• 한국결정성장학회지
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• 제13권5호
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• pp.230-234
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• 2003

GaAs (001) 기판과 완충층을 사용한 ZnTe/GaAs(001) 기판 위에 고농도의 Zn 조성을 가지는 $Cd_xZn_{1-x}$Te/GaAs, $Cd_xZn_{1-x}$Te/ZnTe/GaAs 에피층 구조를 성장시켰다. 이때 $Cd_xZn_{1-x}$Te 에피층에서의 CuPt형의 규칙상 형성, 미세구조적 특성과 광발광특성을 X-선회절과 전자회절상, 고분해능 투과전자현미경, 그리고 저온 광발광 측정 장치를 이용하여 연구하였다.

• 한국결정성장학회지
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• 제11권3호
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• pp.96-101
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• 2001

본 연구에서는 열벽 적층 성장법으로 GaAs(100) 기판 위에 $Zn_{1-x}Mn_{x}Te$ 에피층을 성장하여 그 특성을 조사하였다. $Zn_{1-x}Mn_{x}Te$ 에피층의 Mn 조성비는 x = 0.97까지 얻을 수 있었으며 성장된 시료의 결정구조는 징크브랜드이었다. 성장된 면은 GaAs (100) 기판과 동일한 방향으로 성장되었다. 성장시 기판 온도가 $350^{\circ}C$에서 $400^{\circ}C$로 증가함에 따라 Mn 조성비 x는 0.02에서 0.23으로 증가하였다. $Zn_{1-x}Mn_{x}Te$ 에피층의 격자상수는 Mn 조성비 x가 증가할수록 선형으로 증가하였고 띠 간격 에너지는 x에 대하여 비선형으로 증가하였다.

• 한국결정성장학회지
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• 제13권3호
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• pp.127-131
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• 2003

Zincblende 구조를 갖는 양질의 ZnTe(100) 박막을 $CaAs(100\pm2^{\circ})$ 기판에 HWE법으로 성장하였다 기판온도에 따른 표면상태와 성장률 그리고 결정성의 변화를 관측하였고, 기판온도가 $470^{\circ}C$일 때 결정성이 가장 우수하였다. 10K 광발광 측정으로부터 열적 인장스트레인에 의하여 분리된 가벼운 양공과 무거운 양공을 관측하였고 이들의 일차 들뜬상태를 관측하였다 무거운 양공의 자유 엑시톤의 이중구조는 엑시톤-폴라리톤 결합에 의한 세로방향 엑시톤과 가로방향 엑시톤 사이의 에너지 차이 때문이다.

• 한국공작기계학회논문집
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• 제11권6호
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• pp.105-110
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• 2002

ZnTe epilayers have been successfully grown on (100) CaAs substrate by hot wall epitaxy (HWE) with Zn reservoir. Optimum growth condition has been determined by a four-crystal rocking curve (FCRC). It was found that Zn partial pressure from h reservoir has a strong influence on the quality of grown films. Under the determined optimum growth condition, ZnTe epitaxial films with thickness of 0.72~24.8${\mu}m$ were grown for studying the effect of the thickness on crystalline quality. The FCRC results indicated that the quality of ZnTe films becomes higher rapidly with increase of thickness up to 6${\mu}{\textrm}{m}$. The best value of the FWHM of the few crystal rocking curve, 66 arcsec, was obtained on the film with $12{\mu}m$ in thickness. Until now, this result shows the best quality of ZnTe/GaAs films in reported.

• Journal of Advanced Marine Engineering and Technology
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• 제30권1호
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• pp.176-181
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• 2006

In this study, systematical investigations were carried out on crystal qualifies and optical properties of $ZnSe_{1-x}:Te_x$ (x=0.002-0.04) thin films frown by molecular beam epitaxy (MBE). The crystal qualifies and optical properties have been investigated by X-ray diffraction (XRD) and Photoluminescence (PL) measurements, respectively. From the XRD measurements, the crystallographic characteristics showed mediocre crystal quality with increasing the Te composition. From the PL measurements, emission in the visible spectrum region from blue to green was obtained by varying the Te content of the ZnSe:Te epilayers. The efficient blue and green emission were attributed to the recombination of excitons trapped at isoelectronic isolated a single Te atom and $Te_n(n{\geq}2)$ clusters. respectively. The blue emission become dominant in Te tightly doped $ZnSe_{1-x}:Te_x$ $(Te=0.2\%)$ epilayers with increasing temperature. For the Te heavily doping condition $(Te=4.0\%)$, the dominant green emission could be observed at around 160K.

• 한국공작기계학회논문집
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• 제11권6호
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• pp.111-117
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• 2002

The high quality and a nearly stoichometric growth of $Cd_{1-y} Zn_y$/Te(y＝0.04) epilayers have been successfully grown on GaAs substrate by hot wall epitaxy (HWE) by optimizing the growth condition including the preheating treatment and Cd reservoir temperature. The relationship between quality and thickness was examined and best value of FWHM from X-ray rocking curve of 121 arcsec are obtained. Also, emission peaks related to the recombination of free excitons such as the ground state and the first excited state were observed in the PL spectrum at 4.2K. The ($A^0$, X) emission related to Cd vacancy and deep level emission was not measured. These results indicated that the grown CZT/GaAs epilayer was high qualify and purity.

• 한국진공학회지
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• 제8권4A호
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• pp.470-475
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• 1999

ZnS and ZnTe epilayers were grown on GaAs(100) GaP(100) substrates by hot-wall eitaxy. X-ray diffraction revealed that the epilayers have zinc-blende structure and were grown in (100) direction. The small values of the full width at half maximum (FWHM) of double crystal rocking curve (DCRC) showed high quality of the epilayers. From the thickness dependence of the FWHM of DCRC, the strain remaining in films is found to be due to the thermal expansion difference as well as due to the lattice mismatch.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 연구회
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• pp.208-211
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• 2001

Hot wall epitaxy 법으로 GaAs(100) 기판 위에 $Zn_{1-x}Mn_xTe(0{\leq}x{\leq}1)$ 단결정 박막을 성장하였다. XRD 스펙트럼으로부터 $Zn_{1-x}Mn_xTe$ epilayer들이 전 영역에 걸쳐 zincblende 구조임을 알았다. double crystal rocking curve(DCRC)로부터 격자상수를 계산하고 이훌 이용하여 조성비를 계산하였다. ZnMnTe 단결정 박막의 DCRC 반치폭은 Mn 조성비가 증가함에 따라 급격하게 증가하다가 포화되는 모습을 나타내었다

• 한국표면공학회지
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• 제35권5호
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• pp.305-311
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• 2002

Optical measurements have been used to study the biaxial tensile strain in heteroeptaxial ZnTe epilayers on the (100) GaAs substrate by hot wall epitaxy (HWE) with Zn reservoir. It is effect on the low-temperature photoluminescence spectrum of the material. Optimum growth condition has been determined by a four-crystal rocking curve (FCRC) and a low temperature photoluminescence measurement (PL). It was found that Zn partial pressure from Zn reservoir has a strong influence on the quality of grown films. Under the determined optimum growth condition, ZnTe epitaxial films with thickness of 0.72~24.8$\mu\textrm{m}$ were grown for studying the effect of the thickness on crystalline quality. The PL and FCRC results indicated that the quality of ZnTe films becomes higher rapidly with increase of thickness up to 6$\mu\textrm{m}$. The best value of the FWHM of the four crystal rocking curve, 66 arcsec, was obtained on the film with 12$\mu\textrm{m}$ in thickness. The PL spectrum shows the splitted strong free exciton emissions and very weak deep band emissions. These results show the high quality of films.

• 한국결정성장학회지
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• 제12권6호
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• pp.299-303
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• 2002

The relationship of crystallinity between defects distribution with (100) ZnTe/GaAs using HWE growth was investigated by four crystal rocking curve (FCRC) and transmission electron microscopy (TEM). The thickness dependence of crystal quality in ZnTe epilayer was evaluated. The FWHM value shows a strong dependence on ZnTe epilayer thickness. For the films thinner than 6 ${\mu}{\textrm}{m}$, the FWHM value decreases very steeply as the thickness increases. For the films thicker than 6 ${\mu}{\textrm}{m}$, it becomes an almost constant value. At the thickness of 12 $\mu\textrm{m}$ with the smallest value of 66 arcsec. which is the best value so far reported on ZnTe epilayers was obtained. Investigation into the nature and behavior of dislocations with film thickness in (100) ZnTe/(100)GaAs heterostructures grown by Hot Wall Epitaxy (HWE). This film defects range from interface to 0.7 ${\mu}{\textrm}{m}$ thickness was high density, due to the large lattice mismatch and thermal expansion coefficients. The thickness of 0.7~1.8 ${\mu}{\textrm}{m}$ was exists low defect density. In the thicker range than 1.8 ${\mu}{\textrm}{m}$ thickness was measured hardly defects.