• Bulletin of the Society of Naval Architects of Korea
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• v.18 no.3
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• pp.11-27
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• 1981

This paper is prepared to solve the problem of two-dimensional sinusoidal motion of hydrofoil, which can be related not only to the prediction of unsteady forces acting on the marine propeller blade but to the study of aquatic animal's undulatory mode of propulsion. For convenience's shake, this manuscript can be devided into two parts. In the first part, the lift and moment coefficients have been calculated by the method of conformal transformation. In the other part, the thrust and the hydromechanical efficiency have been evaluated, using Lagally's technique having extended to the unsteady case, they also have been compared with the results, which had been obtained by Lighthill[6] and Wu[7] using Prandtl's acceleration potential.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.15.1-15.1
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• 2009

Nano transfer printing and micro contact printing is well known printing method based on soft lithography which uses conformal soft elastomer with designed surface relief structures. Here I introduce another class of novel 3D nanofabrication technique by using the same elastomer but in a different manner. The approach, which we refer to as proximity field nanopatterning, uses the surface-reliefed elastomers as phase masks to pattern thick layers of transparent, photosensitive materials. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science.

• Transactions on Electrical and Electronic Materials
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• v.4 no.5
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• pp.33-37
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• 2003

This study was performed to investigate the deposition mechanism of SiO$_2$ by ArF excimer laser(l93nm) CVD with Si$_2$H$\_$6/ and N$_2$O gas mixture and evaluate laser CVD quantitatively by modeling. With ArF excimer laser CVD, thin films can be deposited at low temperature(below 300$^{\circ}C$), with less damage and good uniformity owing to generation of conformal reaction species by singular wavelength of the laser beam. In this study, new model of SiO$_2$ deposition process by laser CVD was introduced and deposition rate was simulated by computer with the basis on this modeling. And simulation results were compared with experimental results measured at various conditions such as reaction gas ratio, chamber pressure, substrate temperature and laser beam intensity.

• Proceedings of the KSEEG Conference
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• 2000.04b
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• pp.308-310
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• 2000

Sampling rates become inconsistent when spatial data in spherical coordinate are re-sampled with respect latitudinal or longitudinal degree for mathematical processes such as Fourier Transfrom, and this results in the distrtions of the processed data in the wavenmber domain. This distortions are more evident in the polar regions. An example is presented to show such distortions during the recovery process of free-air gravity anomalies from ERSI radar atimeter data in Russian Arctic Barents Sea, and a method is present to minimize the distortion using Lambect Conformal Conic map projection.

• Tribology and Lubricants
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• v.16 no.3
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• pp.201-207
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• 2000

The numerical procedure to analyze a non-steady 3-dimensional elastohydrodynamic lubrication on the cyclically loaded contact has been newly developed. The procedure was applied on the cam-roller contact of the valve mechanism for the marine diesel engine. Both the pressure distribution and the film thickness between the cam and roller follower were calculated for each time step of the whole cycle. The pressure spike is shown at the outlet of the roller edge and it is getting higher as the external load is increased. The film thicknesses in the result of the non-steady analysis have a tendency to increase compared to those in the result of the analysis with the assumption of steady state. Therefore, the surface roughness of the non-steady contact need not be limited below that of the steady contact of the equivalent operating conditions.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.87-87
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• 2010

We report a new patterning technique of inorganic materials by using thin-film transfer printing (TFTP) with atomic layer deposition. This method consists of the atomic layer deposition (ALD) of inorganic thin film and a nanotransfer printing (nTP) that is based on a water-mediated transfer process. In the TFTP method, the Al2O3 ALD growth occurs on FTS-coated PDMS stamp without specific chemical species, such as hydroxyl group. The CF3-terminated alkylsiloxane monolayer, which is coated on PDMS stamp, provides a weak adhesion between the deposited Al2O3 and stamp, and promotes the easy and complete release of Al2O3 film from the stamp. And also, the water layer serves as an adhesion layer to provide good conformal contact and form strong covalent bonding between the Al2O3 layer and Si substrate. Thus, the TFTP technique is potentially useful for making nanochannels of various inorganic materials.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.264.2-264.2
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• 2013

Molecular layer deposition (MLD) is sequential, self-limiting surface reaction to form conformal and ultrathin polymer film. This technique generally uses bifunctional precursors for stepwise sequential surface reaction and entirely organic polymer films. Also, in comparison with solution-based technique, because MLD is vapor-phase deposition based on ALD, it allows epitaxial growth of molecular layer on substrate and is especially good for surface reaction or coating of nanostructure such as nanopore, nanochannel, nanwire array and so on. In this study, polyurea film that consisted of phenylenediisocyanate and phenylenediamine was formed by MLD technique. In situ Fourier Transform Infrared (FTIR) measurement on high surface area SiO2 substrate was used to monitor the growth of polyurethane and polyurea film. Also, to investigate orientation of chemical bonding formed polymer film, plan-polarized grazing angle FTIR spectroscopy was used and it showed epitaxial growth and uniform orientation of chemical bones of polyurea films.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.75.1-75.1
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• 2013

Atomic layer deposition (ALD) and molecular layer deposition (MLD) are based on sequential, self-limiting surface reactions that produce atomic layer controlled and conformal thin film growth. ALD can deposit inorganic films and MLD can deposit films containing organics. ALD and MLD can be used together to fabricate a wide range of hybrid organic-inorganic alloy films. The relative fraction of inorganic and organic constituents can be defined by controlling the ratio of the ALD and MLD reaction cycles used to grow the film. These hybrid films can be tuned to obtain desirable mechanical, electrical and optical properties. This talk will focus on the growth and properties of metal alkoxide films grown using metal precursors and various organic alcohols that are known as "metalcones". The talk will highlight the tunable mechanical properties of alucone alloys grown using Al2O3 ALD and alucone MLD and the tunable electrical conductivity of zincone alloys grown using ZnO ALD and zincone MLD with DEZ and hydroquinone as the reactants.

• Journal of the Korean Society of Surveying, Geodesy, Photogrammetry and Cartography
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• v.4 no.1
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• pp.37-42
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• 1986

This paper deals with comparison of simultaneous geodetic networks between with geographical coordinates and with plane coordinates. The adjustment computation is performed by variation of coordinates. Provisional values for observation equations are computed by extended Guass mid-latitude formula using, official coordinates ($\varphi,\lambda$) in geographical network abjustment, measurements are reduced to plane by origin scale factor (＝1.0000) Bessel ellipsoid and unit weight are adopted, and geographical coordinates are projected by Guass conformal double projection. The processing results of a test-network by distances yield the average root mean square error of position 6ㆍ2cm for adjustment with $\varphi,\lambda$ and 5.8cm for adjustment with X, Y. RMSE of discrepancy between two methods is 1.7cm. This result conform to required accracy.

• Korean Journal of Chemical Engineering
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• v.35 no.12
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• pp.2474-2479
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• 2018

Plasma-enhanced atomic layer deposition (PEALD) is well-known for fabricating conformal and uniform films with a well-controlled thickness at the atomic level over any type of supporting substrate. We prepared nickel oxide (NiO) thin films via PEALD using bis(ethylcyclopentadienyl)-nickel ($Ni(EtCp)_2$) and $O_2$ plasma. To optimize the PEALD process, the effects of parameters such as the precursor pulsing time, purging time, $O_2$ plasma exposure time, and power were examined. The optimal PEALD process has a wide deposition-temperature range of $100-325^{\circ}C$ and a growth rate of $0.037{\pm}0.002nm$ per cycle. The NiO films deposited on a silicon substrate with a high aspect ratio exhibited excellent conformality and high linearity with respect to the number of PEALD cycles, without nucleation delay.