• 한국세라믹학회지
• /
• 제52권4호
• /
• pp.290-293
• /
• 2015

The properties of the IZTO thin films on the glass were studied with a variation of the $SiO_2$ buffer layer thickness. $SiO_2$ buffer layers were deposited by plasma-enhanced chemical vapor deposition (PECVD) on the glass, and the In-Zn-Tin-Oxide (IZTO) thin films were deposited on the buffer layer by RF magnetron sputtering. All the IZTO thin films with the $SiO_2$ buffer layer are shown to be amorphous. Optimum $SiO_2$ buffer layer thickness was obtained through analyzing the structural, morphological, electrical, and optical properties of the IZTO thin films. As a result, the IZTO surface roughness is 0.273 nm with a sheet resistance of $25.32{\Omega}/sq$ and the average transmittance is 82.51% in the visible region, at a $SiO_2$ buffer layer thickness of 40 nm. The result indicates that the uniformity of surface and the properties of the IZTO thin film on the glass were improved by employing the $SiO_2$ buffer layer and the IZTO thin film can be applied well to the transparent conductive oxide for display devices.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
• /
• pp.1019-1021
• /
• 2008

Multilayer transparent electrodes (MTE) based on an ultrathin metal layer assisted by additional dielectric or semiconducting layers are investigated as electrodes in OLEDs including an inverted geometry. A special attention is paid to their tuning capability in injection behavior and to their potential for ultra-flexible electrodes.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
• /
• pp.860-863
• /
• 2007

ZnO nano film for transparent thin film transistors is prepared by injection type source delivery system of atomic layer deposition. By using this delivery system the source delivery pulse time can dramatically be reduced to 0.005s in ALD system. ZnO nanofilms obtained at $150^{\circ}C$ are characterized.

• 한국유기농업학회지
• /
• 제21권3호
• /
• pp.413-422
• /
• 2013

친환경 마늘재배농가의 엽초유인 및 제초작업에 소요되는 노동력을 절감하고 비닐피복으로 인한 비상품성 마늘의 비율을 낮추기 위하여 왕겨 등 4종의 피복재료를 이용하여 본 시험을 수행하였다. 출현기는 투명P.E.필름 피복구에서 2월 18일로 가장 빨랐으며 무피복구에서 3월 23일로 가장 늦었고, 이중피복구는 투명P.E.필름 피복구보다 다소 늦다. 지상부 생육은 관행>이중피복구>무피복 순으로 양호한 생육을 보였지만 엽초장은 짚+투명P.E.피복구와 톱밥+P.E.피복구에서 투명P.E.필름 피복보다 양호하였다. 피복재료별 잡초발생량은 검정유공P.E.필름+투명P.E.피복구에서 가장 적었고, 이중 피복구에서 48%~56%의 방제가를 보였다. 이중피복 처리에 따른 육쪽비율을 보면 짚+투명P.E.피복구에서 가장 높았고, 이중 피복구가 투명P.E.필름 피복구보다 2배 이상 육쪽비율이 높은 경향을 보였다. 지하부 특성은 투명P.E.필름 피복구에서 구경, 구고, 구중이 가장 양호하였으나 이차생장율이 가장 높았으며, 왕겨+투명P.E.피복구에서 이차생장율이 가장 낮았다. 전체수량은 투명P.E.필름 피복구에서 961kg/10a로 가장 많았지만 상품수량은 왕겨 피복구에서 848kg/10a로 가장 많았다.

• 한국신재생에너지학회:학술대회논문집
• /
• 한국신재생에너지학회 2009년도 춘계학술대회 논문집
• /
• pp.57-60
• /
• 2009

The conductive coating method was used for a various industrial fields. For example, Sputtering process is using to a coat of ITO layer in LCD or OLED panel manufacture process and fabricate a base layer of substrate of an electric printing device. However, conventional coating process (beam sputtering, spin coating etc.) has a problems in the industrial manufacturing process. These processes have a very high cost and critical manufacturing environment as a vacuum process. Recently, many researchers were proposed a various printing process instead of conventional coating process. In this paper, we propose an ESD printing process in ITO coating layer and apply to fabricate a conductive coating film. Ours transparent electrode had a surface resistance of about $66{\Omega}/{\square}$ and transparent of 74% in the wavelength of 500nm. This transparent electrode manufacturing process will be applied to Roll-to-Roll process. In addition, we developed roll printing process system for the next generation flexible solar cell.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
• /
• pp.339-339
• /
• 2013

We study on the optical and electrical properties of indium-free ZTO(ZnSnO)/Ag/ZTO (ZAZ) multilayer electrodes for the low-cost transparent electrode. In the first step, each single layer was deposited using rf magnetron in-line sputter with various working pressure based on $O_2$/$Ar+O_2$ ratio (0~3%) and power at room temperature. Secondly, we studied the optical and electrical properties by analyzing the refractive index, extinction coefficient, transmittance and resistivity of each layer. Finally, we optimized the thickness of each layer using macleod simulation program based on the analyzed optical properties and fabricated the multilayer electrode. As a result, We achieved a low sheet resistance of $11{\Omega}$/sq and anaverage transmittance of 80% in the visible region of light (380~780 nm). This indicates that indium-free ZAZ multilayer electrode is a promising low-cost and low-temperature processing electrode scheme.

• 한국전기전자재료학회논문지
• /
• 제30권6호
• /
• pp.401-405
• /
• 2017

Because silicon thin film solar cells have a high absorption coefficient in visible light, they can absorb 90% of the solar spectrum in a $1-{\mu}m$-thick layer. Silicon thin film solar cells also have high transparency and are lightweight. Therefore, they can be used for building integrated photovoltaic (BIPV) systems. However, the contact electrode needs to be replaced for fabricating silicon thin film solar cells in BIPV systems, because most of the silicon thin film solar cells use metal electrodes that have a high reflectivity and low transmittance. In this study, we replace the conventional aluminum top electrode with a transparent aluminum-doped zinc oxide (AZO) electrode, the band level of which matches well with that of the intrinsic layer of the silicon thin film solar cell and has high transmittance. We show that the AZO effectively replaces the top metal electrode and the bottom fluorine-doped tin oxide (FTO) substrate without a noticeable degradation of the photovoltaic characteristics.

• 한국전기전자재료학회논문지
• /
• 제20권9호
• /
• pp.798-801
• /
• 2007

Multilayer transparent electrodes, having a much lower electrical resistance than the widely used transparent conducting oxide electrodes, were prepared by using radio frequency magnetron sputtering. The multilayer structure consisted of five layers, indium tin oxided (ITO)/zinc oxide (ZnO)/Ag/zinc oxide (ZnO)/ITO. With about 50 nm thick ITO films, the multilayer showed a high optical transmittance in the visible range of the spectrum and had color neutrality. The electrical and optical properties of ITO/ZnO/Ag/ZnO/ITO multilayer were changed mainly by Ag film properties, which were affected by the deposition process of the upper layer. Especially ZnO layer was improved to adhesion of Ag and ITO. A high quality transparent electrode, having a resistance as low as and a high optical transmittance of 91% at 550 nm, was obtained. It could satisfy the requirement for the flexible OLED and LCD.

• 반도체디스플레이기술학회지
• /
• 제19권3호
• /
• pp.88-92
• /
• 2020

As a highly conductive and transparent electrode, the optical transmittances of ITO/Ag/ITO were simulated and compared with the experimental results. The simulations are based on the finite-difference time-domain (FDTD) method in solving linear Maxwell equations. In our simulations, the computation domain is set in the XZ-plane with 3D dimension, and a plane wave with variable wavelengths ranging from 250 nm to 850 nm is incident in the z-direction at normal incidence to the ITO/Ag/ITO film surrounded by free-air space. As the results through both simulations and experiments, it was shown that the thickness combinations by the ITO layers of about 40 nm and the Ag layer of about 10 nm could be most suitable conditions as a high conductive transparent electrode having the transmittance similar to that of a single ITO layer.

• 한국재료학회지
• /
• 제12권5호
• /
• pp.347-352
• /
• 2002

A transparent dielectric of the $PbO-B_2O_3-SiO_2-A1_2O_3$ system which was a low melting glass has been used for PDP (Plasma Display Panel), but it has a problem which is a reaction to be occurred between a transparent dielectric layer and electrodes (Ag, ITO) after firing. This research was conducted for ion migration of $Ag^+\$ and $Sn^ {2+}$ during firing three different frits of low melting glass. The result showed that yellowing phenomena occurred through a chemical reaction between $Ag^+\$and $Sn^ {2+}$ at 550~58$0^{\circ}C$ for 20~60 min. In addition, it was confirmed that the migration of $Sn^{2+}$ from ITO electrode made a strong effect on the yellowing phenomena.