Acknowledgement
This research was supported by the Material parts technology development program of the Ministry of Trade, Industry and Energy Grant of South Korea (20003660) and the Characterization platform for advanced materials funded by Korea Research Institute of Standards and Science (KRISS-2021-GP2021-0011-10).
References
- J.B. Song, J.T. Kim, S.S. Lee, S.G. Oh, E. Oh, J.Y. Yun, Reliability assessment of anodic films under plasma etching process, 2016 27th Annu. SEMI Adv. Semicond. Manuf. Conf. ASMC 2016. (2016) 233-236.
- J.B. Song, J.T. Kim, S.G. Oh, J.S. Shin, J.R. Chun, J.Y. Yun, Effect of sealing time of anodic aluminum oxide (AAO) film for preventing plasma damage, Sci. Adv. Mater. 7 (2015) 127-132. https://doi.org/10.1166/sam.2015.2091
- M. Kim, E. Choi, J. So, J.S. Shin, C.W. Chung, S.J. Maeng, J.Y. Yun, Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature, J. Mater. Res. Technol. 11 (2021) 219-226. https://doi.org/10.1016/j.jmrt.2020.12.086
- J. So, E. Choi, J.T. Kim, J.S. Shin, J.B. Song, M. Kim, C.W. Chung, J.Y. Yun, Improvement of plasma resistance of anodic aluminum-oxide film in sulfuric acid containing cerium(IV) ion, Coatings. 10.2 (2020) 103 https://doi.org/10.3390/coatings10020103
- H. Ashizawa, K. Yoshida, Effect of the microstructures of yttria ceramics on their plasma corrosion behavior, Ceram. Int. 45 (2019) 21162-21167. https://doi.org/10.1016/j.ceramint.2019.07.093
- Y.O. Deposited, Y.F. Coatings, Contamination Particle Behavior of Aerosol, Coatings. 9 (2019) 310. https://doi.org/10.3390/coatings9050310
- A. Joulia, G. Bolelli, E. Gualtieri, L. Lusvarghi, S. Valeri, M. Vardelle, S. Rossignol, A. Vardelle, Comparing the deposition mechanisms in suspension plasma spray (SPS) and solution precursor plasma spray (SPPS) deposition of yttria-stabilised zirconia (YSZ), J. Eur. Ceram. Soc. 34 (2014) 3925-3940. https://doi.org/10.1016/j.jeurceramsoc.2014.05.024
- J.B. Song, J.T. Kim, S.G. Oh, J.Y. Yun, Contamination particles and plasma etching behavior of atmospheric plasma sprayed Y2O3 and YF3 coatings under NF3 plasma, Coatings. 9 (2019) 1-8. https://doi.org/10.3390/coatings9010001
- Y.C. Cao, L. Zhao, J. Luo, K. Wang, B.P. Zhang, H. Yokota, Y. Ito, J.F. Li, Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3, Appl. Surf. Sci. 366 (2016) 304-309. https://doi.org/10.1016/j.apsusc.2016.01.092
- J.B. Song, E. Choi, S.G. Oh, J. So, S.S. Lee, J.T. Kim, J.Y. Yun, Improved reliability of breakdown voltage measurement of yttrium oxide coatings by plasma spray, Ceram. Int. 45 (2019) 22169-22174. https://doi.org/10.1016/j.ceramint.2019.07.238
- J.G. Odhiambo, W.G. Li, Y.T. Zhao, C.L. Li, Porosity and its significance in plasma-sprayed coatings, Coatings. 9 (2019) 1-19. https://doi.org/10.3390/coatings9010001
- T.K. Lin, D.S. Wuu, S.Y. Huang, W.K. Wang, Preparation and characterization of sprayed-yttrium oxyfluoride corrosion protective coating for plasma process chambers, Coatings. 8 (2018) 1-8. https://doi.org/10.3390/coatings8010001
- W.K. Wang, Y.X. Lin, Y.J. Xu, Structural and fluorine plasma etching behavior of sputter-deposition yttrium fluoride film, Nanomaterials. 8.11 (2018) 936 https://doi.org/10.3390/nano8110936
- Y. Kim, H. Kwon, H. Park, C. Lee, Correlation of Plasma Erosion Resistance and the Microstructure of YF3 Coatings Prepared by Vacuum Kinetic Spray, J. Therm. Spray Technol. 29 (2020) 1016-1026. https://doi.org/10.1007/s11666-020-01019-4