• Title/Summary/Keyword: deposited layer

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Tribological Properties of Chemical Vapor Deposited Graphene Coating Layer (화학기상증착법에 의하여 제조된 그래핀 성장층의 기계적 마모 특성)

  • Lee, Jong Hoon;Kim, Sun Hye;Cho, Doo Ho;Kim, Se Chang;Baek, Seung Guk;Lee, Jong Gu;Kang, Junmo;Choi, Jae-Boong;Seok, Chang Sung;Kim, Moon Ki;Koo, Ja Choon;Lim, Byeong Soo
    • Korean Journal of Metals and Materials
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    • v.50 no.3
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    • pp.206-211
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    • 2012
  • Graphene has recently received high attention as a promising material for various applications, and many related studies have been undertaken to reveal its basic mechanical properties. However, the tribological properties of graphene film fabricated by the chemical vapor deposition (CVD) method are barely known. In this study, the contact angle and frictional wear characteristics of graphene coated copper film were investigated under room temperature, normal air pressure, and no lubrication condition. The contact angle was measured by sessile drop method and the wear test was carried out under normal loads of 660 mN and 2940 mN, respectively. The tribological behaviors of a graphene coating layer were also examined. Compared to heat treated bare copper foil, the graphene coated one shows a higher contact angle and lower friction coefficient.

Effects of Chlorine Contents on Perovskite Solar Cell Structure Formed on CdS Electron Transport Layer Probed by Rutherford Backscattering

  • Sheikh, Md. Abdul Kuddus;Abdur, Rahim;Singh, Son;Kim, Jae-Hun;Min, Kyeong-Sik;Kim, Jiyoung;Lee, Jaegab
    • Electronic Materials Letters
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    • v.14 no.6
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    • pp.700-711
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    • 2018
  • CdS synthesized by the chemical bath method at $70^{\circ}C$, has been used as an electron transport layer in the planar structure of the perovskite solar cells. A two-step spin process produced a mixed halide perovskite of $CH_3NH_3PbI_{3-x}Cl_x$ and a mixture of $PbCl_2$ and $PbI_2$ was deposited on CdS, followed by a sub-sequential reaction with MAI ($CH_3NH_3I$). The added $PbCl_2$ to $PbI_2$ in the first spin-step affected the structure, orientation, and shape of lead halides, which varied depending on the content of Cl. A small amount of Cl enhanced the surface morphology and the preferred orientation of $PbI_2$, which led to large and uniform grains of perovskite thin films. In contrast, the high content of Cl produces a new phase PbICl in addition to $PbI_2$, which leads to the small and highly uniform grains of perovskites. An improved surface coverage of perovskite films with the large and uniform grains maximized the performance of perovskite solar cells at 0.1 molar ratio of $PbCl_2$ to $PbI_2$. The depth profiling of elements in both lead halide films and mixed halide perovskite films were measured by Rutherford backscattering spectroscopy, revealing the distribution of chlorine along with the thickness, and providing the basis for the mechanism for enhanced preferred orientation of lead halide and the microstructure of perovskites.

Influence of Plasma Corrosion Resistance of Y2O3 Coated Parts by Cleaning Process (세정공정에 따른 Y2O3 코팅부품의 내플라즈마성 영향)

  • Kim, Minjoong;Shin, Jae-Soo;Yun, Ju-Young
    • Journal of the Korean institute of surface engineering
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    • v.54 no.6
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    • pp.365-370
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    • 2021
  • In this research, we proceeded with research on plasma resistance of the cleaning process of APS(Atmospheric Plasma Spray)-Y2O3 coated parts used for semiconductor and display plasma process equipment. CF4, O2, and Ar mixed gas were used for the plasma environment, and respective alconox, surfactant, and piranha solution was used for the cleaning process. After APS-Y2O3 was exposed to CF4 plasma, the surface changed from Y2O3 to YF3 and a large amount of carbon was deposited. For this reason, the plasma corrosion resistance was lowered and contamination particles were generated. We performed a cleaning process to remove the defect-inducing surface YF3 layer and carbon layer. Among three cleaning solutions, the piranha cleaning process had the highest detergency and the alconox cleaning process had the lowest detergency. Such results could be confirmed through the etching amount, morphology, composition, and accumulated contamination particle analysis results. Piranha cleaning process showed the highest detergency, but due to the very large thickness reduction, the base metal was exposed and a large number of contaminated particles were generated. In contrast, the surfactant cleaning process exhibit excellent properties in terms of surface detergency, etching amount, and accumulated contamination particle analysis.

Microstructural characteristics of a fresh U(Mo) monolithic mini-plate: Focus on the Zr coating deposited by PVD

  • Iltis, Xaviere;Drouan, Doris;Blay, Thierry;Zacharie, Isabelle;Sabathier, Catherine;Onofri, Claire;Steyer, Christian;Schwarz, Christian;Baumeister, Bruno;Allenou, Jerome;Stepnik, Bertrand;Petry, Winfried
    • Nuclear Engineering and Technology
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    • v.53 no.8
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    • pp.2629-2639
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    • 2021
  • Within the frame of the EMPIrE test, four monolithic mini-plates were irradiated in the ATR reactor. In two of them, the monolithic U(Mo) foil had been PVD-coated with Zr before the plate manufacturing. Extensive microstructural characterizations were performed on a fresh archive mini-plate, using Optical Microscopy (OM), Scanning Electron Microscopy (SEM) combined with Energy Dispersive Spectroscopy (EDS), Electron Backscattered Diffraction (EBSD) and Focused Ion Beam (FIB)/Transmission Electron Microscopy (TEM) with nano EDS. A particular attention was paid to the examination of the U(Mo) foil, the PVD coating, the cladding/Zr and Zr/U(Mo) interfaces. The Zr coating has a thickness around 15 ㎛. It has a columnar microstructure and appears dense. The cohesion of the cladding/Zr and Zr/U(Mo) interfaces seems to be satisfactory. An almost continuous layer with a thickness of the order of 100-300 nm is present at the cladding/Zr interface and corresponds to an oxidized part of the Zr coating. At the Zr/U(Mo) interface, a thin discontinuous layer is observed. It could correspond to locally oxidized U(Mo). This work provides a basis for interpreting the results of characterizations on EMPIrE irradiated plates.

Fabrication of Ultra-Small Multi-Layer Piezoelectric Vibrational Device Using P(VDF-TrFE-CFE) (P(VDF-TrFE-CFE)를 이용한 초소형 압전 적층형 진동 출력 소자의 제작)

  • Cho, Seongwoo;Glasser, Melodie;Kim, Jaegyu;Ryu, Jeongjae;Kim, Yunjeong;Kim, Hyejin;Park, Kang-Ho;Hong, Seungbum
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.2
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    • pp.157-160
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    • 2019
  • P(VDF-TrFE-CFE) (Poly (vinylidene fluoride-trifluoroethylene-chlorofluoroethylene)), which exhibits a high electrostriction of about 7%, can transmit tactile output as vibration or displacement. In this study, we investigated the applicability of P(VDF-TrFE-CFE) to wearable piezoelectric actuators. The P(VDF-TrFE-CFE) layers were deposited through spin-coating, and interspaced with patterned Ag electrodes to fabricate a two-layer $3.5mm{\times}3.5mm$ device. This layered structure was designed and fabricated to increase the output and displacement of the actuator at low driving voltages. In addition, a laser vibrometer and piezoelectric force microscope were used to analyze the device's vibration characteristics over the range of ~200~4,200 Hz. The on-off characteristics were confirmed at a frequency of 40 Hz.

The Effects of ZnO Sub-layer Thickness on the Room Temperature Ferromagnetism of (ZnO/Co) Multilayer ((ZnO/Co) 다층 박막에서 ZnO층의 두께가 상온강자성 특성에 미치는 영향)

  • Kang, Sung-geun;Kim, Sungdong
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.137-142
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    • 2018
  • Room temperature ferromagnetism of Co doped ZnO was studied using (ZnO/Co) multilayer structure, and the effects of ZnO sub-layer thickness on the RT ferromagnetism was investigated. As for the as-deposited state, the diamagnetism was observed for ($ZnO\;20{\AA}/Co\;x{\AA}$) while the ferromagnetism was observed for ($ZnO\;40{\AA}/Co\;x{\AA}$). After vacuum-annealed, both showed the RT ferromagnetism and ($ZnO\;40{\AA}/Co\;x{\AA}$) structure interestingly showed negative remanence magnetization behavior. UV-Vis spectrometer revealed that Co atoms were substituted with Zn in ZnO and Co cluster was not found in XPS and HRTEM EDS analysis.

Property of Nano-thickness Nickel Silicides with Low Temperature Catalytic CVD (Catalytic CVD 저온공정으로 제조된 나노급 니켈실리사이드의 물성)

  • Choi, Yongyoon;Kim, Kunil;Park, Jongsung;Song, Ohsung
    • Korean Journal of Metals and Materials
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    • v.48 no.2
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    • pp.133-140
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    • 2010
  • 10 nm thick Ni layers were deposited on 200 nm $SiO_2/Si$ substrates using an e-beam evaporator. Then, 60 nm or 20 nm thick ${\alpha}$-Si:H layers were grown at low temperature (<$200^{\circ}C$) by a Catalytic-CVD. NiSi layers were already formed instantaneously during Cat-CVD process regardless of the thickness of the $\alpha$-Si. The resulting changes in sheet resistance, microstructure, phase, chemical composition, and surface roughness with the additional rapid thermal annealing up to $500^{\circ}C$ were examined using a four point probe, HRXRD, FE-SEM, TEM, AES, and SPM, respectively. The sheet resistance of the NiSi layer was 12${\Omega}$/□ regardless of the thickness of the ${\alpha}$-Si and kept stable even after the additional annealing process. The thickness of the NiSi layer was 30 nm with excellent uniformity and the surface roughness was maintained under 2 nm after the annealing. Accordingly, our result implies that the low temperature Cat-CVD process with proposed films stack sequence may have more advantages than the conventional CVD process for nano scale NiSi applications.

A Study on Glass/Mo/ZnO/Glass Thin-film-heaters for Water Heating (수중 발열을 위한 Glass/Mo/ZnO/Glass 구조의 박막형 발열체 연구)

  • Kim, Jiwoo;Choi, Dooho
    • Journal of the Microelectronics and Packaging Society
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    • v.29 no.1
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    • pp.43-47
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    • 2022
  • In this study, we demonstrated an eco-friendly thin-metallic-film-based heater which can be operated in water. Based on the materials stability, Mo was selected as the heating element to secure long-term stability. Using a magnetron sputtering, 40 nm-thick Mo layers were deposited onto a glass substrate, followed by the deposition of 60-nm-thick ZnO layer to prevent oxidation during the heater fabrication process. Then, PVB (Polyvinyl Butyral) was applied on top of ZnO layer and an additional glass substrate was placed, which were heated at 150℃ for 2 hr. The PVB was cured with strong adhesion by the processing condition. We operated the Glass/Mo/ZnO/Glass heater in water, and it was shown that the water temperature reached 50℃ within 2 minutes, with a minimal resistance change of the heater. Finally, the heaters exhibit a semi-transparency, and this aesthetic advantage is expected to contribute to the added value of the heater.

Effect of Ag interlayer on the optical and electrical properties of ZnO thin films (Ag 중간층 두께에 따른 ZnO 박막의 광학적, 전기적 특성 연구)

  • Kim, Hyun-Jin;Jang, Jin-Kyu;Choi, Jae-Wook;Lee, Yeon-Hak;Heo, Sung-Bo;Kong, Young-Min;Kim, Daeil
    • Journal of the Korean institute of surface engineering
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    • v.55 no.2
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    • pp.91-95
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    • 2022
  • ZnO single layer (60 nm thick) and ZnO with Ag interlayer (ZnO/Ag/ZnO; ZAZ) films were deposited on the glass substrates by using radio frequency (RF) and direct current (DC) magnetron sputter to evaluate the effectiveness of Ag interlayer on the optical visible transmittance and the conductivity of the films. In the ZAZ films, the thickness of ZnO layers was kept at 30 nm, while the Ag thickness was varied as 5, 10, 15 and 20 nm. In X-ray diffraction (XRD) analysis, ZnO films show the (002) diffraction peak and ZAZ films also show the weak ZnO (002) peak and Ag (111) diffraction peak. As a thickness of Ag interlayer increased to 20 nm, the grain size of the Ag films enlarged to 11.42 nm and the optical band gap also increased from 4.15 to 4.22 eV with carrier concentration increasing from 4.9 to 10.5×1021 cm-3. In figure of merit measurements, the ZAZ films with a 10 nm thick Ag interlayer showed the higher figure of merit of 4.0×10-3 Ω-1 than the ZnO single layer and another ZAZ films. From the experimental result, it is assumed that the Ag interlayer enhanced effectively the opto-electrical performance of the ZAZ films.

Light-emitting Diodes based on a Densely Packed QD Film Deposited by the Langmuir-Blodgett Technique (랭뮤어-블롯젯을 통해 형성된 고밀도 양자점 박막과 이를 기반으로 한 발광다이오드)

  • Rhee, Seunghyun;Jeong, Byeong Guk;Roh, Jeongkyun
    • Journal of Sensor Science and Technology
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    • v.31 no.4
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    • pp.249-254
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    • 2022
  • To achieve high-performance colloidal quantum dot light-emitting diodes (QD-LEDs), the use of a densely packed QD film is crucial to prevent the formation of leakage current pathways and increase in interface resistance. Spin coating is the most common method to deposit QDs; however, this method often produces pinholes that can act as short-circuit paths within devices. Since state-of-the-art QD-LEDs typically employ mono- or bi-layer QDs as an emissive layer because of their low conductivities, the use of a densely packed and pinhole-free QD film is essential. Herein, we introduce the Langmuir-Blodgett (LB) technique as a deposition method for the fabricate densely packed QD films in QD-LEDs. The LB technique successfully transfers a highly dense monolayer of QDs onto the substrate, and multilayer deposition is performed by repeating the transfer process. To validate the comparability of the LB technique with the standard QD-LED fabrication process, we fabricate and compare the performance of LB-based QD-LEDs to that of the spin-coating-based device. Owing to the non-destructiveness of the LB technique, the electroluminescence efficiency of the LB-based QD-LEDs is similar to that of the standard spin coating-based device. Thus, the LB technique is promising for use in optoelectronic applications.