• Title/Summary/Keyword: bipolar transistor

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Effects of Fast Neutron Irradiation on Switching of Silicon Bipolar Junction Transistor

  • Sung Ho Ahn;Gwang Min Sun
    • Journal of Radiation Protection and Research
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    • v.48 no.3
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    • pp.124-130
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    • 2023
  • Background: When bipolar junction transistors (BJTs) are used as switches, their switching characteristics can be deteriorated because the recombination time of the minority carriers is long during turn-off transient. When BJTs operate as low frequency switches, the power dissipation in the on-state is large. However, when BJTs operate as high frequency switches, the power dissipation during switching transients increases rapidly. Materials and Methods: When silicon (Si) BJTs are irradiated by fast neutrons, defects occur in the Si bulk, shortening the lifetime of the minority carriers. Fast neutron irradiation mainly creates displacement damage in the Si bulk rather than a total ionization dose effect. Defects caused by fast neutron irradiation shorten the lifetime of minority carriers of BJTs. Furthermore, these defects change the switching characteristics of BJTs. Results and Discussion: In this study, experimental results on the switching characteristics of a pnp Si BJT before and after fast neutron irradiation are presented. The results show that the switching characteristics are improved by fast neutron irradiation, but power dissipation in the on-state is large when the fast neutrons are irradiated excessively. Conclusion: The switching characteristics of a pnp Si BJT were improved by fast neutron irradiation.

A Study on the Improvement of Forward Blocking Characteristics in the Static Induction Transistor (Static Induction Transistor의 순방향 블로킹 특성 개선에 관한 연구)

  • Kim, Je-Yoon;Jung, Min-Chul;Yoon, Jee-Young;Kim, Sang-Sik;Sung, Man-Young;Kang, Ey-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.292-295
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    • 2004
  • The SIT was introduced by Nishizawa. in 1972. When compared with high-voltage, power bipolar junction transistors, SITs have several advantages as power switching devices. They have a higher input impedance than do bipolar transistors and a negative temperature coefficient for the drain current that prevents thermal runaway, thus allowing the coupling of many devices in parallel to increase the current handling capability. Furthermore, the SIT is majority carrier device with a higher inherent switching speed because of the absence of minority carrier recombination, which limits the speed of bipolar transistors. This also eliminates the stringent lifetime control requirements that are essential during the fabrication of high-speed bipolar transistors. This results in a much larger safe operating area(SOA) in comparison to bipolar transistors. In this paper, vertical SIT structures are proposed to improve their electrical characteristics including the blocking voltage. Besides, the two dimensional numerical simulations were carried out using ISE-TCAD to verify the validity of the device and examine the electrical characteristics. A trench gate region oxide power SIT device is proposed to improve forward blocking characteristics. The proposed devices have superior electrical characteristics when compared to conventional device. Consequently, the fabrication of trench oxide power SIT with superior stability and electrical characteristics is simplified.

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Design and Numerical Analyses of SOI Trench-MOS Bipolar-Mode Field Effect Transistor (SOI 트렌치-모스 바이폴라-모드 전계효과 트랜지스터 구조의 설계 및 수치해석)

  • Kim, Du-Yeong;O, Jae-Geun;Han, Min-Gu;Choe, Yeon-Ik
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.5
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    • pp.270-277
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    • 2000
  • A new Lateral Trench-MOS Bipolar-Mode Field-Effect Transistor(LTMBMFET) is proposed and verified by MEDICI simulation. By using a trench MOS structure, the proposed device can enhance the current gain without sacrificing other device characteristics such as the breakdown voltage. The channel region of the proposed device is formed between the trench MOS structure. So the effect of the substrate voltage is negligible when compared with the conventional device which has a channel region between the gate junction and the buried oxide layer.

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Study on Thermal Characteristics of IGBT (IGBT의 열 특성에 관한 연구)

  • Kang, Ey-Goo;Ahn, Byoung-Sub;Nam, Tae-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.70-70
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    • 2009
  • In this paper, we proposed 2500V Non punch-through(NPT) Insulated gate bipolar transistor(IGBT) for high voltage industry application. we carried out optimal simulation for high efficiency of 2500V NPT IGBT according to size of device. In results, we obtaind design parameter with 375um n-drift thickness, 15um gate length, and 8um emitter windows. After we simulate with optimal parameter, we obtained 2840V breakdown voltage and 3.4V Vce,sat. These design and process parameter will be used designing of more 2000V NPT IGBT devices.

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Device Characteristic and Voltage-Type Inverter Simulation by Power IGBT Micro Modeling (전력용 IGBT의 미시적인 모델링에 의한 소자특성 및 전압형 인버터 시뮬레이션)

  • 서영수;백동현;조문택;이상훈;허종명
    • Proceedings of the KIPE Conference
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    • 1996.06a
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    • pp.63-66
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    • 1996
  • An micro model for the power insulated Gate Bipolar Transistor(IGBT) is developed. The model consistently described the IGBT steady-state current-voltage characteristics and switching transient current and voltage waveform for all loading conditions. The model is based on the equivalent circuit of a MOSFET with supplies the base current to a low-gain, high-level injection, bipolar transistor with its base virtual contact at the collector and of the base. Model results are compared with measured turn-on and turn-off waveform for different drive, load, and feedback circuits.

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A Low Close-in Phase Noise 2.4 GHz RF Hybrid Oscillator using a Frequency Multiplier

  • Moon, Hyunwon
    • Journal of Korea Society of Industrial Information Systems
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    • v.20 no.1
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    • pp.49-55
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    • 2015
  • This paper proposes a 2.4 GHz RF oscillator with a very low close-in phase noise performance. This is composed of a low frequency crystal oscillator and three frequency multipliers such as two doubler (X2) and one tripler (X3). The proposed oscillator is implemented as a hybrid type circuit design using a discrete silicon bipolar transistor. The measurement results of the proposed oscillator structure show -115 dBc/Hz close-in phase noise at 10 kHz offset frequency, while only dissipating 5 mW from a 1-V supply. Its close-in phase noise level is very close to that of a low frequency crystal oscillator with little degradation of noise performance. The proposed structure which is consisted of a low frequency crystal oscillator and a frequency multiplier provides new method to implement a low power low close-in phase noise RF local oscillator.

Electrical Characteristics of IGBT for Gate Bias under ${\gamma}$ Irradiation (게이트바이어스에서 감마방사선의 IGBT 전기적특성)

  • Lho, Young-Hwan;Lee, Sang-Yong;Kim, Jong-Dae
    • Proceedings of the KIEE Conference
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    • 2008.10b
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    • pp.165-168
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    • 2008
  • The experimental results of exposing IGBT (Insulated Gate Bipolar Transistor) samples to gamma radiation source show shifting of threshold voltages in the MOSFET and degradation of carrier mobility and current gains. At low total dose rate, the shift of threshold voltage is the major contribution of current increases, but for more than some total dose, the current is increased because of the current gain degradation occurred in the vertical PNP at the output of the IGBTs. In the paper, the collector current characteristics as a function of gate emitter voltage (VGE) curves are tested and analyzed with the model considering the radiation damage on the devices for gate bias and different dose. In addition, the model parameters between simulations and experiments are found and studied.

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The design of on-board inverter using IGBT (IGBT를 이용한 탑재형 인버터 설계)

  • Kim, In-Soo;Kim, Seong-Shin;Lee, Kyung-Seok;Hwang, Yong-Ha
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.1126-1128
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    • 1992
  • The object of this study is the design of 3 phase on-board inverter. The key point in the inverter design is the selection of switching device, and its performance effects that of total system. In this study, six-step square wave inverter was designed using IGBT ( Insulated Gate Bipolar Transistor ) which has the advantages of MOSFET and bipolar transistor as switching device. The condition of being small and light which is the one of requirements for on-board equipment was accomplished by using IGBT module and optimising the snubber circuit, and the reliablity was increased. It is confirmed that the designed inverter satisfies the required performance through the performance and environment test.

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A New SOl LIGBT Structure with Improved Latch-Up Performance

  • Sung, Woong-Je;Lee, Yong-11;Park, Woo-Beom;Sung, Man-Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.283-285
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    • 2001
  • In this paper, a new lateral insulated gate bipolar transistor (LIGBT) is proposed to improve the latch-up performance without current path underneath the n+ cathode region. The improvement of latch-up performance is verified using the two-dimensional simulator MEDICI and the simulation results on the latch-up current density are 3.12${\times}$10$\^$-4/ A/$\mu\textrm{m}$ for the proposed LIGBT and 0.94${\times}$10$\^$-4/ A/$\mu\textrm{m}$ for the conventional LIGBT. The proposed SOI LIGBT exhibits 3 times larger latch-up capability than the conventional SOI LIGBT.

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Analysis of excess minority carrier and charge wish lifetimes in N-dirft region of NPT-IGBT (수명시간에 따른 NPT-IGBT의 N-drift 영역에서의 과잉소수 캐리어와 전하량 분석)

  • 류세환;이용국;안형근;한득영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.844-847
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    • 2001
  • In this work, transient characteristics of the Non-Punch Through(NPT) Insulated Gate Bipolar Transistor(IGBT) has been studied. we has analyzed with lifetimes excess minority carrier injected into N-dirft, base region of IGBT's BJT part and accumulated charge of on-state which affected swiching characteristic. In this paper, excess minority carrier and charge distribution in active base region is expressed analytically. This analysis proposed optical trade-off between lifetimes and accumulated charge for decreasing switching losses because charge result in switching loss when device was tuned off.

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