• 제목/요약/키워드: Wide-gap materials

검색결과 144건 처리시간 0.032초

Tunable Magnetism by Magnetic Phase in $Fe_3O_4$/ZnO Multilayer

  • 윤종구;박창엽;윤순길
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 추계학술발표대회
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    • pp.21.2-21.2
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    • 2011
  • $Fe_3O_4$ having half metallic property is one of the efficient spin filtering materials which are widely used in spintronic research field and ZnO is wide band gap semiconductor which can be used by tunnel barrier or semiconductor channel in spin MOSFET. We investigated the magnetic and the electric properties of $Fe_3O_4$/ZnO multilayer fabricated on c-$Al_2O_3$ substrate by pulsed laser deposition (PLD). For multilayer films, PLD was performed at variable temperatures such as $200{\sim}750^{\circ}C$ and at target distance from 40 to 80 mm, KrF eximer laser of 1.5 $J/cm^2$ and a reputation rate of 2Hz. $Fe_3O_4$/ZnO multilayers were deposited at $4{\times}10^{-6}$ Torr. After fabricating $Fe_3O_4$/ZnO multilayers, $Fe_3O_4$/ZnO multilayers were treated by RTA(Rapid Thermal Annealing) at various temperature to change magnetic phase. The magnetism of the multilayer is changed by thickness of the ZnO tunnel barrier. Magnetic phase of FexOy showed a very small magnetism due to $Fe_2O_3$ ${\alpha}$-phase, but large magnetism from $Fe_3O_4$ or $Fe_2O_3$ ${\gamma}$-phase was observed. In the present study, effect of the ZnO thickness on the MR (magnetoresistance) ratio was investigated in detail.

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ALD ZnO 버퍼층 증착 온도가 전착 Cu2O 박막 태양전지 소자 특성에 미치는 영향 (The Influence of Deposition Temperature of ALD n-type Buffer ZnO Layer on Device Characteristics of Electrodeposited Cu2O Thin Film Solar Cells)

  • 조재유;트란 휴 만;허재영
    • Current Photovoltaic Research
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    • 제6권1호
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    • pp.21-26
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    • 2018
  • Beside several advantages, the PV power generation as a clean energy source, is still below the supply level due to high power generation cost. Therefore, the interest in fabricating low-cost thin film solar cells is increasing continuously. $Cu_2O$, a low cost photovoltaic material, has a wide direct band gap of ~2.1 eV has along with the high theoretical energy conversion efficiency of about 20%. On the other hand, it has other benefits such as earth-abundance, low cost, non-toxic, high carrier mobility ($100cm^2/Vs$). In spite of these various advantages, the efficiency of $Cu_2O$ based solar cells is still significantly lower than the theoretical limit as reported in several literatures. One of the reasons behind the low efficiency of $Cu_2O$ solar cells can be the formation of CuO layer due to atmospheric surface oxidation of $Cu_2O$ absorber layer. In this work, atomic layer deposition method was used to remove the CuO layer that formed on $Cu_2O$ surface. First, $Cu_2O$ absorber layer was deposited by electrodeposition. On top of it buffer (ZnO) and TCO (AZO) layers were deposited by atomic layer deposition and rf-magnetron sputtering respectively. We fabricated the cells with a change in the deposition temperature of buffer layer ranging between $80^{\circ}C$ to $140^{\circ}C$. Finally, we compared the performance of fabricated solar cells, and studied the influence of buffer layer deposition temperature on $Cu_2O$ based solar cells by J-V and XPS measurements.

N2와 NH3 반응성가스를 사용하여 마그네트론 스퍼터링법으로 제작한 AlN박막의 특성 (Characteristics of AlN Thin Films by Magnetron Sputtering System Using Reactive Gases of N2 and NH3)

  • 한창석
    • 한국재료학회지
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    • 제25권3호
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    • pp.138-143
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    • 2015
  • Aluminum nitride, a compound semiconductor, has a Wurtzite structure; good material properties such as high thermal conductivity, great electric conductivity, high dielectric breakdown strength, a wide energy band gap (6.2eV), a fast elastic wave speed; and excellent in thermal and chemical stability. Furthermore, the thermal expansion coefficient of the aluminum nitride is similar to those of Si and GaAs. Due to these characteristics, aluminum nitride can be applied to electric packaging components, dielectric materials, SAW (surface acoustic wave) devices, and photoelectric devices. In this study, we surveyed the crystallization and preferred orientation of AlN thin films with an X-ray diffractometer. To fabricate the AlN thin film, we used the magnetron sputtering method with $N_2$, NH3 and Ar. According to an increase in the partial pressures of $N_2$ and $NH_3$, Al was nitrified and deposited onto a substrate in a molecular form. When AlN was fabricated with $N_2$, it showed a c-axis orientation and tended toward a high orientation with an increase in the temperature. On the other hand, when AlN was fabricated with $NH_3$, it showed a-axis orientation. This result is coincident with the proposed mechanism. We fabricated AlN thin films with an a-axis orientation by controlling the sputtering electric power, $NH_3$ pressure, deposition speed, and substrate temperature. According to the proposed mechanism, we also fabricated AlN thin films which demonstrated high a-axis and c-axis orientations.

NH3를 이용한 반응성 증착법에 의한 AlN 박막의 우선배향특성에 관한 연구 (A Study on the Preferred Orientation Characteristics of AlN Thin Films by Reactive Evaporation Method using NH3)

  • 오창섭;한창석
    • 대한금속재료학회지
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    • 제50권1호
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    • pp.78-85
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    • 2012
  • Aluminum nitride(AlN) is a compound (III-V group) of hexagonal system with a crystal structure. Its Wurzite phase is a very wide band gap semiconductor material. It has not only a high thermal conductivity, a high electrical resistance, a high electrical insulating constant, a high breakdown voltage and an excellent mechanical strength but also stable thermal and chemical characteristics. This study is on the preferred orientation characteristics of AlN thin films by reactive evaporation using $NH_3$. We have manufactured an AlN thin film and then have checked the crystal structure and the preferred orientation by using an X-ray diffractometer and have also observed the microstructure with TEM and AlN chemical structure with FT-IR. We can manufacture an excellent AlN thin film by reactive evaporation using $NH_3$ under 873 K of substrate temperature. The AlN thin film growth is dependent on Al supplying and $NH_3$ has been found to be effective as a source of $N_2$. However, the nuclear structure of AlN did not occur randomly around the substrate a particle of the a-axis orientation in fast growth speed becomes an earlier crystal structure and is shown to have an a-axis preferred orientation. Therefore, reactive evaporation using $NH_3$ is not affected by provided $H_2$ amount and this can be an easy a-axis orientation method.

진동전단유동장에서 점탄성 반고형 연고기제(바셀린)의 레올로지 거동 (Rheological Behavior of Viscoelastic Semi-Solid Ointment Base (Vaseline) in Oscillatory Shear Flow Fields)

  • 송기원;장갑식
    • Journal of Pharmaceutical Investigation
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    • 제36권1호
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    • pp.31-38
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    • 2006
  • Using a Rheometries Dynamic Analyzer (RDA II), the dynamic viscoelastic properties of a semi-solid ointment base (vaseline) in large amplitude oscillatory shear flow fields were measured over a temperature range of $25{\sim}45^{\circ}C$ and the linear viscoelastic behavior in small amplitude oscillatory shear flow fields was investigated over a wide range of angular frequencies. In this article, the nonlinear viscoelastic behavior was reported from the experimentally obtained data and the effect of temperature on this behavior was discussed in detail. In addition, the angular frequency and temperature dependencies of a linear viscoelastic behavior were explained. Finally, the applicability of a time-temperature superposition principle originally developed for polymeric materials was examined using a shift factor. Main results obtained from this study can be summarized as follows : (1) At very small strain amplitude region, vaseline shows a linear viscoelastic behavior independent of the imposed deformation magnitudes. Above a critical strain amplitude $({\gamma}_{0}=0.1{\sim}0.2%)$, however, vaseline exhibits a nonlinear viscoelastic behavior ; indicating that both the storage modulus and dynamic viscosity are sharply decreased with increasing deformation magnitude. (2) In large amplitude oscillatory shear flow fields, an elastic behavior (storage modulus) has a stronger strain amplitude dependence and begins to show a nonlinear behavior at a smaller strain amplitude region than does a viscous behavior (dynamic viscosity). (3) In small amplitude oscillatory shear flow fields, the storage modulus as well as the loss modulus are continuously increased as an increase in angular frequency and an elastic nature is always superior to a viscous behavior over a wide range of angular frequencies. (4) A time-temperature superposition principle can successfully be applicable to vaseline. This finding allows us to estimate the dynamic viscoelastic behavior of vaseline over an extraordinarily extended range (11 decades) of angular frequencies inaccessible from the experimentally measured range (4 decades).

An Active Voltage Doubling Rectifier with Unbalanced-Biased Comparators for Piezoelectric Energy Harvesters

  • Liu, Lianxi;Mu, Junchao;Yuan, Wenzhi;Tu, Wei;Zhu, Zhangming;Yang, Yintang
    • Journal of Power Electronics
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    • 제16권3호
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    • pp.1226-1235
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    • 2016
  • For wearable health monitoring systems, a fundamental problem is the limited space for storing energy, which can be translated into a short operational life. In this paper, a highly efficient active voltage doubling rectifier with a wide input range for micro-piezoelectric energy harvesting systems is proposed. To obtain a higher output voltage, the Dickson charge pump topology is chosen in this design. By replacing the passive diodes with unbalanced-biased comparator-controlled active counterparts, the proposed rectifier minimizes the voltage losses along the conduction path and solves the reverse leakage problem caused by conventional comparator-controlled active diodes. To improve the rectifier input voltage sensitivity and decrease the minimum operational input voltage, two low power common-gate comparators are introduced in the proposed design. To keep the comparator from oscillating, a positive feedback loop formed by the capacitor C is added to it. Based on the SMIC 0.18-μm standard CMOS process, the proposed rectifier is simulated and implemented. The area of the whole chip is 0.91×0.97 mm2, while the rectifier core occupies only 13% of this area. The measured results show that the proposed rectifier can operate properly with input amplitudes ranging from 0.2 to 1.0V and with frequencies ranging from 20 to 3000 Hz. The proposed rectifier can achieve a 92.5% power conversion efficiency (PCE) with input amplitudes equal to 0.6 V at 200 Hz. The voltage conversion efficiency (VCE) is around 93% for input amplitudes greater than 0.3 V and load resistances larger than 20kΩ.

Growth and analysis of Copper oxide nanowire

  • Park, Yeon-Woong;Seong, Nak-Jin;Jung, Hyun-June;Chanda, Anupama;Yoon, Soon-Gil
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.245-245
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    • 2009
  • l-D nanostructured materials have much more attention because of their outstanding properties and wide applicability in device fabrication. Copper oxide(CuO) has been realized as a p-type metal oxide semiconductor with narrow band gap of 1.2 -1.5eV. Copper oxide nanostructures can be synthesized by various growth method such as oxidation reaction, thermal evaporation thermal decomposition, sol-gel. and Mostly CuO nanowire prepared on the Cu substrate such as Copper foil, grid, plate. In this study, CuO NWs were grown by thermal oxidation (at various temperatures in air (1 atm)) of Cu metal deposited on CuO (20nm)/$SiO_2$(250nm)/Si. A 20nm-thick CuO layer was used as an adhesion layer between Cu metal and $SiO_2$

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Multi-scale agglomerates and photocatalytic properties of ZnS nanostructures

  • 만민탄;이홍석
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.267.2-267.2
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    • 2016
  • Semiconductor photo-catalysis offers the potential for complete removal of toxic chemicals through its effective and broad potential applications. Various new compounds and materials for chemical catalysts were synthesized in the past few decades. As one of the most important II-VI group semiconductors, zinc sulfide (ZnS) with a wide direct band gap of 3.8 eV has been extensively investigated and used as a catalyst in photochemistry, environmental protection and in optoelectronic devices. In this work, the ZnS films and nanostructures have been successfully prepared by wet chemical method. We show that the agglomerates with four successive scales are always observed in the case of the homogeneous precipitation of zinc sulfide. Hydrodynamics plays a crucial role to determine the size of the largest agglomerates; however, other factors should be invoked to interpret the complete structure. In addition, studies of the photocatalytic properties by exposure to UV light irradiation demonstrated that ZnS nanocrystals (NCs) are good photo-catalysts as a result of the rapid generation of electron-hole pairs by photo-excitation and the highly negative reduction potentials of excited electrons. A combination of their unique features of high surface-to volume ratios, carrier dynamics and rich photo-catalytic suggests that these ZnS NCs will find many interesting applications in semiconductor photo-catalysis, solar cells, environmental remediation, and nano-devices.

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Etching Properties of ZnS:Mn Thin Films in an Inductively Coupled Plasma

  • Kim, Gwan-Ha;Woo, Jong-Chang;Kim, Kyoung-Tae;Kim, Dong-Pyo;Kim, Chang-Il
    • Transactions on Electrical and Electronic Materials
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    • 제9권1호
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    • pp.1-5
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    • 2008
  • ZnS is an attractive material for future optical and electrical devices since it has a direct and wide band gap to provide blue emission at room temperature. In this study, inductively coupled $BCl_3/Ar$ plasma was used to etch ZnS:Mn thin films. The maximum etch rate of 164.2 nm/min for ZnS:Mn was obtained at a $BCl_3(20)/Ar(80)$ gas mixing ratio, an rf power of 700 W, a dc bias voltage of -200V, a total gas flow of 20 sccm, and a chamber pressure of 1Pa. The etch behaviors of ZnS:Mn thin films under various plasma parameters showed that the ZnS:Mn were effectively removed by the chemically assisted physical etching mechanism. The surface reaction of the ZnS:Mn thin films was investigated by X-ray photoelectron spectroscopy. The XPS analysis revealed that Mn had detected on the surface ZnS:Mn etched in $BCl_3/Ar$ plasma.

3C-SiC 마이크로 히터의 제작과 그 특성 (Fabrication of 3C-SiC micro heaters and its characteristics)

  • 정귀상;정재민
    • 센서학회지
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    • 제18권4호
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    • pp.311-315
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    • 2009
  • This paper describes the characteristics of a poly 3C-SiC micro heater which was fabricated on AlN(0.1 $\mu$m)/3C-SiC(1.0 $\mu$m) suspended membranes by surface micro-machining technology. The 3C-SiC and AlN thin films which have wide energy band gap and very low lattice mismatch were used sensors for high temperature and voltage environments. The 3C-SiC thin film was used as micro heaters and temperature sensor materials simultaneously. The implemented 3CSiC RTD(resistance of temperature detector) and the power consumption of micro heaters were measured and calculated. The TCR(thermal coefficient of the resistance) of 3C-SiC RTD is about -5200 ppm/$^{\circ}C$ within a temperature range from 25 $^{\circ}C$ to 50 $^{\circ}C$ and -1040 ppm/$^{\circ}C$ at 500 $^{\circ}C$. The micro heater generates the heat about 500 $^{\circ}C$ at 10.3 mW. Moreover, durability of 3C-SiC micro heaters in high voltages is better than Pt micro heaters. A thermal distribution measured and simulated by IR thermovision and COMSOL is uniform on the membrane surface.