• Title/Summary/Keyword: W-N thin film

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Basic Studies for the Development of the $NO_2$ Gas Sensor Using Functional Organic Ultrathin Film (기능성 유기 초박막을 이용한 $NO_2$ 가스센서 개발을 위한 기초 연구)

  • Sohn, B.C.;Rim, B.O.;Kim, Y.I.;Sohn, T.W.;Shin, D.M.;Ju, J.B.;Chung, G.Y.;Kim, Y.K.;Kang, W.H.;Lee, B.H.
    • Journal of the Korean Applied Science and Technology
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    • v.12 no.1
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    • pp.125-131
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    • 1995
  • Ultra thin films of Tetra-3-hexadecylsulphamoylcopperphthalocyanine(HDSM-CuPc) were formed on various substrates by Langmuir-Blodgett method, where HDSM-CuPc was synthesized by attaching long-chain alkylamine(hexa-decylamine) to CuPc. The reaction product was identified with FT-IR, UV-visible absorption spectroscopies, elemental analysis and thin layer chromatography. The formation of Ultrathin Langmuir-Blodgett(LB) films of HDSM-CuPc was confirmed by FT-IR and UV-visible spectroscopies. A quartz piezoelectric crystal coated with LB films of HDSM-CuPc was examined as a gas sensor for $N0_2$ gas. HDSM-CuPc LB films were transferred to a quartz crystal microbalance(QCM) in the form of Z-type multilayers. Response characteristics of film-coated QCM to $NO_2$ gas concentrations over a range of $100{\sim}600ppm$ have been tested with a thickness of $5{\sim}20$ layers of HDSM-CuPc. Changes in frequency by adsorption of $NO_2$ were increased With the number of LB layers and $NO_2$ concentration, but the response time was slow.

A Study on the Fabrication of LCVD System and Characteristics of Silicon Nitride Thin Film Deposited by the System (LCVD법을 이용한 박막성장장치의 제작 및 그 장치를 이용하여 제작한 Silicon Nitride 박막의 특성 연구)

  • 유동선;김일곤;이호섭;정광호
    • Journal of the Korean Vacuum Society
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    • v.2 no.3
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    • pp.368-373
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    • 1993
  • LCVD법에 의한 박막성장장치를 제작하였다. 제작한 CO2 레이저는 CO2 : N2 : He이 1 : 1 : 8로 혼합된 가스를 사용하였으며 최대 출력은 60W였고 혼합가스의 유량이 20l/min, 방전전류 40mAdlfEo 50W의 비교적 안정된 출력을 얻을 수 있었다. 반응실의 기초 진공은 1$\times$10-6torr였으며 레이저를 기판에 수직 혹은 수평으로 조사할 수 있도록 설계하였다. 제작된 장치로 SiH4 및 NH3를 재료로 하여 실리콘 및 quartz 기판위에 silicon nitride 박막을 증착하였다. 박막 생장시 가스를 흘리는 방식보다 가스를 채워놓고 하는 방식이 낮은 레이저 출력하에서 균일한 박막을 얻는데 효율적이라는 것을 발견하였다. 출력 55W의 레이저를 실리콘 기판에 5분간 조사하였을 때 최대 두께1.5$mu extrm{m}$의 박막을 얻었으며 quartz 기판위에는 출력 4W, 조사시간 6분에서 두께가 약 1$\mu\textrm{m}$인 비교적 균질의 박막을 얻을 수 있었다. FT-IR 및 XPS 분석 결과 SiH4와 NH3의 혼합비가 1 : 12일 때 비교적 nitride화가 잘 된 박막이 얻어졌음을 알았다.

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The Electric Conductivity $SrBi_2Ta_2O_9$ Capacitors using Rf Magnetron Sputtering Technique

  • Cho, C.N.;Shin, C.G.;Song, M.J.;Choi, W.S.;Park, G.H.;So, B.M.;Kim, C.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.04b
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    • pp.3-5
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    • 2008
  • The $SrBi_2Ta_2O_9$ thin films are deposited on Pt-coated electrode(Pt/$TiO_2/SiO_2$/Si) using RF magnetron sputtering method. The ferroelectric properties of SBT capacitors with annealing temperatures were studied. Through the x-ray diffraction analysis and the scanning electron microscopy (SEM), it could be observed that crystallization of the SBT thin film started around $650^{\circ}C$ and complete crystallization was accomplished around $750^{\circ}C$ and grains grew from a small spheric form to rod-like. For the leakage current density of the SBT capacitor depending upon various annealing atmospheres, capacitor annealed in the oxygen atmosphere showed the most excellent characteristic, and they were respectively about $2.13\times10^{-9}[A/cm^2]$ at 5V and 340.

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2-Dimensional Holographic Grating Formation in Chalcogenide Thin Films

  • Lee, Jung-Tae;Yeo, Choel-Ho;Chung, Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.1
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    • pp.34-37
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    • 2004
  • Amorphous chalcogenide thin films, especially a-(Se, S) based films, exhibit a number of photo-induced phenomena. In this study, we make the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag thin film and then we measure the holographic diffraction efficiency according to thickness of Ag. And we form the two-dimensional holographic grating. At first, we formed one-dimensional grating and then we form two-dimensional grating by rotate the sample. We found out the most suitable thickness of Ag and in case of As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag(600${\AA}$), the diffraction efficiency was more higher than other samples. The holographic grating was formed by He-Ne laser(λ=632.8nm). The intensity of incident beam was 2.5mW and incident angle was 20$^{\circ}$. We confirm. the two-dimensional holographic grating by the pattern of diffracted beam and AFM(Atomic Force Microscope) image. We perform the etching process using by 0.26N NaOH in order to confirm clearly two-dimensional grating.

Realization and Electrical-Optical Properties of AZO/p-Si UV Photodetector (AZO/p-Si 자외선 수광소자의 전기적.광학적 특성)

  • Oh, Sang-Hyun;Jeong, Yun-Hwan;Chen, Hao;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.323-324
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    • 2007
  • Investigation of improving the properties of UV photodetector which uses the wide bandgap of ZnO are under active progress. In this paper, transparent conducting aluminum-doped Zinc oxide films(AZO) were prepared by rf magnetron sputtering on glass(corning 1737) and p-Si substrate, were then annealed at temperature $400^{\circ}C$ for 2hr. The AZO thin films were deposited by RF sputtering system. HF power and work pressure is 120 W and 15 mTorr, respectively, and the purity of AZO target is 5N. The AZO thin films were deposited at 300, 400, $500^{\circ}C$, and $600^{\circ}C$. For sample deposited at $400^{\circ}C$, we observed best $V_r-I_{ph}$ of 0.94 mA and good transmittance.

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Quality prediction method by using ZnO thin film deposition process modeling (ZnO 박막 증착 공정 모델링에 의한 품질 예측 기법)

  • Lim, Keun-Young;Chung, Doo-Yeon;Lee, Sang-Keuk;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.163-164
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    • 2006
  • ZnO deposition parameters are not independent and have a nonlinear and complex properties respectively. Therefore, finding optimal process conditions are very difficult and need to do many experiments. To predict ZnO deposition result, neural network was used. To gather training data, Si, GaAs, and Glass were used for substrates, and substrate temperature, work pressure, RF power were $50-500^{\circ}C$, 15 mTorr, and 180-210 W respectively, and the purity of target was ZnO 4N. For predicting the result of ZnO deposition process exactly, sensitivity analysis and drawing a response surface was added. The temperature of substrate was evaluated as a most important variable. As a result, neural network could verify the nonlinear and complex relations of variables and find the optimal process condition for good quality ZnO thin films.

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Room temperature deposition of SiN thin film using pulsed $SiH_4-N_2$ plasma and the effect of duty ratio on refractive index (펄스드 $SiH_4-N_2$ 플라즈마를 이용한 SiN 박막의 상온 증착과 굴절률에의 Duty ratio 영향)

  • Kwon, Sang-Hee;Kim, Byung-Whan;Woo, Hyung-Su;Lee, Hyung-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.25-26
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    • 2009
  • Pulsed-PECVD를 이용하여 상온에서 실리콘 나이트라이드(SiN) 박막을 증착하였다. 본 연구에서는, 60-100%의 duty ratio 변화에 따른 굴절률을 살펴보고, 굴절률에 대한 이온에너지의 영향을 분석했다. RF 소스파워는 900W로 고정하였고 $SiH_4-N_2$를 이용하였다. 이온에너지에 대한 정보는 non-invasive 이온 분석기를 이용하여 수집하였다. 측정된 이온에너지 변수는 high ion energy, low ion energy, high ion energy flux, low ion energy flux이며, 이를 이용해 또 다른 변수인 ion energy flux ratio를 계산하였다. Duty ratio의 감소에 따라 굴절률은 일반적으로 감소하였다. 또한 duty ratio의 감소에 따라 high ion energy는 증가하였다. 한편, 60-80%에서 굴절률은 이온에너지 flux의 비에 강한 의존성을 보였으며, 60%를 제외한 모든 duty ratio 구간에서 굴절률은 Nl에 강하게 영향을 알고 있는 것으로 유추되었다. 굴절률은 1.508와 1.714 사이에서 변화하였다.

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Inorganic Thin Film Passivation Layer Fabricated by Plasma Enhanced Chemical Vapor Deposition

  • Lee, Bum-Hee;Park, Dong-Hee;Jin, Chang-Kyu;Kim, Tae-Hwan;Choi, Won-Kook
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.516-516
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    • 2013
  • Flexible Display를 제작하기 위해서는 유기소자를 보호하는 보호막이 필요하다. 유기소자는 산소 및 수분에 매우 취약하기 때문에 장수명을 확보하기 위해서는 추가적인 보호층이 필요하다. 본 논문에서는 이를 위해 Encapsulation 중 한 방법인 Barrier Film을 제작하고 그에 따른 광학적인 특성 및 수분 투습율을 조사하였다. Barrier film의 광학적 분석 방법으로는 XPS, SEM, AFM, Transmittance를 측정하였으며, XPS는 박막내의 화학적인 결합을 알기 위해서 사용되었고, SEM은 박막의 두께 및 박막내의 결함을 파악하고자 하였다. SEM을 통해 증착속도가 32.6 nm/m이라는 것을 관찰할 수 있었다. AFM을 통해 증착된 박막의 표면 거칠기를 파악하였다. Transmittance는 PET 기판을 사용하여 가시광 영역에서 80%이상의 투과도를 나타내었다. PECVD 장비를 사용하여 SiH4, NH3, N2가스를 사용하여 PET 필름 위에 박막을 증착하였으며, 유량을 10~400 sccm 내에서 변화시키고, RF Power는 각각 30~300 W 15분간 증착하였다. 제작된 보호막의 수분투습율은 $2{\times}10{_2}^{-2}g/m^2/day$ 이하의 값을 나타내었다.

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Characteristics of a planar Bi-Sb multijunction thermal converter with Pt-heater (백금 히터가 내장된 평면형 Bi-Sb 다중접합 열전변환기의 특성)

  • Lee, H.C.;Kim, J.S.;Ham, S.H.;Lee, J.H.;Lee, J.H.;Park, S.I.;Kwon, S.W.
    • Journal of Sensor Science and Technology
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    • v.7 no.3
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    • pp.154-162
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    • 1998
  • A planar Bi-Sb multijunction thermal converter with high thermal sensitivity and small ac-dc transfer error has been fabricated by preparing the bifilar thin film Pt-heater and the hot junctions of thin film Bi-Sb thermopile on the $Si_{3}N_{4}/SiO_{2}/Si_{3}N_{4}$-diaphragm, which functions as a thermal isolation layer, and the cold junctions on the dielectric membrane supported with the Si-substrate, which acts as a heat sink, and its ac-dc transfer characteristics were investigated with the fast reversed dc method. The respective thermal sensitivities of the converter with single bifilar heater were about 10.1 mV/mW and 14.8 mV/mW in the air and vacuum, and those of the converter with dual bifilar heater were about 5.1 mV/mW and 7.6 mV/mW, and about 5.3 mV/mW and 7.8 mV/mW in the air and vacuum for the inputs of inside and outside heaters, indicating that the thermal sensitivities in the vacuum, where there is rarely thermal loss caused by gas, are higher than those in the air. The ac-dc voltage and current transfer difference ranges of the converter with single bifilar heater were about ${\pm}1.80\;ppm$ and ${\pm}0.58\;ppm$, and those of the converter with dual bifilar heater were about ${\pm}0.63\;ppm$ and ${\pm}0.25\;ppm$, and about ${\pm}0.53\;ppm$ and ${\pm}0.27\;ppm$, respectively, for the inputs of inside and outside heaters, in the frequency range below 10 kHz and in the air.

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A Study on the Mechanical Properties of CNx Thin Films Deposited by Asymmetric Bipolar Pulsed D.C. Sputtering (비대칭 펄스 DC 반응성 스퍼터링 법에 의한 CNx 박막의 기계적 특성에 관한 연구)

  • Kim, J.H.;Kim, D.W.;Cha, B.C.;Kim, S.K.;Lee, B.S.;Jeon, S.H.;Kim, D.I.;You, Y.Z.
    • Journal of the Korean Society for Heat Treatment
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    • v.22 no.5
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    • pp.290-297
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    • 2009
  • In case of using Asymmetric Bipolar Pulsed DC (ABPD) power generator, thin film is efficiently deposited as ions are getting higher energy by suppressing target poisoning and electric arc. In this article, the mechanical properties of CNx thin films deposited on the STS 316L were compared with DC and ABPD power generators. The CNx thin films deposited with ABPD clearly improved wear resistance by higher ratio of sp3CN as compared with DC. Nb interlayer affected to increase the value of 10N of adhesion between CNx thin films and substrate. But, CNx thin films deposited with ABPD couldn't endure to wear load and decreased wear resistance as the films were too thinner than substrate. Nevertheless the higher substrate bias energy applied to perform the dense films, it wasn't shown benefits about the wear properties from DC sputtering. But, in case of using ABPD sputtering, the wear resistance was largely improved without changing morphology despite of thin films.