• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.964-967
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• 2002

The effectiveness of silicon nitride SiNx surface passivation is investigated and quantified. This study adopted single-layer antireflection (SLAR) coating of SiNx for efficiency improvement of solar cell. The silicon nitride films were deposited by means of plasma enhanced chemical vapor deposition (PECVD) in planar coil reactor. The process gases used were pure ammonia and a mixture of silane and helium. The thickness and the refractive index on the films were measured by ellipsometry and chemical bonds were determined by using an FT-IR equipment. This films obtained were analyzed in term of hydrogen content, refractive index for gas flow ratio $(NH_3/SiH_4)$, and efficiency of solar cell. The polycrystalline silicon solar cells passivated by silicon nitride shows efficiency above 12.8%.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 추계학술대회 발표 논문집
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• pp.51-55
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• 2006

ITO/Ag/AZO and AZ0/Ag/ITO multi-layer films deposited on glass substrate by RF magnetron sputtering have a much better electrical properties than ITO and AZO single-layer films. The multi-layer structure was consisted of three layers of ITO, Ag and AZO. The optimum working pressure of AZO layers deposition was determined to be $1.0{\times}10^{-2}$ torr for high optical transmittance and good electrical conductivity. The electrical and optical properties of sub/IT0/Ag/AZO were higher than those of sub/AZ0/Ag/ITO multi-layer films.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2007년도 춘계학술대회
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• pp.251-251
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• 2007

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2007년도 춘계학술대회
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• pp.164-168
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• 2007

Deformation of a shadow mask is one of the problems encountered during the deposition of organic materials for manufacturing large size OLED. The larger the glass substrate, the larger the shadow mask becomes. But as the size of the shadow mask increases, its deformation becomes more severe, thereby making it difficult to deposit organic materials in a precise pattern on a substrate. In this paper, a new type mask-frame structure is proposed. The proposed mask-frame structure making a curved mask has the ability of reducing drooping of mask. The test frame is fabricated and evaluation experiments are performed.

• Bulletin of the Korean Chemical Society
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• 제27권8호
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• pp.1159-1163
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• 2006

Aluminum nanotube has been fabricated by a physical vapor deposition/atmospheric pressure injection using an anodic porous alumina film as a template. The pore external-, and inside diameters and the length of the aluminum nanotubes fabricated by this method are 60 nm, 35 nm and 2 $\mu$m, respectively. The structure of the fabricated aluminum nanotubes was examined by a kind of chemical treatment as extraction of copper on the cross-sectional area of these aluminum tubes in a mixed solution of $CuCl_2$ and HCl by difference of ionization tendency between aluminum and copper. The composition of the aluminum nanotube was identified by the two dimensional Hybrid Plasma Equipment Model (HPEM) employing the inductively coupled plasma.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 춘계학술대회
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• pp.127-130
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• 2006

사파이어 기판위에 MOCVD (metal organic chemical vapor deposition)를 이용하여 8주기의 InGaN/GaN 다중양자우물(multiple quantum well : MQW)구조가 성장되어졌고 이 구조 위에 p-GaN층이 형성됐다. 다시 p-GaN 위에 200nm의 두께를 갖는 PMMU 박막을 도포하고 electron beam lithography system을 이용하여 직경이 150nm가 되도록 나노단위의 삼각격자 구조를 가진 구멍을 패턴하고 inductively coupled plasma(ICP)를 이용하여 식각을 하여 광결정을 제작하였다. 광결정은 두께가 26nm이고 격자간격은 460nm로서 파장이 450nm인 파란빛을 나노회절 시켜서 photoluminescence(PL)의 세기를 강화시킨다.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 춘계학술대회
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• pp.145-149
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• 2006

As the minimum feature size decreases, it is more difficult to control critical contaminant particles. For 16GB flash memory introduced by Samsung a few months ago, 50nm process was used and in this case, contaminant particles as small as 25nm should be control led. The particle beam mass spectrometer (PBMS) was developed to directly sample particles at pressures down to 100 mtorr. This instrument is sensitive to small particles (>5nm) produced in low concentrations ($>20cm^{-3}$). The PBMS has proved to be effect ive in measuring particles generated during semi-conductor fabrication processes, such as low-pressure chemical vapor deposition (LPCVD) of thin films. The operating principle of the PBMS and some measurement results are reviewed in this paper.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 춘계학술대회
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• pp.211-215
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• 2006

평면 광도파로 코어로 사용되는 SiON (Silicon oxynitride)과 클래딩으로 사용되는 $SiO_2$ (Silicon oxide)의 굴절률 차이가 2.5 %인 고굴절률차 평면 광도파로용 SiON 박막을 PECVD (plasma enhanced chemical vapor deposition)로 제작하였다. PECVD에 사용된 가스는 $SiH_4,\;NH_3,\;N_{2}O$이고, Si 기판의 $SiO_2$ 막은 100 nm이다. 가스의 비율에 따라 SiON 막의 굴절률은 633 nm의 파장에서 1.476에서 1.777까지 변화하였다. 코어로 사용되는 SiON의 두께는 $2.5{\mu}m$이고 클래딩과의 굴절률 차이는 2.5 %였다.

• 반도체디스플레이기술학회지
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• 제15권2호
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• pp.1-5
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• 2016

3D printer is the equipment of the system for sequentially layer laminated in the materials. Now 3D printer used in various fields such as, semiconductor, electricity automobile, medical and various types of output method and material. In this paper, we studied about the improvement on warpage due to shrinkage of product from 3D printer of FDM(Fused Deposition Modeling) type, we proposed measures systematically to solve warpage problem using of 6SC(6 Step Creativity) method of practical TRIZ. After experimented with product prototypes experiment, we verified effect about solution.

• 반도체디스플레이기술학회지
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• 제19권1호
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• pp.55-60
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• 2020

This study designed High impedance filter to reduce RF loss to heater heating wire and increase RF current flowing to heater ground wire. Effects such as D / R improvement and process reproducibility could be seen. In addition, RF parameter distribution optimization was possible by understanding the RF path of PE-CVD equipment using Plasma and designing filter.