• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.96-96
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• 2010

To improve surface wettability, each sample was treated by atmospheric pressure plasma (APP) using dielectric barrier discharge (DBD) system. Argon and oxygen gases were used for treatment gas to modify the $TiO_2$ surface by APP with RF power range from 50 to 200 W. Water contact angle was decreased from $20^{\circ}$ to $10^{\circ}$ with argon only. However, water contact angle was decreased from $20^{\circ}$ to < $1^{\circ}$ with mixture of argon and oxygen. Water contact angle with $O_2$ plasma was lower than water contact angle with Ar plasma at the same RF power. It seems to be increasing the polar force of $TiO_2$ surface. Also, analysis result of X-ray photoelectron spectra (XPS) shows the increase of intensity of O1s shoulder peak, resulting in increasing of surface wettability by APP. Moreover, each water contact angle increased according to increase past time. However, contact angle increase with plasma treatment was lower than without plasma treatment. Additionally, the efficiency of $TiO_2$ photocatalyst was improved by plasma surface-treatment through the degradation experiment of phenol

• Journal of Convergence for Information Technology
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• v.12 no.2
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• pp.149-156
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• 2022

In this paper, it was attempted to form a titanium (Ti: Titanium) thin film using the atmospheric pressure plasma process technology for the conductor, which is the main component of the optical sensor. The atmospheric plasma equipment was remodeled. A 4-inch Ti target for sputter was etched using CF4 gas, and the by-product was coated on a glass sample. These by-products were formed up to about 2 cm, and could be divided into 15 areas according to color. Surface shape and constituent elements were analyzed using scanning electron microscopy (SEM) and energy dispersive spectrometer (EDS), respectively. Electrical properties using 4-point probe equipment were also measured. If the process is performed by positioning the sample at about 4.5 mm to 5 mm from the target, a uniform Ti thin film will be deposited. However, it was found that the thin film contained a significant amount of fluorine, which greatly affects the electrical properties of the thin film. Therefore, additional experiments and studies should be performed to remove or minimize fluorine during deposition.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.141-141
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• 2013

We have generated the needle-typed nonthermal plasma jet by using an Ar gas flow at atmospheric pressure. Diagnostics of electron temperature anddensity is critical factors in optimization of the atmospheric plasma jet source in accordance with the gas flow rate. We have investigated the electron temperature and density of plasma jet by selecting the four metastable Ar emission lines based on the atmospheric collisional radiative model and radial profile characteristics of current density, respectively. The averaged electron temperature and electron density for this plasma jet are found to be ~1.6 eV and ~$3.2{\times}10^{12}cm^{-3}$, respectively, in this experiment. The densities of OH radical species inside the various bio-solutions are found to be higher by about 4~9 times than those on the surface when the argon bioplasma jet has been bombarded onto the bio-solution surface. The densities of the OH radicalspecies inside the DI water, DMEM, and PBS are measured to be about $4.3{\times}10^{16}cm^{-3}$, $2.2{\times}10^{16}cm^{-3}$, and $2.1{\times}10^{16}cm^{-3}$, respectively, at 2 mm downstream from the surface under optimized Ar gas flow 250 sccm.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.222.2-222.2
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• 2014

대기압 플라즈마는 기존의 저압 플라즈마에 비해 제작이 간단하고 조작이 간편하기 때문에 응용 가능 분야가 넓다는 장점이 있지만 다양한 외부 요인으로 인한 안정성의 문제로 저압 플라즈마의 모든 응용범위를 대신하기에는 문제점이 있다. 현재 이 문제점을 해결하기 위한 연구가 활발히 진행 중에 있으며, 기판 및 유리 세정, Bio-medical, 물질 합성 등 다양한 분야에 대한 응용 연구도 진행 중에 있다. 본 연구에서는 본 연구실에서 자체 개발한 전원 장치를 이용하여 대기압 플라즈마를 발생 시켰으며, He, Ar Gas를 이용하여 PDMS 기판과 유리 기판에 표면 처리 한 후 친수성 비교 분석 실험을 실시하였다. Optical Emission Spectroscopy(OES)장치와 ICCD camera를 이용하여 플라즈마 진단과 특성 분석을 실시하였으며 Computer Numerical Control (CNC) x-y-z 3축 stage를 이용하여 플라즈마 발생을 제어함으로서 재현성을 높은 플라즈마 표면 처리 연구를 진행 하였다.

• Journal of the Korean institute of surface engineering
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• v.48 no.1
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• pp.7-10
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• 2015

Recently, oxide TFTs has attracted a lot of interests due to their outstanding properties such as excellent environmental stability, high mobility, wide-band gap energy and high transparency, and investigated through the method using vacuum system and wet solution. In the case of the method using wet solution, process is very simple, however, annealing process should be included. In this study, to overcome the problem of annealing process, atmospheric pressure plasma was used for annealing, and the electrical characteristics such as on/off ration and mobility of device were investigated.

• Applied Science and Convergence Technology
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• v.26 no.6
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• pp.201-207
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• 2017

An electron-excited temperature ($T_{ex}$) is not determined by the Boltzmann plots only with the spectral data of $4p{\rightarrow}4s$ in an Ar-plasma jet operated with a low frequency of several tens of kHz and the low voltage of a few kV, while $T_{ex}$ can be obtained at least with the presence of a high energy-level transition ($5p{\rightarrow}4s$) in the high-voltage operation of 8 kV. The optical intensities of most spectra that are measured according to the voltage and the measuring position of the plasma column increase or decay exponentially at the same rate as that of the intensity variation; therefore, the excitation temperature is estimated by comparing the relative optical-intensity to that of a high voltage. In the low-voltage range of an Ar-jet operation, the electron-excitation temperature is estimated as being from 0.61 eV to 0.67 eV, and the corresponding radical density of the Ar-4p state is in the order of $10^{10}{\sim}10^{11}cm^{-3}$. The variation of the excitation temperature is almost linear in relation to the operation voltage and the position of the plasma plume, meaning that the variation rates of the electron-excitation temperature are 0.03 eV/kV for the voltage and 0.075 eV/cm along the plasma plume.

• Journal of Korean society of Dental Hygiene
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• v.19 no.2
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• pp.307-315
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• 2019

Objectives: The aim of this study was to investigate the characterization of composite resin inlay surface with silane and non-thermal atmospheric pressure plasma treatment. Methods: Composite resin inlay was used as a specimen, which was treated by sandblasting + silane and sandblasting + plasma. The untreated specimens were assigned to the control group. Specimens were analyzed for surface roughness, color change, and chemical composition. Statistical analyses were performed using one-way ANOVA test (p<0.05). Results: The present findings showed that the roughness and color changes of the plasma-treated surface were significantly lower than those of the silane-treated surface. In addition, a change in the chemical composition was observed on the plasma-treated surface. Conclusions: Based on the results, non-thermal atmospheric pressure plasma could be a potential tool for the cementation of composite resin inlay.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.35 no.5
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• pp.445-450
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• 2011

We studied the adhesion characteristics of polymer films (PC, PET, EVA) treated by atmospheric pressure plasma. The process parameters were the frequency, gas flow, and treatment time; we studied the effects of these parameters on the adhesion characteristics of the polymer materials. We used de-ionized water and diiodomethane as the polar and nonpolar solvents, respectively, for measuring the contact angles, and subsequently calculated the surface free energy of each polymer film. The adhesion characteristics were studied by carrying out a $180^{\circ}$ peel-off test. The polymer films treated with plasma developed a hydrophilic surface, which led to increased surface free energy and improved adhesion properties. From the results for contact angle, surface free energy, and adhesion strength, we obtained the optimal plasma-treatment conditions.

• Journal of Convergence for Information Technology
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• v.11 no.6
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• pp.146-153
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• 2021

Recently, research on perovskite semiconductor materials has been performed, and the evaluation of properties using surface treatment for this material is the basis for subsequent studies. We studied the results of surface treatment of perovskite thin films exposed to air for about 6 months by generating oxygen plasma with an atmospheric pressure plasma equipment. The reason for exposure for 6 months is that the perovskite thin film is made of organic and inorganic substances, so when exposed to air, the surface changes through reaction with oxygen or water vapor. Therefore, this change is to investigate whether it is possible to restore the original film. The surface shape and the ratio of elements were analyzed by varying the process time from 1 s to 1200 s in an oxygen plasma atmosphere. It was found that the crystal grains change over a process time of 5 s or more. In order to maintain the properties of the deposited film, it is the optimal process condition between 2 s and 5 s.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.337-337
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• 2011

Application of plasma technology on microbial sterilization has been frequently studied. In spite of accumulating number of studies, many have been focused on bacteria. Reports on eukaryotic yeasts and filamentous fungi are limited. In addition, mechanism of plasma effect still needs to be clarified. In this study, we analyzed the effect of non-thermal atmospheric pressure plasma on the budding yeast, Saccharomyces cerevisiae using DBD-type device. When yeast cells were exposed to plasma (at 2 mm distance) and then cultured on YPD-agar plate, number of cells survived (shown as colony) were reduced proportionally to exposure time. More than 50% reduction in number of colonies were observed after twice exposure of 5min. each. Colonies much smaller than those of control (no plasma exposure) were appeared after twice exposure of 5 min. each. It seems that small colonies are resulted from delayed cell growth due to the damage caused by plasma treatment. Microscopic analysis demonstrates that yeast cells treated with plasma for 5 min. twice have more rough and shrinked shape compared to oval shape with smooth surface of control.