• 제목/요약/키워드: Wafer Cutting Machine

검색결과 19건 처리시간 0.022초

GaN 웨이퍼의 다이싱을 위한 스크라이빙 머신의 개발 (Development of Scribing Machine for Dicing of GaN Wafer)

  • 차영엽;고경용
    • 제어로봇시스템학회논문지
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    • 제8권5호
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    • pp.419-424
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    • 2002
  • After the patterning and probe process of wafer have been achieved, the dicing processing is necessary to separate chips from a wafer. The dicing process cuts a semiconductor wafer to lengthwise and crosswise directions to make many chips. The existing general dicing method is the mechanical cutting using a narrow circular rotating blade impregnated diamond particles or laser cutting. Inferior goods can be made by the mechanical or laser cutting unless several parameters such as blade, wafer, cutting water and cutting conditions are properly set. Moreover, we can not apply these general dicing method to that of GaN wafer, because the GaN wafer is harder than general semiconductor wafers such as GaAs, GaAsP, AIGaAs and so forth. In order to overcome these problems, this paper describes a new wafer dicing method using fixed diamond scriber and precision servo mechanism.

반도체 웨이퍼용 스크라이빙 머신의 개발 (Development of Scribing Machine for Semiconductor Wafer)

  • 차영엽;최범식;고경용
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2000년도 제15차 학술회의논문집
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    • pp.222-222
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    • 2000
  • The general dicing process cuts a semiconductor wafer to lengthwise and crosswise direction by using a rotating circular diamond blade. But inferior goods are made under the influence of several parameters in dicing such as blade, wafer, cutting water and cutting conditions. Moreover we can not applicable this dicing method to GaN wafer, because the GaN wafer is harder than the other wafer as GaAs. In older to overcome this problem, a new dicing process is necessary. This paper describes a new machine using scriber and precision servo mechanism in order to dice a semiconductor wafer.

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웨이퍼 가공기에서 회전 원판의 동특성에 미치는 불균일 장력의 영향 분석 (Analysis of Non-uniform Tension Effect on Dynamic Characteristics of Spinning Circular Plates in the Wafer Cutting Machine)

  • 임경화
    • 소음진동
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    • 제8권2호
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    • pp.324-330
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    • 1998
  • The forced vibration analysis of the outer-clamped spinnig annular disk with arbitrary in-plane is formulated to investigate the influence of non-uniform tension on the cutting accuracy of wafer cutting machine. The arbitrary in-plan force along the outer edge of an annular plate is expressed as a Fourier series. Galerkin method and modal superposition method are employed to obtain the forced responses under the static force and the impulse force in astationary coordinate. Through qualitative and quantitative analyses, it can be found that forced and impulse responses are sensitive to the non-uniformity of in-plane force, which can bring a bad effect to the accuracy of wafer cutting process. Also, in case of a spinning disk with non-uniform in-plane force, critical speed is required to define in a different way, compared with conventional definition in axi-symmetrical spinning disk.

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반도체 웨이퍼용 브레이킹 머신의 개발 (Development of Breaking Machine for Semiconductor Wafer)

  • 차영엽;최범식
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2000년도 추계학술대회 논문집
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    • pp.729-732
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    • 2000
  • The general dicing process cuts a semiconductor wafer to lengthwise and crosswise direction by using a rotating circular diamond blade. But inferior goods are made under the influence of several parameters in dicing such as blade, wafer, cutting water and cutting condition. Moreover we can not applicable this dicing method to GaN wafer, because the GaN wafer is harder than the other wafer as GaAs. In order to overcome this problem, a new dicing process is necessary. This paper describes a new machine using scriber, breaker, and precision servo mechanism in order to dice an semiconductor wafer.

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반도체 웨이퍼용 스크라이빙 머신의 파라메터 결정 (The Parameter Determination of Scribing Machine for Semiconductor Wafer)

  • 차영엽;최범식
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 추계학술대회 논문집
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    • pp.164-167
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    • 2002
  • The general dicing process cuts a semiconductor wafer to lengthwise and crosswise direction by using a rotating circular diamond blade. But inferior goods are made under the influence of several parameters in dicing process such as blade, wafer, cutting water and cutting conditions. Moreover we can not applicable this dicing method to GaN wafer, because the GaN wafer is harder than the other wafer such as SiO$_2$, GaAs, CaAsP, and AlCaAs. In order to overcome this problem, development of a new dicing process and determination of dicing parameters are necessary. This paper describes determination of several parameters - scribing depth, scribing force, scriber inclined angle, scribing speed, and factor for scriber replacement - for a new dicing machine using scriber.

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반도체 웨이퍼용 스크라이빙 머신의 파라메터 결정 (The Parameter Determination of a Scribing Machine for Semiconductor Wafer)

  • 차영엽;최범식
    • 한국정밀공학회지
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    • 제20권2호
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    • pp.218-225
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    • 2003
  • The general dicing process cuts a semiconductor wafer to lengthwise and crosswise direction by using a rotating circular diamond blade. However, inferior goods may be made under the influence of several parameters in dicing process such as blade, wafer, cutting water and cutting conditions. Moreover we can not apply this dicing method to a GaN wafer, because the GaN wafer is harder than other wafers such as SiO$_2$, GaAs, GaAsP, and AlGaAs. In order to overcome this problem, development of a new dicing process and determination of dicing parameters are necessary. This paper describes determination of several parameters - scribing depth, scribing force, scriber inclined angle, scribing speed, and factor for scriber replacement - for a new dicing machine using a scriber.

반도체 웨이퍼를 위한 새로운 다이싱 방법 (A New Dicing Method for Semiconductor Wafer)

  • 차영엽;최범식
    • 대한기계학회논문집A
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    • 제27권8호
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    • pp.1309-1316
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    • 2003
  • The general dicing process cuts a semiconductor wafer to lengthwise and crosswise direction by using a rotating circular diamond blade. But products with inferior quality are produced under the influence of several parameters in dicing process such as blade, wafer, cutting water and cutting conditions. Moreover we can not apply this dicing method to GaN wafer, because the GaN wafer is harder than the other wafer such as SiO2, GaAs, GaAsP, and AlGaAs. In order to overcome this problem, development of a new dicing process and determination of dicing parameters are necessary. This paper describes a new wafer dicing method using fixed diamond scriber and precision servo mechanism and determination of several parameters - scribing depth, scribing force, scriber inclined angle, scribing speed, and factor for scriber replacement - for a new dicing machine using scriber.

웨이퍼 가공기의 진동 해석 및 실험적 검증 (Vibration Analysis of Wafer Cutting Machine and its Experimental Verification)

  • 김명업;임경화;이종원
    • 대한기계학회논문집
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    • 제16권1호
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    • pp.22-30
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    • 1992
  • The free vibrations of the outer-clamped spinning annular disk which simulates a wafer cutting machine are investigated. The effects of the initial tension, the centrifugal force and outer-fixture extension caused by spinning on the vibration characteristics of the disk are considered. The modal parameters of the disk are calculated by using Galerkin's method as the rotating speed and initial tension are varied. Laboratory experiments are also performed with a rotating and stationary disk, and, it is found that experimental and simulation results are in good agreement.

GUI를 이용한 슬라이싱 머신의 자동화 알고리즘 개발 (A Development of the Algorithms for Automation of Slicing Machine with GUI Interface)

  • 김형태;양해정;송창섭
    • 한국정밀공학회지
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    • 제16권7호
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    • pp.85-93
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    • 1999
  • In this study, PC-based slicing machine and driving software were constructed for the purpose of automation of semi-conductor cutting process. The biggest feature of software is variation of parameter and include data base, signal monitoring, error report, corresponding action or automatic motion planing. Parameters were drawn and algorithms were developed to make software by GUI interface. The cutting experiment was done for sampled wafer to see the effectiveness of the soft automation. From the experimented and implemented results, it is shown that parameters for automation of slicing process could be drawn, then its algorithms constructed. It could be considered what is the merit of this slicing machine by comparing the PC-based and the NC-based.

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습식워터젯을 채용한 초정밀 절삭 가공시스템의 특허동향조사에 관한 연구 (Research for Patent Application Tendency in the Super Fine Machining System Using the Wet Waterjet)

  • 김성민;고준빈;박희상
    • 한국공작기계학회논문집
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    • 제18권1호
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    • pp.1-12
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    • 2009
  • Presently, the semiconductor industry has the chronic problem. In the semiconductor industry, it has the semiconductor wafer, a package, the optical filter cut by using the saw blade, the mold, a laser etc. The cutting technique has the difficulty due to the rising of the production cost by the wearing of mold, the poor quality problem due to generated heat at the moment of cutting procedure and curve cutting etc. The goal of this time of national research and development project is develop the apparatus for solving the problem that the existing cutting technique has. The technology is so called waterjet abrasive method. This technology will be mainly applied to cut a semiconductor package and a wafer. Two important things to be considered are ripple effect(in other words, the scale of a market) and simplicity of an application.