• Title/Summary/Keyword: Zn precursor

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Effective Oxygen-Defect Passivation in ZnO Thin Films Prepared by Atomic Layer Deposition Using Hydrogen Peroxide

  • Wang, Yue;Kang, Kyung-Mun;Kim, Minjae;Park, Hyung-Ho
    • Journal of the Korean Ceramic Society
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    • v.56 no.3
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    • pp.302-307
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    • 2019
  • The intrinsic oxygen-vacancy defects in ZnO have prevented the preparation of p-type ZnO with high carrier concentration. Therefore, in this work, the effect of the concentration of H2O2 (used as an oxygen source) on the oxygen-vacancy concentration in ZnO prepared by atomic layer deposition was investigated. The results indicated that the oxygen-vacancy concentration in the ZnO film decreased by the oxygen-rich growth conditions when using H2O2 as the oxygen precursor instead of a conventional oxygen source such as H2O. The suppression of oxygen vacancies decreased the carrier concentration and increased the resistivity. Moreover, the growth orientation changed to the (002) plane, from the combined (100) and (002) planes, with the increase in H2O2 concentration. The passivation of oxygen-vacancy defects in ZnO can contribute to the preparation of p-type ZnO.

Coating of ZnS phosphor by $SiO_2$ sol-gel

  • Lee, You-Hui;Han, Sang-Do;Han, Chi-Hwan;Yang, Hua;Singh, Ishwa
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.719-723
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    • 2004
  • Silica coating on ZnS particles with buffer solution has been investigated. Diluted sodium silicate in water was used as the precursor material and it was diluted in water. Sodium silicate was added drop-wise in the continuously stirred suspension of ZnS in the buffer solution at room temperature. Smooth and evenly distributed silica coated ZnS phosphors has been obtained when the pH of buffer solution was 10, the concentration of sodium silicate in water was 20 wt%, firing temperature was 500 $^{\circ}C$.

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ALD를 이용하여 살펴본 CdSe/CdS Quantum Dot-sensitized Solar Cell에서의 TiO2 Passivation 효과

  • Park, Jin-Ju;Lee, Seung-Hyeop;Seol, Min-Su;Yong, Gi-Jung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.370-370
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    • 2011
  • ZnO 나노 라드 위에 Quantum dot을 형성하고 최종적으로 TiO2를 Atomic Layer Deposition방법으로 증착하여, 그 passivation 효과가 solar cell의 효율에 미친 영향에 대한 실험을 진행하였다. 암모니아 솔루션을 이용한 Hydrothermal 방법으로 수직한 1차원 형태의 ZnO 나노라드를 TCO 기판 위에 성장시킨다. 여기에 잘 알려진 SILAR와 CBD 방법으로 CdS, CdSe 양자점을 증착한다. 그리고 amorphous TiO2로 표면을 덮는 과정을 거치는데, TiO2가 좁은 간격으로 형성된 ZnO라드 구조 위에서 균일하고 정밀하게 증착되도록 하기 위해 Atomic Layer Deposition을 이용하였다. 사용된 precursor는 Titanium isopropoxide와 H2O이며, 실험상에서 0~5 nm 두께의 TiO2 박막을 형성해 보았다. 다양한 분석 방법을 통해 TiO2/QDs/ZnO의 shell-shell-core 구조를 조사했다. (Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), and X-ray Photoelectron Spectroscopy (XPS)). 이를 solar cell에 적용하고 I-V curve를 통해 그 효율을 확인하였으며, Electrochemical Impedance Spectroscopy (EIS)를 통해서 재결합 측면에서 나타나는 변화 양상을 확인하였다.

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Sol-Gel법을 이용한 YZO/Si 이종접합 구조의 제작과 정류특성

  • Heo, Seong-Eun;Kim, Won-Jun;Kim, Chang-Min;Lee, Hwang-Ho;Lee, Byeong-Ho;Lee, Yeong-Min;Kim, Deuk-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.350-350
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    • 2013
  • Sol-gel법을 이용하여 p-Si 기판위에 yttrium이 도핑된 ZnO (YZO)를 성장하였다. ZnO의 precursor로는 zinc acetate dihydrate를, yttrium의 source로는 yttrium acetate hydrate를 사용하였으며, 용매와 안정제로는 각각 2-methoxy ethanol과 monoethanolamine (MEA)를 사용하였다. yttrium의 doping 농도에 따른 영향을 알아보기 위하여 1~4 at.%로 제작된 YZO sol을 각각 p-type Si 기판에 성장하였으며, 이 후 furnace를 이용하여 500oC에서 1시간 동안 열처리하였다. 성장된 YZO 박막의 표면과 두께를 SEM을 통하여 확인하였으며, XRD를 통한 구조적인 특성을 분석한 결과 모든 박막에서 뚜렷한 c-축 배양성을 갖는 ZnO (0002)피크를 확인하였다. Hall effect를 통하여 YZO는 모두 n-type 특성을 나타낸다는 것을 확인하였으며, 광학적인 특성은 PL을 통해서 분석하였다. n-YZO/p-Si 이종접합의 전류-전압 특성을 분석한 결과 뚜렷한 정류특성을 나타내었다.

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Zn2SiO4:Mn Phsophor Particles Prepared by Flame Spray Pyrolysis (화염분무열분해 공정에 의해 합성되어진 Zn2SiO4:Mn 형광체)

  • Kang Y. C.;Sohn J. R.;Jung K. Y.
    • Korean Journal of Materials Research
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    • v.14 no.8
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    • pp.600-606
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    • 2004
  • $Zn_{2}SiO_{4}:Mn$ phosphor particles were prepared by a flame spray pyrolysis method. It has been generally known that the high-temperature flame enables fast drying and decomposition of droplets. In the present investigation, the morphology and luminescent property of $Zn_{2}SiO_{4}:Mn$ phosphor were controlled in a severe flame preparation condition. The particle formation in the flame spray pyrolysis process was achieved by the droplet-to-particle conversion without any evaporation of precursors, which made it possible to obtain spherical $Zn_{2}SiO_{4}:Mn$ particles of a pure phase from a droplet. Using colloidal solutions wherein dispersed nano-sized silica particles were adopted as a silicon precursor. $Zn_{2}SiO_{4}:Mn$ particles with spherical shape and filled morphology were prepared and the spherical morphology was maintained even after the high-temperature heat treatment, which is necessary to increase the photoluminescence intensity. The $Zn_{2}SiO_{4}:Mn$ particles with spherical shape, which were prepared by the flame spray pyrolysis and posttreated at $1150^{\circ}C$, showed good luminescent characteristics under vacuum ultraviolet (VUV) excitation.

Properties of Aluminum Doped Zinc Oxide Thin Film Prepared by Sol-gel Process

  • Yi, Sung-Hak;Kim, Jin-Yeol;Jung, Woo-Gwang
    • Korean Journal of Materials Research
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    • v.20 no.7
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    • pp.351-355
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    • 2010
  • Transparent conducting aluminum-doped ZnO thin films were deposited using a sol-gel process. In this study, the important deposition parameters were investigated thoroughly to determine the appropriate procedures to grow large area thin films with low resistivity and high transparency at low cost for device applications. The doping concentration of aluminum was adjusted in a range from 1 to 4 mol% by controlling the precursor concentration. The annealing temperatures for the pre-heat treatment and post-heat treatment was $250^{\circ}C$ and 400-$600^{\circ}C$, respectively. The SEM images show that Al doped and undoped ZnO films were quite uniform and compact. The XRD pattern shows that the Al doped ZnO film has poorer crystallinity than the undoped films. The crystal quality of Al doped ZnO films was improved with an increase of the annealing temperature to $600^{\circ}C$. Although the structure of the aluminum doped ZnO films did not have a preferred orientation along the (002) plane, these films had high transmittance (> 87%) in the visible region. The absorption edge was observed at approximately 370 nm, and the absorption wavelength showed a blue-shift with increasing doping concentration. The ZnO films annealed at $500^{\circ}C$ showed the lowest resistivity at 1 mol% Al doping.

Thickness-dependent Electrical, Structural, and Optical Properties of ALD-grown ZnO Films

  • Choi, Yong-June;Kang, Kyung-Mun;Park, Hyung-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.2
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    • pp.31-35
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    • 2014
  • The thickness dependent electrical, structural, and optical properties of ZnO films grown by atomic layer deposition (ALD) at various growth temperatures were investigated. In order to deposit ZnO films, diethylzinc and deionized water were used as metal precursor and reactant, respectively. ALD process window was found at the growth temperature range from $150^{\circ}C$ to $250^{\circ}C$ with a growth rate of about $1.7{\AA}/cycle$. The electrical properties were studied by using van der Pauw method with Hall effect measurement. The structural and optical properties of ZnO films were analyzed by using X-ray diffraction, field emission scanning electron microscopy, and UV-visible spectrometry as a function of thickness values of ZnO films, which were selected by the lowest electrical resistivity. Finally, the figure of merit of ZnO films could be estimated as a function of the film thickness. As a result, this investigation of thickness dependent electrical, structural, and optical properties of ZnO films can provide proper information when applying to optoelectronic devices, such as organic light-emitting diodes and solar cells.

Synthesis and Characterization of ZnAl2O4 Nanopowders by a Reverse Micelle Processing

  • Hoon, Son-Jung;Sohn, Jeongho;Shin, Hyung-Sup;Bae, Dong-Sik
    • Korean Journal of Materials Research
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    • v.25 no.11
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    • pp.598-601
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    • 2015
  • Using reverse micelle processing, $ZnAl_2O_4$ nanopowders were synthesized from a mixed precursor(consisting of $Zn(NO_3)_2$ and $Al(NO_3)_3$). The $ZnAl_2O_4$ was prepared by mixing the aqueous solution at a molar ratio of Zn : Al = 1 : 2. The average size and distribution of the synthesized powders with heat treatment at $600^{\circ}C$ for 2 h were in the range of 10-20 nm and narrow, respectively. The average size of the synthesized powders increased with increasing water to surfactant molar ratio. The XRD diffraction patterns show that the phase of $ZnAl_2O_4$ was spinel(JCPDS No. 05-0669). The synthesized and calcined powders were characterized using a thermogravimetric - differential scanning calorimeter(TG-DSC), X-ray diffraction analysis (XRD), and high resolution transmission electron microscopy(HRTEM). The effects of the synthesis parameter, such as the molar ratio of water to surfactant, are discussed.

Electrodeposition of SnO2-doped ZnO Films onto FTO Glass

  • Yoo, Hyeonseok;Park, Jiyoung;Kim, Yong-Tae;Kim, Sunkyu;Choi, Jinsub
    • Journal of Electrochemical Science and Technology
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    • v.10 no.1
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    • pp.61-68
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    • 2019
  • Well aligned $SnO_2$-doped ZnO nanorods were prepared by single step or 2-step electrochemical depositions in a mixture solution of zinc nitrate hexahydrate, ammonium hydroxide solution and 0.1 M tin chloride pentahydrate. The morphologies of electrochemically deposited $SnO_2$-doped ZnO were transformed from plain (or network) structures at low reduction potential to needles on hills at high reduction potential. Well aligned ZnO was prepared at intermediate potential ranges. Reduction reagent and a high concentration of Zn precursor were required to fabricate $SnO_2$ doped ZnO nanorods. When compared to results obtained by single step electrochemical deposition, 2-step electrochemical deposition produced a much higher density of nanorods, which was ascribed to less potential being required for nucleation of nanorods by the second-step electrochemical deposition because the surface was activated in the first-step. Mechanisms of $SnO_2$ doped ZnO nanorods prepared at single step or 2-step was described in terms of applied potential ranges and mass-/charge- limited transfer.