• 대한기계학회논문집B
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• 제28권7호
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• pp.826-833
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• 2004

Cascade impactors are widely used to collect size classified aerosol. A major disadvantage of this instrument is the required long sampling time. Electrical low pressure impactor has been developed to overcome this disadvantage and to achieve real-time measurements on the particle size distribution. The instrument consists primarily of a corona charger, low pressure cascade impactor and multi channel electrometer. We designed and evaluated the performance of a potable 3-stage low pressure impactor using an electrical method. For the calibration of the impactor, monodispersed particles were generated using evaporation-condensation method followed by electrostatic classification using a DMA(Differential Mobility Analyzer). The collection efficiency curves of the stages can be determined by analysing the fraction of particles collected by each stage.

• 대한전자공학회논문지SD
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• 제37권1호
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• pp.8-18
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• 2000

본 논문은 RF 호로 모듈을 구현하기 위한 방법으로서 BGA(Ball Grid Array) 패키지 구조를 제시하고 그 전기적 변수를 추출하였다. RF 소자의 동작 주파수가 높아지면서 RF 회로를 구성하는 패키지의 전지적 기생 성분들은 무시할 수 없을 정도로 동작회로에 영향을 끼친다. 또한 소형화 이동성을 요구하는 무선 통신 시스템은 그 전기적 특성을 만족시킬 수 있도록 새로운 RF 회로 모듈 구조를 요구한다. RF 회로 모듈 BGA 패키지 구조는 회로 동작의 고속화, 소형화, 짧은 회로 배선 길이, 아날로그와 디지탈 혼성 회로에서 흔히 발생하는 전기적 기생 성분에 의한 잡음 개선등 기존의 구조에 비해 많은 장점을 제공한다. 부품 실장 공정 과정에서도 BGA 패키지 구조는 드릴링을 이용한 구멍 관통 홀 제작이 아닌 순수한 표면 실장 공정만으로 제작될 수 있는 장점을 제시한다. 본 실험은 224MHz에서 동작하는 ITS(Intelligent Transportation System) RF 모튤을 BGA 패키지 구조로 설계 제작하였으며, HP5475A TDR(Time Domain Reflectometry) 장비를 이용하여 3${\times}$3 입${\cdot}$출력단자 구조을 갖는 RF 모튤 BGA 패키지의 전기적 파라메타의 기생성분을 측정하였다. 그 결과 BGA 공납의 자체 캐패시턴스는 68.6fF, 자체 인덕턴스는 1.53nH로써 QFP 패키지 구조의 자체 캐패시턴스 200fF와 자체 인덕턴스 3.24nH와 비교할 때 각각 34%, 47%의 값에 지나지 않음을 볼 수 있었다. HP4396B Network Analyzer의 S11 파라메타 측정에서도 1.55GHz 근방에서 0.26dB의 손실을 보여주어 계산치와 일치함을 보여 주었다. BGA 패키지를 위한 배선 길이도 0.78mm로 짧아져서 RF 회로 모튤을 소형화시킬 수 있었으며, 이는 RF 회로 모듈 구성에서 BGA 패키지 구조를 사용하면 전기적 특성을 개선시킬 수 있음을 보여준 것이다.

• Transactions on Electrical and Electronic Materials
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• 제18권1호
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• pp.55-57
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• 2017

Amorphous oxide thin film transistors (TFTs) were fabricated with 0.5 wt% silicon doped zinc tin oxide (a-0.5SZTO) thin film deposited by radio frequency (RF) magnetron sputtering. In order to investigate the effect of annealing treatment on the electrical properties of TFTs, a-0.5SZTO thin films were annealed at three different temperatures ($300^{\circ}C$, $500^{\circ}C$, and $700^{\circ}C$ for 2 hours in a air atmosphere. The structural and electrical properties of a-0.5SZTO TFTs were measured using X-ray diffraction and a semiconductor analyzer. As annealing temperature increased from $300^{\circ}C$ to $500^{\circ}C$, no peak was observed. This provided crystalline properties indicating that the amorphous phase was observed up to $500^{\circ}C$. The electrical properties of a-0.5SZTO TFTs, such as the field effect mobility (${\mu}_{FE}$) of $24.31cm^2/Vs$, on current ($I_{ON}$) of $2.38{\times}10^{-4}A$, and subthreshold swing (S.S) of 0.59 V/decade improved with the thermal annealing treatment. This improvement was mainly due to the increased carrier concentration and decreased structural defects by rearranged atoms. However, when a-0.5SZTO TFTs were annealed at $700^{\circ}C$, a crystalline peak was observed. As a result, electrical properties degraded. ${\mu}_{FE}$ was $0.06cm^2/Vs$, $I_{ON}$ was $5.27{\times}10^{-7}A$, and S.S was 2.09 V/decade. This degradation of electrical properties was mainly due to increased interfacial and bulk trap densities of forming grain boundaries caused by the annealing treatment.

• 한국재료학회지
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• 제21권2호
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• pp.115-119
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• 2011

Si Nanowire (NW) field effect transistors (FETs) were fabricated on hard Si and flexible polyimide (PI) substrates, and their electrical characteristics were compared. Si NWs used as channels were synthesized by electroless etching method at low temperature, and these NWs were refined using a centrifugation method to get the NWs to have an optimal diameter and length for FETs. The gate insulator was poly(4-vinylphenol) (PVP), prepared using a spin-coating method on the PI substrate. Gold was used as electrodes whose gap was 8 ${\mu}m$. These gold electrodes were deposited using a thermal evaporator. Current-voltage (I-V) characteristics of the device were measured using a semiconductor analyzer, HP-4145B. The electrical properties of the device were characterized through hole mobility, $I_{on}/I_{off}$ ratio and threshold voltage. The results showed that the electrical properties of the TFTs on PVP were similar to those of TFTs on $SiO_2$. The bending durability of SiNWs TFTs on PI substrate was also studied with increasing bending times. The results showed that the electrical properties were maintained until the sample was folded about 500 times. But, after more than 1000 bending tests, drain current showed a rapid decrease due to the defects caused by the roughness of the surface of the Si NWs and mismatches of the Si NWs with electrodes.

• 대한기계학회논문집B
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• 제28권3호
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• pp.349-358
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• 2004

A low pressure impactor is an impaction device to separate airborne particles into aerodynamic size classes at low pressure condition. We designed a two-stage low-pressure impactor to classify submicron sized environmental aerosols. Performance evaluation was carried out for stages 1 and 2 by using an electrical method. Monodisperse liquid dioctyl sebacate (DOS) particles were generated using evaporation-condensation process followed by electrostatic classification using a DMA (differential mobility analyzer). The test particles were in the range of 0.08∼0.8$\mu\textrm{m}$. For the evaluation of the impactor we used two electrometers; one was connected to the impaction plate of the impactor and the other was to the Faraday cage used as a backup filter. The effect of polydispersity of test aerosols on the performance was investigated. The results showed that the experimental 50-% cutoff diameters at each impactor's operation pressure were 0.53 and 0.187$\mu\textrm{m}$ for stages 1 and stage 2, respectively. The effects of operation pressure on the cutoff diameter and the steepness of collection efficiency curves were also investigated.

• 대한기계학회논문집B
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• 제27권3호
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• pp.326-333
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• 2003

In the measurement using DMA and CPC in series, there is some time delay for particles classified in DMA to detect in CPC. During this time, the DMA time-response changes due to the velocity profile of sampling tube and the diffusion of particles in the volume that exists between the DMA exit and the detector of ultra-fine CPC. This is called mixing effect. In the accelerated measurement methods like the TSI -SMPS, the size distribution is obtained from the correlation between the time-varying electrical potential of the DMA and the corresponding particle concentrations sampled in DMA. If the DMA time -response changes during this delay time, this can cause the error of a size distribution measured by this accelerated technique. The kernel function considering this mixing effect using the residence time distribution is proposed by Russell et al. In this study, we obtained a size distribution using this kernel to compare to the result obtained by the commercial accelerated measurement system, TSI -SMPS for verification and considered the errors that result from the mixing effect with the geometric mean diameters of originally sampled particles, using virtually calculated responses obtained with this kernel as input data.

• 전기화학회지
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• 제8권3호
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• pp.130-134
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• 2005

본 연구에서는 그동안 전기화학적으로 합성되지 못했던 III-V족 화합물 반도체 InSb를 구연산 용액으로부터 합성하였으며 자체 제조한 AAO를 나노템플릿으로 이용하여 정전압 도금을 실시하여 InSb 나노와이어를 제조하였다 제조된 InSb나노와이어는 X선 회절분석 결과 단결정의 나노와이어는 아니었으나 정확하게 화학양론을 만족시키는 화합물임을 확인하였고, 평판 박막 상태의 InSb와는 달리 나노와이어의 길이방향으로 (220) 방향의 결정이 주로 성장하는 우선결정방위를 가지고 있음을 알 수 있었다. 또한 집합적으로 배열된 상태에서 측정된 I-V특성 곡선에서는 n형 반도체의 특성을 보이되 밴드갭이 좁고, 전자이동도가 큰 InSb고유의 특성상 반금속과 유사한 전기적 특성을 보유하고 있음을 확인하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.341-341
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• 2012

Recently, oxide semi-conductor materials have been investigated as promising candidates replacing a-Si:H and poly-Si semiconductor because they have some advantages of a room-temperature process, low-cost, high performance and various applications in flexible and transparent electronics. Particularly, amorphous indium-gallium-zinc-oxide (a-IGZO) is an interesting semiconductor material for use in flexible thin film transistor (TFT) fabrication due to the high carrier mobility and low deposition temperatures. In this work, we demonstrated improvement of flexibility in IGZO TFTs, which were fabricated on polyimide (PI) substrate. At first, a thin poly-4vinyl phenol (PVP) layer was spin coated on PI substrate for making a smooth surface up to 0.3 nm, which was required to form high quality active layer. Then, Ni gate electrode of 100 nm was deposited on the bare PVP layer by e-beam evaporator using a shadow mask. The PVP and $Al_2O_3$ layers with different thicknesses were used for organic/inorganic multi gate dielectric, which were formed by spin coater and atomic layer deposition (ALD), respectively, at $200^{\circ}C$. 70 nm IGZO semiconductor layer and 70 nm Al source/drain electrodes were respectively deposited by RF magnetron sputter and thermal evaporator using shadow masks. Then, IGZO layer was annealed on a hotplate at $200^{\circ}C$ for 1 hour. Standard electrical characteristics of transistors were measured by a semiconductor parameter analyzer at room temperature in the dark and performance of devices then was also evaluated under static and dynamic mechanical deformation. The IGZO TFTs incorporating hybrid gate dielectrics showed a high flexibility compared to the device with single structural gate dielectrics. The effects of mechanical deformation on the TFT characteristics will be discussed in detail.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.11-11
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• 2010

Thin-film-transistors (TFTs) that can be deposited at low temperature have recently attracted lots of applications such as sensors, solar cell and displays, because of the great flexible electronics and transparent. Transparent and flexible transistors are being required that high mobility and large-area uniformity at low temperature [1]. But, unfortunately most of TFT structures are used to be $SiO_2$ as gate dielectric layer. The $SiO_2$ has disadvantaged that it is required to high driving voltage to achieve the same operating efficiency compared with other high-k materials and its thickness is thicker than high-k materials [2]. To solve this problem, we find lots of high-k materials as $HfO_2$, $ZrO_2$, $SiN_x$, $TiO_2$, $Al_2O_3$. Among the High-k materials, $Al_2O_3$ is one of the outstanding materials due to its properties are high dielectric constant ( ~9 ), relatively low leakage current, wide bandgap ( 8.7 eV ) and good device stability. For the realization of flexible displays, all processes should be performed at very low temperatures, but low temperature $Al_2O_3$ grown by sputtering showed deteriorated electrical performance. Further decrease in growth temperature induces a high density of charge traps in the gate oxide/channel. This study investigated the effect of growth temperatures of ALD grown $Al_2O_3$ layers on the TFT device performance. The ALD deposition showed high conformal and defect-free dielectric layers at low temperature compared with other deposition equipments [2]. After ITO was wet-chemically etched with HCl : $HNO_3$ = 3:1, $Al_2O_3$ layer was deposited by ALD at various growth temperatures or lift-off process. Amorphous InGaZnO channel layers were deposited by rf magnetron sputtering at a working pressure of 3 mTorr and $O_2$/Ar (1/29 sccm). The electrodes were formed with electron-beam evaporated Ti (30 nm) and Au (70 nm) bilayer. The TFT devices were heat-treated in a furnace at $300^{\circ}C$ and nitrogen atmosphere for 1 hour by rapid thermal treatment. The electrical properties of the oxide TFTs were measured using semiconductor parameter analyzer (4145B), and LCR meter.