 중합된 HCl이 50% 정도 도핑된 PAni를 첨가하여 도전성 PCA 복합 필름을 제조하여 기계적, 전기적 특성 및 표면 morphology를 고찰하였다. PCA 복합 필름의 인장강도는 PAni 함유량 5 wt% 인 경우 순수 CA 필름($377.1kg_f/cm^2$)에 비해 27% 정도 감소된 $275.2kg_f/cm^2$를 나타내었으며, 신율도 7.65%에서 4.35% 정도로 감소하였다. 표면저항은 PAni의 함량에 따라 감소하였으며, PAni 함유량이 5 wt%인 PCA05의 경우 $7.0{\times}10^9{\Omega}/sq$로 정전기 방지용 필름으로 사용이 가능할 정도였다. 표면 정전기량의 소멸 속도도 PAni 함량에 따라 비례하여 빨라짐을 확인하였다. PCA 복합 필름의 열적 안정성은 PAni 함량이 늘어남에 따라 분해온도가 낮아졌으며, 최종 재(char)의 함량은 PAni의 함량에 비례하였다. 최종 재의 함량을 이용하여 미지의 PCA 복합 필름 중의 PAni의 분율을 계산할 수 있을 것으로 판단된다.

• 한국표면공학회지
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• 제36권5호
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• pp.373-378
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• 2003

With increasing environmental concerns, application of lead-free solder and fluxless soldering process have been taken attention from the electronic packaging industry. Plasma treatment is one of the soldering methods for the fluxless soldering, and it can prevent environmental pollution cased by flux. On this study fluxless soldering process under $Ar-H_2$plasma using lead free solders such as Sn-3.5 wt%Ag, Sn-3.5 wt%Ag-0.7 wt%Cu and Sn-37%Pb for a reference was investigated. As the plasma reflow has higher soldering temperature than normal air reflow, the effects of UBM(Under Bump Metallization) thickness on the interfacial reaction and bonding strength can be critical. Experimental results showed in case of the thin UBM, Au(20 nm)/Cu(0.3 $\mu\textrm{m}$)/Ni(0.4 $\mu\textrm{m}$)/Al(0.4 $\mu\textrm{m}$), shear strength of the soldered joint was relatively low as 19-27㎫, and it's caused by the crack observed along the bonded interface. The crack was believed to be produced by the exhaustion of the thin UBM-layer due to the excessive reaction with solder under plasma. However, in case of thick UBM, Au(20 nm)/Cu(4 $\mu\textrm{m}$)/Ni(4 $\mu\textrm{m}$)/Al(0.4 $\mu\textrm{m}$), the bonded interface was sound without any crack and shear strength gives 32∼42㎫. Thus, by increasing UBM thickness in this study the shear strength can be improved to 50∼70%. Fluxed reflow soldering under hot air was also carried out for a reference, and the shear strength was 48∼52㎫. Consequently the fluxless soldering with plasma showed around 65∼80% as those of fluxed air reflow, and the possibility of the $Ar-H_2$ plasma reflow was evaluated.

• 대한전자공학회논문지SD
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• 제48권12호
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• pp.73-81
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• 2011

초고속 디지털 통신시스템의 성능은 빠른 에지율(edge rate), 클럭속도 및 디지털 정보전송방법 등에 영향을 받는다. 특히 고주파 통신시스템의 잡음원은 다수 전송선에서의 신호 간 동시 스위칭, 전원 공급, 신호 반사와 왜곡 등에 의해 발생하며, 다층(multilayer) PCB를 설계할 경우 신호의 충실성이 더욱 훼손된다. 따라서 시스템 H/W의 신호충실성을 얻기 위해 최적 임피던스 정합을 갖는 PCB 설계가 필요하다. 본 논문에서는 시스템 신호의 충실성을 위하여 다층 PCB 선로의 패턴에 따른 트랙계산 이론, 설계에 필요한 임피던스 및 특성 자동 분석 시뮬레이터를 개발한다. 특히 다층으로 PCB를 설계할 때 신호선과 접지부분 배치를 사전에 컴퓨터 모의실험을 통하여 최적조건의 임피던스에 맞는 설계가 가능하도록 시뮬레이터를 개발함은 물론 이를 데이터베이스화한다. 그리하여 제안된 시뮬레이션 툴은 PCB 설계 시 소요되는 시간을 단축하고 경제적인 PCB 개발을 가능케 한다.

• 한국공작기계학회논문집
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• 제18권1호
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• pp.116-121
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• 2009

Thermosonic flip chip bonding is an important technology for the electronic packaging due to its simplicity, cost effectiveness and clean and dry process. Mechanical properties of the horn and the shank, such as the natural frequency and the amplitude, have a great effect on the bonding capability of the transverse flip chip bonding system. In this research, two kinds of study are performed. The first is the new design of the clamp and the second is the effect of tolerance parameters to the performance of the system. The clamp with a bent shape is newly designed to hold the nodal point of the flip chip. The second is the effect of the design parameters on the vibration amplitude and planarity at the end of the shank. The variation of the tolerance parameters changes the amplitude and the frequency of the vibration of the shank. They, in turn, have an effect on the quantity of the plastic deformation of the gold ball bump, which determined the quality of the flip chip bonding. The tolerance parameters that give the great effect on the amplitude of the shank are determined using Taguchi's method. Error of set-up angle, the length and diameter of horn and error of the length of the shank are determined to be the parameters that have peat effect on the amplitude of the system.

• 산업경영시스템학회지
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• 제38권3호
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• pp.21-28
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• 2015

As film products are increasingly used in a wide range of areas, from producing traditional flexible packaging to high-tech electronic products, a higher level of quality is demanded. Most film products are made in the form of rolled finished goods, therefore, various quality issues related to their shape characteristics must be addressed. The thickness of the film products is one of the most common and important critical-to-quality attributes (CTQs). Particularly, the degree of thickness uniformity is more important than other thickness parameters, because it will be potential causes of many secondary thickness-related quality problems, such as wrinkles or faulty windings. To control the degree of thickness uniformity, the fixed bending region is oneof the most important CTQs to manage. Fixed bending regions are special points in the transverse direction of a rolled product with consistent minute variations of the thickness gap. This paper describes the measurement and analysis of thickness uniformity data, which were performed in a real manufacturing field of biaxial oriented polypropylene (BOPP) film. In previous researches, quality function deployment (QFD) or fault tree analysis were used to find the most critical process attributes out to controlthe CTQ of thickness uniformity. Whereas, this paper uses traditional control charts to find the most critical process attributes out in this problem. In addition, the selection of one of the major critical process attributes (CTPs) that is expected to affect the CTQ of thickness uniformity is also described. The selected critical-to-process attributes are the controlled temperatures along the transverse direction. A dramatic improvement in thickness uniformity was observed when the selected CTPs were controlled.

• Macromolecular Research
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• 제12권1호
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• pp.78-84
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• 2004

Advanced epoxy molding compounds (EMCs) should be considered to alleviate the thermal stress problems caused by low thermal conductivity and high elastic modulus of an EMC and by the mismatch of the coefficient of thermal expansion (CTE) between an EMC and the Si-wafer. Though A1N has some advantages, such as high thermal conductivity and mechanical strength, an A1N-filled EMC could not be applied to commercial products because of its low fluidity and high modules. To solve this problem, we used 2-$\mu\textrm{m}$ fused silica, which has low porosity and spherical shape, as a small size filler in the binary mixture of fillers. When the composition of the silica in the binary filler system reached 0.3, the fluidity of EMC was improved more than twofold and the mechanical strength was improved 1.5 times, relative to the 23-$\mu\textrm{m}$ A1N-filled EMC. In addition, the values of the elastic modules and the dielectric constant were reduced to 90％, although the thermal conductivity of EMC was reduced from 4.3 to 2.5 W/m-K, when compared with the 23-$\mu\textrm{m}$ A1N-filled EMC. Thus, the A1N/silica (7/3)-filled EMC effectively meets the requirements of an advanced electronic packaging material for commercial products, such as high thermal conductivity (more than 2 W/m-K), high fluidity, low elastic modules, low dielectric constant, and low CTE.

• Journal of Welding and Joining
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• 제29권6호
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• pp.65-70
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• 2011

The effect of flip chip bonding parameters on formation of intermetallic compounds (IMCs) between Au stud bumps and Sn-3.5Ag solder was investigated. In this study, flip chip bonding temperature was performed at $260^{\circ}C$ and $300^{\circ}C$ with various bonding times of 5, 10, and 20 sec. AuSn, $AuSn_2$ and $AuSn_4$ IMCs were formed at the interface of joints and (Au, Cu)$_6Sn_5$ IMC was observed near Cu pad side in the joint. At bonding temperature of $260^{\circ}C$, $AuSn_4$ IMC was dominant in the joint compared to other Au-Sn IMCs as bonding time increased. At bonding temperature of $300^{\circ}C$, $AuSn_2$ IMC clusters, which were surrounded by $AuSn_4$ IMC, were observed in the solder joint due to fast diffusivity of Au to molten solder with increased bonding temperature. Bond strength of Au stud bump joined with Sn-3.5Ag solder was about 23 gf/bump and fracture mode of the joint was intergranular fracture between $AuSn_2$ and $AuSn_4$ IMCs regardless bonding conditions.