• Title/Summary/Keyword: compound semiconductor

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A Design of Integrated Manufacturing System for Compound Semiconductor Fabrication (화합물 반도체 공장의 통합생산시스템 설계에 관한 연구)

  • 이승우;박지훈;이화기
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.26 no.3
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    • pp.67-73
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    • 2003
  • Manufacturing technologies of compound semiconductor are similar to the process of memory device, but management technology of manufacturing process for compound semiconductor is not enough developed. Semiconductor manufacturing environment also has been emerged as mass customization and open foundry service so integrated manufacturing system is needed. In this study we design the integrated manufacturing system for compound semiconductor fabrication t hat has monitoring of process, reduction of lead-time, obedience of due-dates and so on. This study presents integrated manufacturing system having database system that based on web and data acquisition system. And we will implement them in the actual compound semiconductor fabrication.

Data Acquisition System of Compound Semiconductor Fabrication (화합물반도체공장의 생산정보수집시스템)

  • Lee S.W.;Song J.Y.;Lee H.K.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.335-336
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    • 2006
  • Compound semiconductor manufacturing environment also has been emerged as mass customization and open foundry service so integrated manufacturing system is needed. In this study, we design data acquisition system of compound semiconductor fabrication that has monitoring and control of process. The developed DAS is consisted of key-in system inputted by operator and automatic acquisition system by GEM protocol. And we implemented them in the actual compound semiconductor. It is expected that using developed system would offer precise process information to buyer, reduce a lead-time, and obey a due-dates and so on.

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Calculation and measurement of optical coupling coefficient for bi-directional tancceiver module (양방향 송수신모듈 제작을 위한 광결합계수의 계산 및 측정)

  • Kim, J. D.;Choi, J. S.;Lee, S. H.;Cho, H. S.;Kim, J. S.;Kang, S. G.;Lee, H. T.;Hwang, N.;Joo, G. C.;Song, M. K.
    • Korean Journal of Optics and Photonics
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    • v.10 no.6
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    • pp.500-506
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    • 1999
  • We designed and fabricated a bidirectional optical transceiver module for low cost access network. An integrated chip forming a pin-PD on an 1.3 urn FP-LD was assembled by flip-chip bonding on a Si optical bench, a single mode fiber with an angled end facet was aligned passively with the integrated chip on V-groove of Si-optical bench. Gaussian beam theory was applied to evaluate the coupling coefficients as a function of some parameters such as alignment distance, angle of fiber end facet, vertical alignment error. The theory is also used to search the bottle-neck between transmittance and receiving coupling efficiency in the bi-directional optical system. Tn this paper, we confirmed that reduction of coupling efficiency by the vertical alignment error between laser beam and fiber core axis can be compensated by controlling the fiber facet angle. In the fabrication of sub-module, a'||'&'||' we made such that the fiber facet have a corn shape with an angled facet only core part, the reflection of transmitted laser beam from the fiber facet could be minimized below -35 dE in alignment distance of 2: 30 /J.m. In the same condition, transmitted output power of -12.1 dEm and responsivity of 0.2. AIW were obtained.

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Pseudomorphic AlGaAs/InGaAs/GaAs High Electron Mobility Transistors with Super Low Noise Performances of 0.41 dB at 18 GHz

  • Lee, Jin-Hee;Yoon, Hyung-Sup;Park, Byung-Sun;Park, Chul-Soon;Choi, Sang-Soo;Pyun, Kwang-Eui
    • ETRI Journal
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    • v.18 no.3
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    • pp.171-179
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    • 1996
  • Fully passivated low noise AlGaAs/InGaAs/GaAs pseudomorphic (PM) HEMT with wide head T-shaped gates were fabricated by dose split electron beam lithography (DSL). The dimensions of gate head and footprint were optimized by controlling the splitted pattern size, dose, and spaces of each pattern. We obtained stable T-shaped gate of $0.15{\mu}m$ gate length with $1.35{\mu}m-wide$ head. The maximum extrinsic transconductance was 560 mS/mm. The minimum noise figure measured at 18 GHz at $V_{ds}=2V andI_{ds}=17mA$ was 0.41 dB with associated gain of 8.19 dB. At 12 GHz, the minimum noise figure and an associated gain were 0.26 and 10.25 dB, respectively. These noise figures are the lowest values ever reported for GaAs-based HEMTs. These results are attributed to the extremely low gate resistance of wide head T-shaped gate having a ratio of the head to footprint dimensions larger than 9.

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Monolithic X-band Mixer (모노리식 X-band 혼합기)

  • Jun, Yong-Il;Park, Hyung-Moo;Ma, Dong-Sung
    • Proceedings of the KIEE Conference
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    • 1988.07a
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    • pp.426-429
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    • 1988
  • A simple design method of a single balanced MMIC mixer is described. It uses small signal S11 and capacitive load for the input matching circuit and the output loading circuit, respectively. It is found that the conversion gain of the FET mixer is independent of FET gate width. The fabricated mixer has 2.5 dB conversion gain at 9 GHz with 50 ohm IF load and 2 dBm local oscillator power.

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High-Voltage GaN Schottky Barrier Diode on Si Substrate Using Thermal Oxidation (열 산화공정을 이용하여 제작된 고전압 GaN 쇼트키 장벽 다이오드)

  • Ha, Min-Woo;Roh, Cheong-Hyun;Choi, Hong-Goo;Song, Hong-Joo;Lee, Jun-Ho;Kim, Young-Shil;Han, Min-Koo;Hahn, Cheol-Koo
    • Proceedings of the KIEE Conference
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    • 2011.07a
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    • pp.1418-1419
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    • 2011
  • 차세대 전력 반도체인 고전압 GaN 쇼트키 장벽 다이오드의 역방향 특성을 개선하기 위해서 열 산화공정이 제안되었다. AlGaN/GaN 에피탁시 위에 쇼트키 장벽 다이오드 구조가 제작되었으며, 쇼트키 컨택은 증착 후 $450^{\circ}C$에서 산화되었다. 열 산화공정이 메사 측벽의 AlGaN 및 GaN 표면에 $AlO_x$$GaO_x$를 형성하여 표면으로 흐르는 누설전류를 억제한다. 표면 및 GaN 버퍼를 통한 누설전류는 열 산화 공정 이후 100 ${\mu}m$-너비당 51.3 nA에서 24.9 pA로 1/2000 배 수준으로 감소하였다. 표면 산화물 형성으로 인하여 생성된 Ga-vacancy와 Al-vacancy는 acceptor로 동작하여 surface band bending을 증가시켜 쇼트키 장벽 높이를 증가시킨다. 애노드-캐소드 간격이 5 ${\mu}m$인 제작된 소자는 0.99 eV의 높은 쇼트키 장벽 높이를 획득하여, -100 V에서 0.002 A/$cm^2$의 낮은 누설전류를 확보하였다. 애노드-캐소드 간격이 5에서 10, 20, 50 ${\mu}m$로 증가되면 소자의 항복전압은 348 V에서 396, 606, 941 V로 증가되었다. 열 산화공정은 전력용 GaN 전자소자의 누설전류감소와 항복전압 증가를 위한 후처리 공정으로 적합하다.

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Photo-Induced Chemical Vapor Deposition of $SiO_2$ Thin Film by Direct Excitation Process (직접 광여기 Photo-CVD에 의한 이산화실리콘 박막의 증착 특성)

  • Kim, Youn-Tae;Kim, Chi-Hoon;Jung, Ki-Ro;Kang, Bong-Ku;Kim, Bo-Woo;Ma, Dong-Sung
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.26 no.7
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    • pp.73-82
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    • 1989
  • We developed a photo-CVD equipment for the deposition of silicon based insulating materials. Silicon dioxide thin films were deposited at various process conditions especially low temperature range $50-250^{\circ}C$. Low pressure mercury lamp was used in the direct excitation of $SiH_4/N_2O$ mixture gas without mercury sensitization. AES and ESCA analysis showed that oxygen to silicon atomic ratio and binding state of Si-O bond was nearly 2.0 and $SiO_2$ type, respectively. The refractive indices were measured to be 1.39-1.44, indicating that films were in relatively low density.

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Compound Learning Curve Model for Semiconductor Manufacturing (반도체에 적합한 복합 학습곡선 모형)

  • Ha, Chung-Hun
    • IE interfaces
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    • v.23 no.3
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    • pp.205-212
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    • 2010
  • The learning curve model is a mathematical form which represents the relationship between the manufacturing experience and its effectiveness. The semiconductor manufacturing is widely known as an appropriate example for the learning effect due to its complicated manufacturing processes. In this paper, I propose a new compound learning curve model for semiconductor products in which the general learning curve model and the growth curve are composed. The dependent variable and the effective independent variables of the model were abstracted from the existing learning curve models and selected according to multiple regression processes. The simulation results using the historical DRAM data show that the proposed compound learning curve model is one of adequate models for describing learning effect of semiconductor products.

A Study on the design of separation force measuring system for improvement of semiconductor productivity

  • Park, Kun-Jong
    • Journal of the Korea Society of Computer and Information
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    • v.22 no.10
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    • pp.1-7
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    • 2017
  • In this paper, the separation force measuring system is developed. The separation force aries due to adhesive strength between semiconductor epoxy molding compound(EMC) and the metal plate in semiconductor formed plate. In general, when removing the metal plate in semiconductor formed plate from semiconductor epoxy molding compound, excessive strength can result in a increase in semiconductor defect rates, or conversely, if too little force is exerted on the metal plate in semiconductor formed plate, the semiconductor production rates can decrease. In this study, the design criteria for the selection of the AC servo motor, the role of the ball screw, the relationship between the load cell and the ball screw, and the rate of deceleration are given. In addition, minimizing the reject rate of semiconductors and maximizing the semiconductor production rate are achieved through the standardization of the collected separation force data measured by the proposed system.