• ETRI Journal
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• v.25 no.2
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• pp.73-80
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• 2003

This paper describes an effective method for forming silicon oxide on silica-on-silicon platforms, which results in excellent characteristics for hybrid integration. Among the many processes involved in fabricating silica-on-silicon platforms with planar lightwave circuits (PLCs), the process for forming silicon oxide on an etched silicon substrate is very important for obtaining transparent silica film because it determines the compatibility at the interface between the silicon and the silica film. To investigate the effects of the formation process of the silicon oxide on the characteristics of the silica PLC platform, we compared two silicon oxide formation processes: thermal oxidation and plasma-enhanced chemical vapor deposition (PECVD). Thermal oxidation in fabricating silica platforms generates defects and a cristobalite crystal phase, which results in deterioration of the optical waveguide characteristics. On the other hand, a silica platform with the silicon oxide layer deposited by PECVD has a transparent planar optical waveguide because the crystal growth of the silica has been suppressed. We confirm that the PECVD method is an effective process for silicon oxide formation for a silica platform with excellent characteristics.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.11
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• pp.35-43
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• 1995

To obtain high quality of $Ta_{2}O_{5}$ film, two dielectric layers of $Si_{3}N_{4}$ and $Ta_{2}O_{5}$ were subsequently formed on Si wafer. Silicon nitride films were thermally grown in 10 Torr ammonia ambient by R.F induced heating system. The thickness of thermally grown $Si_{3}N_{4}$ film was able to be controlled in the range of tens $\AA$ due to the self-limited growth property. $Ta_{2}O_{5}$ film of 200$\AA$ thickness was then deposited on the as-grown $Si_{3}N_{4}$ film about 25$\AA$ thickness by sputtering method and annealed at $900^{\circ}C$in $O_{2}$ ambient for 1hr. Stoichiometry film was prepared by the annealing in oxygen ambient. Despite the high temperature anneal process, silicon oxide layer was not grown at the interface of the layered films because of the oxidation barrier effect of Si$_{3}$N$_{4}$ film. The fabricated $Ta_{2}O_{5}$/$Si_{3}N_{4}$ film showed low leakage current less than several nA and high dielectric breakdown strength.

• The Journal of the Acoustical Society of Korea
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• v.23 no.1
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• pp.1-7
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• 2004

We developed SH-SAW sensors to detect protein molecules in liquid solutions applying a particular antibody thin film on the delay line of transverse SAW devices. The antibody investigated was human-immune-globulin G (HigG) to hold the antigens (anti-HigG) in the protein solution. We fabricated the sensor generating 100 MHz with the piezoelectric single crystal LiTaO₃. We measured the frequency change of the sensor by adding the anti-body concentration on SAM (self assembled monolayer) deposited on the Au layer. The sensor showed stable response to the mass loading effects of the anti-HigG molecules with the sensitivity up to 10.8 ng/ml/Hz at noise level 400 Hz below.

• Current Photovoltaic Research
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• v.6 no.2
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• pp.56-61
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• 2018

In this study, CIGS absorber layers were deposited on low-alkali glass and sodalime glass substrates and potasium floride (KF) of various thicknesses was supplied at an elevated temperature after the CIGS growth. The effect of KF post-deposition treatment on the two types of substrates was extremely different. On the low-alkali substrate, the open-circuit voltage (Voc) was improved but the fill-factor (FF) degradation was severe, whereas the sodalime substrate showed Voc deterioration and FF improvement. In the case of supplying 20 nm of KF on both substrates, the efficiency gain of 0.3~1.1%p was obtained. With increasing the KF thickness, a small protrusion-like microstructure developed on the surface of the absorber layer, and the microstructures that were not removed in the subsequent process were found to be the main cause of the FF loss.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.200.1-200.1
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• 2016

Tungsten coatings on the graphite (CX-2320) were successfully deposited using the vacuum plasma spraying (VPS) method. An optimum coating procedure was developed and coating thicknesses of $409{\mu}m$ (without an interlayer) and $378{\mu}m$ (with an interlayer) were obtained with no cracks and no signs of delamination. The mechanical characteristics and microstructure of the tungsten coating layers were investigated using a Vickers hardness tester, FE-SEM, EDS, and XRD. The effect of a titanium interlayer on the properties of the tungsten coating was investigated. It was shown that the titanium interlayer prevented the diffusion of carbon to the tungsten layer, thereby suppressing the formation of tungsten carbide. Vickers hardness data yielded values that were 62.5 ~ 80.46% of those for bulk tungsten, indicating that tungsten coatings on graphite can be utilized as a plasma-facing material. High heat flux tests were performed by using thermal plasma with a maximum flux of $10MW/^2$. Vickers hardness after the heat flux test is performed to see a change in the mechanical properties. The formationof a tungsten carbide and the effect of the titanium interlayer for the diffusion barrier are investigated by using energy dispersion spectroscopy (EDS).

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.334.2-334.2
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• 2016

Silicon nitride (SiNx:H) films are generally used as passivation layer on solar cell and they are usually made by plasma enhanced chemical vapor deposition (PECVD). In this study, we investigated the properties of silicon nitride (SiNx:H) films made by PECVD. Effects of mixture ratio of process gases with silane (SiH4) and ammonia (NH3) on the passivation qualities of silicon nitride film are evaluated. Passivation properties of SiNx:H are focused by making antireflection properties identical with thickness and refractive index controlled. The absorption coefficient of each film was evaluated by spectrometric ellipsometery and the minority carrier lifetimes were evaluated by quasi-steady-state photo-conductance (QSSPC) measurement. The optical properties were obtained by UV-visible spectrophotometer. The interface properties were measured by capacitance-voltage (C-V) measurement and the film components were identified by Fourier transform infrared spectroscopy (FT-IR) and Rutherford backscattering spectroscopy detection (RBS) - elastic recoil detection (ERD).

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.130-130
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• 2016

Bioinspired hierarchical nanostructures for self-cleaning s-tnwjurface and SERS substrates are investigated. The multi-level hierarchy is combined with CuO nanowire and additional nanoscale structures. CuO nanowire, which has extremely high aspect ratio, serves as a base structure of multi-level hierarchy and additional flower like structures are placed on the CuO nanowires. Since as-fabricated CuO nanostructures are hydrophilic, the surface is coated with perfluorooctyltrichlorosilane in order to change its wetting property to hydrophobic. While those CuO based nanostructures have a sufficient roughness for superhydrophobic characteristics, hierarchical nanoflowers on nanowire structures lead to a self-cleaning surface. Furthermore, flower like nanostructures provide reentrant curvatures, thus enabling oleophobic property. The surfaces has a repellency even for a tiny droplet (10 nL) of low surface tension liquids (~35 mN/m). On the on hands, nanoflowers provide many number of nanoscale gaps. After a thin layer of silver is deposited on the surface of CuO nanostructures, those nanoscale gaps act as hot-spot for surface enhanced Raman scattering (SERS). To analyze SERS enhancement of the surfaces, Raman shift is measured with varying molar density of 4-Mercaptopyridine from mM to pM. From these results, hierarchical CuO nanostructures are suitable for self-maintenance and cost effective SERS sensing applications.

• Journal of the Korean Society for Heat Treatment
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• v.30 no.3
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• pp.113-116
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• 2017

100 nm thick Sn doped ZnO (ZTO) single layer, 15 nm thick Ag buffered ZTO (ZTO/Ag), Ag intermediated ZTO (ZTO/Ag/ZTO) and Ag capped ZTO (Ag/ZTO) films were prepared on poly-carbonate (PC) substrates by RF and DC magnetron sputtering and then the influence of the Ag thin film on the optical and electrical properties of ZTO films were investigated. As deposited ZTO thin films show the visible transmittance of 81.8%, while ZTO/Ag/ZTO trilayer films show a higher visible transmittance of 82.5% in this study. From the observed results, it can be concluded that the 15 nm thick Ag interlayer enhances the opto-electrical performance of ZTO thin films effectively for use as flexible transparent conducting oxides films in various opto-electrical applications.

• Journal of the Korean Ceramic Society
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• v.55 no.6
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• pp.608-617
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• 2018

The effects of the purity and monoclinic phase of feedstock powder on the thermal durability of thermal barrier coatings (TBC) were investigated through cyclic thermal exposure. Bond and top coats were deposited by high velocity oxygen fuel method using Ni-Co based feedstock powder and air plasma spray method using three kinds of yttria-stabilized zirconia with different purity and monoclinic phase content, respectively. Furnace cyclic thermal fatigue test was performed to investigate the thermal fatigue behavior and thermal durability of TBCs. TBCs with high purity powder showed better sintering resistance and less thickness in the thermally grown oxide layer. The thermal durability was found to strongly depend on the content of monoclinic phase and the porosity in the top coat; the best thermal fatigue behavior and thermal durability were in the TBC prepared with high purity powder without monoclinic phase.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.988-991
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• 2004

In the present investigation, we tried AR coating simulation by using the "Essential Macleod optical coating design and analysis" program. After various run of the program we selected appropriate materials which have specific refractive indices and for that thickness was optimized to get the low reflectance. By comparing the simulated results for the different materials,we found that $SiO_2$ and TiN are the appropriate materials for this Flat panel device (FPD) application. Thin films of these materials were deposited using RF magnetron sputtering and Inductively Coupled Plasma Chemical Vapour Deposition (ICPCVD) methods on Polyethyleneterephthalate (PET) substrates. Spectroscopic ellipsometer (SE MF-1000) and UV-Vis spectrophotometer (SCINCO) were used for the optical characterization. The obtained experimental results are in good agreement with the simulation results.