• Proceedings of the Optical Society of Korea Conference
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• 2003.02a
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• pp.234-235
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• 2003

All solid-state UV lasers provide efficient, clean and semipermanent light sources for various applications, such as eye surgery, microchip lithography. $CsLiB_{6}O_{10}$ (CLBO) is one of the most suitable crystals for UV generation because of its small walk-off, large effective nonlinear susceptibility in UV region and high damage threshold. We produced fourth (266 nm) and fifth (213 nm) harmonic generation of an Nd：YAG laser (1064 nm) with $LiB_{3}O_{5}$ as a second harmonic generation medium and CLBO as a fourth harmonic and fifth harmonic mediums. (omitted)

• 기계와재료
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• v.22 no.1
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• pp.22-29
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• 2010

최근 휴대폰 등 모방일 전자기기 산업에서 차세대 고부가 PCB(MLB, HDI, FPC, 등) 및 고기능 PCB(COF, MOF, SOF)의 급속한 적용 확대로 직경$20{\mu}m$급의 비아홀(viahole) 및 interconnection 홀 가공을 위한 초정밀/초고속 레이저 드릴링 공정 및 장비기술 개발에 대한 시장의 요구가 급증하고 있다. 이에 반해 기존의 CO2 레이저 드릴링은 기술적 한계에 도달하여 시장의 요구에 대응이 불가하며, 선진업체에서는 최근 UV 레이저 드릴링 장비에 대한 시장 점유율을 높여가고 있다. 특히 국내시장은 미국의 ESI사가 독점하고 있어 기술개발 투자를 통한 국산화가 절실한 상황이다. 이에 당사에서는 초고속/초정밀 UV laser 시스템을 이용한 FPC iva hole drilling을 연구과제로 개발을 진행하고 있으며 국산화를 넘어서 세계시장점유를 목표로 공정장비개발을 진행중이다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.185-187
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• 2004

The electron concentration of ZnO thin film fabricated by pulsed laser deposition was controlled by varying oxygen gas pressure. The electron concentration of ZnO was increased from $10^{17}\;to\;10^{19}/cm^3$ as oxygen gas pressure increased from 20 mTorr to 350 mTorr. Ultraviolet(UV) intensity of photoluminescence of ZnO was controlled, too. UV intensity of ZnO was increased as oxygen gas pressure increased from 20 mTorr to 350 mTorr. The relation between electron concentration and UV intensity was investigated.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2005.11a
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• pp.37-41
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• 2005

When screen size of the Flat Panel Display (FPD) becomes larger, the traditional photo-lithography using photomasks and UV lamps might not be possible to make patterns on Photo Resist (PR) material due to limitation of the mask size. Though the maskless photo-lithography using UV lasers and scanners had been developed to implement large screen display, it was very slow to apply the process for mass-production systems. The laser exposure system using 405 nm semi-conductor lasers and Digital Micromirror Devices (DMD) has been developed to overcome above-mentioned problems and make more than 100 inches FPD devices. It makes very fine patterns for full HD display and exposes them very fast. The optical engines which contain DMD, Micro Lens Array (MLA) and projection lenses are designed for 10 to 50 ${\mu}m$ bitmap pattern resolutions. The test patterns for LCD and PDP displays are exposed on PR and Dry Film Resists (DFR) which are coated or laminated on some specific substrates and developed. The fabricated edges of the sample patterns are well-defined and the results are satisfied with tight manufacturing requirements.

• Korean Journal of Materials Research
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• v.33 no.2
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• pp.71-76
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• 2023

The electroconvection generated on the surface of an ion exchange membrane (IEM) is closely related to the electrical/chemical characteristics or topology of the IEM. In particular, when non-conductive regions are mixed on the surface of the IEM, it can have a great influence on the transfer of ions and the formation of nonlinear electroconvective vortices, so more theoretical and experimental studies are necessary. Here, we present a novel method for creating microscale non-conductive patterns on the IEM surface by laser ablation, and successfully visualize microscale vortices on the surface modified IEM. Microscale (~300 ㎛) patterns were fabricated by applying UV nanosecond laser processing to the non-conductive film, and were transferred to the surface of the IEM. In addition, UV nanosecond laser process parameters were investigated for obvious micro-pattern production, and operating conditions were optimized, such as minimizing the heat-affected zone. Through this study, we found that non-conductive patterns on the IEM surface could affect the generation and growth of electroconvective vortices. The experimental results provided in our study are expected to be a good reference for research related to the surface modification of IEMs, and are expected to be helpful for new engineering applications of electroconvective vortices using a non-conductive patterned IEM.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.3
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• pp.36-40
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• 2013

Recently, electronic equipments become smaller, more functional, and more complex than before. As these trends, MLC(multi-layer ceramic) circuit has been emerged to a promising technology in semiconductor inspection industry. Especially, multi-layer ceramic which is consisted of many fine-pitch multi-hole is used to produce a semiconductor inspection unit. The hole is processed by UV laser. But, working conditions are changed all the time. Therefore real time measurement of fine-pitch multi-hole is very important method for ensuring performance. In this paper we found the best method for illuminating and auto focusing. And, we verified our equipment.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.656-660
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• 2003

We studied the crystallization behavior of LP-CVD a-Si film using UV pulsed laser. With increase in the shot number of irradiation by fixing its energy density, poly-Si film having a large grain size of $0.5 {\mu}m$ was obtained. By analyzing the crystallized Si films using optical analysis such as Raman spectroscopy or AFM technique etc., conspicuous correlation between the grain size and the resultant film properties such as the stress or the roughness has been found. With the increase in the energy density or the shots number of laser, remarkable grain growth occurred following to the roughness formation corresponding to the increase in the tensile stress.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2006.11a
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• pp.103-107
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• 2006

Decapsulation of EMC(Epoxy Molding Compound) in package device is a method used to inspect inside of device by removing plastic molding. So far, chemical etching and mechanical grinding methods have been used widely. Recently, several works using laser have been carried out. This method has advantages with fast process time and precision than conventional methods because of noncontact process. Also, laser process is a clean process because of removing EMC directly without using toxic chemicals. The wavelength of laser used in this study is 355nm. Key parameters of removing EMC are laser power, scan speed, and number of scans of laser. It if confirmed that laser decapsulation is a useful process to inspect inside a device with a small thermal damage to chip surface.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.361-362
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• 2012

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.04b
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• pp.65-68
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• 2002

The effect of low-temperature ZnO buffer layer has been investigated for the optical properties of ZnO thin films. ZnO buffers and thin films have been deposited using the pulsed laser deposition technique. ZnO buffer layers were grown at $200^{\circ}C$ with various thickness of 0 to 60 nm, followed by raising the substrate temperature to $400^{\circ}C$ to grow $2{\mu}m$ ZnO thin films. The buffer layers could relax stresses induced by the lattice mismatch and different thermal expansion coefficients between ZnO thin films and sapphire substrate. In order to identify the optical properties of ZnO thin films, PL measurement was used. From the results of PL measurement, all the fabricated ZnO thin films with buffer layers have shown intensive UV emission with a narrow linewidth. ZnO thin films with buffer layer of 20 nm have shown the strongest UV emission. It was found that the use of ZnO buffer layer plays an important role to improve the intensive UV emission of the ZnO thin films.