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J.B. Song, J.T. Kim, S.S. Lee, S.G. Oh, E. Oh, J.Y. Yun, Reliability assessment of anodic films under plasma etching process, 2016 27th Annu. SEMI Adv. Semicond. Manuf. Conf. ASMC 2016. (2016) 233-236.
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J.B. Song, J.T. Kim, S.G. Oh, J.S. Shin, J.R. Chun, J.Y. Yun, Effect of sealing time of anodic aluminum oxide (AAO) film for preventing plasma damage, Sci. Adv. Mater. 7 (2015) 127-132.
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M. Kim, E. Choi, J. So, J.S. Shin, C.W. Chung, S.J. Maeng, J.Y. Yun, Improvement of corrosion properties of plasma in an aluminum alloy 6061-T6 by phytic acid anodization temperature, J. Mater. Res. Technol. 11 (2021) 219-226.
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Y.C. Cao, L. Zhao, J. Luo, K. Wang, B.P. Zhang, H. Yokota, Y. Ito, J.F. Li, Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3, Appl. Surf. Sci. 366 (2016) 304-309.
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J.B. Song, E. Choi, S.G. Oh, J. So, S.S. Lee, J.T. Kim, J.Y. Yun, Improved reliability of breakdown voltage measurement of yttrium oxide coatings by plasma spray, Ceram. Int. 45 (2019) 22169-22174.
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J.G. Odhiambo, W.G. Li, Y.T. Zhao, C.L. Li, Porosity and its significance in plasma-sprayed coatings, Coatings. 9 (2019) 1-19.
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T.K. Lin, D.S. Wuu, S.Y. Huang, W.K. Wang, Preparation and characterization of sprayed-yttrium oxyfluoride corrosion protective coating for plasma process chambers, Coatings. 8 (2018) 1-8.
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Y. Kim, H. Kwon, H. Park, C. Lee, Correlation of Plasma Erosion Resistance and the Microstructure of YF3 Coatings Prepared by Vacuum Kinetic Spray, J. Therm. Spray Technol. 29 (2020) 1016-1026.
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J. So, E. Choi, J.T. Kim, J.S. Shin, J.B. Song, M. Kim, C.W. Chung, J.Y. Yun, Improvement of plasma resistance of anodic aluminum-oxide film in sulfuric acid containing cerium(IV) ion, Coatings. 10.2 (2020) 103
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H. Ashizawa, K. Yoshida, Effect of the microstructures of yttria ceramics on their plasma corrosion behavior, Ceram. Int. 45 (2019) 21162-21167.
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11 |
Y.O. Deposited, Y.F. Coatings, Contamination Particle Behavior of Aerosol, Coatings. 9 (2019) 310.
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W.K. Wang, Y.X. Lin, Y.J. Xu, Structural and fluorine plasma etching behavior of sputter-deposition yttrium fluoride film, Nanomaterials. 8.11 (2018) 936
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A. Joulia, G. Bolelli, E. Gualtieri, L. Lusvarghi, S. Valeri, M. Vardelle, S. Rossignol, A. Vardelle, Comparing the deposition mechanisms in suspension plasma spray (SPS) and solution precursor plasma spray (SPPS) deposition of yttria-stabilised zirconia (YSZ), J. Eur. Ceram. Soc. 34 (2014) 3925-3940.
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J.B. Song, J.T. Kim, S.G. Oh, J.Y. Yun, Contamination particles and plasma etching behavior of atmospheric plasma sprayed Y2O3 and YF3 coatings under NF3 plasma, Coatings. 9 (2019) 1-8.
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