• Proceedings of the KIPE Conference
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• 2015.07a
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• pp.89-90
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• 2015

포항가속기 연구소에서 4세대 전자를 가속시키기 위하여 RF 공급원으로 사용하는 펄스 모듈레이터의 펄스전압 안정도는 50ppm 이하의 고전압이 요구된다. 200 MW 모듈레이터에 공급하기 위하여 개발된 고전압 CCPS사양은 50 kV, 120 kJ/sec, 2400mA, 20ppm이하이다. XFEL용 모듈레이터는 고정밀 고전압 CCPS를 적용하여 운전하였으며 모듈레이터 사양은 400kV, 500A, 8us, 60Hz, beam voltage stability 0.005(%)이다. 본 논문에서는 개발한 고정밀 고전압 CCPS를 사용하여 시험한 모듈레이터의 시험 결과에 대하여 발표하고자 한다.

• Journal of the Korea Society for Simulation
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• v.20 no.4
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• pp.115-125
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• 2011

Manufacturing companies usually manage the process to achieve high quality using various types of control chart in statistical process control. When an assignable cause occurs in a process, the data in the control chart changes with different patterns by the specific causes. It is important in process control to classify the CCP (Control Chart Pattern) recognition for fast decision making. In former research, gathered data from process used to apply as raw data, leads to degrade the performance of recognizer and to decrease the learning speed. Therefore, feature based recognizer, employing feature extraction method, has been studied to enhance the classification accuracy and to reduce the dimension of data. We propose the method to extract features that take the distances between CCP data and reference vector generated from BDK (Bi-Directional Kohonen Network). We utilize those features as the input vectors in ANN (Artificial Neural Network) and compare with raw data applied ANN to evaluate the performance.

• The Pure and Applied Mathematics
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• v.30 no.2
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• pp.155-167
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• 2023

In this paper, we use a vector-valued conditioning function to define a conditional Fourier-Feynman transform (CFFT) and a conditional convolution product (CCP) on the Wiener space. We establish the existences of the CFFT and the CCP for bounded functionals which form a Banach algebra. We then provide fundamental relationships between the CFFTs and the CCPs.

• Journal of the Korean Vacuum Society
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• v.18 no.4
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• pp.288-295
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• 2009

We report the etch characteristics of GaAs and AlGaAs in the diffusion pump-based capacitively coupled $BCl_3$ plasma. Process variables were chamber pressure ($50{\sim}180$ mTorr), CCP power ($50{\sim}200\;W$) and $BCl_3$ gas flow rate ($2.5{\sim}10$ sccm). Surface profilometry was used for etch rate and surface roughness measurement after etching. Scanning electron microscopy was used to analyze the etched sidewall and surface morphology. Optical emission spectroscopy was used in order to characterize the emission peaks of the $BCl_3$ plasma during etching. We have achieved $0.25{\mu}m$/min of GaAs etch rate with only 5 sccm $BCl_3$ flow rate when the chamber pressure was in the range of 50{\sim}130 mTorr. The etch rates of AlGaAs were a little lower than those of GaAs at the conditions. However, the etch rates of GaAs and AlGaAs decreased significantly when the chamber pressure increased to 180 mTorr. GaAs and AlGaAs were not etched with 50 W CCP power. With $100{\sim}200\;W$ CCP power, etch rates of the materials increased over $0.3{\mu}m$/min. It was found that the etch rates of GaAs and AlGaAs were not always proportional to the increase of CCP power. We also found the interesting result that AlGaAs did not etched at 2.5 sccm $BCl_3$ flow rate at 75 mTorr and 100 W CCP power even though it was etched fast like GaAs with more $BCl_3$ gas flow rates. By contrast, GaAs was etched at ${{\sim}}0.3{\mu}m$/min at the 2.5 sccm $BCl_3$ flow rate condition. A broad molecular peak was noticed in the range of $500{\sim}700\;mm$ wavelength during the $BCl_3$ plasma etching. SEM photos showed that 10 sccm $BCl_3$ plama produced more undercutting on GaAs sidewall than 5 sccm $BCl_3$ plasma.

• Journal of Information Technology Applications and Management
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• v.11 no.1
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• pp.175-187
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• 2004

Many companies have integrated their internal processes with the aid of information technology. Now the focus is on interconnecting trading partners. Collaborative commerce (also known as c-Commerce) has a key role. It is not just about making it easier for business to communicate. It is about by breaking down barriers along the entire length of the supply chain. Some c-Commerce links are permanent, others get established when and where they are needed. c-Commerce is helping business in electronic supply chains to improve product delivery while cutting costs, to strengthen relationships and to reduce lead time. In this paper, we propose the concept of collaborative commerce, and design and implement Collaborative Commerce Portal (CCP) system of small and medium enterprise for marketing support. The technical definition of CCP is set of all technical elements can do collaborative commerce between small and medium enterprises with Internet or Internet. The target information of CCP includes usual and unusual information and all other information of companies used as process events. Through this, it enhances efficiency of business processes, core information sharing and marketing activation.

• Bulletin of the Korean Mathematical Society
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• v.60 no.5
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• pp.1221-1235
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• 2023

In this paper, we use an infinite dimensional conditioning function to define a conditional Fourier-Feynman transform (CFFT) and a conditional convolution product (CCP) on the Wiener space. We establish the existences of the CFFT and the CCP for bounded functions which form a Banach algebra. We then provide fundamental relationships between the CFFTs and the CCPs.

• Korean Journal of Community Nutrition
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• v.14 no.6
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• pp.817-830
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• 2009

The purpose of this study was to analysis the sanitary management performance based on HACCP system for school foodservice. This study was carried out from September 2008 until December 2008 and is targeted towards schools' dietitians that work at schools with school foodservice. The regional distribution of this research is as follows; 377 schools in Seoul, 648 schools in Gyeonggido, 160 schools in Kangwondo, 438 schools in Choongchungdo equaling 1,623 schools in total. When school foodservices were put through sanitation management achievement level analysis applied by the HACCP system, results displayed that management of temperature (3.96 points), time (4.08 points), and cross-contamination (4.07 points) were all below the average achievement level. HACCP system's achievement level based on the TQM showed that areas for strategy development, leadership, information and analysis had low achievement levels. Achievement levels for CCP are quality check, delivery/distribution process, sterilization/cleansing of food's contact surface. As a result of multiple regression analysis of the factors that influenced sanitation management achievement level of school foodservice HACCP system; sanitary job standard showed 35.6% and CCP achievement levels showed 26.8% explanatory rate. In particular, Kangwondo's number of foodservice provided to per cook was small. Also, the better the processing management was assessed, the higher the sanitary job standard achievement level became resulting to a explanatory rate of 39.5%. Elementary schools showed a higher explanatory rate of 37.0% than middle and high schools. CCP achievement levels in middle and high schools with self-operated foodservice had a 28.0% variable explanatory rate, which was the highest. The better the drainage system, leadership and assessments turned out to be, the higher the CCP achievement levels became. In summary, to revitalize HACCP system that is based on the TQM, it is considered that proper database of HACCP system for school foodservice's sanitation management be constructed and more emphasis should be put on strategy development to improve customers' satisfactory level. In addition, improvements in achievement levels of time, temperature, and cross-contamination for sanitary job standard and CCP achievement level are essential.

• Journal of the Korean Society of Systems Engineering
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• v.10 no.2
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• pp.21-31
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• 2014

Recently, global market competition of iron and steel products is ever increasing due to over-supply from increased number of industries in rapidly growing countries, such as China, Brazil, and Indonesia. To occupy the big market, major industries are trying to develop high quality, high performance steel products via developing a new iron and steel making process. In other words, development of a new and innovative steel plant is a key to cope with the tough situation. Design and development for the life cycle of iron and steel making plant is very much complex and multi-disciplinary. In this paper, Plant Systems Engineering (PSE), a tailored SE process for industrial plant based on ISO/IEC 15288 is used for the design of Continuous Casting Process (CCP) Plant system. The CCP is a crucial process in steel making plant, whose design technology is occupied by the advanced foreign companies. For the sake of increasing engineering capability for the design of CCP, we applied PSE Process for the renovation of the existing CCP Process. Through the study, we were convinced that the applied method can be used for other plant systems, and SE is really the way of thinking, design, and development of modern complex and multi-disciplinary systems where high risk factors are present throughout the whole life cycle.

• Journal of Food Hygiene and Safety
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• v.18 no.4
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• pp.202-210
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• 2003

This study aims at making a HACCP(Hazard Analysis Critical Control Point)plan to be applied to soybean curd and verifing its effectiveness. First, we develped a general model of HACCP according to the guidelines of Codex (FAO/WHO). And we applied the model to 4 soybean curd workshops for 3 months. The HACCP model is composed of these procedures; HACCP team organization, production description, work flow chart, hazatd analysis, CCP (critical control point) decision, CL (critical limit) establishment, monitoring method decision, correction, verification and documentation. CCP were selection procedure and refrigeration procedure in non-wrapped soybean curd. CCP were selection procedure, heat-sterilizing and refrigeration in wrapped soybean curd. The result of bacterial experiment after apling the model for 3 months, the bacterial numbers of soybean curd box, wrapper, and soybean curd production were lower after appling than before appling, the model. We could verify that the appications of the HACCP model were effective to the soybean curd workshops.

• KIEE International Transactions on Electrophysics and Applications
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• v.4C no.5
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• pp.220-229
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• 2004

We have examined a technique of one-dimensional (1D) fluid modeling for radio-frequency Ar capacitively coupled plasmas (CCP) between unequal-sized powered and grounded electrodes. In order to simulate a practical CCP reactor configuration with a grounded side wall by the 1D model, it has been assumed that the discharge space has a conic frustum shape; the grounded electrode is larger than the powered one and the discharge space expands with the distance from the powered electrode. In this paper, we focus on how much a 1D model can approximate a 2D model and evaluate their comparisons. The plasma density calculated by the 1D model has been compared with that by a two-dimensional (2D) fluid model, and a qualitative agreement between them has been obtained. In addition, 1D and 2D calculation results for another reactor configuration with equal-sized electrodes have also been presented together for comparison. In the discussion, four CCP models, which are 1D and 2D models with symmetric and asymmetric geometries, are compared with each other and the DC self-bias voltage has been focused on as a characteristic property that reflects the unequal electrode surface areas. Reactor configuration and experimental parameters, which the self-bias depends on, have been investigated to develop the ID modeling for reactor geometry with unequal-sized electrodes.