• Title/Summary/Keyword: band gap engineering

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Studies on structural, optical, thermal and low energy shielding for gamma rays for the ZSBP glasses

  • Abeer S. Altowyan;M.I. Sayyed;Ashok Kumar
    • Nuclear Engineering and Technology
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    • v.56 no.9
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    • pp.3796-3803
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    • 2024
  • By employing the melt-quenching technique, the ZnO-SrO-B2O3-PbO (ZSBP) glasses have been successfully fabricated. The derivative of Absorption Spectra Fitting (DASF) method was used to study the energy band gap (Eg) of the glasses which decreases from 3.57 eV to 3.39 eV. The structural properties have been studied using the Raman spectroscopy. The glass transition temperature (Tg) decreases with increase in concentration of the lead oxide. The current study examines the radiation shielding properties at 30.80-444 keV. The addition of PbO to the glasses resulted in a proportionate increase in the mass attenuation coefficient (MAC), suggesting a diminishing tendency in radiation transmission. At 30.80 keV, the MAC values are extremely high and range from 18.06 to 21.11 cm2/g. As density rises, the half value layer (HVL) decreases. In addition, the average HVL (${\overline{HVL}}$) decreases. The glass thickness required to reduce the radiation intensity to 90 %, 50 %, 25 %, and 10 % of its initial value is investigated at an energy of 35.80 keV. The T90 %, T50 %, T25 %, and T10 % values are 0.0020, 0.0132, 0.0264, and 0.0439 cm, respectively. The results suggest that a greater thickness of the radiation barrier is necessary to attain the necessary degree of attenuation.

A 1.8 V 40-MS/sec 10-bit 0.18-㎛ CMOS Pipelined ADC using a Bootstrapped Switch with Constant Resistance

  • Eo, Ji-Hun;Kim, Sang-Hun;Kim, Mun-Gyu;Jang, Young-Chan
    • Journal of information and communication convergence engineering
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    • v.10 no.1
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    • pp.85-90
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    • 2012
  • A 40-MS/sec 10-bit pipelined analog to digital converter (ADC) with a 1.2 Vpp differential input signal is proposed. The implemented pipelined ADC consists of eight stages of 1.5 bit/stage, one stage of 2 bit/stage, a digital error correction block, band-gap reference circuit & reference driver, and clock generator. The 1.5 bit/stage consists of a sub-ADC, digital to analog (DAC), and gain stage, and the 2.0 bit/stage consists of only a 2-bit sub-ADC. A bootstrapped switch with a constant resistance is proposed to improve the linearity of the input switch. It reduces the maximum VGS variation of the conventional bootstrapped switch by 67%. The proposed bootstrapped switch is used in the first 1.5 bit/stage instead of a sample-hold amplifier (SHA). This results in the reduction of the hardware and power consumption. It also increases the input bandwidth and dynamic performance. A reference voltage for the ADC is driven by using an on-chip reference driver without an external reference. A digital error correction with a redundancy is also used to compensate for analog noise such as an input offset voltage of a comparator and a gain error of a gain stage. The proposed pipelined ADC is implemented by using a 0.18-${\mu}m$ 1- poly 5-metal CMOS process with a 1.8 V supply. The total area including a power decoupling capacitor and the power consumption are 0.95 $mm^2$ and 51.5 mW, respectively. The signal-to-noise and distortion ratio (SNDR) is 56.15 dB at the Nyquist frequency, resulting in an effective number of bits (ENOB) of 9.03 bits.

Influence of Au Interlayer Thickness on the Opto-Electrical Properties of ZnO Thin Films (Au 층간박막 두께에 따른 ZnO 박막의 전기광학적 특성 변화)

  • Park, Yun-Je;Choe, Su-Hyeon;Kim, Yu-Sung;Cha, Byung-Chul;Gong, Young-Min;Kim, Daeil
    • Journal of the Korean institute of surface engineering
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    • v.53 no.3
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    • pp.104-108
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    • 2020
  • ZnO single layer films (100 nm thick) and Au intermediated ZnO films (ZnO/Au/ZnO; ZAZ) were deposited on the glass substrate by RF and DC magnetron sputtering at room temperature and then the influence of the Au interlayer on the electrical and optical properties of the films were investigated. ZnO thin films show the visible transmittance of 90.3 % and sheet resistance of 63.2×108 Ω/□. In ZAZ films, as Au interlayer thickness increased from 6 to 10 nm, the sheet resistance decreased from 58.3×108 to 48.6 Ω/□, and the visible transmittance decreased from 84.2 to 73.9 %. From the observed results, it can be concluded that the intermediate Au thin film enhances the opto-electrical performance of ZnO films without intentional substrate heating.

Application of CBD Zinc Sulfide (ZnS) Film to Low Cost Antireflection Coating on Large Area Industrial Silicon Solar Cell

  • U. Gangopadhyay;Kim, Kyung-Hea;S.K. Dhungel;D. Mangalaraj;Park, J.H.;J. Yi
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.1
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    • pp.1-6
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    • 2004
  • Zinc sulfide is a semiconductor with wide band gap and high refractive index and hence promising material to be used as ARC on commercial silicon solar cells. Uniform deposition of zinc sulfide (ZnS) by using chemical bath deposition (CBD) method over a large area of silicon surface is an emerging field of research because ZnS film can be used as a low cost antireflection coating (ARC). The main problem of the CBD bath process is the huge amount of precipitation that occurs during heterogeneous reaction leading to hamper the rate of deposition as well as uniformity and chemical stoichiometry of deposited film. Molar concentration of thiorea plays an important role in varying the percentage of reflectance and refractive index of as-deposited CBD ZnS film. Desirable rate of film deposition (19.6 ${\AA}$ / min), film uniformity (Std. dev. < 1.8), high value of refractive index (2.35), low reflectance (0.655) have been achieved with proper optimization of ZnS bath. Decrease in refractive index of CBD ZnS film due to high temperature treatment in air ambiance has been pointed out in this paper. Solar cells of conversion efficiency 13.8 % have been successfully achieved with a large area (103 mm ${\times}$ 103 mm) mono-crystalline silicon wafers by using CBD ZnS antireflection coating in this modified approach.

Preparation of p-type transparent conducting $CuGaO_2$ thin film by DC/RF sputtering (DC-RF 스퍼터링에 의한 p형 투명 전도성 $CuGaO_2$ 박막의 제조)

  • Park, Hyun-Jun;Kwak, Chang-Gon;Kim, Sei-Ki;Ji, Mi-Jung;Lee, Mi-Jae;Choi, Byung-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.48-48
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    • 2007
  • P-type transparent conducting $CuGaO_2$ thin films have been prepared by DC/RF sputtering using Quartz(0001) and sapphire(0001) substrates. The target was fabricated by heating a stoichiometric mixture of CuO and $Ga_2O_3$ at 1373K for 12h under $N_2$ atmosphere. The film were deposited under mixture gas of Ar and $O_2(Ar:O_2=4:1)$ during 10~30min. and the as-deposited films were annealed at 1123K and $N_2$ atmosphere. Room temperature conductivity and the activation energy of the sintered body in the temperature range of 223K ~ 423K were 0 004S/cm, 1.9eV, respectively. XRD revealed that all of the as-deposited films were amorphous. Heating of the films deposited on Quartz substrates above 1123K resulted in crystallization with a second phase of $CuSiO_3$, which was assumed owing to reaction with Quartz substrate. The single phase of $CuGaO_2$ was obtained at the film deposited on the sapphire substrates. The transmittance after annealing of DC- and RF-sputtered films were 55~75% at 550nm. From the transmittance and reflectance measurement. the direct band gap of the DC/RF-sputtered films were 3.63eV and 3.57eV. and there was little difference between DC and RF sputtered films.

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Photo-catalytic Activity of CNT-TiO2 Nano Complex Prepared from Titanium Oxysulfate and Carbon Nanotube by Hydrosis (황산티타늄과 탄소나노튜브로부터 가수분해로 제조된 CNT-TiO2 나노복합체의 광촉매활성)

  • Kim, Sang Jin;Jung, Min-Jung;Lee, Young-Seak
    • Applied Chemistry for Engineering
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    • v.21 no.1
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    • pp.58-62
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    • 2010
  • CNT-$TiO_{2}$ nano complexes were prepared from $TiOSO_4$ and multi-walled carbon nanotube (MWCNT) by hydrolysis. The CNTs were dispersed uniformly with anatase $TiO_{2}$ in the prepared $TiO_{2}$-CNT complexes. The increasing MWCNT ratio leads to increased crystalline carbon and O/Ti ratio. The decomposition degree of methylene blue was experienced according to UV radiation time for study adsorption and photocatalytic activity. The samples having high MWCNT ratio show high adsorption and photodegradation. The high specific surface area, functional group having oxygen, low band gap energy, high electric conductivity, high volume to surface ratio, uniform structure and properties of MWCNT assist photocatalytic activity of CNT-$TiO_{2}$ complex.

Contact Resistance and Leakage Current of GaN Devices with Annealed Ti/Al/Mo/Au Ohmic Contacts

  • Ha, Min-Woo;Choi, Kangmin;Jo, Yoo Jin;Jin, Hyun Soo;Park, Tae Joo
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.2
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    • pp.179-184
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    • 2016
  • In recent years, the on-resistance, power loss and cell density of Si power devices have not exhibited significant improvements, and performance is approaching the material limits. GaN is considered an attractive material for future high-power applications because of the wide band-gap, large breakdown field, high electron mobility, high switching speed and low on-resistance. Here we report on the Ohmic contact resistance and reverse-bias characteristics of AlGaN/GaN Schottky barrier diodes with and without annealing. Annealing in oxygen at $500^{\circ}C$ resulted in an increase in the breakdown voltage from 641 to 1,172 V for devices with an anode-cathode separation of $20{\mu}m$. However, these annealing conditions also resulted in an increase in the contact resistance of $0.183{\Omega}-mm$, which is attributed to oxidation of the metal contacts. Auger electron spectroscopy revealed diffusion of oxygen and Au into the AlGaN and GaN layers following annealing. The improved reverse-bias characteristics following annealing in oxygen are attributed to passivation of dangling bonds and plasma damage due to interactions between oxygen and GaN/AlGaN. Thermal annealing is therefore useful during the fabrication of high-voltage GaN devices, but the effects on the Ohmic contact resistance should be considered.

Effect of oxygen deficiency on electronic properties and local structure of amorphous tantalum oxide thin films

  • Denny, Yus Rama;Firmansyah, Teguh;Park, Chanae;Kang, Hee Jae;Yang, Dong-Seok;Heo, Sung;Chung, Jae Gwan;Lee, Jae Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.122.1-122.1
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    • 2015
  • The dependence of electronic properties and local structure of tantalum oxide thin film on oxygen deficiency have been investigated by means of X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), and X-ray absorption spectroscopy (XAS). The XPS results showed that the oxygen flow rate change results in the appearance of features in the Ta 4f at the binding energies of 23.2 eV, 24.4 eV, 25.8, and 27.3 eV whose peaks are attributed to Ta1+, Ta2+, Ta3+, Ta4+, and Ta5+, respectively. The presence of nonstoichiometric state from tantalum oxide (TaOx) thin films could be generated by the oxygen vacancies. The REELS spectra suggested the decrease of band gap for tantalum oxide thin films with increasing oxygen deficiency. In addition, XAS spectra manifested both the increase of coordination number of the first Ta-O shell and a considerable reduction of the Ta-O bond distance with the decrease of oxygen deficiency.

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$Cu_2ZnSnS_4$ Thin Film Absorber Synthesized by Chemical Bath Deposition for Solar Cell Applications

  • Arepalli, Vinaya Kumar;Kumar, Challa Kiran;Park, Nam-Kyu;Nang, Lam Van;Kim, Eui-Tae
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.35.1-35.1
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    • 2011
  • New photovoltaic (PV) materials and manufacturing approaches are needed for meeting the demand for lower-cost solar cells. The prototypal thin-film photovoltaic absorbers (CdTe and $Cu(In,Ga)Se_2$) can achieve solar conversion efficiencies of up to 20% and are now commercially available, but the presence of toxic (Cd,Se) and expensive elemental components (In, Te) is a real issue as the demand for photovoltaics rapidly increases. To overcome these limitations, there has been substantial interest in developing viable alternative materials, such as $Cu_2ZnSnS_4$ (CZTS) is an emerging solar absorber that is structurally similar to CIGS, but contains only earth abundant, non-toxic elements and has a near optimal direct band gap energy of 1.4~1.6 ev and a large absorption coefficient of ${\sim}10^4\;cm^{-1}$. The CZTS absorber layers are grown and investigated by various fabrication methods, such as thermal evaporation, e-beam evaporation with a post sulfurization, sputtering, non-vacuum sol-gel, pulsed laser, spray-pyrolysis method and electrodeposition technique. In the present work, we report an alternative method for large area deposition of CZTS thin films that is potentially high throughput and inexpensive when used to produce monolithically integrated solar panel modules. Specifically, we have developed an aqueous chemical approach based on chemical bath deposition (CBD) with a subsequent sulfurization heat treatment. Samples produced by our method were analyzed by scanning electron microscopy, X-ray diffraction, transmission electron microscopy, absorbance and photoluminescence. The results show that this inexpensive and relatively benign process produces thin films of CZTS exhibiting uniform composition, kesterite crystal structure, and good optical properties. A preliminary solar cell device was fabricated to demonstrate rectifying and photovoltaic behavior.

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Effect of Sputtering Power on Structural and Optical Properties of CuS Thin Films Deposited by RF Magnetron Sputtering Method (RF 마그네트론 스퍼터링 방법으로 증착된 CuS 박막의 구조적 및 광학적 특성에 대한 스퍼터링 전력의 영향)

  • Lee, Sangwoon;Shin, Donghyeok;Son, Young Guk;Son, Chang Sik;Hwang, Donghyun
    • Current Photovoltaic Research
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    • v.8 no.1
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    • pp.27-32
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    • 2020
  • CuS thin films were deposited on glass substrates at room temperature by RF magnetron sputtering. The structural and optical properties of CuS thin films grown by varying RF-power from 40 W to 100 W were studied. From the XRD analysis, we confirmed hexagonal crystal structures grown in the preferred orientation of the (110) plane in all CuS thin films, and the intensity of the main diffraction peak increased in proportion to the increase of RF-power. In the case of CuS thin film deposited at 40W, small-sized particles formed a thin and dense surface morphology with narrow pore spacing, relatively. As the power increased, the grain size and grain boundary spacing increased sequentially. The peaks for the binding energy of Cu 2p3/2 and Cu 2p1/2 were determined at 932.1 eV and 952.0 eV, respectively. The difference in binding energy for the Cu2+ states was the same at 19.9 eV regardless of process parameters. The transmittance and band gap energy in the visible region tended to decrease with increasing sputtering powers.