• Title/Summary/Keyword: copolymer thin films

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A photoswitch from conjugative aromatic polymers

  • Kwon, Tae-Chang;Kim, Yong-Jung;Kim, Yu-Na;Lee, Hyo-Jin;Rameshbabu Krishnamurthy;Sarwade Bhimrao D.;Kim, Eun-Kyoung
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.174-174
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    • 2006
  • By condensing two different functional monomers, highly fluorescent aromatic polymers were prepared to produce a conjugated- conjugated spacer-type copolymer or conjugated-non-conjugated spacer-type copolymer. As synthesized polymers were soluble in an organic solvent and showed significantly enhanced optical properties compared to its monomer. Variation in the monomer composition afforded polymers having multifunctionaility such as photochromic-fluorescent polymers. Transparent thin films of the polymer as a solid medium were prepared using spin coating method and fabricated as a photoswitch, which showed photo-induced conductivity switching properties depending on the core monomeric unit in the polymers.

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Preparation of 3,4-Ethylenedioxythiophene (EDOT) and N-4-butylphenyl-N,N-diphenylamine (BTPA) Copolymer Having Hole Transport Ability

  • Sim, Jae-Ho;Sato, Hisaya
    • Macromolecular Research
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    • v.17 no.9
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    • pp.714-717
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    • 2009
  • Hole transport copolymers consisting of 3,4-ethylenedioxythiophene (EDOT) and N-4-butylphenyl-N,N-diphenylamine (BTPA) were synthesized by oxidative coupling reaction using $FeCl_3$ as an oxidant. These copolymers showed good solubility and their thin films showed sufficient morphological stability. The copolymers showed an absorption maximum around 320 nm. Copolymers had an oxidation peak at approximately $1.03{\sim}1.14V$ versus the Ag/AgCl electrode. The hole mobility increased with increasing portion of the EDOT unit. The hole mobility of the copolymer containing 57% of the EDOT unit showed the highest mobility of $3{\times}10^{-5}cm^2/V{\cdot}s$.

Fabrication of Nanopatterns by Using Diblock Copolymer

  • KANG GIL BUM;KIM SEONa-IL;KIM YONG TAE;KIM YOUNG HHAN;PARK MIN CHUL;KIM SANG JIN;LEE CHANG WOO
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2005.09a
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    • pp.183-187
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    • 2005
  • Thin films of diblock copolymers may be suitable for semiconductor device applications since they enable patterning of ordered domains with dimensions below photolithographic resolution over wafer-scale area. We obtained nanometer-scale cylindrical structure of dibock copolymer of polystyrene-block-poly(methylmethacrylate), PS-b-PMMA, also demonstrate pattern transfer of the nanoporous polymer using both reactive ion etching. The size of fabricated naonoholes were about 10 nm. Fabricated nanopattern surface was observed by field emission scanning electron microscope (FESEM).

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Fabrication of Nanostructured Films of Block Copolymers for Nanolithographical Masks (나노리소그래피 마스크용 블록공중합체 나노구조 필름의 제조)

  • Park Dae-Ho;Sohn Byeong-Hyeok;Jung Jin Chul;Zin Wang-Cheol
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.2 s.35
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    • pp.181-186
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    • 2005
  • We fabricated thin films of polystyrene-block-poly(methyl methacrylate)(PS -b-PMMA) on the self-assembled monolayers(SAM) of 3-(p-methoxyphenyl)propyltrichlorosilane(MPTS) on silicon wafers. Cylindrical nanodomains of PMMA or PS were oriented perpendicular to the surface of silicon wafers due to the neutral affinity of the SAM to PS and PMMA blocks. By selective removal of the PMMA block with UV irradiation and washing, nanoporous films and nanorod assemblies were produced. The nanoporous film can be used for a nanolithographical mask.

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Au/Titania Composite Nanoparticle Arrays with Controlled Size and Spacing by Organic-Inorganic Nanohybridization in Thin Film Block Copolymer Templates

  • Li, Xue;Fu, Jun;Steinhart, Martin;Kim, Dong-Ha;Knoll, Wolfgang
    • Bulletin of the Korean Chemical Society
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    • v.28 no.6
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    • pp.1015-1020
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    • 2007
  • A simple approach to prepare arrays of Au/TiO2 composite nanoparticles by using Au-loaded block copolymers as templates combined with a sol-gel process is described. The organic-inorganic hybrid films with closely packed inorganic nanodomains in organic matrix are produced by spin coating the mixtures of polystyrene-block-poly(ethylene oxide) (PS-b-PEO)/HAuCl4 solution and sol-gel precursor solution. After removal of the organic matrix with deep UV irradiation, arrays of Au/TiO2 composite nanoparticles with different compositions or particle sizes can be easily produced. Different photoluminescence (PL) emission spectra from an organic-inorganic hybrid film and arrays of Au/TiO2 composite nanoparticles indicate that TiO2 and Au components exist as separate state in the initial hybrid film and form composite nanoparticles after the removal of the block copolymer matrix.

Synthesis of Porous $TiO_2$ Thin Films Using PVC-g-PSSA Graft Copolymer and Their Use in Dye-sensitized Solar Cells (PVC-g-PSSA 가지형 공중합체를 이용한 다공성 $TiO_2$ 박막의 합성 및 염료감응 태양전지 응용)

  • Byun, Su-Jin;Seo, Jin-Ah;Chi, Won-Seok;Shul, Yong-Gun;Kim, Jong-Hak
    • Membrane Journal
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    • v.21 no.2
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    • pp.193-200
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    • 2011
  • An amphiphilic graft copolymer comprising a poly(vinyl chloride) (PVC) backbone and poly (styrene sulfonic acid) (PSSA) side chains (PVC-g-PSSA) was synthesized via atom transfer radical polymerization (ATRP). Mesoporous titanium dioxide $(TiO_2)$ films with crystalline anatase phase were synthesized via a sol-gel process by templating PVC-g-PSSA graft copolymer. Titanium isopropoxide (TTIP), a $TiO_2$ precursor was selectively incorporated into the hydrophilic PSSA domains of the graft copolymer and grew to form mesoporous $TiO_2$ films, as confirmed by scanning electron microscopy (SEM) and X-ray diffraction (XRD) analysis. The performances of dye-sensitized solar cell (DSSC) were systematically investigated by varying spin coating times and the amounts of P25 nanoparticies. The energy conversion efficiency reached up to 2.7% at 100 mW/$cm^2$ upon using quasi-solid-state polymer electrolyte.

Morphological Transitions of Symmetric Polystyrene-block-Poly(1,4-butadiene) Copolymers in Thin Films upon Solvent-Annealing (용매 어닐링에 의한 박막에서 Polystyrene-Poly(1,4-butadiene) 블록공중합체의 모폴로지 전이)

  • Lee, Dong-Eun;Kim, Eung-Gun;Lee, Dong-Hyun
    • Polymer(Korea)
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    • v.36 no.4
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    • pp.542-548
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    • 2012
  • Morphological characteristics and formation of symmetric polystyrene-block-poly(1,4-butadiene) copolymer (PS-b-PBD) in thin films upon solvent-annealing were investigated by using atomic force microscopy (AFM). The thin films solvent-annealed in cyclohexane revealed the perforated lamellae of poly(1,4-butadiene) in the matrix of polystyrene while those solvent-annealed in n-hexane exhibited highly disordered patterns. Interestingly, when the thin films of PS-b-PBD were solvent-annealed with binary mixtures of cyclohexane and n-hexane, the morphological transition from the perforated lameallae to the perpendicularly-oriented lamellae of poly(1,4-butadiene) could be induced by changing the mixing ratio of both solvents. We also demonstrated that after microdomians of poly(1,4-butadiene) were successfully degraded by UV-$O_3$, linear poly(dimethyl siloxane) chains were back-filled into the etched regions of the thin film and then converted to silica nano-objects by oxygen plasma treatments.

Low Cost, Large Area Nanopatterning via Directed Self-Assembly

  • Kim, Sang-Uk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.24-25
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    • 2011
  • Molecular self-assembly has several advantages over other nanofabrication methods. Molecular building blocks ensure ultrafine pattern precision, parallel structure formation allows for mass production and a variety of three-dimensional structures are available for fabricating complex structures. Nevertheless, the molecular interaction for self-assembly generally relies on weak forces such as van der Waals force, hydrogen bonding, or hydrophobic interaction. Due to the weak interaction, the structure formation is usually slow and the degree of ordering is low in a self-assembled structure. To promote self-assembly, directed assembly methods employing prepatterned substrates or external fields have been developed and gathered a great deal of technological attention as a next generation nanofabrication process. In this presentation a variety of directed assembly methods for soft nanomaterials including block copolymers, peptides and carbon nanomaterials will be introduced. Block copolymers are representative self-assembling materials extensively utilized in nanofabrication. In contrast to colloid assembly or anodized metal oxides, various shapes of nanostructures, including lines or interconnected networks, can be generated with a precise tunability over their shape and size. Applying prepatterned substrates$^{1,2}$ or introducing thickness modulation$^3$ to block copolymer thin films allowed for the control over the orientational and positional orderings of self-assembled structures. The nanofabrication processes for metals, semiconductors$^4$, carbon nanotubes$^{5,6}$, and graphene$^{6,7}$ templating block copolymer self-assembly will be presented.

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