• Title/Summary/Keyword: deposited layer

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$H_2$ sensor for detecting hydrogen in DI water using Pd membrane (수중 수소 감지를 위한 MISFET형 센서제작과 그 특성)

  • Cho, Yong-Soo;Son, Seung-Hyun;Choi, Sie-Young
    • Journal of Sensor Science and Technology
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    • v.9 no.2
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    • pp.113-119
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    • 2000
  • In this work, Pd/Pt gate MISFET sensor using Pd membrane was fabricated to detect the hydrogen in DI water. A differential pair-type was used to minimize the intrinsic voltage drift of the MISFET. To avoid hydrogen induced drift of the sensor, the silicon dioxide/silicon nitride double layer was used as the gate insulator of the FET's. In order to eliminate the blister formation on the surface of the hydrogen sensing gate metal, Pd/Pt double metal layer was deposited on the gate insulator. For this type of application sensors need to be isolated from the DI water, and a Pd membrane was used to separate the sensor from the DI water. The output voltage change due to the variation of hydrogen concentration is linear from 100ppm to 500 ppm.

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Synthesis and Surface Characterization of Carbon Nanotubes by Hot-Filament Plasma Enhanced Chemical Vapor Deposition (Hot-filament 화학기상 증착법에 의한 탄소나노튜브의 성장 및 표면 특성)

  • Choi, Eun-Chang;Kim, Jung-Tae;Park, Yong-Seob;Choi, Won-Seok;Hong, Byung-You
    • Journal of the Korean Vacuum Society
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    • v.16 no.3
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    • pp.187-191
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    • 2007
  • In this paper, the catalyst layer is deposited on silicon substrate using magnetron sputtering system and carbon nanotubes(CNTs) were grown in $NH_3\;and\; C_2H_2$ gas by hot-filament plasma enhanced chemical vapor deposition (HFPECVD) system. A growth temperature of carbon nanotubes was changed from $350^{\circ}C\;to\;650^{\circ}C\;by\;100^{\circ}C$. We observed the shape of CNTs by a field-emission scanning electron microscope(FE-SEM) measurement and analyzed the surface characteristic of CNTs layer by contact angle measurement. That is, the growth temperature of CNTs is the important factor leads to the variation of the properties.

Process Characteristics of SiOx and SiOxNy Films on a Gas Barrier Layer using Facing Target Sputtering (FTS) System (FTS 장치를 이용한 가스 차단막용 SiOx 및 SiOxNy 박막의 공정특성)

  • Son, Jin-Woon;Park, Yong-Jin;Sohn, Sun-Young;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.12
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    • pp.1028-1032
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    • 2009
  • In this study, the influences of silicon-based gas barrier films fabricated by using a facing target sputtering(FTS) system on the gas permeability for flexible displays have been investigated. Under these optimum conditions on the $SiO_x$ film with oxygen concentration($O_2/Ar+O_2$) of 3.3% and the $SiO_xN_y$ film with nitrogen concentration($N_2/Ar+O_2+N_2$) of 30% deposited by the FTS system, it was found that the films were grown about 4 times higher deposition rate than that of the conventional sputtering system and showed high transmittance about 85% in the visible light range. Particularly, the polyethylene naphthalate(PEN) substrates with the $SiO_x$ and/or $SiO_xN_y$ films showed the enhanced properties of decreased water vapor transmission rate (WVTR) over $10^{-1}\;g/m^2{\cdot}day$ compared with the PEN substrate without any gas barrier films, which was due to high packing density in the Si-based films with high plasma density by FTS process and/or the denser chemical structure of Si-N bond in the $SiO_xN_y$ film.

The Optical properties of Fe2O3/Na3AlF6/Fe2O3/Cu, Al, Cr Multi Layered Thin Film depending on the Optical Thickness (Fe2O3/Na3AlF6/Fe2O3/Cu, Al, Cr 다층박막의 광학적 두께에 따른 광학특성)

  • Kim, Jun-Sik;Jang, Gang-Jae;Jang, Gun-Eik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.7
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    • pp.665-668
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    • 2008
  • Multi-layered thin films of $Fe_2O_3/Na_3AlF_6/Fe_2O_3/Cu$, Cr, Al were deposited on glass substrate by evaporation process. As high and low refractive index material, $Fe_2O_3$ and $Na_3AlF_6$ were selected and additionally Cu, Al and Cr were chosen as mid reflective layer respectively. Optical properties including reflectance were systematically studied depending on optical thickness of $Na_3AlF_6$ especially $0.25{\lambda}$ and $0.5{\lambda}$. In order to expect the experimental result, the simulation program, the Essential Macleod Program(EMP) was adopted and compared with the experimental data. Based on the results taken by spectrophotometer at viewing angle $45^{\circ}C$, the $Fe_2O_3/Na_3AlF_6/Fe_2O_3/Cu$ show the colour rage between red and orange in $0.25{\lambda}$ and green and pupple in $0.5{\lambda}$ respectively. When the Al was used as mid reflective layers in $Fe_2O_3/Na_3AlF_6/Fe_2O_3$ system, typical yellow colour and mixed colour between green and pupple were appeared in $0.25{\lambda}$ and $0.5{\lambda}$ of $Na_3AlF_6$ respectively. As compared the experimental result to simulation data, it was found out that the experimental data is relatively well matched with the EMP simulation data.

A Study on the DLC Film Coating for Improving Loosening Torque of Dental Implant Screw (치과 임플란트 스크루 풀림토크 개선용 DLC 박막 코팅에 관한 연구)

  • Jeong, Woon-Jo;Cho, Jae-Cheol
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.67 no.10
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    • pp.1375-1381
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    • 2018
  • In this paper, we studied coatings of the DLC thin film for improving loosening torque of dental implant screw. We used a filtered arc ion plating process which can realize the most dense DLC layer by coating the DLC thin film on the surface of the dental abutment screw. It showed both hardness comparable to diamond and low friction coefficient similar to graphite, and to improve the loosening phenomenon by increasing the screw tightening force Cr/CrN, Ti/TiN or Ti/TiN/Cr/CrN buffer layers were deposited for 5 to 10 minutes to improve the adhesion of the DLC thin film to the surface of the Ti (Gr.5), and then the DLC thin film was coated for about 15 minutes. As a result, the Cr/CrN buffer layer exhibited the highest hardness of 29.7 GPa, the adhesion of 18.62N on average, and a very low coefficient of friction of less than 0.2 as a whole. And we measured loosening torque after one million times with masticatory movement simulator. As a result, the values of the coated screw loosening torque were clearly higher than those of the uncoated screw. From this, it was found that the DLC coating was effective methods improving the loosening torque. In addition, it was confirmed that the cytotoxicity test and cell adhesion test showed high biocompatibility.

Dependence of LaAlO3/SrTiO3 Interfacial Conductivity on the Thickness of LaAlO3 Layer Investigated by Current-voltage Characteristics (LaAlO3 두께에 따른 LaAlO3/SrTiO3 계면에서의 전류-전압 특성을 이용한 전도성 변화 연구)

  • Moon, Seon-Young;Baek, Seung-Hyub;Kang, Chong-Yun;Choi, Ji-Won;Choi, Heon-Jin;Kim, Jin-Sang;Jang, Ho-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.8
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    • pp.616-619
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    • 2012
  • Oxides possess several interesting properties, such as ferroelectricity, magnetism, superconductivity, and multiferroic behavior, which can effectively be used oxide electronics based on epitaxially grown heterostructures. The microscopic properties of oxide interfaces may have a strong impact on the electrical transport properties of these heterostructures. It was recently demonstrated that high electrical conductivity and mobility can be achieved in the system of an ultrathin $LaAlO_3$ film deposited on a $TiO_2$-terminated $SrTiO_3$ substrate, which was a remarkable result because the conducting layer was at the interface between two insulators. In this study, we observe that the current-voltage characteristics exhibit $LaAlO_3$ thickness dependence of electrical conductivity in $TiO_2$-terminated $SrTiO_3$. We find that the $LaAlO_3$ layers with a thickness of up 3 unit cells, result in highly insulating interfaces, whereas those with thickness of 4 unit cells and above result in conducting interfaces.

Growth of Bi-Te Based Materials by MOCVD and Fabrication of Thermoelectric Thin Film Devices (MOCVD 법에 의한 Bi-Te계 열전소재 제조 및 박막형 열전소자 제작)

  • Kwon, Sung-Do;Ju, Byeong-Kwon;Yoon, Seok-Jin;Kim, Jin-Sang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.12
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    • pp.1135-1140
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    • 2008
  • Bismuth-telluride based thin film materials are grown by Metal Organic Chemical Vapor Deposition(MOCVD). A planar type thermoelectric device has been fabricated using p-type $Bi_{0.4}Sb_{1.6}Te_3$ and n-type $Bi_2Te_3$ thin films. Firstly, the p-type thermoelectric element was patterned after growth of $4{\mu}m$ thickness of $Bi_{0.4}Sb_{1.6}Te_3$ layer. Again n-type $Bi_2Te_3$ film was grown onto the patterned p-type thermoelectric film and n-type strips are formed by using selective chemical etchant for $Bi_2Te_3$. The top electrical connector was formed by thermally deposited metal film. The generator consists of 20 pairs of p- and n-type legs. We demonstrate complex structures of different conduction types of thermoelectric element on same substrate by two separate runs of MOCVD with etch-stop layer and selective etchant for n-type thermoelectric material. Device performance was evaluated on a number of thermoelectric devices. To demonstrate power generation, one side of the sample was heated by heating block and the voltage output measured. As expected for a thermoelectric generator, the voltage decreases linearly, while the power output rises to a maximum. The highest estimated power of $1.3{\mu}W$ is obtained for the temperature difference of 45 K. we provide a promising procedure for fabricating thin film thermoelectric generators by using MOCVD grown thermoelectric materials which may have nanostructure with high thermoelectric properties.

Fabrication and Characteristics of $CuInS_2$ thin films produced by Vacuum Evaporation (진공증착에 의해 제조된 $CuInS_2$ 박막의 제작 및 특성)

  • Yang, Hyeon-Hun;Jeong, Woon-Jo;Kim, Duck-Tae;Park, Gye-Choon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.04c
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    • pp.15-17
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    • 2008
  • $CuInS_2$ thin films were synthesized by sulpurization of Cu/In Stacked elemental layer deposited onto glass Substrates by vacuum furance annealing at temperature 200[$^{\circ}C$]. And structural and electrical properties were measured in order to certify optimum conditions for growth of the ternary compound semiconductor $CuInS_2$ thin films with non-stoichiometry composition. $CuInS_2$ thin film was well made at the heat treatment 200[$^{\circ}C$] of SLG/Cu/In/S stacked elemental layer which was prepared by thermal evaporator, and chemical composition of the thin film was analyzed nearly as the proportion of 1 : 1 : 2. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM and hall measurement system. At the same time, carrier concentration, hall mobility and resistivity of the thin films was $9.10568{\times}10^{17}[cm^{-3}]$, 312.502[$cm^2/V{\cdot}s$] and $2.36{\times}10^{-2}[{\Omega}{\cdot}cm]$, respectively.

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Fabrication and Evaluation of the SnO2 Based Gas Sensor for CO and NOx Detection (SnO2를 이용한 CO 및 NOx 가스 감지 센서 제작 및 특성 연구)

  • Kim, Man Jae;Lee, Yu-Jin;Ahn, Hyo-Jin;Lee, Sang Hoon
    • Transactions of the Korean Society of Automotive Engineers
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    • v.23 no.5
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    • pp.515-523
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    • 2015
  • In this paper, we fabricated and evaluated the gas sensor for the detection of CO gas and $NO_X$ gas among the vehicle exhaust emission gasses. The $SnO_2$ (tin dioxide) layer is used as the detection material, and the thin-film type and the nano-fiber type layers are deposited with various thicknesses using sputtering method and electro spinning method, respectively. The experiments are performed in the chamber where the gas concentration is controlled with mass flow controller. The fabricated devices are applied to the CO and $NO_X$ gas, where the device with the thinner $SnO_2$ layer shows better sensitivity. The nano-fiber has the larger surface area, and the shorter response time and recovery time are obtained. From the experimental results, both types of gas sensors successfully detect CO and $NO_X$ gases, which can be applied to measure those gases from the vehicle emissions.

Influence of Sputtering Conditions on Properties of Copper Oxide Thin Films (스퍼터링 공정 조건이 산화 구리 박막 특성에 미치는 영향)

  • Cho, Jae Yu;Heo, Jaeyeong
    • Current Photovoltaic Research
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    • v.5 no.1
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    • pp.15-19
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    • 2017
  • The fossil fuel power consumption generates $CO_2$, which causes the problems such as global warming. Also, the increase in energy consumption has accelerated the depletion of the fossil fuels, and renewable energy is attracting attention. Among the renewable energies, the solar energy gets a lot of attention as the infinite clean energy source. But, the supply level of solar cell is insignificant due to high cost of generation of electric power in comparison with fossil fuels. Thus several researchers are recently doing the research on ultra-low-cost solar cells. Also, $Cu_2O$ is one of the applied materials as an absorption layer in ultra-low-cost solar cells. Cuprous oxide ($Cu_2O$) is highly desirable semiconductor oxide for use in solar energy conversion due to its direct band gap ($E_g={\sim}2.1eV$) and a high absorption coefficient that absorbs visible light of wavelengths up to 650 nm. In addition, $Cu_2O$ has several advantages such as non-toxicity, low cost and can be prepared with simple and cheap methods on large scale. In this work, we fabricated the $Cu_2O$ thin films by reactive sputtering method. The films were deposited with a Cu target with variable parameters such as substrate temperature, rf-power, and annealing condition. Finally, we confirmed the structural properties of thin films by XRD and SEM.