• 제목/요약/키워드: development process

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신제품 개발 프로세스 변환의 성공 요인에 관한 사례연구 : IT제품에서 Automotive 제품으로 (Case Study on the Success Factors of NPD Process Transformation : From IT to Automotive Product Development Process)

  • 이현욱;한정희;김병근
    • 한국IT서비스학회지
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    • 제15권4호
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    • pp.175-191
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    • 2016
  • This paper investigates changing processes of new product development (NPD) systems. In order to continuously develop first-class products, world wide super-class products and hit products, R&D (Research & Development) must be competitive. Firms must achieve competitiveness in terms of quality and cost by launching new products. Most films focus on improving effectiveness and efficiency of NPD process. However, sometimes, they face to the critical challenge of transforming NPD processes entirely reflecting dramatic change of their core products. Transforming of NPD process is difficult in that it involves technological and organizational changes in marketing, R&D, Engineering and manufacturing systems. The purpose of this paper is to shed light on processes and factors affecting successful transformation of new product development systems. We present a case study on the changing processes of S company's NPD process. S company has changed new product development systems successfully from a major IT equipment supplier to an automotive supplier. Empirical results show successful changes of 10 core NPD processes from understanding the market and customers process to after sales process. In case of transformation of NPD, adaption of attribute of business is crucial for success factors in the process innovation. This paper shows the bridging the gap between IT and automotive industrial dynamics and growth through adaption of two processes in the NPD.

Improvement of Slit Photolithography Process Reliability for Four-Mask Fabrication process in TFT LCDs

  • Min, Tae-Yup;Qiu, Haijun;Wang, Zhangtao;Gao, Wenbao;Choi, Sang-Un;Lee, Sung-Kyu
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.851-854
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    • 2008
  • In order to reduce the manufacturing cost of TFT LCDs and cut down an amount facilities invested, there are many LCD panel makers contributes to convert the current Five-mask manufacturing process into the noble Four-mask fabrication process. We optimized the slit mask to improve the poor process reliability.

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서비스 기반 소프트웨어 개발을 지원하는 4D 프로세스 (A 4D Process for Service Oriented Software Development)

  • 박준석;문미경;남태우;염근혁
    • 한국정보과학회논문지:소프트웨어및응용
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    • 제35권11호
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    • pp.653-660
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    • 2008
  • 최근에 제시된 서비스 기반 컴퓨팅 패러다임에서의 서비스 기반 소프트웨어 개발을 지원하기 위한 체계적인 프로세스 모델에 대한 요구가 대두되고 있다. 기존에 제시된 Unified Software Development Process, UML Components 등의 방법론은 컴포넌트에 초점을 두고 만들어진 방법으로, 서비스의 정의, 바인딩, BPEL(Business Process Execution Language)을 이용한 서비스의 조합등과 같은 서비스 기반의 개발이 가지고 있는 특징을 반영하지 못하고 있다. 또한 서비스 기반의 개발 방법론으로 제시된 SOUP(Service Oriented Unified Process), SOMA(Service Oriented Modeling and Architecture) 등은 개념적인 절차가 위주로 되어 있지, 구체적인 가이드라인, 산출물 및 접근 방법을 명확히 제시하지 않는다. 그러므로 본 논문에서는 서비스 기반의 개발 패러다임을 지원하기 위한 체계화되고, 간소화된 프로세스 모델을 제시한다. 또한 OMG에서 제시한 SPEM(Software Process Engineering MetaModel)을 적용하여 프로세스 모델을 명시적으로 표현한다. 본 논문에서 제안된 프로세스 모델을 실제 서비스 기반의 개발에 적용함으로써 서비스 기반 소프트웨어 개발의 체계성 및 효율성을 증대시킬 수 있게 된다.

J2EE 패턴기반의 컴포넌트 개발 프로세스 (J2EE Pattern Based Component Development Process)

  • 최일우;류성열;이남용
    • 한국전자거래학회지
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    • 제7권3호
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    • pp.219-240
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    • 2002
  • The various software engineering techniques have been appeared in order to cope with the software crisis since 1980's. Currently, the research against the techniques likes the Design pattern, Component which improve the software's re-use are spread out. Also S/W Development Process are interested intensively which attempts the quality and a increasing productivity of software development with the basic policy. The design pattern is the solution against the problem which occurs repeat in a specific area. Many design pattern are developed and researched, but the method which accommodates the developed design pattern efficiently in the phase of analysis and design software development process is not good enough, so it is the actual applying technique is difficult. In this paper we suggest and the “UML components+” which is a efficient component development process from customizing EJB based the J2EE using the “UML Components” which is a component development methodology. Applying J2EE pattern efficiently with UML components+, there is a possibility of efficiency in the component development based pattern.

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철도 시스템 개발에서 시스템공학 프로세스와 안전성 평가를 동시에 고려한 통합 프로세스에 관한 연구 (A Study on Integrated SE Process for the Development of the Railway Systems with Safety Assessment Included)

  • 윤재한;이재천;홍선호
    • 한국철도학회논문집
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    • 제10권4호
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    • pp.438-443
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    • 2007
  • This paper proposes an integrated SE process for the development of railway systems with safety assessment included. Although the safety assessment process must be performed with SE process properly with good coordination, the interfaces between the two processes have not been clear. Thus, in many of safety critical system developments in Korea, it is difficult to assess safety in proper development phase. The process model proposed in this paper is based on both the concept of system life cycle and the repetitive use of SE process. In each of development phases, appropriate safety assessment methods are described. Also the evaluation of the integrated system incorporating safety factors is described. The resultant process model is expressed by the Enhanced Functional Flow Block Diagram (EFFBD) using a CASE tool. The model also allows timeline analysis for identifying activity flow and data flow, resulting in the effective management of process. In conclusion, the integrated process enable both the SE process and safety assessment process to cooperate with each other from early development phase throughout the whole system life cycle.

다중 프로젝트 상황에서 제품개발 업무의 동적 순서결정 (Dynamic Task Sequencing of Product Development Process in a Multi-product Environment)

  • 강창묵;홍유석
    • 산업공학
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    • 제20권2호
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    • pp.112-120
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    • 2007
  • As the market rapidly changes, the speed of new product development is highlighted as a critical element which determines the success of firms. While firms endeavor to accelerate the development speed, frequent iterations in a development process hinders the effort of acceleration. For this reason, many previous researches tried to find the optimal structure of the development process which minimizes the number of iterations. However, such researches have a limitation in that they can be applied to only a single-project environment. In a multi-project environment, waiting time induced by lack of resources also delays the process as well as the iterations do. In this paper, we propose dynamic sequencing method focusing on both iterations and waiting time for reducing the durations of development projects in a multi-project environment. This method reduces the waiting time by changing the sequence of development tasks according to the states of resources. While the method incurs additional iterations, they are expected to be offset by the reduced waiting time. The results of simulation show that the dynamic sequencing method dramatically improves the efficiency of a development process. Especially, the improvement is more salient as projects are more crowded and the process is more unbalanced. This method gives a new insight in researches on managing multiple development projects.

프로세스 이행 수준과 개발 기술 품질 관리 모델 (Quality Management Model for Process Performance Level and Development Technology)

  • 박정현;박영식;정효택;김상훈
    • 전자통신동향분석
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    • 제32권6호
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    • pp.105-115
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    • 2017
  • This paper describes a project - based quality management model that identifies development technologies and codes while at the same time verifying the ability to implement processes that are essential in R & D projects. In order to verify the process implemented in the R & D project implementation, there are review, checking points, and evaluating methods the process performance levels for five processes such as defining requirements which is the beginning stage of system development, testing process which is the completion stage of system development, and project management and peer review process for project management and support in the proposed project-based quality management model. For development technology and code validation, the model included the documented test cases for each requirement by the developer in the requirements definition stage, debugging and testing in the design and implementation stages, static analysis and open source licence verification procedure, and system environment. After applying the model in SW development R&D project for evaluating the process performance, and verifying the development technology and the code, the developers responded that the improvement in the development technique and the code, and upgrade of process performance level for project are more than 10%.

대형 복합 시스템 개발을 위한 효과적인 시스템공학 관리계획 개발 프로세스 (Development Process of Systems Engineering Management Plan(SEMP) for Large-Scale Complex System Programs)

  • 유일상;박영원
    • 산업경영시스템학회지
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    • 제26권4호
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    • pp.82-90
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    • 2003
  • The Systems Engineering, as a methodology for engineering and management of today's ever-growing complex system, is a comprehensive and iterative problem-solving process. The process centers on the analysis and management of the stakeholders' needs throughout the entire life-cycle of a system and searches for an optimized system architecture. There are many essential needs and requirements to be met when a system development task is carried out. Systems Engineering Management Plan(SEMP), as a specification for system development process, must be established to satisfy constraints and requirements of stakeholders successfully and to prevent cost overrun and schedule delay. SEMP defines technical management functions and comprehensive plans for managing and controlling the entire system development process, specialty engineering processes, etc. Especially. in the case of a large-scale complex system development program where various disciplinary engineering such as mechanical; electrical; electronics; control; telecommunication; material; civil engineering etc. must be synthesized, it Is essential to develop SEMP to ensure systematic and continuous process improvements for quality and to prevent cost/schedule overruns. This study will enable the process knowledge management on the subject of SEMP as a core systems engineering management effort, that is, definitely defining and continuously managing specification of development process about requirements, functions, and process realization of it using a computer-aided systems engineering software. The paper suggests a systematic SEMP development process and demonstrates a data model and schema for computer-aided systems engineering software, RDD-100, for use in the development and management of SEMP. These are being applied to the systems engineering technology development task for the next-generation high-speed railway systems in progress.

Analysis of Process Parameters to Improve On-Chip Linewidth Variation

  • Jang, Yun-Kyeong;Lee, Doo-Youl;Lee, Sung-Woo;Lee, Eun-Mi;Choi, Soo-Han;Kang, Yool;Yeo, Gi-Sung;Woo, Sang-Gyun;Cho, Han-Ku;Park, Jong-Rak
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제4권2호
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    • pp.100-105
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    • 2004
  • The influencing factors on the OPC (optical proximity correction) results are quantitatively analyzed using OPCed L/S patterns. ${\sigma}$ values of proximity variations are measured to be 9.3 nm and 15.2 nm for PR-A and PR-B, respectively. The effect of post exposure bake condition is assessed. 16.2 nm and 13.8 nm of variations are observed. Proximity variations of 11.6 nm and 15.2 nm are measured by changing the illumination condition. In order not to seriously deteriorate the OPC, these factors should be fixed after the OPC rules are extracted. Proximity variations of 11.4, 13.9, and 15.2 nm are observed for the mask mean-to-targets of 0, 2 and 4 nm, respectively. The decrease the OPC grid size from 1 nm to 0.5 nm enhances the correction resolution and the OCV is reduced from 14.6 nm to 11.4 nm. The enhancement amount of proximity variations are 9.2 nm corresponding to 39% improvement. The critical dimension (CD) uniformity improvement for adopting the small grid size is confirmed by measuring the CD uniformity on real SRAM pattern. CD uniformities are measured 9.9 nm and 8.7 nm for grid size of 1 nm and 0.5 nm, respectively. 22% improvement of the CD uniformity is achieved. The decrease of OPC grid size is shown to improve not only the proximity correction, but also the uniformity.

금형 개발 기간 단축을 위한 CAE(전공정해석) PROCESS 구축 (The Construction of CAE Process for Die Development Period Shortening)

  • 강동규;정인성;하광용;이성호
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 제4회 박판성형 심포지엄
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    • pp.41-52
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    • 2003
  • The tendency of current die manufacturing is focusing into development period shortening and panel quality improvement. This brings change of manufacturing process. In existing process, depended on experience, we were faced on a limit of sufficiency in this focus. Thus, we have attempted to make a conquest of that by constructing a process of CAE. Our attempt apply not only draw die formability but also trimming and flanging die formability with simulation of sheet metal. In this paper, we publish effects that were obtained by constructing a process.

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