• 제목/요약/키워드: deposition cross section

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정전 분무법으로 제조한 β-형 PVDF 막에 미치는 니켈 질산염 첨가의 영향 (Effect of Nickel Nitrate Doping on β-type PVDF Layers Prepared by Electrostatic Spray Deposition)

  • 황규석;김명윤;손병래;황보승;노형갑
    • 전기학회논문지
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    • 제67권10호
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    • pp.1317-1321
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    • 2018
  • PVDF as a semicrystal polymer, having a structure with C-F dipole moments, has been widely investigated because of its excellent chemical stability, mechanical strength, and ferroelectricity. In this study, ferroelectic ${\beta}$ type - PVDF layer was prepared by using an electrostatic spray deposition method and the effects of the addition of Ni-nitrate in precursor solution on the properties of PVDF layer were evaluated. Crystallinity and chemical structure of the PVDF layer were analyzed by a X-ray diffraction and Fourier Transform Infrared Spectrophotometer. Surface structure and fractured cross section of the layer were examined by a field emission-scanning electron microscope. LCR meter was used to obtain the dielectric properties of the layer. As the addition of an inorganic metal salt in PVDF sol, ${\beta}$ type - PVDF crystals were appeared in the hydrated metal salts doped-layer since the strong hydrogen bondings $(O-H{\cdots}F-C)_n$ due to high polarity of OH- were formed.

HIPIMS를 활용한 SiO2 반사방지막 코팅 제조 및 특성분석

  • 김경훈;김성민;이근혁;안세훈;김동환;한승희
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.168.2-168.2
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    • 2014
  • 반사방지막 코팅(Anti-reflection coating)은 태양전지(Solar cell), 발광다이오드(LED) 등의 반사율을 낮추어 효율을 증대시키기 위하여 사용되고 있다. 본 실험에서는 유리 기판 위에 실리콘 타겟을 이용한 반응성 high power impulse magnetron sputtering (HIPIMS) 장비를 활용하여, 높은 공정 압력(High-pressure)에서 펄스폭(Pulse width)을 조절하여 $SiO_2$ 반사방지막 코팅층을 형성하였다. 또한, 기공이 더 많은 박막을 제작하기 위해 빗각증착(Oblique-angle deposition)을 적용하여 더 좋은 광학 특성을 갖는 반사방지막 코팅층을 형성하였다. UV-Vis spectrometer를 이용하여, 380~800 nm 파장에서 투과율(Transmittance)을 측정하여 비교, 분석하였다. Ellipsometer를 이용하여 $SiO_2$ 박막층의 굴절률(Refractive index)을 측정한 결과, 반사방지막 코팅층 내부 기공에 따라 다양한 굴절률을 가지는 것을 확인할 수 있었다. 또한, 코팅층 내부 기공의 형상을 확인하기 위해 SEM(Secondary electron microscopy)을 활용하여 코팅층 단면(Cross section)을 측정하였다. 이를 활용하여 낮은 굴절률을 갖는 반사방지용 $SiO_2$ 코팅층을 형성하여 태양전지의 광 변환 효율을 상승 시킬 수 있고, 발광다이오드의 광 추출 효율을 증가시킬 있을 것으로 여겨진다.

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마이크로웨이브 플라즈마 화학기상증착장비를 사용한 유리기판상의 탄소나노튜브의 합성 (GROWTH OF CARBON NANOTUBES ON GLASS BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION)

  • 이재형;최성헌;최원석;홍병유;김정태;임동건;양계준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.99-100
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    • 2005
  • We have grown carbon nanotubes (CNTs) with a microwave plasma chemical vapor deposition (MPECVD) method, which has been regard as one of the most promising candidates for the synthesis of CNTs due to the vertical alignment, the low temperature and the large area growth. We use methane ($CH_4$) and hydrogen ($H_2$) gas for the growth of CNTs. 60 nm thick Ni catalytic layer were deposited on the TiN coated glass substrate by RF magnetron sputtering method. In this work, we report the effects of pressure on the growth of CNTs. We have changed pressure of processing (10 $\sim$ 20 Torr) deposition of CNTs. SEM (Scanning electron microscopy) images show diameter, length and cross section state CNTs.

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Direct Laser Melting 공정시 분말 형태가 적층 품질에 미치는 영향 (Effect of Powder Morphology on the Deposition Quality for Direct Laser Melting)

  • 이성훈;길태동;한상욱;문영훈
    • 소성∙가공
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    • 제25권3호
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    • pp.195-202
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    • 2016
  • Direct laser melting(DLM) is an additive manufacturing process that can produce parts by solidification of molten metallic powder layer by layer. The properties of the fabricated parts strongly depend on characteristics of the metallic powder. Atomized powders having spherical morphology have commonly been used for DLM. Mechanical ball-milling is a powder processing technique that can provide non-spherical solid powders without melting. The aim of the current study was to investigate the effect of powder morphologies on the deposition quality in DLM. To characterize the morphological effect, the performances of spherical and non-spherical powders were compared using both single- and multi-track DLM experiments. DLM experiments were performed with various laser process parameters such as laser power and scan rate, and the deposition quality was evaluated. The surface roughness, cross-section bead shape and process defects such as balling or non-filled area were compared and discussed in this study.

대입열 수직상진 용접의 조선적용에 관한 연구 (A Study on the Application of Vertical Welding Process to the Shipbuilding with High Deposition Rate)

  • 박철성;손영락;이정수
    • 대한조선학회논문집
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    • 제44권5호
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    • pp.482-487
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    • 2007
  • The container mobilization of material resources has increased continually owing to international economy growth and overseas trade increase in recent years. There are large amounts of order received for container carriers which are the biggest in the world ranging from 8,000 TEU to 10,000 TEU or above The very large container carriers have minimum thickness of sheer strake, upper deck and hatch coaming about $65mm{\sim}90mm$. Therefore, this study is performed in order to develop vertical welding process with high deposition rates applicable to thick plate above 65mm thickness. Electrogas welding process with 1 pole and 2 poles has been developed to apply to vertical joint with thick plates in the shipyard. In this paper, it was explained that the relationship of cross section to various groove types and executed that electrogas welding for thick plates. The mechanical tests were carried out to verify the soundness and effectiveness of EGW.

Formation of $Y_{2}O_{3}$ nanodots on substrate surface using the rf-sputtering method

  • Chang, K.C.;Yoo, J.M.;Kim, Y.K.;Wang, X.L.;Dou, S.X.
    • 한국초전도ㆍ저온공학회논문지
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    • 제10권4호
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    • pp.6-8
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    • 2008
  • $Y_{2}O_{3}$ nanodots have been deposited on top of the substrate surface using rf-sputtering method. This approach was adopted to be able to modulate the substrate surface with nanodots used as a seed for the flux pinning sites in the superconducting films. The nanodot density of $Y_{2}O_{3}$ was controlled mainly using the deposition time, rf-power, and substrate temperature. $Y_{2}O_{3}$ nanodots with ${\sim}\;50\;nm$ in diameter and ${\sim}\;3\;nm$ in height were obtained at rf-sputtering time of about 15 seconds using 400 watts of rf-power and $630^{\circ}C$ of substrate temperature. As deposition time increased up to about 30 seconds, the interconnected islands of $Y_{2}O_{3}$ nanodots formed, which can be clearly observed with AFM surface image. The substrate surface was covered entirely with $Y_{2}O_{3}$ layer above the deposition time of 60 seconds. The modulated surface morphologies and cross section analysis of deposited $Y_{2}O_{3}$ nanodots at various experimental conditions have been examined using AFM and discussed with respect to the flux pinning sites for the practical application.

Deltacon공법을 통한 해안 침식지의 복구 효과 연구 (The Restoration Effect of Deltacon Method in Coastal Erosion)

  • 한봉호;박석철;이풍
    • 한국환경복원기술학회지
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    • 제20권6호
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    • pp.35-50
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    • 2017
  • This study is to see the recovery effect of the Deltacon method by investigating the amount of sand deposition, the topographical cross section and the vegetation structure; and to derive the effective recovery method of coastal erosion area. The target areas of this study include Jinri coastal dune, Bajireum coastal dune and Seopori coastal dune in Deokjeok-do Island, Ongjin-gun, Incheon. In order to assess the current status of the coastal erosion area recovery, the soil profile structure map was prepared on the site and then the amount of sand deposition within 1m was calculated indoors. The vegetation recovery status of the costal erosion area was assessed via the analyses of the topographical profile structure and the plant community structure, and we aim to derive the effective recovery plan of the Deltacon method with the results. With the Deltacon method, structures with ductile material, special non-woven fabric bags filled with soil and vegetation can be performed therefore the structuralstability and prevention of sand erosion can be achieved. The amounts of sand deposition of Bajireum coastal dune, Seopori costal dune and Jinri costal dune were calculated $0.98{\sim}2.54m^3$, $1.02{\sim}2.96m^3$, and $0.27{\sim}0.75m^3$, respectively, and it is considered that the costal erosion recovery is actively performed for Bajireum costal dune and Seopori costal dune. The analysis results of vegetation structures by topography show that the installation of the send collecting net in steep areas has been highly effective and the Deltacon-constructed target areas have been restored to vegetation and the costal dune, which is similar to the natural dune. The investigation of the plant community structure in Deokjeok-do Island costal dune, Incheon displayed similar research results of the existing costal dune flora and confirmed the emergence of Lathyrus japonicus, Carex kobomugi, Elymus mollis, Vitex rotundifolia, and Calystegia soldanella and others. In order to carry out further effective recovery with the Deltacon method, improvements to rootage of herbaceous vegetation are needed in areas without foredune herbaceous vegetation, and continuos maintenance & management monitoring of connected windbreak forest to costal dunes are also necessary.

입자추적 유동해석을 이용한 초음파분무화학기상증착 균일도 예측 연구 (Uniformity Prediction of Mist-CVD Ga2O3 Thin Film using Particle Tracking Methodology)

  • 하주환;박소담;이학지;신석윤;변창우
    • 반도체디스플레이기술학회지
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    • 제21권3호
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    • pp.101-104
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    • 2022
  • Mist-CVD is known to have advantages of low cost and high productivity compared to ALD and PECVD methods. It is capable of reacting to the substrate by misting an aqueous solution using ultrasonic waves under vacuum-free conditions of atmospheric pressure. In particular, Ga2O3 is regarded as advanced power semiconductor material because of its high quality of transmittance, and excellent electrical conductivity through N-type doping. In this study, Computational Fluid Dynamics were used to predict the uniformity of the thin film on a large-area substrate. And also the deposition pattern and uniformity were analyzed using the flow velocity and particle tracking method. The uniformity was confirmed by quantifying the deposition cross section with an FIB-SEM, and the consistency of the uniformity prediction was secured through the analysis of the CFD distribution. With the analysis and experimental results, the match rate of deposition area was 80.14% and the match rate of deposition thickness was 55.32%. As the experimental and analysis results were consistent, it was confirmed that it is possible to predict the deposition thickness uniformity of Mist-CVD.

초고진공 전자 사이클로트론 화학 기상 증착 장치에 의한 저온 실리콘 에피 성장에 기판 DC 바이어스가 미치는 영향 (The Effect of Substrate DC Bias on the Low -Temperature Si homoepitaxy in a Ultrahigh Vacuum Electron Cyclotron Resonance Chemical Vapor Deposition)

  • 태흥식;황석희;박상준;윤의준;황기웅;송세안
    • 한국진공학회지
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    • 제2권4호
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    • pp.501-506
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    • 1993
  • The spatial potential distribution of electron cyclotron resonance plasma is measured as a function of tehsubstrate DC bias by Langmuir probe method. It is observed that the substrate DC bias changes the slope of the plasma potential near the subsrate, resulting in changes in flux and energy of the impinging ions across plasma $_strate boundary along themagnetric field. The effect of the substrate DC bias on the low-temperature silicon homoepitaxy (below $560^{\circ}C$) is examine dby in situ reflection high energy electron diffraction (RHEED), cross-section transmission electron microscopy (XTEM),plan-view TEM and high resolution transmision electron microscopy(HRTEM). While the polycrystalline silicon layers are grow withnegative substrate biases, the single crystaline silicon layers are grown with negative substrate biases, the singel crystalline silicon layers are grown with positive substrate biases. As the substrate bias changes form negative to positive values, the growth rate decreases. It is concluded that the control of the ion energy during plasma deposition is very important in silicon epitaxy at low temperatures below $560^{\circ}C$ by UHV-ECRCVD.VD.

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무전해 Ni-W-P 도금에서 착화제의 종류가 피막특성에 미치는 영향 (The Effect of Complexing Agents on the Deposit Characteristics in the Electroless Nickel-Tungsten-Phosphorus Plating)

  • 조진기;박상욱;강성군;손성호
    • 대한금속재료학회지
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    • 제46권11호
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    • pp.725-729
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    • 2008
  • Deposition characteristics of electroless plated Ni-W-P films were investigated for various complexing agents. Used complexing agents are sodium citrate, sodium gluconate and sodium malonate. In this study, the existing mixed potential theory could explain the overall mechanism of Ni-W-P electroless plating for all complexing agents. The deposition rate could be also expected by the theory. The deposited Ni-W-P films were evaluated in term of surface hardness and corrosion resistance. Microhardness of the deposit increased about 1,000 Hv after heat treatment for one hour at $400^{\circ}C$, because it was above the crystallization temperature of $Ni_3P$. The deposited Ni-W-P films can exhibit excellent corrosion resistance in using sodium malonate as a complexing agent, the other hand the using sodium gluconate was the worst corrosion resistance. The worst corrosion resistance was due to a large number of nano-sized pin-holes or small pores. The plating current at the mixed potential increases when the using sodium malonate as a complexing agent, it was explained by the cross section.