• Atmosphere
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• v.16 no.4
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• pp.333-342
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• 2006

The long-term trends of global solar irradiance, air temperature, specific humidity and cloudiness measured at King Sejong station, Antarctica, during the period of 1988-2004, have been investigated. A statistically insignificant decrease, -0.21 $Wm^{-2}yr^{-1}$ (-0.26 %$yr^{-1}$, P<0.5) in global solar irradiance was found in an analysis from the time series of the monthly mean values, except for the increasing trends only in two months of January and June. The trends in irradiance are directly and inversely associated with the cloudiness trends in annual and monthly means. The trends in surface air temperature show a slight warming, $0.03^{\circ}Cyr^{-1}$ (1.88 %$yr^{-1}$, P<0.5) on the annual average, with cooling trend in the summer months and the warming in the winter. The exact relationship, if any, between the irradiance and temperature trends is not known. No significant tendency was found in specific humidity for the same periods. Recent (1996-2004) erythermal ultraviolet irradiance shows decreasing trend in annual mean, -0.15 $mWm^{-2}yr^{-1}$ (-1.18 %$yr^{-1}$, P<0.1) which is about five times the trends of global solar irradiance. The ratio of erythermal ultraviolet to global solar irradiance shows remarkable seasonal variations with annual mean value of 0.01 % and a peak in October and November, showing the increase of ultraviolet irradiance resulting from the Antarctic ozone hole. The sensitivity of global solar irradiance to the change in cloudiness is roughly $13%oktas^{-1}$ which is about twice of the value at the South Pole due to the difference in the average surface reflectance between the two stations. Much more sensitive values of $59%oktas^{-1}$ was found for erythermal UV irradiance than for the global solar irradiance.

• Journal of the Semiconductor & Display Technology
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• v.10 no.4
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• pp.53-59
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• 2011

Recently there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we focused on the deformation of the $2^{nd}$ generation TFT-LCD sized ($370{\times}470mm^2$) large-area soft mold in the UV imprinting process. A mold was fabricated with PDMS(Poly-dimethyl Siloxane) layered glass back plate(t0.5). Besides, the mold includes large surrounding wall type protrusions of 1.9 mm width and the via-hole(7 ${\mu}m$ diameter) patterend area. The large surrounding wall type protrusions cause the proximity effect which severely degrades the uniformity of residual layer in the via-hole patterend area. Therefore the deformation of the mold was calculated by finite element analysis to assess the effect of large surrounding wall type protrusions and the flexiblity of the mold. The deformation of soft mold was verified by the measurements qualitatively.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.3
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• pp.36-40
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• 2013

Recently, electronic equipments become smaller, more functional, and more complex than before. As these trends, MLC(multi-layer ceramic) circuit has been emerged to a promising technology in semiconductor inspection industry. Especially, multi-layer ceramic which is consisted of many fine-pitch multi-hole is used to produce a semiconductor inspection unit. The hole is processed by UV laser. But, working conditions are changed all the time. Therefore real time measurement of fine-pitch multi-hole is very important method for ensuring performance. In this paper we found the best method for illuminating and auto focusing. And, we verified our equipment.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.7
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• pp.449-453
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• 2016

The amount of electrical energy has been increased with the rapid development of the industrial society. Accordingly, operating voltage of the power equipment and facility capacity are continuously increasing. Development trends of recent high-voltage electrical equipment are ultra high-voltage, large-capacity and compact. Early diagnosis of a failure of the power plant has been emerging as an important task as to supply high quality power to users. In this study, we have tried to develope an algorithm for distinguishing an arc fault signal generated in the power plant by using UV sensor.

• Journal of the Korean Applied Science and Technology
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• v.38 no.2
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• pp.618-627
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• 2021

Functional cosmetics are products that help emphasize certain functions such as skin whitening, wrinkle reduction and UV protection. Functional cosmetic items have expanded since 2017. Korea's functional cosmetics industry has focused on skin whitening, wrinkle reduction, UV protection, and high-performance items including medical cosmetics that are in the research and development stage. France leads the international export performance rankings followed by the United states and Germany. France's cosmetic industry is renowned for emphasizing mechanism driven functional cosmetics in bio-industrial and functional materials, while the United states cosmetic industry is in high demand for luxury premium products. The German cosmetic industry is showing growing strength in bio high tech functional cosmetics. For the Korean cosmetic industry to challenge the top 3, it will also have to develop new material of various functional cosmetics that can be applied to emerging industries, and develop a variety of industry equipment in an environment where politics and economy are backed by more focus on research.

• Journal of the Korean Wood Science and Technology
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• v.46 no.5
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• pp.449-470
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• 2018

A review of research trends on wood surface protection for exterior use obtained the following conclusions: It has been reported that inorganic compounds such as chrome and copper used as wood preservatives can protect wood from weathering. It has been shown that precoating with hydrophobic substances such as wax and oil, UV absorbers, and HALS (Hindered Amine Light Stabilizers) enhances weathering resistance on the surface of ACQ-treated wood. Opaque coatings of paint/stains and semitransparent stains on the surface of preservative treated wood can increase the synergistic effects on prevention of weathering deterioration. Also the need for repainting periodically for the protection of the preservative treated wood surface has also been suggested. ZnO or $TiO_2$ of fine particles, metal ions such as Co, Cr, Fe, Mn, Ni and Ti, and UV absorbers such as tris-resorcinol triazine derivatives, triazine and benzotriazole were introduced as additives for preventing UV in the transparent coating on wood. Several reports showed that chemical modification such as methylation, acetylation, or alkylations have made some increases the effects of preventing weathering with the increasing weight gain of chemical formulas. In heat-treated wood, there were various contradictory reports on the resistance of weathering, and there were some other reports emphasizing the necessity of painting with UV resistance, which leads to the necessity of more advanced studies.

• Journal of the Semiconductor & Display Technology
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• v.14 no.3
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• pp.61-66
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• 2015

Recently, the major trends of NIL are high throughput and large area patterning. For UV NIL, if it can be proceeded in the non-vacuum environment, which greatly simplifies tool construction and greatly shorten process times. However, one key issue in non-vacuum environment is air bubble formation problem. In this paper, numerical analysis of bubble defect of UV NIL is performed. Fluent, flow analysis focused program was utilized and VOF (Volume of Fluid) skill was applied. For various resist-substrate and resist-mold angles, effects of velocity inlet and residual layer thickness of resist on bubble defect formation were investigated. The numerical analyses show that the increases of velocity inlet and residual layer thickness can cause the bubble defect formation, however the decreases of velocity inlet and residual layer thickness take no difference in the bubble defect formation.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.28 no.1
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• pp.202-213
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• 2002

There have been a lot of research going on for developing a new blend of cosmetic ingredients. such as Porous sphere power, High functional composition power, Ultrafine power, UV sunscreen agent, Flat titanium dioxide etc. It's said that these ingredients will have multi functional effects on foundation users. Regarding foundation products. UV care effect is basic and consumers want special feelings for skin and its'transparency. People also look for a high performance foundation which helps skin stay shineless and flawless with a longlasting beautiful finish. A lot of cosmetics are produced in small quantities resulting in a greater variety depending on consumers'ages, hobbies, trends, season and environment, so more specific cosmetics should be developed. To satisfy more specific clientele, It is expected that special care product will come out. Foundations for the elderly and men are already being considered as well as ones for trans-genders are possibility. It's considered that fecundation is not a makeup but something in skin-care categories based on the development and production of high performonce foundations.

• Journal of the Semiconductor & Display Technology
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• v.9 no.2
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• pp.91-96
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• 2010

In recent years there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we consider the roll-to-plate type imprinting process. In the process a glass mold, which is placed upon the 2nd generation TFT-LCD glass sized substrate(370${\yen}$470 mm), is rolled by a rubber roller to achieve a uniform residual layer. The pressure distribution on the glass mold by rolling of the rubber roller is crucial information to analyze mold deformation, transferred pattern quality, uniformity of residual layer and so forth. In this paper the quantitative pressure distribution induced by rolling of the rubber roller was calculated with finite element analysis under the assumption of Neo-Hookean hyperelastic constitutive relation. Additionally the numerical results were verified by the experiments.

• Journal of the Semiconductor & Display Technology
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• v.12 no.2
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• pp.79-84
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• 2013

Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper, with the rolling type imprinting process, a mold, placed upon the $2^{nd}$ generation TFT-LCD glass sized substrate($370{\times}470mm^2$), is rolled by a rubber roller to achieve a uniform residual layer. The prediction of residual layer thickness of the photoresist by rolling of the rubber roller is crucial to design the rolling type imprinting process, determine the rubber roller operation conditions-mpressing force & feeding speed, operate smoothly the following etching process, and so forth. First, using the elasticity theory of contact problem and the empirical equation of rubber hardness, the contact length between rubber roller and mold is calculated with consideration of the shape and hardness of rubber roller and the pressing force to rubber roller. Next, using the squeeze flow theory to photoresist flow, the residual layer thickness of the photoresist is calculated with information of the viscosity and initial layer thickness of photoresist, the shape of mold pattern, feeding speed of rubber roller, and the contact length between rubber roller and mold previously calculated. Last, the effects of rubber roller operation conditions, impressing force & feeding speed, on the residual layer thickness are analyzed with consideration of the shape and hardness of rubber roller.