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Development of Nano-Stereolithography Process for Precise Fabrication of Three-Dimensional Micro-Devices  

Park Sang-Hu (한국과학기술원 기계공학과)
Lim Tae Woo (한국과학기술원 기계공학과)
Yang Dong-Yol (한국과학기술원 기계공학과)
Yi Shin Wook (한국과학기술원 물리학과)
Kong Hong-Jin (한국과학기술원 물리학과)
Lee Kwang-Sup (한남대학교 공과대학 생명정보신소재공학과)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers C / v.55, no.1, 2006 , pp. 45-49 More about this Journal
Abstract
A nano-stereolithography (NSL) process has been developed for the fabrication of three-dimensional (3D) micro-devices with high spatital resolution of approximately 100 nm. In the NSL process, a complicated 3D structure can be created by stacking layer-by-layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D stacked structure was finished, unsolidified liquid resins were rinsed by ethanol to develop the fabricated structures; then, the polymerized structure was only left on the glass substrate. Through this work, several 3D microstructures such as a micro-channel, shell structures, and photonic crystals were fabricated to evaluate the possibility of the developed system.
Keywords
Two-Photon Polymerization; Nano-StereolithOgraphy; 3D Microstructures; Femtosecond Laser;
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Times Cited By KSCI : 4  (Citation Analysis)
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