• 제목/요약/키워드: Wafer transfer module

검색결과 7건 처리시간 0.023초

전산유동가시화를 활용한 웨이퍼 이송장치의 복사열전달에 관한 연구 (A Study on Radiation Heat Transfer of Wafer Transfer Module Using Computational Flow Visualization)

  • 추민기;정지홍;손동기;고한서
    • 한국가시화정보학회지
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    • 제20권3호
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    • pp.58-66
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    • 2022
  • The high heat emitted from the process module and heat jacket may cause errors in semiconductor process equipment. Barriers were designed to reduce the temperature of surface on transfer module. A designed barrier was compared and analyzed by numerical analysis using ANSYS Fluent. The average temperature of barrier and effect of radiation heat transfer were also compared through absorbed radiative heat flux of the barrier. The adoption of the barrier had an effect on the radiative heat transfer reduction of the transfer module rod. The effect of the angles of barrier from 50° to 90° on the heat transfer was investigated using the absorbed radiative heat flux with the average temperature. The angle of barrier of 50° reduced the temperature up to 9.6 %.

GaAs 웨이퍼 본딩모듈의 최적화 설계 (Design Optimization of GaAs Wafer Bonding Module)

  • 지원호;송준엽;강재훈;한승우
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.860-864
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    • 2003
  • Recently. use of compound semiconductor is widely increasing in the area of LED and RF device. In this study, wafer bonding module is designed and optimized to bond 6 inches device wafer and carrier wafer. Bonding process is performed in vacuum environment and resin is used to bond two wafers. Load spreader and double heating mechanisms are adopted to minimize wafer warpage and void. Structure and heat transfer analyses show the designed mechanisms are very effective in performance improvement.

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고수준 필드버스 기반의 클러스터 툴 모듈 통신 (Cluster Tool Module Communication Based on a High-level Fieldbus)

  • 이진환;이태억;박정현
    • 한국경영과학회:학술대회논문집
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    • 대한산업공학회/한국경영과학회 2002년도 춘계공동학술대회
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    • pp.285-292
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    • 2002
  • A cluster tool for semiconductor manufacturing is an integrated device that consists of several single wafer processing modules and a wafer transport module based on a robot. The distributed module controllers are integrated by an inter-module communication network and coordinated by a centralized controller, called a cluster tool controller (CTC). Since the CTC monitors and coordinates the distributed complex module controllers for advanced process control, complex commuication messaging and services between the CTC and the module controllers are required. A SEMI standard, CTMC(Cluster Tool Module Communication), specifies application-level communication service requirements for inter-module communication. We propose the use of high-level fieldbuses, for instance. PROFIBUS-FMS, for implementing CTMC since the high-level fieldbuses are well suited for complex real-time distributed manufacturing control applications. We present a way of implementing CTMC using PROFIBUS-FMS as the communication enabler. We first propose improvements of a key object of CTMC for material transfer and the part transfer protocol to meet the functional requirements of modem advanced cluster tools. We also discuss mapping objects and services of CTMC to PROFIBUS-FMS communication objects and services. Finally, we explain how to implement the mappings.

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웨이퍼 레벨 패키지를 적용한 저가격 고성능 FBAR 듀플렉서 모듈 (Cost-effective and High-performance FBAR Duplexer Module with Wafer Level Packaging)

  • 배현철;김성찬
    • 한국정보통신학회논문지
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    • 제16권5호
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    • pp.1029-1034
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    • 2012
  • 본 논문에서는 US-PCS(US-personal communications services)를 위해 사용이 가능한 저가격 고성능 FBAR (film bulk acoustic resonator) 듀플렉서(duplexer) 모듈(module)을 제시하였다. FBAR 소자는 일반적인 실리콘(Si) 기반의 공정보다 가격경쟁력이 우수한 유리(glass) 웨이퍼 기반의 패키지를 개발하여 적용하였다. FBAR 듀플렉서 모듈의 전송단(Tx)과 수신단(Rx)에서 얻어진 최대 삽입손실 특성은 각각 1.9 dB와 2.4 dB이다. 전송단 및 수신단 FBAR 소자와 본딩(bonding)된 유리 기반의 웨이퍼 및 PCB 기판과 몰딩(molding) 물질을 모두 포함하는 FBAR 듀플렉서 모듈의 전체 두께는 1.2 mm이다.

예외상황 처리를 고려한 반도체 통합제조장비 시뮬레이터 (Simulator of Integrated Single-Wafer Processing Tools with Contingency Handling)

  • 김우석;전영하;이두용
    • 대한기계학회논문집A
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    • 제29권1호
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    • pp.96-106
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    • 2005
  • An integrated single-wafer processing tool, composed of multiple single wafer processing modules, transfer robots, and load locks, has complex routing sequences, and often has critical post-processing residency constraints. Scheduling of these tools is an intricate problem, and testing schedulers with actual tools requires too much time and cost. The Single Wafer Processor (SWP) simulator presented in this paper is to validate an on-line scheduler, and evaluate performance of integrated single-wafer processing tools before the scheduler is actually deployed into real systems. The data transfer between the scheduler and the simulator is carried out with TCP/IP communication using messages and files. The developed simulator consists of six modules, i.e., GUI (Graphic User Interface), emulators, execution system, module managers, analyzer, and 3D animator. The overall framework is built using Microsoft Visual C++, and the animator is embodied using OpenGL API (Application Programming Interface).

GaAs Wafer 접합용 본딩시스템 개발 (Development of Automatic Bonding System for GaAs Wafer)

  • 송준엽;강재훈;이창우;하태호;지원호;김원경
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.427-431
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    • 2005
  • In this study, 6' GaAs wafer bonding system is designed and optimized to bond 6 inches device wafer and material wafer. Bonding process is performed in vacuum environment and resin is used to bond two wafers. Vacuum module and double heating mechanisms are adopted to minimize wafer warpage and void. Structure and heat transfer analysis, et al of the core modules review the designed mechanisms are very effective in performance improvement. As a result, high productivity (tack time cut-down) and stabilized process can be obtained by reducing breakage failure of wafer.

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차세대 반도체 세정장비 기술동향

  • 조중근
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2007년도 정기총회 및 추계학술대회
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    • pp.42-54
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    • 2007
  • ${\blacksquare}$ 매엽실 세정장비의 양산적용 확대 ${\centerdot}$ 역오염 감소로 수율개선, 짧은 TAT ${\centerdot}$ Throughput 개선필요 : Process Module + Wafer Transfer ${\blacksquare}$ 향후 $2{\sim}3$년 동안 세정기술의 패러다임 변화 예상 ${\centerdot}$ 초미세 패턴에서의 입자 제거 대책 (${\sim}22.5nm$), 신재료에 따른 케미컬 대응 (에칭, 부식, 물성변화). ${\blacksquare}$ 세정기술의 통합 솔루션 필요 ${\centerdot}$ 초임계 유체세정 : 극미세 패턴까지도 대응 가능 ${\centerdot}$ 장비와 공정 측면에서 많은 연구 필요

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