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http://dx.doi.org/10.4313/JKEM.2008.21.12.1135

Growth of Bi-Te Based Materials by MOCVD and Fabrication of Thermoelectric Thin Film Devices  

Kwon, Sung-Do (고려대학교 전자전기공학과)
Ju, Byeong-Kwon (고려대학교 전자전기공학과)
Yoon, Seok-Jin (KIST 박막재료연구센터)
Kim, Jin-Sang (KIST 박막재료연구센터)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.21, no.12, 2008 , pp. 1135-1140 More about this Journal
Abstract
Bismuth-telluride based thin film materials are grown by Metal Organic Chemical Vapor Deposition(MOCVD). A planar type thermoelectric device has been fabricated using p-type $Bi_{0.4}Sb_{1.6}Te_3$ and n-type $Bi_2Te_3$ thin films. Firstly, the p-type thermoelectric element was patterned after growth of $4{\mu}m$ thickness of $Bi_{0.4}Sb_{1.6}Te_3$ layer. Again n-type $Bi_2Te_3$ film was grown onto the patterned p-type thermoelectric film and n-type strips are formed by using selective chemical etchant for $Bi_2Te_3$. The top electrical connector was formed by thermally deposited metal film. The generator consists of 20 pairs of p- and n-type legs. We demonstrate complex structures of different conduction types of thermoelectric element on same substrate by two separate runs of MOCVD with etch-stop layer and selective etchant for n-type thermoelectric material. Device performance was evaluated on a number of thermoelectric devices. To demonstrate power generation, one side of the sample was heated by heating block and the voltage output measured. As expected for a thermoelectric generator, the voltage decreases linearly, while the power output rises to a maximum. The highest estimated power of $1.3{\mu}W$ is obtained for the temperature difference of 45 K. we provide a promising procedure for fabricating thin film thermoelectric generators by using MOCVD grown thermoelectric materials which may have nanostructure with high thermoelectric properties.
Keywords
Thin film; Thermoelectric; Generator; Seebeck coefficient; MOCVD; Bismuth-telluride;
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