Dependence of LaAlO3/SrTiO3 Interfacial Conductivity on the Thickness of LaAlO3 Layer Investigated by Current-voltage Characteristics
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Moon, Seon-Young
(Electronic Materials Center, Korea Institute of Science and Technology (KIST))
Baek, Seung-Hyub (Electronic Materials Center, Korea Institute of Science and Technology (KIST)) Kang, Chong-Yun (Electronic Materials Center, Korea Institute of Science and Technology (KIST)) Choi, Ji-Won (Electronic Materials Center, Korea Institute of Science and Technology (KIST)) Choi, Heon-Jin (Department of Materials Science and Engineering, Yonsei University) Kim, Jin-Sang (Department of Materials Science and Engineering, Yonsei University) Jang, Ho-Won (Department of Materials Science and Engineering, Seoul National University) |
1 | H. Iwai, Microelectron. Eng., 86, 1520 (2009). DOI |
2 | Ian Osborne, M. Laving, and R. Coontz, Science, 327, 1595 (2010). DOI |
3 | H. Takagi and H. Y. Hwang, Science, 327, 601 (2010). |
4 | M. Baibich, J. Broto, A. Fert, F. Vandau, F. Petroff, P. Eitenne, G. Creuzet, A. Frederich, and J. Chazelas, Phys. Rev. Lett., 61, 2472 (1988). DOI ScienceOn |
5 | G. Rijnders and D. H. A. Blank, Nature, 433, 369 (2005). DOI |
6 | A. Ohtomo and H. Y. Hwang, Nature, 427, 423 (2004). DOI ScienceOn |
7 | G. Koster, B. L. Kropman, G. J. H. M. Rijnders D. H. A. Blank, and H. Rogalla, Appl. Phys. Lett., 73, 2920 (1998). DOI |
8 | N. Nakagawa, H. Y. Hwang, and A. Muller, Nature, 5, 204 (2006). DOI |
9 | S. Thiel, G. Hammerl, A. Schmehl, C. W. Schneider, and J. Mannhart, Science, 313, 1942 (2006). DOI |
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