• 한국재료학회지
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• 제11권8호
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• pp.636-640
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• 2001

PDP용 녹색 형광체의 발광특성을 개선시키기 위해 고안된 액상의 화학적 합성법을 사용하여 조성식이 $Zn_{2-x}$ $SiO_4$:xMn(x=0.05, 0.08)인 형광체를 입자크기가 0.5~2$\mu\textrm{m}$로 조절하여 제조하였다. 제조된 형광체 입자는 구상이며 잘 분산된 형상을 봉주었고, 고상반응법에 비해 상대적으로 낮은 $1080^{\circ}C$에서 willemite구조의 단일상을 얻을 수 있었다. 또한 진공 자외선 영역의 147 nm의 여기원을 사용하여 광발광 특성을 조사하였다. 입자의 크기가 1$\mu\textrm{m}$이고 Mn의 도핑양이 8mole%일 때, 상용 형광체와 비교하여 발광세기는 약 40% 향상되었고 색좌표는 x=0.24, y=0.69로 거의 일치하는 결과를 얻을 수 있었다. 측정된 형광체의 잔광시간은 7.8ms이었다.

• 한국재료학회지
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• 제11권8호
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• pp.363-363
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• 2001

PDP용 녹색 형광체의 발광특성을 개선시키기 위해 고안된 액상의 화학적 합성법을 사용하여 조성식이 $Zn_{2-x}$ $SiO_4$:xMn(x=0.05, 0.08)인 형광체를 입자크기가 0.5~2$\mu\textrm{m}$로 조절하여 제조하였다. 제조된 형광체 입자는 구상이며 잘 분산된 형상을 봉주었고, 고상반응법에 비해 상대적으로 낮은 $1080^{\circ}C$에서 willemite구조의 단일상을 얻을 수 있었다. 또한 진공 자외선 영역의 147 nm의 여기원을 사용하여 광발광 특성을 조사하였다. 입자의 크기가 1$\mu\textrm{m}$이고 Mn의 도핑양이 8mole%일 때, 상용 형광체와 비교하여 발광세기는 약 40% 향상되었고 색좌표는 x=0.24, y=0.69로 거의 일치하는 결과를 얻을 수 있었다. 측정된 형광체의 잔광시간은 7.8ms이었다.

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 2004년도 추계학술발표회 발표논문집
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• pp.1051-1052
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• 2004

• 한국세라믹학회지
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• 제51권2호
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• pp.121-126
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• 2014

The influence of a liquid medium duringa wet-milling process in the grinding and oxidation of silicon powder was investigated. Distilled water, dehydrated ethanol and diethylene glycol were used as the liquid media. The applied grinding times were 0.5, 3, and 12 h. Ground silicon powder samples were characterized by means of aparticle size analysis, scanning electron microscopy(SEM), x-ray powder diffraction (XRD), FT-IR spectroscopy and by a chemical composition analysis. From the results of the characterization process, we found that diethylene glycol is the most efficient liquid medium when silicon powder is ground using a wet-milling process. The FT-IR results show that the Si-O band intensity in an unground silicon powder is quite strongbecause oxygen becomes incorporated with silicon to form $SiO_2$ in air. By applying deionized water as a liquid medium for the grinding of silicon, the $SiO_2$ content increased from 4.12% to 31.7%. However, in the cases of dehydrated ethanol and diethylene glycol, it was found that the $SiO_2$ contents after grinding only changed insignificantly, from 4.12% to 5.91% and 5.28%, respectively.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.299.2-299.2
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• 2013

We investigated the potassium remaining on a crystalline silicon solar cell after potassium hydroxide (KOH) etching and its effect on the lifetime of the solar cell. KOH etching is generally used to remove the saw damage caused by cutting a Si ingot; it can also be used to etch the rear side of a textured crystalline silicon solar cell before atomic layer-deposited Al2O3 growth. However, the potassium remaining after KOH etching is known to be detrimental to the efficiency of Si solar cells. In this study, we etched a crystalline silicon solar cell in three ways in order to determine the effect of the potassium remnant on the efficiency of Si solar cells. After KOH etching, KOH and tetramethylammonium hydroxide (TMAH) were used to etch the rear side of a crystalline silicon solar cell. To passivate the rear side, an Al2O3 layer was deposited by atomic layer deposition (ALD). After ALD Al2O3 growth on the KOH-etched Si surface, we measured the lifetime of the solar cell by quasi steady-state photoconductance (QSSPC, Sinton WCT-120) to analyze how effectively the Al2O3 layer passivated the interface of the Al2O3 layer and the Si surface. Secondary ion mass spectroscopy (SIMS) was also used to measure how much potassium remained on the surface of the Si wafer and at the interface of the Al2O3 layer and the Si surface after KOH etching and wet cleaning.

• 한국재료학회지
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• 제11권9호
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• pp.740-744
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• 2001

The $Y_2SiO_5:Ce$ phosphors were synthesized by sol-gel technique in order to improve the performance of blue emitting phosphors for field emission display(FED). The resulted$Y_2SiO_5:Ce$ phosphors enhanced the emission intensity. In addition, calcination temperature of sol-gel technique(1300~140$0^{\circ}C$) was lower than that of the solid state reaction(>1$600^{\circ}C$). Under 365 nm and low voltage electron excitations. $Ce^{3+}$ -activated $Y_2SiO_5$phosphors showed blue emission band with a range of 400~ 430nm. Especially, 2mol% $Ce^{3+}$ doped $Y_2SiO_5:Ce$phosphors showed the maximum emission intensity. We have also controlled drying temperature of wet gel, pH, and $H_2O$/TEOS molar ratio for the optimum condition of TEOS hydrolysis.

• 한국결정성장학회지
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• 제24권1호
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• pp.41-45
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• 2014

다양한 공정 조건으로 $SiN_x$와 $SiO_2$ 박막을 형성하고 이에 대한 패시베이션 특성에 대한 연구를 수행하였다. Plasma enhanced chemical vapor deposition(PECVD)을 이용하여 증착된 $SiN_x$ 박막의 경우, 증착 두께가 증가함에 따라 페시베이션 특성이 향상되는 것을 관찰하였다. 이는 PECVD 증착 공정 중 유입되는 수소 원자들이 실리콘 표면에 존재하는 Dangling bond와 결합하여 소수 캐리어의 재결합 현상을 효과적으로 감소시켰기 때문이다. 건식 산화법으로 형성된 $SiO_2$ 박막은 습식 산화법으로 형성된 것 보다 치밀한 계면 구조를 가짐으로 인하여 약 20배 이상 우수한 패시베이션 특성을 나타내었다. 건식 산화 공정 온도가 증가함에 따라 패시베이션 특성이 열화되는 현상이 발생하였고, Capacitance-voltage(C-V) 및 Conductance-voltage(G-V) 분석을 통하여 $SiO_2$/실리콘 계면에 존재하는 계면 결함 밀도 증가에 의해 나타나는 현상임을 알 수 있었다.

• 한국전기전자재료학회논문지
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• 제24권9호
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• pp.687-692
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• 2011

Hafnium oxide ($HfO_2$) was very advantageous for substitute material of gate on existing transistor. $HfO_2$ has been widely studied due to high contact with polysilicon and thermal stability and also, it is easily etched by using HF solution. In this study, $HfO_2$ and thermal oxide films were etched by wet etch method using chemical etchant. Etch rate of $HfO_2$ and thermal oxide was linearly increased with increasing concentration of HF and temperature but etch rate of $HfO_2$ was higher than thermal oxide due to $H^+$, $F^-$, and $HF_2^-$ ions at below 0.5% concentration of HF. And also, etch selectivity was improved by adding Hydrazine as additive.

• 한국재료학회지
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• 제26권2호
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• pp.95-99
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• 2016

In this study, 5 um sized $ZrSiO_4$ was ground to 1.9 um, 0.3 um, and 0.1 um sized powders by wet high energy milling process, and the sintering characteristics were observed. Pure $ZrSiO_4$ itself can-not be sintered to these levels of theoretical density, but it was possible to sinter $ZrSiO_4$ powder of nano-scale size of, -0.1 um to the theoretical density and to lower the sintering temperature for full density. Also, the decomposition of $ZrSiO_4$ with a size in the micron range resulted in the formation of monoclinic $ZrO_2$; however, in the nano sized range, the decomposition resulted in the tetragonal phase of $ZrO_2$. So, it was possible to improve the sintering characteristics of nano-sized $ZrSiO_4$ powders.

• 한국세라믹학회지
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• 제44권3호
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• pp.162-168
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• 2007

Silica wet gels were prepared ken water glass ($29\;wt%\;SiO_{2}$) by using Amberlite as a ion exchange resin. After washing in distilled water, the wet gels were further aged in a solution of TEOS/EtOH to strengthen of 3-dimensional network structure. As increase TEOS content in aging solution, BET surface area and porosity of the ambient dried silica aerogels were significantly decreased, and average pore diameter was also decreased 30 nm to -10 nm. Also, higher density and compressive strength were obtained in case of higher TEOS content. This is due to precipitation of $SiO_{2}$ nano particles by TEOS. Hence, TEOS addition plays an important role of both strengthening and stiffness of silica wet gel network. By adding over 30 vol% TEOS, a crack-free monolithic silica aerogel tiles were obtained and its density, compressive strength, and thermal conductivity were shown $0.232g/cm^{3}$, 7.3 MPa, and 0.029 W/mk, respectivly.