• Title/Summary/Keyword: Zn metal target

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Sputtering Growth of ZnO Thin-Film Transistor Using Zn Target (Zn 타겟을 이용한 ZnO 박막트랜지스터의 스퍼터링 성장)

  • Yu, Meng;Jo, Jungyol
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.3
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    • pp.35-38
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    • 2014
  • Flat panel displays fabricated on glass substrate use amorphous Si for data processing circuit. Recent progress in display technology requires a new material to replace the amorphous Si, and ZnO is a good candidate. ZnO is a wide bandgap (3.3 eV) semiconductor with high mobility and good optical transparency. ZnO is usually grown by sputtering using ZnO ceramic target. However, ceramic target is more expensive than metal target, and making large area target is very difficult. In this work we studied characteristics of ZnO thin-film transistor grown by rf sputtering using Zn metal target and $CO_2$. ZnO film was grown at $450^{\circ}C$ substrate temperature, with -70 V substrate bias voltage applied. By using these methods, our ZnO TFT showed $5.2cm^2/Vsec$ mobility, $3{\times}10^6$ on-off ratio, and -7 V threshold voltage.

Preparation for Mn-Zn Ferrite Soft Magnetic Underlayer Perpendicular Magnetic Recording Disk using Mn-Zn-Fe-O Metal Target (Mn-Zn-Fe-O 금속타깃을 이용한 수직자기기록디스크의 하지연자성층용 Mn-Zn ferrite 박막제작)

  • Kong, Sok-Hyun;Kim, Kyung-Hwan
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.9
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    • pp.883-887
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    • 2006
  • In order to attain high-rate deposition of Mn-Zn ferrite thin film for soft magnetic underlayer in perpendicular magnetic recording media, a reactive sputtering using powder-metal targets under the mixture gas of Ar and $O_{2}$ was performed. It was succeeded that Mn-Zn ferrite films with (111) crystal orientation were deposited on Pt(111) underlayer without any annealing process. The film revealed 3.4 kG of 4 ${\pi}Ms$, 70 Oe of coercivity. The deposition rate of the new method was 16 times as high as that of the conventional method using ferrite target.

Effect of sputtering parameters and targets on properties of ZnO:Al thin films prepared by reactive DC magnetron sputtering (직류 반응성 sputtering법으로 제막된 ZnO:Al 박막의 물성에 미치는 증착조건 및 타겟의 영향)

  • 유병석;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.4
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    • pp.592-598
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    • 1998
  • AZO(Aluminum doped Zinc Oxide) thin films were fabricated by reactive DC magnetron sputtering method using zinc metal target (Al 2%) and zinc oxide target ($Al_2O_3\;2%$) respectively. The intermediate condition with optimum transmittance and conductivity was obtained by controlling the sputtering parameters. Oxygen gas ratio for this condition was $0.5{\times}10^{-2}~1.0{\times}10^{-2}$ in oxide target and. In case of metal target, this optimum oxygen gas ratio at the applied power of 0.6 kW and 1.0 kW was 0.215~0.227 and 0.305~0.315, respectively. The resistivity of AZO film deposited was obtained $1.2~1.4{\times}10^{-3} {\Omega}{\cdot}$cm as deposited state regardless of target species.

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The Characterization of Interfaces between ZnO Thin Films and Metal Electrodes (ZnO 박막과 금속전극과의 계면특성조사)

  • 박성순;임원택;이창효
    • Journal of the Korean Vacuum Society
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    • v.7 no.3
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    • pp.201-207
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    • 1998
  • We have investigated about interface characteristics between ZnO thin films and metal electrodes when ZnO and metal electrodes were fabricated as piezoelectric vibrators. At this, ZnO thin films were deposited by rf reactive magnetron sputtering method. After fabricating piezoelectric vibrator of Cr/ZnO/Cr structure with optimum condition, we analyse interface characteristics between ZnO thin films and metal electrodes by I-V measurement. AES depth profile, SEM and C-V measurement. From these measurements we found that ZnO piezoelectric vibrators showed good property when they fabricated as Cr/$SiO_2$/ZnO/Cr structure. And we could confirm these things by driving, and measuring vibration displacement of piezoelectric vibrator with $SiO_2$diffusion barrier.

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Ethylenediamine as a Promising and Biodegradable Chelating Agent in Growth of Plant Under Zinc Stress (아연 스트레스를 받는 식물의 성장을 위한 생분해되는 킬레이트로서 에틸렌디아민)

  • Lee, Sang-Man
    • Korean Journal of Environmental Agriculture
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    • v.29 no.2
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    • pp.115-119
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    • 2010
  • Zinc (Zn) is an essential element required for growth and development of plants. However, Zn can be toxic to plants when it presents excessive amount. Phytoextraction is an economic and environment-friendly technique using plants to clean-up metal-contaminated soils. However, the technique cannot be applied in highly metal-contaminated areas because plants will not normally grow in such conditions. Therefore, this research focuses on identifying chelating agents which are biodegradable and applicable to highly metalcontaminated areas. Zn as a target metal and cysteine (Cys), histidine (His), malate, citrate oxalate, succinate, and ethylenediamine (EDA) as biodegradable chelating agents were selected. Plants were grown on agar media containing various chelating agents with Zn to analyze the effect on plant growth. Malate and His slightly increased the inhibitory effect of Zn on root growth of plants, whereas Cys, citrate, oxalate, and succinate did not show significant effects. However, EDA strongly diminished the inhibitory effect of Zn on root growth. The effect of EDA is correlated with decreased Zn uptake into the plants. In conclusion, as biodegradable chelating agents, EDA is a good candidate for growth of plants in highly Zn-contaminated areas.

Crystallography properties of $ZnO/AZO/SiO_2/Si$ thin film for FBAR (FBAR용 $ZnO/AZO/SiO_2/Si$ 박막의 결정학적 특성에 관한 연구)

  • Kang, Tai-Young;Keum, Min-Jong;Son, In-Hwan;Kim, Kyung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.880-883
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    • 2003
  • ZnO thin films for Film Bulk Acoustic Resonator(FBAR) were prepared by FTS (Facing Target Sputtering) system. The FTS methode enable to generate high density plasma, and it has a high deposition rate at 1mTorr pressure. Therefore, the ZnO thin films were deposited on $AZO/SiO_2/Si$ substrates with oxygen gas flow rate, and the other sputtering conditions were fixed such as a sputtering current of 0.8A, a substrate temperature at room temperature. AZO bottom electrode were deposited on $SiO_2/Si$ substrate and by Zn:Al(Al:2wt%) metal target. ZnO thin film thickness and the c-axis preferred orientation of ZnO thin film were evaluated by ${\alpha}-step$ and XRD.

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Evaluation of Sequential Extraction Techniques for Selected Heavy Metal Speciation in Contaminated Soils

  • Lee, Jin-Ho;Doolittle, James J.;Oh, Byung-Taek
    • Korean Journal of Environmental Agriculture
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    • v.25 no.3
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    • pp.236-246
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    • 2006
  • In this study, we give insight into questionable results that can be encountered in the conventional sequential extraction of heavy metals (Cd, Cu, and Zn) from soils. Objectives of this study were to determine the extraction variability of exchangeable (EXC)-metals as using six different EXC-extractants commonly accepted, and to investigate selectivity problems with carbonates bound (CAB)-metal fraction, a buffered acetate (1.0 M NaOAc; pH 5.0) extractable-metal fraction, leading to erratic results in especially non-calcareous soils. The contents of EXC-metals were markedly varied with the different extractability of various EXC-metal extractants used. The contents of EXC-Cd fraction were ranged from 2.0 to 74.3% of total Cd content in all of the metal spiked soils studied. The contents of EXC-Zn fraction extracted with the different EXC-extractants were varied with soil types, which were from 0.4 to 3.9% of total Zn in the calcareous soils, from 7.6 to 17.9% in the acidic soil, and from 13.6 to 56.8% in the peat soil. However, the contents of EXC-Cu fraction were relatively similar among the applications of different EXC-meal extractants, 0.2 to 2.1 % of total Cu, in all soils tested. Also, these varied amounts of EXC-metal fractions, especially Cd and Zn, seriously impacted the contents of subsequent metal fractions in the procedure. Furthermore, the CAB-Cd, -Cu, and -Zn fractions extracted by the buffered acetate solution were in critical problem. That is, the buffered acetate solution dissolved not only CAB-metals but also metals that bound or occupied to subsequent fractions, especially OXD-metal fraction, in both calcareous and non-calcareous soils. The erratic results of CAB-fraction also seriously impacted the amounts of subsequent metal fractions. Therefore, the conventional sequential extraction should be reconsidered theoretically and experimentally to quantify the target metal fractions or might be progressively discarded.

Preparation of High Permeability Mn-Zn Ferrites by the Wet Method (습식법에 의한 고투자율 Mn-Zn Ferrite의 제조에 관한 연구)

  • 이경희;이병하;허원도;황우연
    • Journal of the Korean Ceramic Society
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    • v.31 no.1
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    • pp.55-61
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    • 1994
  • Mn-Zn ferrite powder was obtained by wet method that was to be coprecipitated the metal ions of Fe2+, Mn2+ and Zn2+ with alkali solution. The target composition of the ferrite powder was 52 mol% Fe2O3, 24 mol% MnO, and 24 mol% ZnO, that was based on the region of high permeability. And the other ferrite powder was prepared by the dry method that was to be mixed the metal oxides as the above chemical composition. The wet method was compared with dry method for the powder properties and the electromagnetic characteristics of sintered cores. The synthesized powder by wet method was smaller particle size, narrower particle distribution, and higher purity than that of dry method. The initial permeability of sintered sample prepared by the wet method was 14000~28000, on the other side, 9000~15500 in case of the dry method.

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An Experimental Study to Secure Electromagnetic Pulse Shielding Performance of Concrete Coated by an Arc Metal Spraying Process (아크 금속 용사 공법에 의해 코팅된 콘크리트의 전자기파 차폐 성능 확보를 위한 실험적 연구)

  • Jang, Jong-Min;Jeong, Hwa-Rang;Lee, Han-Seung
    • Journal of the Korea Institute of Building Construction
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    • v.21 no.6
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    • pp.519-527
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    • 2021
  • In this study, an electromagnetic pulse shielding effect was obtained by applying the arc metal spraying method to the ordinary concrete. For this study, to evaluate the electrical properties in the thickness of the metal sprayed coating, 8 types of metals(Cu, CuAl, CuNi, CuZn, Al, Zn, ZnAl, AlMg) were sprayed as coatings with a thickness of 100, 200 and 500㎛. The electrical conductivity on the surface was measured with a 4-pin probe, and an electromagnetic wave shielding effect test was performed according to KS. Based on the test results, 200 ㎛ was proposed as an optimal metal coating thickness for electromagnetic pulse shielding, and it was thermally sprayed on a 300×300×100mm concrete specimen to analyze the electromagnetic wave shielding performance. However, in the area of adhesion strength, the maximum was 1.11MPa, which was found to be less than 74% of the target performance.

Growth of p-ZnO by RF-DC magnetron co-sputtering (RF-DC magnetron co-sputtering법에 의한 p-ZnO 박막의 성장)

  • Kang Seung Min
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.14 no.6
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    • pp.277-280
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    • 2004
  • p-ZnO films have been grown on (0001) sapphire substrates by RF-DC magnetron co-sputtering. The p-ZnO single crystalline thin films of the thickness about 120 nm were grown successfully. The dopant (Aluminum) was sputtered simultaneously from Al metal target by DC sputtering during rf-magnetron sputtering of ZnO at the substrate temperatures of $400^{\circ}C$ and $600^{\circ}C$ respectively. The crystallinity and optical properties of as-grown P-ZnO films have been characterized.