• 제목/요약/키워드: beam pattern

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Beam Tilt를 위한 변형된 전송선로형 안테나 (Modified Transmission Line Type Antennal for the Beam Tilt)

  • 이종철
    • 한국전자파학회논문지
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    • 제9권2호
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    • pp.141-148
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    • 1998
  • 빔 성형 안테나를 개발하기 위해서 변형된 전송선로형 안테나(MTLA)의 둘레 및 수평, 수직 소자 길이를 가변한다. 빔 틸트 특성의 검증을 위해 각각의 변형된 형상을 갖는 MTLA에 대한 수직면 방사패턴을 모먼트법으로 해석한다. 해석 결과로부터 구현될 수 있는 최대 빔 틸트는 주로 수직 소자길이에따라 결정된다는 사실올 확 인하였다. 최대 빔 틸트를 갖는 안테나를 셜게하고 입력 임피던스 및 방사 특성을 이론적으로 계산하고 실험에 의하여 확인하였다.

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Design Study for Pulsed Proton Beam Generation

  • Kim, Han-Sung;Kwon, Hyeok-Jung;Seol, Kyung-Tae;Cho, Yong-Sub
    • Nuclear Engineering and Technology
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    • 제48권1호
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    • pp.189-199
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    • 2016
  • Fast neutrons with a broad energy spectrum, with which it is possible to evaluate nuclear data for various research fields such as medical applications and the development of fusion reactors, can be generated by irradiating proton beams on target materials such as beryllium. To generate short-pulse proton beam, we adopted a deflector and slit system. In a simple deflector with slit system, most of the proton beam is blocked by the slit, especially when the beam pulse width is short. Therefore, the available beam current is very low, which results in low neutron flux. In this study, we proposed beam modulation using a buncher cavity to increase the available beam current. The ideal field pattern for the buncher cavity is sawtooth. To make the field pattern similar to a sawtooth waveform, a multiharmonic buncher was adopted. The design process for the multiharmonic buncher includes a beam dynamics calculation and three-dimensional electromagnetic simulation. In addition to the system design for pulsed proton generation, a test bench with a microwave ion source is under preparation to test the performance of the system. The design study results concerning the pulsed proton beam generation and the test bench preparation with some preliminary test results are presented in this paper.

Changes of SDS-PAGE Pattern of Pork Myofibrillar Proteins Induced by Electron Beam Irradiation

  • Whang Key;Jeong, Dong-Kwan;Kim, Hyuk-Il
    • Preventive Nutrition and Food Science
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    • 제10권4호
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    • pp.378-381
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    • 2005
  • Actin and myosin solutions and fresh ground pork were irradiated with the electron beam (e-beam) at a dose of 0, 1.5, 3.0, 5.0 and 10 kGy. The changes in SDS-PAGE pattern of 2 proteins and the salt-soluble proteins extracted from ground pork after e-beam irradiation were monitored. When the myosin solution was irradiated with e-beam, myosin was degraded completely. Complete myosin degradations were observed even with the lowest dose (1.5 kGy) of e-beam treatment. Actin was degraded with the irradiation, but to a less extent than myosin was. The degradation of actin increased as the e-beam treatment increased from 1.5 to 10.0 kGy. Among the salt-soluble proteins extracted from ground pork, myosin was degraded gradually when the e-beam dose increased from 1.5 up to 10.0 kGy. Similar gradual increase in the degradation of actin also occurred with the increase of irradiation. Increases of 2 low molecular weight compounds (<29 kDa) were observed when the irradiation dose increased from 1.5 to 10.0 kGy. These 2 molecules are thought to be the breakdown products produced from the degradation of major salt-soluble proteins, myosin and actin. The salt-soluble protein content of ground pork did not change with the e-beam irradiation.

50nm급 패턴 니켈 스탬퍼 제작에 관한 연구 (A Study on the Fabrication of Ni Stamper for 50nm Class of Patterns)

  • 유영은;오승훈;이관희;김선경;윤재성;최두선
    • 한국금형공학회:학술대회논문집
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    • 한국금형공학회 2008년도 하계 학술대회
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    • pp.35-38
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    • 2008
  • A pattern master and a Ni stamper for 50nm class of patterns are fabricated through e-beam lithography and Ni electroforming process. A model pattern set is designed, which is based on unit patterns of 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The e-beam process is optimized to fabricate designed patterns with some parameters including dose, accelerating voltage, focal distance and developing time. For Ni electroforming to fabricate Ni stamper, a seed layer, a conducting layer, is deposited first on the pattern master fabricated by an e-beam lithography process. Ni, Ti/Ni and Cr are first tested to find optimal seed layer process. Currently the best result is obtained when adopting Cr deposited to be 100nm thick with continuous tilting motion of the master substrate during the deposition process.

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초음파 감쇠계수 주정에 있어서 빔 형태의 보정에 관한 연구 (A Study on the Correction of Beam Pattern for the Ultrasonic Attenuation Coefficient Estimation)

  • 김기욱;최흥호;홍승홍
    • 대한의용생체공학회:의공학회지
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    • 제8권1호
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    • pp.41-48
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    • 1987
  • In estimating the freguency-dependent attenuation coefficient, we analyzed the range-dependent ultrasonic beam and proposed the method of calculating the experimental equation of beam pattern in order to reduce the error on the influence of beam pattern. These experimental equations are divided into the spectral centroid and the spec ural standard deviation slope according to axial propagation length. These are repnesented by the first-order equation in the near field of the beam and the second- order eqLlatlon In the far field. In order to prove the validity of this method, the attenuation coefficients of the non-corrected ease and the corrected case are compared. Using the reflected signal from acryle plate, the attenuation coefficients were estimated by the spectral shift method ann the spectral difference method. The result shows attenuation coeffi talents after correction are better than attenuation coefficients before correction. And this method can be applied In vivo measurement.

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레이저 구조광을 이용한 로봇 목표 추적 방법 (Robot Target Tracking Method using a Structured Laser Beam)

  • 김종형;고경철
    • 제어로봇시스템학회논문지
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    • 제19권12호
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    • pp.1067-1071
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    • 2013
  • A 3D visual sensing method using a laser structured beam is presented for robotic tracking applications in a simple and reliable manner. A cylindrical shaped laser structured beam is proposed to measure the pose and position of the target surface. When the proposed laser beam intersects on the surface along the target trajectory, an elliptic pattern is generated. Its ellipse parameters can be induced mathematically by the geometrical relationship of the sensor coordinate and target coordinate. The depth and orientation of the target surface are directly determined by the ellipse parameters. In particular, two discontinuous points on the ellipse pattern, induced by seam trajectory, indicate mathematically the 3D direction for robotic tracking. To investigate the performance of this method, experiments with a 6 axis robot system are conducted on two different types of seam trajectories. The results show that this method is very suitable for robot seam tracking applications due to its excellence in accuracy and efficiency.

곡면 배열 소나의 빔 균일화를 위한 빔 패턴 분석 (Beam pattern analysis for beam homogenization of conformal array sonar)

  • 최정웅;홍우영;임준석;이근화
    • 한국음향학회지
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    • 제41권6호
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    • pp.637-646
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    • 2022
  • 임의의 곡면 배열에서 단위 빔 형성에 사용되는 부배열은 조향 방위마다 기하학적 형상이 다르다. 이 때문에 조향 방위 별 부배열의 빔 패턴은 항상 균일하지 않다. 본 논문에서는 볼록 최적화를 이용한 빔 형성 기법을 곡면 배열에 적용하고, 조향 방위별 빔 성능의 균일성이 향상되는 것을 보였다. 시뮬레이션은 절단 구면 형상의 곡면 배열에 대해 수행되었다. 고각 3 dB 빔 폭의 표준 편차가 크게 감소하였으나 반대급부로 지향 지수도 감소하는 것을 관찰했다. 이를 완화시키기 위한 하나의 방법으로 쉐이딩 함수를 이용한 최적화 기법을 제안한다.

단결정 다이아몬드공구 제작 기술을 통한 초정밀 미세패턴 가공 연구 (Research on ultra-precision fine-pattern machining through single crystal diamond tool fabrication technology)

  • 정성택;송기형;최영재;백승엽
    • Design & Manufacturing
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    • 제14권3호
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    • pp.63-70
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    • 2020
  • As the consumer market in the VR(virtual reality) and the head-up display industry grows, the demand for 5-axis machines and grooving machines using on a ultra-precision machining increasing. In this paper, ultra-precision diamond tools satisfying the cutting edge width of 500 nm were developed through the process research of a focused ion beam. The material used in the experiment was a single-crystal diamond tool (SCD), and the equipment for machining the SCD used a focused ion beam. In order to reduce the influence of the Gaussian beam emitted from the focused ion beam, the lift-off process technology used in the semiconductor process was used. 2.9 ㎛ of Pt was coated on the surface of the diamond tool. The sub-micron tool with a cutting edge of 492.19 nm was manufactured through focused ion beam machining technology. Toshiba ULG-100C(H3) equipment was used to process fine-pattern using the manufactured ultra-precision diamond tool. The ultra-precision machining experiment was conducted according to the machining direction, and fine burrs were generated in the pattern in the forward direction. However, no burr occurred during reverse machining. The width of the processed pattern was 480 nm and the price of the pitch was confirmed to be 1 ㎛ As a result of machining.

3차원 레이저 스캐너용 ND 필터의 시뮬레이션 (Simulation of ND Filter for Terrestrial Laser Scanner)

  • 양수효;오동근;정중연
    • 한국측량학회:학술대회논문집
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    • 한국측량학회 2009년도 춘계학술발표회 논문집
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    • pp.65-73
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    • 2009
  • The terrestrial laser scanner measures the signal delay time of electronic circuit in EDM(Electronic Distance Measurement) Module for distance measurement. To measure signal delay time precisely, transmitting laser beam of terrestrial laser scanner is divided optically. Therefore, 10% of the laser beam power is entered into the electronic circuit and the others go out through lens. But, measure of delay time is severe in the laser scanner system that the laser beam power is changed dynamically by reflectance of a object, because characters like gain of electronic circuit involving APD(Avalanche Photo Diode) and so on are changed by incident laser beam. Therefore, we adapt ND(Neutral Density) filter that has grid pattern to the laser scanner system to keep constant the incident laser beam power. In this paper, we propose the simulation program for efficient design of ND filter pattern. Finally, to affirm simulation program, we conduct the experimental test of simulated ND filter that has linearly transmittance change, and we consider the experiment result.

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ZEP520 포토리지스트를 이용한 나노 패턴 형성을 위한 전자빔 리소그래피 공정 모델링 및 시뮬레이션 (Modeling and Simulation of Electron-beam Lithography Process for Nano-pattern Designs using ZEP520 Photoresist)

  • 손명식
    • 반도체디스플레이기술학회지
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    • 제6권3호
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    • pp.25-33
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    • 2007
  • A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

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