• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2007.10a
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• pp.104-107
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• 2007

An aspheric microlens array to improve the properties of multi optical probes was designed and fabricated. To generate multi optical probes with good qualities, a microlens array with the minimum spherical aberration was designed by ray tracing. Using the reflow process, a master pattern of aspheric microlens array was made and finally with the ultraviolet-imprinting (UV-imprinting) method, the aspheric microlens array was replicated. The reflow condition was optimized to realize the master pattern of the microlens array with the designed aspheric shape. The intensity distribution of the optical probes at the focal plane showed a diffraction-limited shape.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.196-198
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• 2003

Classical lithography in semiconductor employs stepper technologies. Limits of this technology are clearly seen at structures below 100nm. Nano-imprinting lithography is a new method for generating patterns in submicron range at reasonable cost. In order to manufacture nano-imprinting lithography(NIL) equipment, several NIL manufacturers have been developing key technologies for realization of nano-imprinting process, recently. In this paper, we've been describe state-of-the-art and technology trends for nano-imprinting lithography equipments.

• Journal of the Korean Vacuum Society
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• v.13 no.1
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• pp.39-45
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. A 5${\times}$5${\times}$0.09 in. quartz stamp is fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. FAS(Fluoroalkanesilane) is used as a material for anti-adhesion surface treatment on the stamp and a thin organic film to improve adhesion on a wafer is formed by spin-coating. The low viscosity resin droplets with a nanometer scale volume are dispensed on the whole area of the coated wafer. The UV-NIL experiments have been performed using the EVG620-NIL. 370 nm - 1 m features on the stamp have been transferred to the thin resin layer on the wafer using the multi-dispensing method and UV-NIL process. We have measured the imprinted patterns and residual layer using SEM and AFM to evaluate the potential of the process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.12
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• pp.771-775
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• 2015

In this paper, we designed and fabricated low cost imprinting process for micro patterning on FCCL (flexible copper clad laminate). Compared to conventional imprinting process, developed fabrication method processing imprint and UV photolithography step simultaneously and it does not require resin etch process and it can also reduce the fabrication cost and processing time. Based on proposed method, patterns with $10{\mu}m$ linewidth are fabricated on $180mm{\times}180mm$ FCCL. Compared to conventional methods using LDI (laser direct imaging) equipment that showed minimum line with $10{\sim}20{\mu}m$, proposed method shows comparable pattern resolution with very competitive price and shorter processing time. In terms of mass production, it can be applied to fabrication of large-area low cost applications including FPCB.

• Transactions of Materials Processing
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• v.14 no.5 s.77
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• pp.473-476
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• 2005

The demand of on-chip total analyzing system with MEMS (micro electro mechanical system) bio/chemical sensor is rapidly increasing. In on-chip total analyzing system, to detect the bio/chemical products with submicron feature size, a filtration system with nano-filter is required. One of the conventional methods to fabricate nano-filter is to use direct patterning or RIE (reactive ion etching). However, those procedures are very costly and are not suitable fur mass production. In this study, we suggested new fabrication method for a nano-filter based on replication process, which is simple and low cost process. After the Si master was fabricated by laser interference lithography and reactive ion etching process, the polymeric mold was replicated by UV-imprint process. Metallic nano-filter was fabricated after removing the polymeric part of metal deposited polymeric mold. Finally, our fabrication method was applied to metallic nano-filter with $1{\mu}m$ pitch size and $0.4{\mu}m$ hole size for bacteria sensor application.

• Transactions of the Society of Information Storage Systems
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• v.6 no.1
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• pp.37-40
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• 2010

Fresnel lens is a kind of refractive optical lens with various advantages. It has nearly flat shaped optical lens that has small mass. Fresnel lens has number of applications in the compact optical systems. Recently, demands of high quality Fresnel lens for small size optical systems such as illumination units, compact imaging systems, display units, information storage systems, optical detecting units had increased rapidly. Conventional manufacturing process of high quality Fresnel lens is direct machining. However, it is not suitable for mass production because of high cost and long cycle time. Replication method can provide cost effective mass production process. However, there are various issues about replication of Fresnel lens. Fresnel lens has number of sharp blade shape prism. In the replication process, this blade shape causes defects that can affect optical efficiency. In this study, replication processes; injection molding process and UV imprinting process, were developed and evaluated using Fresnel lens that has maximum pattern height of $250\;{\mu}m$ and aspect ratio of 1.5.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1622-1624
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• 2006

We introduce a modified UV-imprint lithography, a resin transfer from the template to the substrate. We analyzed this method by considering the surface and interfacial free energies of the template-resinsubstrate system. This technique is purely fast and applicable to large area patterning.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.525-526
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• 2010

• Journal of the Microelectronics and Packaging Society
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• v.29 no.1
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• pp.55-59
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• 2022

In this paper, we compared the electric field and absorptance of nano particles in nanostructures by amplifying the electric field around the nanoparticles through plasmon resonance and comparing the structure that can increase the absorptance with the nanostructure by using the Finite Different Time Domain (FDTD) simulation. In addition, the width of the nanostructure was adjusted to 240 nm ~ 300 nm, and the light absorptance rate was higher as the gap between the particles was short. In addition, a study was conducted on the formation of nanoparticles and nanostructures on the surface through UV imprint. In order to form particles in the structure, the nano particles were first arranged in the mold used for the fabrication of the structure using spray coating, and then fabricated through UV imprinting. The nanostructure and particles were formed together by scanning electron microscopy.

• Polymer(Korea)
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• v.32 no.2
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• pp.138-142
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• 2008

Molecularly imprinting technology is an effective method to prepare a synthetic material with a high selectivity to a target molecule. In this study, a molecularly imprinted polymer (MIP) was synthesized via UV-polymerization using theophylline and UV-curable polyester-acrylate resin as a template molecule and a crosslinker, respectively. To elucidate the effects of functional monomer type on the performance of the MIP, each MIP was synthesized using mathacrylic acid, acrylic acid, and acryl amide as functional monomers. Each MIP showed higher rebinding capacity to theophylline than its corresponding non-imprinted polymer (NIP). The MIP synthesized using mathacrylic acid as a functional monomer showed the highest rebinding capacity to theophylline. The selectivity of the MIP was investigated using a solution with caffeine having a very similar structure to theophylline. The binding performance of the MIP to theophylline decreased when distilled water was used as a solvent, which has more polarity than chloroform.