• 음성과학
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• 제14권4호
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• pp.53-64
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• 2007

This paper attempts to verify the theoretical claims in Syntax ($Bo{\check{s}}kovi{\acute{c}}$ & Lasnik, 2003; Kim, 1999, 2004) about the phrasing in English that-clauses, presenting an acoustic experiment conducted to observe the patterns of edge tones at the boundaries of that. In the experiment, two different that clauses, complement and relative clauses, were varied in forms (that-retention, that-deletion, adverb insertion before that) and length. Results showed that edge tones, if occurred, mostly showed up before the complement clauses in that-deletion sentences (67%), and that their positions polarized in adverb insertion sentences (56% before toot and 44% after toot). In the relative clauses, phrasing mostly occurred before toot as opposed to after toot in that-retention (73%) and adverb insertion sentences (87%). Additionally, phrasing tends to occur more frequently as the sentences get longer. The results suggest that the previous claims based on syntax are not consistent with the results of the current phonetic experiment. This may be interpreted as stating that syntactic boundaries do not always indicate phonetic phrasing, and that there may be some other factors to determine phrasing patterns, for example, rhythmic phrasing operating at the surface level of speech.

• 한국콘텐츠학회논문지
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• 제8권12호
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• pp.10-19
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• 2008

본 논문에서는 문화재의 실측된 3D 스캔(scan) 데이터로부터 내부문양 및 실루엣(silhouette)을 효과적으로 추출할 수 있는 자동화된 실루엣 추출 방법을 제안한다. 제안한 방법에서는 먼저 3D 벡터 데이터의 에지리스트(edge list)를 생성하고, 시점에 따라 윤곽 에지(contour edge)와 주름 에지(crease edge)를 결정한다. 다음으로 주름 에지에서 인접면들의 벡터 변화량을 검사하여 표면 실루엣을 추출한 후, 최종적으로 문화재의 도면(blueprint) 생성을 위한 윤곽 실루엣과 표면 실루엣을 추출한다. 제안한 실루엣 추출 방법의 성능 평가를 위하여 전통 기와, 자동차 및 석탑 데이터를 이용한 실루엣 추출 실험을 진행하였다. 제안한 방법은 기존의 임계값을 이용한 실루엣 추출 방법에서 불필요한 에지까지도 실루엣을 형성하는 것을 보완하여, 잡음과 같은 의미 없는 에지들을 효과적으로 제거함으로써 더욱 선명하고 깨끗한 실루엣 및 내부 문양을 추출하였다.

• Journal of information and communication convergence engineering
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• 제8권1호
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• pp.51-58
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• 2010

This paper proposes an edge adaptive color interpolation for an ultra-small HD-grade complementary metal-oxide semiconductor (CMOS) video sensor in camera phones that can process 720-p/30-fps videos. Recently, proposed methods with great image quality perceptually reconstruct the green component and then estimate the red/blue component using the reconstructed green and neighbor red and blue pixels. However, these methods require the bulky memory line buffers in order to temporally store the reconstructed green components. The edge adaptive color interpolation method uses seven or nine patterns to calculate the six edge directions. At the same time, the threshold values are adaptively adjusted by the sum of the color values of the selected pixels. This method selects the suitable one among the patterns using two flowcharts proposed in this paper, and then interpolates the missing color values. For verification, we calculated the peak-signal-to-noise-ratio (PSNR) in the test images, which were processed by the proposed algorithm, and compared the calculated PSNR of the existing methods. The proposed color interpolation is also fabricated with the 0.18-${\mu}m$ CMOS flash memory process.

• 센서학회지
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• 제28권4호
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• pp.251-255
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• 2019

We propose a two-step lithography process to minimize edge-bead issues caused by thick photoresist (PR) coating. In the conventional PR process, the edge bead can be efficiently removed by applying an edge-bead removal (EBR) process while rotating the silicon wafer at a high speed. However, applying conventional EBR to the production of desired PR mold with unique negative patterns cannot be used because a lower rpm of spin coating and a lower temperature in the soft bake process are required. To overcome this problem, a two-step lithography process was developed in this study and applied to the fabrication of a polydimethylsiloxane (PDMS) film having super-hydrophobic characteristics. Following UV exposure with a first photomask, the exposed part of the silicon wafer was selectively removed by applying a PR developer while rotating at a low rpm. Then, unique PR mold structures were prepared by employing an additional under-exposure process with a second mask, and the mold patterns were transferred to the PDMS. Results showed that the fabricated PDMS film based on the two-step lithography process reduced the height difference from 23% to 5%. In addition, the water contact angle was greatly improved by spraying of hydrophobic nanosilica on the dual-scaled PDMS surface.

• 전기학회논문지
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• 제57권12호
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• pp.2194-2198
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• 2008

In this paper, the construction of secondary reaction plate is analyzed by 3-D Finite Element Method(3-D FEM) to consider the influence of its variation on the transverse edge effect of LIM. The effective 3-D analysis model for considering the transverse edge effect caused by the finite widths of the primary and the secondary is proposed. The simple method measuring the transverse edge effect by using the patterns of currents induced in the secondary reaction plate is also proposed. With this effective analysis method, various models of secondary reaction plate with overhang and cap has been analyzed to consider the relationship between the construction of secondary reaction plate and the transverse edge effect of LIM.

• 방송공학회논문지
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• 제8권4호
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• pp.492-500
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• 2003

본 논문에서는 수평 방향의 에지 패턴을 고려한 새로운 순차주사화(de-interlacing) 알고리즘을 제안한다. 일반적으로 기존의 에지를 고려한 순차주사화 알고리즘은 한 장의 필드만을 사용한 다른 순차주사화 알고리즘들에 비해 시각적으로 우수한 결과를 나타낸다. 그러나 에지의 방향을 잘못 추정할 경우, 결과 영상에서 심각한 에러가 발생하므로, 이를 보완하고 정확한 에지의 방향을 찾아내기 위해, 기존의 크기의 차 성분만을 이용한 방법들과는 달리 에지의 패턴까지 고려하여 에지를 고려한 순차주사화(EDI: edge dependent interpolation)가 제안된다. 제안된 새로운 알고리즘은 기존의 방법에 비해 수치상으로도 시각적으로도 뛰어난 결과를 산출한다.

• Journal of the Korean Physical Society
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• 제73권10호
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• pp.1473-1478
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• 2018

In this study, we have developed a simple and cost-effective method to prevent edge bead formation by covering the edge of a chip-level substrate with heat-resistant tape during patterning using SU-8. Edge beads are a fundamental problem in photoresists and are particularly notable in high-viscosity fluids and thick coatings. Edge beads can give rise to an air gap between the substrate and the patterning mask during UV exposure, which results in non-uniform patterns. Furthermore, the sample may break since the edge bead is in contact with the mask. In particular, the SU-8 coating thickness of the chip-level substrates used in MEMS or BioMEMS may not be properly controlled because of the presence of edge beads. The proposed method to solve the edge bead problem can be easily and economically utilized without the need for a special device or chemicals. This method is simple and prevents edge bead formation on the sample substrate. Despite the small loss in the taping area, the uniformity of the SU-8 coating is improved from 50.9% to 5.6%.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 B
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• pp.883-885
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• 1995

Edges are one of the most important features used in various computer vision applications. Most of the known edge detection techniques are categorized into three gropus: First two approaches are to find gray level changes using first-order or second-order differentiation. The third method uses intrinsic propoeties of edges such as the result shown during scale space filtering. In this paper, we study various kind of edge detection techniques. Two images (Lenna image and a certain image which is composed of step, ramp, roof, and other artificial edge patterns) are used to compare different edge detection techniques and to verify the advantages and disadvantage of each techniques.

• 한국컴퓨터정보학회논문지
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• 제14권10호
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• pp.251-258
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• 2009

그래프마이닝에서 그래프패턴의 동형판단문제는 지수함수적 계산시간을 요구하기 때문에 그래프마이닝의 전체수행시간에서 동형판단 연산이 차지하는 비율이 매우 높다. 그러므로 그래프마이닝 알고리즘은 그래프동형판단을 최대한 효율적으로 할 필요가 있다. 본 논문은 그래프마이닝에서 빠른 수행시간을 보이는 gaston 알고리즘의 동형판단효율성을 증가시켜 수행시간을 평가해 보았으며, 제시한 방법으로 인해 더욱 향상된 성능을 보인다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.294.2-294.2
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• 2016

Graphene, a sigle atomic layered structure of graphite, has drawn many scientific interests for attractive future electronics and optoelectronics beyond silicon-based technology because of its robust physical, optical, and electrical properties. But high metal-graphene contact resistance prevents the successful integration of high speed graphene devices and circuits, although pristine graphene is known to have a novel carrier transport property. Meanwhile, in the recently reported metal-graphene contact studies, there are many attempts to reduce the metal-graphene contact resistance, such as doping and one-dimensional edge contact. However, there is a lack of quantitative analysis of the edge contact scheme through variously designed patterns with different metal contact. We first investigate the effets of edge contact (metal-graphene interface) on the contact resistance in terms of edge pattern design through patterning (photolithography + plasma etching) and electral measurements. Where the contact resistance is determined using the transfer length method (TLM). Finally, we research the role of metal-kind (Palladium, Copper, and Tianium) on the contact resistance through the edge-contacted devices, eventually minimizing contact resistance down to approximately $23{\Omega}{\cdot}{\mu}m$ at room temperature (approximately $19{\Omega}{\cdot}{\mu}m$ at 100 K).