• 한국정밀공학회지
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• 제21권6호
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• pp.153-159
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• 2004

In this study, a new process to pattern directly on a thin metal layer using improved nano replication printing (nRP) process is suggested to evaluate the possibilities of fabricating a stamp for nano-imprinting. In the nRP process, any figure can be replicated from a bitmap figure file in the range of several micrometers with nano-scaled details. In the process, liquid-state resins are polymerized by two-photon absorption which is induced by femto-second laser. A thin gold layer was sputtered on a glass plate and then, designed patterns or figures were developed on the gold layer by newly developed top-down building approach. Generally, stamps fur nano-imprinting have been fabricated by using the costly electron-beam lithography process combined with a reactive ion-etching process. Through this study, the effectiveness of the improved nRP process is evaluated to make a stamp with the resolution of around 200nm with reduced cost.

• 한국정밀공학회지
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• 제23권3호
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• pp.156-162
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• 2006

Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

• 대한기계학회논문집A
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• 제32권4호
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• pp.303-309
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• 2008

Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.1365-1368
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• 2004

A scheme to control the laser power and the exposure time was studied to fabricate precise microstructures using the nanostereolithography (nSL) process. Some recent works have shown that a three-dimensional (3D) microstructure can be fabricated by the photopolymerizing process which is induced by two-photon absorption (TPA) with a femtosecond pulse laser. TPA provides the ability to confine photochemical and physical reactions within the order of laser wavelength, so neardiffraction limit features can be produced. In the nSL process, voxels are continuously generated to form a layer and then another layer is stacked in the normal direction of a plane to construct a 3D structure. Thus, fabrication of a voxel with low aspect ratio and small diameter is one of the most important parameters for fabricating precise 3D microstructures. In this work, the mechanism of a voxel formation is studied and a scheme on the control of laser power and exposure for minimizing aspect ratio of a voxel is proposed.

• 한국광학회:학술대회논문집
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• 한국광학회 1997년도 Advance Program of 14th optics andquantum Electronics conference, 1997제14 회 광학 및 양자전자 학술 발표회 논문 요약집
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• pp.33-33
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• 1997

• 한국광학회지
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• 제15권5호
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• pp.399-404
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• 2004

매개하향변환과정에서 발생한 640 nm와 660 nm 파장을 갖는 광자쌍의 진동수 얽힘상태를 이용하여 양자간섭실험을 수행하였다. 두 광자의 파장에 대응하는 각진동수가 각각 $\omega$$_1$과 $\omega$$_2$인 광자쌍을 간섭계의 출구에 놓인 두 검출기로 서로 다른 진동수의 광자들을 동시계수할 때, 광의 결맞음 시간이내에서 두 광자가 빔분할기에 도달하는 시간 간격의 변화 $\delta$$\tau$에 따라 동시계수가 변하는 간섭무늬를 관측하였다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권1호
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• pp.45-49
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• 2006

A nano-stereolithography (NSL) process has been developed for the fabrication of three-dimensional (3D) micro-devices with high spatital resolution of approximately 100 nm. In the NSL process, a complicated 3D structure can be created by stacking layer-by-layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D stacked structure was finished, unsolidified liquid resins were rinsed by ethanol to develop the fabricated structures; then, the polymerized structure was only left on the glass substrate. Through this work, several 3D microstructures such as a micro-channel, shell structures, and photonic crystals were fabricated to evaluate the possibility of the developed system.

• Bulletin of the Korean Chemical Society
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• 제23권2호
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• pp.189-194
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• 2002

Two-photon resonant third photon ionization of atomic bromine $(4p^5\;^2P_{3/2}\;and\;^2P_{1/2})$ has been studied using a photoelectron imaging spectroscopy in the wavelength region 250 - 278 nm. The technique has yielded simultaneously both relative branching ratios to the three levels of $Br^+(^3P_2,\;^3P_{0.1}\;and^1D_2)$ with $4p^4$ configuration and the angular distributions of outgoing photoelectrons. The product branching ratios reveal a strong propensity to populate particular levels in many cases. Several pathways have been documented for selective formation of $Br^+(^3P_2)$ and $Br^+(^3P_{0.1})$ ions. In general, the final ion level distributions are dominated by the preservation of the ion core configuration of a resonant excited state. Some deviations from this simple picture are discussed in terms of the configuration interaction of resonant states and the autoionization in the continuum. The photoelectron angular distributions are qualitatively similar for all transitions, with a positive $A_2$ anisotropy coefficient of 1.0-2.0 and negligible $A_4$ in most cases, which suggests that the angular distribution is mainly determined by the single-photon ionization process of a resonant excited state induced from the third photon absorption.

• Bulletin of the Korean Chemical Society
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• 제23권2호
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• pp.179-183
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• 2002

Resonance-enhanced multiphoton ionization with time-of-flight product imaging of the $N(^2D)$ atoms has been used to study the $N_2O$ photodissociation at 118.2 nm and the two-photon dissociation at 268.9 nm. These imaging experiments allowed the determination of the total kinetic energy distribution of the $NO(X^2{\prod})$ and $N(^2D_{5/2})$ products. The $NO(X^2{\prod})$ fragments resulting from the photodissociation processes are produced in highly vibrationally excited states. The two-photon photodissociation process yields a broad $NO(X^2{\prod})$ vibrational energy distribution, while the 118.2 nm dissociation appears to produce a vibrational distribution sharply peaked at $NO(X^2{\prod},\;{\nu}=14)$.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 추계학술대회 논문요약집
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• pp.41-41
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• 2003