• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.454-454
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• 2012

Magnetron sputtering에서, 영구자석의 자속은 target 표면 가까이에 전자를 구속한다. 구속된 전자는 Ar중성기체와 충돌하여 Ar이온을 발생시킬 수 있으므로, target 근처에서의 플라즈마 밀도를 높여, 자석이 없을 때보다 낮은 압력 또는 낮은 전압에서 방전할 수 있다. 구속 전자가 밀집된 공간에서 sputtering 현상이 주로 발생하기 때문에, planar target을 사용할 경우에는 target이 불균일하게 식각되어 target의 사용효율이 좋지 못하다. 이에 대한 한 가지 대안은 target을 원통형으로 만들어 회전시키는 것이다. Cylindrical target 의 내부에 위치한 영구자석은 고정시키고, target만을 회전시키면 비교적 균일하게 식각되므로 target의 사용효율을 높일 수 있다. 본 연구에서는 기존의 planar target에 대한 Particle-In-Cell Simulation을 Cylindrical target 에 적용시키기 위한 방법을 알아본다. 또한, 개발된 Simulator를 이용하여, Sputtering 조건의 변화에 대한 I-V curve의 변화를 살펴본다.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.3
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• pp.142-148
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• 2006

The resonances that contain the information on the properties of the scattering target can be used for target reconstruction approaches. The inverse scattering theory for the resonances has been applied to the problems of the scattering for a spherical, cylindrical dielectric objects and dielectrically coated conductors, shown reasonable results. Though by using this method the thickness and the dielectric constants of the target can be obtained from a determination of the spacing and of the widths of the scattering resonances, the radius of the target should be given. In this paper, we suggest the improved inverse theory combined with the resonance scattering theory to obtain the radius in addition to the dielectric constant of the target. The applications of this method for scattering problems of electromagnetic waves from cylindrical targets were accomplished, and it shows its validity.

• Korean Journal of Materials Research
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• v.24 no.7
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• pp.344-350
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• 2014

Metal films (i.e., Ti, Al and SUH310S) were prepared in a magnetron sputtering apparatus, and their cross-sectional structures were investigated using scanning electron microscopy. The apparatus used consisted of a cylindrical metal target which was electrically grounded, and two anode rings attached to the top and to the bottom of the target. A wire was placed along the center-line of the cylindrical target to provide a substrate. When the electrical potential of the substrate was varied, the metal-film formation rate depended on both the discharge voltage and the electrical potential of the substrate. As we made the magnetic field stronger, the plasma which appeared near the target collected on the plasma wall surface and thereby decreased the bias current. The bias current on the conducting wire was different from that for cation collection. The bias current decreased because the collection of cations decreased when we increased the magnetic-coil current. When the substrate was electrically isolated, the films deposited showed a slightly coarse columnar structure with thin voids between adjacent columns. In contrast, in the case of the grounded substrate, the deposited film did not show any clear columns but instead, showed a densely-packed granular structure. No peeling region was observed between the film and substrate, indicating good adhesion.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.179.1-179.1
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• 2013

Cylindrical Rotating Magnetron Sputtering Cathode (이하 Rotary Cathode)는 기존에 사용 되던 rectangular type 보다 Target 사용 효율이 높다는 큰 이점을 가지고 있다. 높은 Target 사용 효율은 비용 절감 효과와 직접적으로 관련 된다. 이번 연구는 3D Plasma simulation(PIC-MCC)을 통한 Target 사용 효율 80% 이상의 Rotary Cathode 개발을 목적으로 한다. Plasma simulation에 External Magnetic fields를 접목하여 Electron의 이동 궤적을 제어하였고, 생성된 Ion (Ar+)의 밀도 및 속도로 Plasma의 안정성과 Erosion 계산 구간을 선정 하였다. Target Erosion Profile은 Sputtering yield Data와 Target에 충돌한 Ion 정보를 사용하여 산출 하였으며, Sputtered Particles의 Deposition Profile은 계산된 Target Erosion Profile과 The cosine law of emission을 이용하여 계산 하였다. 실험 조건은 Plasma simulation의 초기조건 바탕으로 하여 2G size의 ITO Target을 대상으로 실험 하였다. 비 Erosion 영역 최소화하기 위해 Magnet Length를 변경하여 제작 적용 하였다. Simulation 계산 시간의 제약으로 인하여 simulation에서 생성된 최대 이온 밀도는 일반적으로 알려진 값 보다 적게 계산 되었지만, Simulation으로 예측한 Erosion Profile 및 Deposition Profile은 실험 값과 유사한 형태를 나타났으며, 실험 결과는 Target 사용 효율 80%이상의 결과를 보였다.

• Transactions of the Korean Society for Noise and Vibration Engineering
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• v.25 no.6
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• pp.440-446
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• 2015

Acoustic signal is emitted from a vessel and received by a cylindrical array sensor at some distance from the vessel. Acoustic signal is the source for a cylindrical array sensor which is designed to detect the acoustic signal. Cylindrical array sensors seldom have an ideal hydrodynamic shape and are not sufficiently robust to survive without some protection and they are normally housed in a sonar dome. Reflected signals by some structure inside a sonar dome make unwanted signals. Therefore, an acoustic baffle is used to minimize unwanted signals. The performance of the acoustic baffles can be determined from the acoustic numerical analysis at the design stage. In this study, finite element method was used to analyze the acoustic field around the cylindrical array sensor and baffle effects. The baffle performance can be defined the echo reduction. To show the baffle performance, the specimens were made for pulse tube test and echo reductions were measured during the test. In this paper, the effect of echo reduction of the acoustic baffle was discussed.

• Journal of the Korean Society for Heat Treatment
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• v.23 no.1
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• pp.23-28
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• 2010

The cylindrical magnetron sputtering has not been widely used, although this system is useful for only certain types of applications such as fiber coatings. This paper presents electrode configurations which improved the complicacy of the target assembly by using the positive voltage power supply. It is a modified type which has a target constructed with a large cylindrical part, a conical part and a small cylindrical part. When positive voltage was applied to an anode, a stable glow discharge was established and a high deposition rate was obtained. The substrate bias current was monitored to estimate the effect of ion bombardment. As a result, it was found that the substrate current was large. With cylindrical and conical cathode magnetron sputter deposition on the surface of the substrate to prevent re-sputtering, ion impact because it can increase the effectiveness with excellent ductility and adhesion of Ti film deposition can be obtained. We board at the front end of the ground resistance of $5\;k{\Omega}$ attached to the substrate potential can be controlled easily, and Ti film deposition with excellent adhesion can be obtained. Microstructure and morphology of Ti films deposited on pure Cu wires were investigated by scanning electron microscopy in relation to preparation conditions. High level ion bombardment was found to be effective in obtaining a good adhesion for Cu wire coatings.

• Molecules and Cells
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• v.42 no.10
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• pp.729-738
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• 2019

Autophagy is an important process for protein recycling. Oligomerization of p62/SQSTM1 is an essential step in this process and is achieved in two steps. Phox and Bem1p (PB1) domains can oligomerize through both basic and acidic surfaces in each molecule. The ZZ-type zinc finger (ZZ) domain binds to target proteins and promotes higher-oligomerization of p62. This mechanism is an important step in routing target proteins to the autophagosome. Here, we determined the crystal structure of the PB1 homo-dimer and modeled the p62 PB1 oligomers. These oligomer models were represented by a cylindrical helix and were compared with the previously determined electron microscopic map of a PB1 oligomer. To accurately compare, we mathematically calculated the lead length and radius of the helical oligomers. Our PB1 oligomer model fits the electron microscopy map and is both bendable and stretchable as a flexible helical filament.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1995.05a
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• pp.35-38
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• 1995

Indium Tin Oxide(ITO) thin film is transparent to visible ray and conductive in electricity. It is seen that the samples made by the sputtering process have high transmission rate to visible ray and high adhesion , but the planar type magnetron sputtering process with is very well known in industrial region have a defect of partial erosion on the surface of target and a high loss of target and also since the substrate is positioned in plasma, the damage on thin film surface is caused by the reaction with plasma. In cylindrical magnetron sputtering system. it is known that the loss of target is little , the damage of thin film is very little and the adhesion of thin film with substrate is strong. In this study, we have made ITO thin film in the cylindrical DC magnetron system with the variable of substrate temperature , magnetic field, vacuum condution and the applied voltage. The general temperature for formation on ITO is asked at 350 $^{\circ}C$~400$^{\circ}C$ but we have made ITO is low temperature(80-150$^{\circ}C$) By studing electrical and optical properties of ITO thin fims made by varing several condition, we have searched the optimal condition for formation in the best ITO in low temperature.

• Korean Journal of Computational Design and Engineering
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• v.18 no.5
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• pp.367-373
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• 2013

In this study, the penetration characteristic from the cubic and cylindrical penetrator consisting of tungsten material with the velocity of 2,300 m/s is evaluated and the penetration possibility into the target is confirmed. The design of shape and size of penetrator is directly related to space and weight of the warhead. AUTODYN-3D simulation is used to study the penetration effect of penetrator. The purpose of numerical analysis is to verify the penetration characteristic with various L/D penetrator. The penetration performance of penetrator with identical weight due to the shape is also confirmed. The cylindrical and cubic penetrator has enough penetration energy on constant target body. Because the possibility of 2'nd penetration is important factor after 1'st penetration into target body, residual velocity of residual mass must be existed as much as possible. As geometrical shape ratio increases, penetration performance is confirmed to improve.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.2
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• pp.43-48
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• 2008

This paper proposes a new method for measuring the power of spherical and cylindrical lens with 6 points light source, which is composed of a LED and six holes, and magnification ellipse fitting algorithm. Each measured diagonal length of 6 points light source is determined by the target lens power. After finding the center position of each light point with threshold method, 3 axis-diagonal lengths were calculated. The long axis and short axis power of cylindrical lens can be calculated by using magnification ellipse fitting algorithm with the magnification relationships between the initial diagonal lengths and the measured diagonal lengths changed by lens power.