• 제목/요약/키워드: Wafer Test

검색결과 241건 처리시간 0.029초

멤스기술을 이용한 가상밸브가 있는 새로운 잉크젯 헤드 개발 (Development of a new thermal inkjet head with the virtual valve fabricated by MEMS technology)

  • 배기덕;백석순;신종우;임형택;신수호;오용수
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 추계학술대회
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    • pp.1892-1897
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    • 2003
  • A new thermal inkjet printer head on SOI wafer with virtual valve was proposed. It was composed of two rectangular heaters with same size. So we could call it T-jet(Twin jet). T-jet has a lot of merits. It has the advantage of being fabricated with one wafer and is easy to change the size of chamber, nozzle, restrictor and so on. However, above all, It is the best point that T-jet has a virtual valve. And it was manufactured on SOI wafer. The chamber was formed in its upper silicon whose thickness was 40um. The chamber's bottom layer was silicon dioxide of SOI wafer and two heaters were located underneath the chamber's ceiling. And the restirctor was made beside the chamber. Nozzle was molded by process of Ni plating. Ni was 30um thick. Nozzle ejection test was performed by printer head having 56 nozzles in 2 columns with 600NPI(nozzle per inch) and black ink. It measured a drop velocity of 12m/s, a drop volume of 30pl, and a maximum firing frequency of 12KHz for single nozzle ejection. Throwing out the ink drop in whole nozzles at the same time, it was observed that the uniformity of the drop velocity and volume was less than 4%.

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Novel Hierarchical Test Architecture for SOC Test Methodology Using IEEE Test Standards

  • Han, Dong-Kwan;Lee, Yong;Kang, Sung-Ho
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제12권3호
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    • pp.293-296
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    • 2012
  • SOC test methodology in ultra deep submicron (UDSM) technology with reasonable test time and cost has begun to satisfy high quality and reliability of the product. A novel hierarchical test architecture using IEEE standard 1149.1, 1149.7 and 1500 compliant facilities is proposed for the purpose of supporting flexible test environment to ensure SOC test methodology. Each embedded core in a system-on- a-chip (SOC) is controlled by test access ports (TAP) and TAP controller of IEEE standard 1149.1 as well as tested using IEEE standard 1500. An SOC device including TAPed cores is hierarchically organized by IEEE standard 1149.7 in wafer and chip level. As a result, it is possible to select/deselect all cores embedded in an SOC flexibly and reduce test cost dramatically using star scan topology.

MEMS 자이로스코프 센서의 신뢰성 문제 (Reliability Assessment of MEMS Gyroscope Sensor)

  • 최민석;좌성훈;김종석;정희문;송인섭;조용철
    • 대한기계학회논문집A
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    • 제28권9호
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    • pp.1297-1305
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    • 2004
  • Reliability of MEMS devices is receiving more attention as they are heading towards commercial production. In particular are the reliability and long-term stability of wafer level vacuum packaged MEMS gyroscope sensors subjected to cyclic mechanical stresses at high frequencies. In this study, we carried out several reliability tests such as environmental storage, fatigue, shock, and vibration, and we investigated the failure mechanisms of the anodically bonded vacuum gyroscope sensors. It was found that successful vacuum packaging could be achieved through reducing outgassing inside the cavity by deposition of titanium as well as by pre-taking process. The current gyroscope structure is found to be safe from fatigue failure for 1000 hours of operation test. The gyroscope sensor survives the drop and vibration tests without any damage, indicating robustness of the sensor. The reliability test results presented in this study demonstrate that MEMS gyroscope sensor is very close to commercialization.

미세 연소기 개발 (III) - 감광 유리를 이용한 마이크로 엔진의 제작 - (Design and Fabrication of Micro Combustor (III) - Fabrication of Micro Engine by Photosensitive Class -)

  • 이대훈;박대은;윤준보;윤의식;권세진
    • 대한기계학회논문집B
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    • 제26권12호
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    • pp.1639-1645
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    • 2002
  • Micro engine that includes Micro scale combustor is fabricated. Design target was focused on the observation of combustion driven actuation in MEMS scale. Combustor design parameters are somewhat less than the size recommended by feasibility test. The engine structure is fabricated by isotropic etching of the photosensitive glass wafers. Electrode formed by electroplating of the Nickel. Photosensitive glass can be etched isotropically with almost vertical angle. Bonding and assembly of structured photosensitive glass wafer form the engine. Combustor size was determined to be 1 mm scale. Movable piston is engraved inside the wafer. Ignition was done by nickel spark plug which was electroplated with thickness of 40 ${\mu}{\textrm}{m}$. The wafers were bonded by epoxy that resists high temperature. In firing test due to the bonding method and design tolerance pressure buildup by reaction was not confirmed. But ignition, flame propagation and actuation of micro structure from the reaction was observed. From the result basement of design and fabrication technology was obtained.

실리콘기판위에 양극접합된 MLCA의 기계적 특성 (Mechanical Characteristics of MLCA Anodic Bonded on Si wafers)

  • 김재민;이종춘;윤석진;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.160-163
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    • 2003
  • This paper describes on anodic bonding characteristics of MLCA(Multi Layer Ceramic Actuator) to Si-wafer using evaporated Pyrex #7740 glass thin-films for MEMS applications. Pyrex #7740 glass thin-films with same properties were deposited on MLCA under optimum RF magneto conditions(Ar 100 %, input power $1\;/cm^2$). After annealing in $450^{\circ}C$ for 1 hr, the anodic bonding of MLCA to Si-wafer was successfully performed at 600 V, $400^{\circ}C$ in - 760 mmHg. Then, the MLCA/Si bonded interface and fabricated Si diaphragm deflection characteristics were analyzed through the actuation test. It is possible to control with accurate deflection of Si diaphragm according to its geometries and its maximum non-linearity is 0.05-008 %FS. Moreover, any damages or separation of MICA/Si bonded interfaces do not occur during actuation test. Therefore, it is expected that anodic bonding technology of MICA/Si wafers could be usefully applied for the fabrication process of high-performance piezoelectric MEMS devices.

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마이크로컬럼 어레이에 적용 가능한 웨이퍼단위의 수직 배선 방법 (Wafer level vertical interconnection method for microcolumn array)

  • 한창호;김현철;강문구;전국진
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2005년도 추계종합학술대회
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    • pp.793-796
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    • 2005
  • In this paper, we propose a method which can improve uniformity of a miniaturized electron beam array for inspection of very small pattern with high speed using vertical interconnection. This method enables the individual control of columns so that it can reduce the deviation of beam current, beam size, scan range and so on. The test device that used vertical interconnection method was fabricated by multiple wafer bonding and metal reflow. Two silicon and one glass wafers were bonded and metal interconnection by melting of electroplated AuSn was performed. The contact resistance was under $10{\Omega}$.

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PC 기반의 다이싱 공정 자동화 시스템 개발

  • 김형태;양해정;송창섭
    • 한국정밀공학회지
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    • 제17권3호
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    • pp.47-57
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    • 2000
  • In this study, PC-based dicing machine and driving software were constructed for the purpose of automation of wafer cutting process. To automate the machine, hard automation including vision, loading, and software were considered in the development. Auto loading device and vision system were adopted for the increase of productivity, GUI software programmed for the expedient operation. The dicing machine is operated by the control algorithm and some parameters. It is verified that this kind of PC based automation has a great potential compared with the conventional dicing machine when applied to manufacturing some kinds of wafers as a test purpose.

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2축 로드셀을 이용한 박막평가장치의 설계 및 개발 (Design & development of a device for thin-film evaluation using a two-component loadcell)

  • 이정일;김종호;박연규;오희근
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 추계학술대회
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    • pp.1448-1452
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    • 2003
  • A scratch tester was developed to evaluate the adhesive strength at interface between thin-film and substrate(silicon wafer). Under force control, the scratch tester can measure the normal and the tangential forces simultaneously as the probe tip of the equipment approaches to the interface between thin-film and substrate of wafer. The capacity of each component of force sensor is 0.1 N ${\sim}$ 100 N. In addition, the tester can detect the signal of elastic wave from AE sensor(frequency range of 900 kHz) attached to the probe tip and evaluate the bonding strength of interface. Using the developed scratch tester, the feasibility test was performed to evaluate the adhesive strength of thin-film.

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레이저를 이용한 웨이퍼 다이싱 특성 분석

  • 이용현;최경진;유승렬;양영진;배성창
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2006년도 춘계학술대회
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    • pp.251-254
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    • 2006
  • In this paper, cutting qualifies and fracture strength of silicon dies by laser dicing are investigated. Laser micromachining is the non-contact process using thermal ablation and evaporation mechanisms. By these mechanisms, debris is generated and stick on the surface of wafer, which is the problem to apply laser dicing to semiconductor manufacture process. Unlike mechanical sawing using diamond blade, chipping on the surface and crack on the back side of wafer isn't made by laser dicing. Die strength by laser dicing is measured via the three-point bending test and is compared with the die strength by mechanical sawing. As a results, die strength by the laser dicing shows a decrease of 50% in compared with die strength by the mechanical sawing.

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Epi poly를 이용한 MEMS 소자용 웨이퍼 단위의 진공 패키징에 대한 연구 (A Study on Wafer Level Vacuum Packaging using Epi poly for MEMS Applications)

  • 석선호;이병렬;전국진
    • 반도체디스플레이기술학회지
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    • 제1권1호
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    • pp.15-19
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    • 2002
  • A new vacuum packaging process in wafer level is developed for the surface micromachining devices using glass silicon anodic bonding technology. The inside pressure of the packaged device was measured indirectly by the quality factor of the mechanical resonator. The measured Q factor was about 5$\times10^4$ and the estimated inner pressure was about 1 mTorr. And it is also possible to change the inside pressure of the packaged devices from 2 Torr to 1 mTorr by varying the amount of the Ti gettering material. The long-term stability test is still on the way, but in initial characterization, the yield is about 80% and the vacuum degradation with time was not observed.

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