• 제목/요약/키워드: drain switching

검색결과 73건 처리시간 0.026초

드레인 바이어스 스위칭을 이용한 와이브로/무선랜 이중 모우드 전력증폭기 (Dual Mode Power Amplifier for WiBro and Wireless LAN Using Drain Bias Switching)

  • 이영민;구경헌
    • 대한전자공학회논문지TC
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    • 제44권3호
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    • pp.1-6
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    • 2007
  • 와이브로 및 무선랜 이중 대역 이중 모우드 송신기에서 전력부가효율을 증가시킬 수 있는 바이어스 스위칭 기술을 제시한다. 서로 다른 주파수 대역과 출력을 갖는 송신기에서 높은 효율을 얻을 수 있는 기법으로 바이어스 스위칭을 제안하고 드레인과 게이트 바이어스의 변화에 따른 영향을 각각 시뮬레이션 하였다. 바이어스 스위칭을 적용하지 않은 경우의 전력부가효율에 비해 시뮬레이션 된 최적의 고정 게이트 바이어스를 공급하고 드레인 바이어스 스위칭을 한 경우 매우 개선된 전력 효율 특성을 얻을 수 있었다 이러한 드레인 및 게이트 바이어스 스위칭 기술은 다양한 기능을 필요로 하는 다중 모우드 통신 시스템에 유용할 것이다.

Switching Characteristics of Amorphous GeSe TFT for Switching Device Application

  • 남기현;김장한;조원주;정홍배
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.403-404
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    • 2012
  • We fabricated TFT devices with the GeSe channel. A single device consists of a Pt source and drain, a Ti glue layer and a GeSe chalcogenide channel layer on SiO2/Si substrate which worked as the gate. We confirmed the drain current with variations of gate bias and channel size. The I-V curves of the switching device are shown in Fig. 1. The channel of the device always contains amorphous state, but can be programmed into two states with different threshold voltages (Vth). In each state, the device shows a normal Ovonic switching behavior. Below Vth (OFF state), the current is low, but once the biasing voltage is greater than Vth (ON state), the current increases dramatically and the ON-OFF ratio is high. Based on the experiments, we draw the conclusion that the gate voltage can enhance the drain current, and the electric field by the drain voltage affects the amorphous-amorphous transition. The switching device always contains the amorphous state and never exhibits the Ohmic behavior of the crystalline state.

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Electrical Switching Characteristics of Thin Film Transistor with Amorphous Chalcogenide Channel

  • 남기현;김장한;정홍배
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.280-281
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    • 2011
  • We fabricated the devices of TFT type with the amorphous chalcogenide channel. A single device consists of a Pt source and drain, a Ti glue layer and a GeSe chalcogenide channel layer on SiO2/Si substrate which worked as the gate. We confirmed the drain current with variations of gate bias and channel size. The I-V curves of the switching device are shown in Fig. 1. The channel of the device always contains amorphous state, but can be programmed into two states with different threshold voltages (Vth). In each state, the device shows a normal Ovonic switching behavior. Below Vth (OFF state), the current is low, but once the biasing voltage is greater than Vth (ON state), the current increases dramatically and the ON-OFF ratio is about 4 order. Based on the experiments, we contained the conclusion that the gate voltage can enhance the drain current, and the electric field by the drain voltage affects the amorphous-amorphous transition. The switching device always contains the amorphous state and never exhibits the Ohmic behavior of the crystalline state.

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Design and Evaluation of Cascode GaN FET for Switching Power Conversion Systems

  • Jung, Dong Yun;Park, Youngrak;Lee, Hyun Soo;Jun, Chi Hoon;Jang, Hyun Gyu;Park, Junbo;Kim, Minki;Ko, Sang Choon;Nam, Eun Soo
    • ETRI Journal
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    • 제39권1호
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    • pp.62-68
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    • 2017
  • In this paper, we present the design and characterization analysis of a cascode GaN field-effect transistor (FET) for switching power conversion systems. To enable normally-off operation, a cascode GaN FET employs a low breakdown voltage (BV) enhancement-mode Si metal-oxide-semiconductor FET and a high-BV depletion-mode (D-mode) GaN FET. This paper demonstrates a normally-on D-mode GaN FET with high power density and high switching frequency, and presents a theoretical analysis of a hybrid cascode GaN FET design. A TO-254 packaged FET provides a drain current of 6.04 A at a drain voltage of 2 V, a BV of 520 V at a drain leakage current of $250{\mu}A$, and an on-resistance of $331m{\Omega}$. Finally, a boost converter is used to evaluate the performance of the cascode GaN FET in power conversion applications.

Effect of Channel Variation on Switching Characteristics of LDMOSFET

  • Lee, Chan-Soo;Cui, Zhi-Yuan;Kim, Kyoung-Won
    • Journal of Semiconductor Engineering
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    • 제3권2호
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    • pp.161-167
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    • 2022
  • Electrical characteristics of LDMOS power device with LDD(Lightly Doped Drain) structure is studied with variation of the region of channel and LDD. The channel in LDMOSFET encloses a junction-type source and is believed to be an important parameter for determining the circuit operation of CMOS inverter. Two-dimensional TCAD MEDICI simulation is used to study hot-carrier effect, on-resistance Ron, breakdown voltage, and transient switching characteristic. The voltage-transfer characteristics and on-off switching properties are studied as a function of the channel length and doping levels. The digital logic levels of the output and input voltages are analyzed from the transfer curves and circuit operation. Study indicates that drain current significantly depends on the channel length rather than the LDD region, while the switching transient time is almost independent of the channel length. The high and low logic levels of the input voltage showed a strong dependency on the channel length, while the lateral substrate resistance from a latch-up path in the CMOS inverter was comparable to that of a typical CMOS inverter with a guard ring.

Gate 전하를 감소시키기 위해 Separate Gate Technique을 이용한 Trench Power MOSFET (Trench Power MOSFET using Separate Gate Technique for Reducing Gate Charge)

  • 조두형;김광수
    • 전기전자학회논문지
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    • 제16권4호
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    • pp.283-289
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    • 2012
  • 이 논문에서 Trench Power MOSFET의 스위칭 성능을 향상시키기 위한 Separate Gate Technique(SGT)을 제안하였다. Trench Power MOSFET의 스위칭 성능을 개선시키기 위해서는 낮은 gate-to-drain 전하 (Miller 전하)가 요구된다. 이를 위하여 제안된 separate gate technique은 얇은(~500A)의 poly-si을 deposition하여 sidewall을 형성함으로서, 기존의 Trench MOSFET에 비해 얇은 gate를 형성하였다. 이 효과로 gate와 drain에 overlap 되는 면적을 줄일 수 있어 gate bottom에 쌓이는 Qgd를 감소시키는 효과를 얻었고, 이에 따른 전기적인 특성을 Silvaco T-CAD silmulation tool을 이용하여 일반적인 Trench MOSFET과 성능을 비교하였다. 그 결과 Ciss(input capacitance : Cgs+Cgd), Coss(output capacitance : Cgd+Cds) 및 Crss(reverse recovery capacitance : Cgd) 모두 개선되었으며, 각각 14.3%, 23%, 30%의 capacitance 감소 효과를 확인하였다. 또한 inverter circuit을 구성하여, Qgd와 capacitance 감소로 인한 24%의 reverse recovery time의 성능향상을 확인하였다. 또한 제안된 소자는 기존 소자와 비교하여 어떠한 전기적 특성저하 없이 공정이 가능하다.

Optically Controlled Silicon MESFET Modeling Considering Diffusion Process

  • Chattopadhyay, S.N.;Motoyama, N.;Rudra, A.;Sharma, A.;Sriram, S.;Overton, C.B.;Pandey, P.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제7권3호
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    • pp.196-208
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    • 2007
  • An analytical model is proposed for an optically controlled Metal Semiconductor Field Effect Transistor (MESFET), known as Optical Field Effect Transistor (OPFET) considering the diffusion fabrication process. The electrical parameters such as threshold voltage, drain-source current, gate capacitances and switching response have been determined for the dark and various illuminated conditions. The Photovoltaic effect due to photogenerated carriers under illumination is shown to modulate the channel cross-section, which in turn significantly changes the threshold voltage, drainsource current, the gate capacitances and the device switching speed. The threshold voltage $V_T$ is reduced under optical illumination condition, which leads the device to change the device property from enhancement mode to depletion mode depending on photon impurity flux density. The resulting I-V characteristics show that the drain-source current IDS for different gate-source voltage $V_{gs}$ is significantly increased with optical illumination for photon flux densities of ${\Phi}=10^{15}\;and\;10^{17}/cm^2s$ compared to the dark condition. Further more, the drain-source current as a function of drain-source voltage $V_{DS}$ is evaluated to find the I-V characteristics for various pinch-off voltages $V_P$ for optimization of impurity flux density $Q_{Diff}$ by diffusion process. The resulting I-V characteristics also show that the diffusion process introduces less process-induced damage compared to ion implantation, which suffers from current reduction due to a large number of defects introduced by the ion implantation process. Further the results show significant increase in gate-source capacitance $C_{gs}$ and gate-drain capacitance $C_{gd}$ for optical illuminations, where the photo-induced voltage has a significant role on gate capacitances. The switching time ${\tau}$ of the OPFET device is computed for dark and illumination conditions. The switching time ${\tau}$ is greatly reduced by optical illumination and is also a function of device active layer thickness and corresponding impurity flux density $Q_{Diff}$. Thus it is shown that the diffusion process shows great potential for improvement of optoelectronic devices in quantum efficiency and other performance areas.

불순물 농도에 따른 산화막 성장률의 차이를 이용한 자기 정렬된 금속게이트 MOSFET 구조 (A Self-Aligned Metal Gate MOSFET Structure Utilizing The Oxidation Rate Variation on The Impurity Concentration)

  • 고요환;최진호;김충기
    • 대한전기학회논문지
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    • 제36권7호
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    • pp.462-469
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    • 1987
  • A metal gate MOSFET with source/drain regions self-aligned to gate region is proposed. The proposed MOS transistor is fabricated by utilizing the higher oxidation rate of source/drain regions with high doping concentration when compared with channel region with moderate doping. The thick oxide on the source/drain regions reduces the gate and drain(source) overlap capacitance down to that of a self-aligned polysilicon gate device while allowing the use of a metal gate with much lower resistivity than the more commonly used polycrystalline silicon. A ring oscillator composed of 15 inverter stages has been computer simulated using SPICE. The results of the simulation show good agreement with experimental measurement confirming the fast switching speed of propesed MOSFET.

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Antireflective ZTO/Ag bilayer-based transparent source and drain electrodes for highly transparent thin film transistors

  • 최광혁;김한기
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2012년도 춘계학술발표대회
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    • pp.110.2-110.2
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    • 2012
  • We reported on antireflective ZnSnO (ZTO)/Ag bilayer and ZTO/Ag/ZTO trilayer source/drain (S/D) electrodes for all-transparent ZTO channel based thin film transistors (TFTs). The ZTO/Ag bilayer is more transparent (83.71%) and effective source/drain (S/D) electrodes for the ZTO channel/Al2O3 gate dielectric/ITO gate electrode/glass structure than ZTO/Ag/ZTO trilayer because the bottom ZTO layer in the trilayer increasea contact resistance between S/D electrodes and ZTO channel layer and reduce the antireflection effect. The ZTO based all-transparent TFTs with ZTO/Ag bilayer S/D electrode showed a saturation mobility of 4.54cm2/Vs and switching property (1.31V/decade) comparable to TTFT with Ag S/D electrodes.

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Balanced Buck-Boost Switching Converter to Reduce Common-Mode Conducted Noise

  • Shoyama Masahito;Ohba Masashi;Ninomiya Tamotsu
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2001년도 Proceedings ICPE 01 2001 International Conference on Power Electronics
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    • pp.212-216
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    • 2001
  • Because conventional switching converters have been usually using unbalanced circuit topologies, parasitic capacitance between the drain/collector of an active switch and the frame ground through its heat sink may generate the common-mode conducted noise. We have proposed a balanced switching converter circuit, which is an effective way to reduce the common-mode conducted noise. As an example, a boost converter version of the balanced switching converter was presented and the mechanism of the common-mode noise reduction was explained using equivalent circuits. This paper extends the concept of the balanced switching converter circuit and presents a buck-boost converter version of the balanced switching converter. The feature of common-mode noise reduction is confirmed by experimental results and the mechanism of the common-mode noise reduction is explained using equivalent circuits.

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